JP2001524603A5 - - Google Patents

Download PDF

Info

Publication number
JP2001524603A5
JP2001524603A5 JP2000522295A JP2000522295A JP2001524603A5 JP 2001524603 A5 JP2001524603 A5 JP 2001524603A5 JP 2000522295 A JP2000522295 A JP 2000522295A JP 2000522295 A JP2000522295 A JP 2000522295A JP 2001524603 A5 JP2001524603 A5 JP 2001524603A5
Authority
JP
Japan
Prior art keywords
particles
carbon
electrodes
electrode
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000522295A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001524603A (ja
JP4336040B2 (ja
Filing date
Publication date
Priority claimed from US08/979,072 external-priority patent/US6015597A/en
Application filed filed Critical
Publication of JP2001524603A publication Critical patent/JP2001524603A/ja
Publication of JP2001524603A5 publication Critical patent/JP2001524603A5/ja
Application granted granted Critical
Publication of JP4336040B2 publication Critical patent/JP4336040B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000522295A 1997-11-26 1998-10-07 ダイヤモンド状カーボンを粒子にコーティングする方法と装置 Expired - Fee Related JP4336040B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/979,072 US6015597A (en) 1997-11-26 1997-11-26 Method for coating diamond-like networks onto particles
US08/979,072 1997-11-26
PCT/US1998/021111 WO1999027157A1 (en) 1997-11-26 1998-10-07 Method and apparatus for coating diamond-like carbon onto particles

Publications (3)

Publication Number Publication Date
JP2001524603A JP2001524603A (ja) 2001-12-04
JP2001524603A5 true JP2001524603A5 (enExample) 2006-01-05
JP4336040B2 JP4336040B2 (ja) 2009-09-30

Family

ID=25526671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000522295A Expired - Fee Related JP4336040B2 (ja) 1997-11-26 1998-10-07 ダイヤモンド状カーボンを粒子にコーティングする方法と装置

Country Status (9)

Country Link
US (2) US6015597A (enExample)
EP (1) EP1034320B1 (enExample)
JP (1) JP4336040B2 (enExample)
KR (1) KR100582134B1 (enExample)
CN (1) CN1109776C (enExample)
AU (1) AU9687898A (enExample)
DE (1) DE69803096T2 (enExample)
TW (1) TW414726B (enExample)
WO (1) WO1999027157A1 (enExample)

Families Citing this family (133)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9625916D0 (en) * 1996-12-13 1997-01-29 Gencoa Limited Low friction coating
US6015597A (en) * 1997-11-26 2000-01-18 3M Innovative Properties Company Method for coating diamond-like networks onto particles
JP3555844B2 (ja) * 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
US6406745B1 (en) * 1999-06-07 2002-06-18 Nanosphere, Inc. Methods for coating particles and particles produced thereby
DE50008516D1 (de) * 1999-07-13 2004-12-09 Unaxis Balzers Ag Anlage und verfahren zur vakuumbehandlung bzw. zur pulverherstellung
US6572937B2 (en) * 1999-11-30 2003-06-03 The Regents Of The University Of California Method for producing fluorinated diamond-like carbon films
US6696157B1 (en) * 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
US6795636B1 (en) 2000-03-05 2004-09-21 3M Innovative Properties Company Radiation-transmissive films on glass articles
US6749813B1 (en) 2000-03-05 2004-06-15 3M Innovative Properties Company Fluid handling devices with diamond-like films
EP1158088A3 (de) * 2000-05-26 2003-01-22 Voith Paper Patent GmbH Verfahren und Vorrichtung zur Behandlung einer Faserstoffsuspension
US6565719B1 (en) 2000-06-27 2003-05-20 Komag, Inc. Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content
US6669996B2 (en) 2000-07-06 2003-12-30 University Of Louisville Method of synthesizing metal doped diamond-like carbon films
US20030107865A1 (en) * 2000-12-11 2003-06-12 Shinsuke Masuda Wafer handling apparatus and method of manufacturing the same
US6537429B2 (en) 2000-12-29 2003-03-25 Lam Research Corporation Diamond coatings on reactor wall and method of manufacturing thereof
US7019399B2 (en) * 2001-01-22 2006-03-28 N.V. Bekaert S.A. Copper diffusion barriers made of diamond-like nanocomposits doped with metals
JP4753489B2 (ja) * 2001-04-27 2011-08-24 株式会社ユーテック Ｄｌｃ被覆粉体の焼結体の製造方法
EP1420876B1 (fr) * 2001-08-31 2005-08-10 Apit Corp. SA Procede de fabrication de poudre de grains composites et dispositif pour la mise en oeuvre du procede
US7106939B2 (en) * 2001-09-19 2006-09-12 3M Innovative Properties Company Optical and optoelectronic articles
US7887889B2 (en) * 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
US6878419B2 (en) * 2001-12-14 2005-04-12 3M Innovative Properties Co. Plasma treatment of porous materials
US20030157000A1 (en) * 2002-02-15 2003-08-21 Kimberly-Clark Worldwide, Inc. Fluidized bed activated by excimer plasma and materials produced therefrom
DE10213661A1 (de) * 2002-03-27 2003-10-16 Bosch Gmbh Robert Verfahren zur Herstellung einer Beschichtung eines metallischen Substrates
KR100486692B1 (ko) 2002-03-29 2005-05-03 주식회사 엘지이아이 연속처리가 가능한 열교환기 표면처리장치
KR100455430B1 (ko) 2002-03-29 2004-11-06 주식회사 엘지이아이 열교환기 표면처리장비의 냉각장치 및 그 제조방법
KR100455426B1 (ko) 2002-03-29 2004-11-06 주식회사 엘지이아이 열교환기 연속 표면처리장비의 2열처리구조
DE10227836B4 (de) * 2002-06-21 2006-02-09 Mikrowellen-Systeme Mws Gmbh Verfahren, Verwendung des Verfahrens sowie Verwendung eines Mikrowellenheizgeräts zum Mischen und zur Auslösung von chemischen Reaktionen von Feststoffgemischen oder Suspensionen in einem Mikrowellenfeld
US7150789B2 (en) 2002-07-29 2006-12-19 Micron Technology, Inc. Atomic layer deposition methods
GB0217553D0 (en) * 2002-07-30 2002-09-11 Sheel David W Titania coatings by CVD at atmospheric pressure
US6890596B2 (en) * 2002-08-15 2005-05-10 Micron Technology, Inc. Deposition methods
US6753271B2 (en) * 2002-08-15 2004-06-22 Micron Technology, Inc. Atomic layer deposition methods
US6673701B1 (en) * 2002-08-27 2004-01-06 Micron Technology, Inc. Atomic layer deposition methods
JP2004100012A (ja) * 2002-09-12 2004-04-02 Univ Nagoya 化合物薄膜、及び化合物薄膜の作製方法
DE10243022A1 (de) * 2002-09-17 2004-03-25 Degussa Ag Abscheidung eines Feststoffs durch thermische Zersetzung einer gasförmigen Substanz in einem Becherreaktor
JP2004138128A (ja) 2002-10-16 2004-05-13 Nissan Motor Co Ltd 自動車エンジン用摺動部材
US6969198B2 (en) * 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
DE10260745A1 (de) * 2002-12-23 2004-07-01 Outokumpu Oyj Verfahren und Anlage zur thermischen Behandlung von körnigen Feststoffen
US6907841B2 (en) * 2002-12-27 2005-06-21 Korea Institute Of Science And Technology Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method
JP3891433B2 (ja) * 2003-04-15 2007-03-14 日産自動車株式会社 燃料噴射弁
EP1479946B1 (en) * 2003-05-23 2012-12-19 Nissan Motor Co., Ltd. Piston for internal combustion engine
EP1482190B1 (en) * 2003-05-27 2012-12-05 Nissan Motor Company Limited Rolling element
JP2005008851A (ja) * 2003-05-29 2005-01-13 Nissan Motor Co Ltd 硬質炭素薄膜付き機械加工工具用切削油及び硬質炭素薄膜付き機械加工工具
JP2004360649A (ja) 2003-06-06 2004-12-24 Nissan Motor Co Ltd エンジン用ピストンピン
US7033670B2 (en) * 2003-07-11 2006-04-25 Siemens Power Generation, Inc. LCT-epoxy polymers with HTC-oligomers and method for making the same
US7781063B2 (en) 2003-07-11 2010-08-24 Siemens Energy, Inc. High thermal conductivity materials with grafted surface functional groups
JP4863152B2 (ja) * 2003-07-31 2012-01-25 日産自動車株式会社 歯車
WO2005014761A2 (ja) * 2003-08-06 2005-02-17 Nissan Motor Co., Ltd. 低摩擦摺動機構、低摩擦剤組成物及び摩擦低減方法
JP2005054617A (ja) * 2003-08-08 2005-03-03 Nissan Motor Co Ltd 動弁機構
JP4973971B2 (ja) * 2003-08-08 2012-07-11 日産自動車株式会社 摺動部材
DE602004008547T2 (de) 2003-08-13 2008-05-21 Nissan Motor Co., Ltd., Yokohama Struktur zur Verbindung von einem Kolben mit einer Kurbelwelle
JP4117553B2 (ja) * 2003-08-13 2008-07-16 日産自動車株式会社 チェーン駆動装置
JP4539205B2 (ja) 2003-08-21 2010-09-08 日産自動車株式会社 冷媒圧縮機
US7771821B2 (en) * 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
EP1508611B1 (en) 2003-08-22 2019-04-17 Nissan Motor Co., Ltd. Transmission comprising low-friction sliding members and transmission oil therefor
US7658994B2 (en) * 2003-12-30 2010-02-09 3M Innovative Properties Company Substrates and compounds bonded thereto
KR20060113747A (ko) * 2003-12-30 2006-11-02 쓰리엠 이노베이티브 프로퍼티즈 컴파니 기질 및 그에 결합된 화합물
JP2005256047A (ja) * 2004-03-10 2005-09-22 Ulvac Japan Ltd Ｍｇ合金部材の表面処理方法及び表面処理装置
CN1938224B (zh) * 2004-03-30 2011-03-30 东洋先进机床有限公司 基材表面处理方法及处理了表面的基材、医疗材料和器具
US8216672B2 (en) * 2004-06-15 2012-07-10 Siemens Energy, Inc. Structured resin systems with high thermal conductivity fillers
US7776392B2 (en) * 2005-04-15 2010-08-17 Siemens Energy, Inc. Composite insulation tape with loaded HTC materials
US7309526B2 (en) * 2004-06-15 2007-12-18 Siemens Power Generation, Inc. Diamond like carbon coating on nanofillers
US20050277721A1 (en) 2004-06-15 2005-12-15 Siemens Westinghouse Power Corporation High thermal conductivity materials aligned within resins
US7553781B2 (en) * 2004-06-15 2009-06-30 Siemens Energy, Inc. Fabrics with high thermal conductivity coatings
US20050274774A1 (en) * 2004-06-15 2005-12-15 Smith James D Insulation paper with high thermal conductivity materials
US20080050580A1 (en) * 2004-06-15 2008-02-28 Stevens Gary C High Thermal Conductivity Mica Paper Tape
US7592045B2 (en) * 2004-06-15 2009-09-22 Siemens Energy, Inc. Seeding of HTC fillers to form dendritic structures
US7553438B2 (en) * 2004-06-15 2009-06-30 Siemens Energy, Inc. Compression of resin impregnated insulating tapes
DE602005026820D1 (de) 2004-08-23 2011-04-21 Basf Se Verfahren zur herstellung von blättchenförmigen pi0)
US20070048456A1 (en) * 2004-09-14 2007-03-01 Keshner Marvin S Plasma enhanced chemical vapor deposition apparatus and method
WO2006083725A2 (en) * 2005-02-01 2006-08-10 Carlotto John A Vacuum deposition of coating materials on powders
US7651963B2 (en) * 2005-04-15 2010-01-26 Siemens Energy, Inc. Patterning on surface with high thermal conductivity materials
US7846853B2 (en) * 2005-04-15 2010-12-07 Siemens Energy, Inc. Multi-layered platelet structure
KR100649091B1 (ko) * 2005-06-13 2006-11-27 한국과학기술연구원 텅스텐 함유 다이아몬드상 탄소박막 및 그 제조방법,그리고 그에 따른 치과용구
US7781057B2 (en) * 2005-06-14 2010-08-24 Siemens Energy, Inc. Seeding resins for enhancing the crystallinity of polymeric substructures
US8357433B2 (en) * 2005-06-14 2013-01-22 Siemens Energy, Inc. Polymer brushes
US7851059B2 (en) * 2005-06-14 2010-12-14 Siemens Energy, Inc. Nano and meso shell-core control of physical properties and performance of electrically insulating composites
US7655295B2 (en) 2005-06-14 2010-02-02 Siemens Energy, Inc. Mix of grafted and non-grafted particles in a resin
US7955661B2 (en) * 2005-06-14 2011-06-07 Siemens Energy, Inc. Treatment of micropores in mica materials
US20070026221A1 (en) * 2005-06-14 2007-02-01 Siemens Power Generation, Inc. Morphological forms of fillers for electrical insulation
US7510742B2 (en) * 2005-11-18 2009-03-31 United Technologies Corporation Multilayered boron nitride/silicon nitride fiber coatings
US7604871B2 (en) * 2006-06-07 2009-10-20 Honeywell International Inc. Electrical components including abrasive powder coatings for inhibiting tin whisker growth
US20080008842A1 (en) * 2006-07-07 2008-01-10 Applied Materials, Inc. Method for plasma processing
US7547847B2 (en) * 2006-09-19 2009-06-16 Siemens Energy, Inc. High thermal conductivity dielectric tape
ATE458839T1 (de) * 2006-10-20 2010-03-15 3M Innovative Properties Co Verfahren für leicht zu reinigende substrate und artikel daraus
US20080139003A1 (en) * 2006-10-26 2008-06-12 Shahid Pirzada Barrier coating deposition for thin film devices using plasma enhanced chemical vapor deposition process
EP2203144A2 (en) 2007-10-01 2010-07-07 3M Innovative Properties Company Orthodontic composition with polymeric fillers
NL1036526A1 (nl) * 2008-02-14 2009-08-17 Asml Netherlands Bv Use of a coating, an article having the coating and a lithographic apparatus comprising the coating.
DE102008020468B4 (de) * 2008-04-23 2011-09-15 Auctio Gmbh Verfahren zur Beschichtung von Oberflächen mit einer elektrisch leitfähigen diamantähnlichen Schicht, elektrisch leitfähige diamantähnliche Schicht, hergestellt durch das Verfahren, Werkstück mit der nach dem Verfahren hergestellten elektrisch leitfähigen diamantähnlichen Schicht, Verfahren zur Herstellung des Werkstücks mit der elektrisch leitfähigen diamantähnlichen Schicht und Verfahren zur Bestimmung der Position des Werkstücks
JP5211332B2 (ja) * 2008-07-01 2013-06-12 株式会社ユーテック プラズマｃｖｄ装置、ｄｌｃ膜及び薄膜の製造方法
US20110171591A1 (en) * 2008-09-30 2011-07-14 Amos David T Orthodontic composition with heat modified minerals
US9067797B2 (en) * 2009-04-28 2015-06-30 Xi Chu Methods and systems to produce large particle diamonds
EP2427902B1 (en) 2009-05-06 2017-01-18 3M Innovative Properties Company Apparatus and method for plasma treatment of containers
FR2947814B1 (fr) * 2009-07-13 2011-10-14 Serigne Dioum Produit de depollution d'un fluide et procede d'obtention
TWI501792B (zh) 2009-11-23 2015-10-01 3M Innovative Properties Co 經處理之多孔顆粒及其製造及使用方法
US9205531B2 (en) 2011-09-16 2015-12-08 Baker Hughes Incorporated Methods of fabricating polycrystalline diamond, and cutting elements and earth-boring tools comprising polycrystalline diamond
US10005672B2 (en) 2010-04-14 2018-06-26 Baker Hughes, A Ge Company, Llc Method of forming particles comprising carbon and articles therefrom
TWI515276B (zh) 2010-05-25 2016-01-01 ３Ｍ新設資產公司 抗微生物塗料
WO2011150103A2 (en) 2010-05-25 2011-12-01 3M Innovative Properties Company Antimicrobial–coated medical articles
CN103154314B (zh) * 2010-10-07 2016-02-17 罗克斯达技术有限责任公司 适于生产硅的机械流化的反应器系统和方法
GB201021870D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
US20120258853A1 (en) 2011-04-11 2012-10-11 3M Innovative Property Company Porous particles with masking powder and methods of making and using the same
CN102752950A (zh) * 2011-04-22 2012-10-24 苏州市奥普斯等离子体科技有限公司 一种颗粒状物料低温等离子体表面处理方法及其装置
US9951419B2 (en) * 2011-09-03 2018-04-24 Ying-Bing JIANG Apparatus and method for making atomic layer deposition on fine powders
RU2014114867A (ru) 2011-09-16 2015-10-27 Бейкер Хьюз Инкорпорейтед Способы изготовления поликристаллического алмаза, а также режущих элементов и буровых инструментов, содержащих поликристаллический алмаз
JP6076780B2 (ja) * 2012-03-12 2017-02-08 エア・ウォーター株式会社 粉体処理装置および粉体処理方法
US8871153B2 (en) 2012-05-25 2014-10-28 Rokstar Technologies Llc Mechanically fluidized silicon deposition systems and methods
AU2013309311B2 (en) 2012-08-29 2015-06-25 Cardiac Pacemakers, Inc. Enhanced low friction coating for medical leads and methods of making
TWI565353B (zh) * 2012-10-19 2017-01-01 逢甲大學 可撓性電熱發熱體及其製作方法
EP2922594B1 (en) 2012-11-21 2018-02-14 Cardiac Pacemakers, Inc. Medical electrodes with layered coatings
KR20150108832A (ko) * 2013-01-23 2015-09-30 피코순 오와이 미립 물질의 처리를 위한 ａｌｄ 방법 및 장치
MX2015012544A (es) 2013-03-13 2016-02-10 Celanese Acetate Llc Filtros de humo para reducir componentes en un flujo de humo.
EP3013526A4 (en) * 2013-06-24 2017-03-08 3M Innovative Properties Company Abrasive particles, method of making abrasive particles, and abrasive articles
GB2521751A (en) * 2013-11-12 2015-07-01 Perpetuus Res & Dev Ltd Treating particles
US20170008143A1 (en) * 2014-01-24 2017-01-12 3M Innovative Properties Company Abrasive material having a structured surface
US9920185B2 (en) 2014-04-07 2018-03-20 Powder Treatment Technology, Llc Surface energy modified particles, method of making, and use thereof
US9520295B2 (en) * 2015-02-03 2016-12-13 Lam Research Corporation Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems
US9865459B2 (en) * 2015-04-22 2018-01-09 Applied Materials, Inc. Plasma treatment to improve adhesion between hardmask film and silicon oxide film
CN105617962B (zh) * 2016-02-27 2018-11-23 安徽海德化工科技有限公司 一种内外循环式超声波-微波搅拌反应釜
US10519539B2 (en) * 2017-03-24 2019-12-31 City University Of Hong Kong Method for hydrogen-free diamond-like coatings having isolated carbon particle embedded within
US20190127846A1 (en) * 2017-10-26 2019-05-02 Duralar Technologies, Llc Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors
CN107952402B (zh) * 2017-11-23 2019-11-01 福建农林大学 一种流化床及其气相法包覆片状材料的工艺
US20190161859A1 (en) * 2017-11-30 2019-05-30 Ying-Bing JIANG Apparatus for making large-scale atomic layer deposition on powdered materials with plowing action
CN109119627B (zh) * 2018-08-28 2022-03-29 中南大学 一种高性能硅碳基负极材料的制备方法及装置
CN110158051B (zh) * 2018-11-22 2020-07-17 中国科学院过程工程研究所 一种低温介稳流化工艺制备TiOxCyNz涂层及其复合涂层的系统及方法
TWI738301B (zh) 2019-04-24 2021-09-01 美商應用材料股份有限公司 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器
CN109954876B (zh) * 2019-05-14 2020-06-16 广东工业大学 一种抗氧化微纳铜材料的制备方法
CN110055513B (zh) * 2019-06-10 2021-01-15 南开大学 一种粉末原子层沉积设备及其沉积方法与应用
CN112176314A (zh) * 2019-07-05 2021-01-05 中国科学院宁波材料技术与工程研究所 一种制备金刚石包覆粉体的方法
JP7413786B2 (ja) * 2020-01-15 2024-01-16 セイコーエプソン株式会社 圧粉磁心の製造方法および圧粉磁心
CN113122820B (zh) * 2020-01-15 2023-05-30 株洲弗拉德科技有限公司 一种粉体专用真空气相沉积炉
CN113122821B (zh) * 2020-01-15 2023-05-30 株洲弗拉德科技有限公司 一种搅拌式粉体真空气相沉积炉
KR102488995B1 (ko) * 2020-08-03 2023-01-16 전남대학교산학협력단 분말 입자 코팅을 위한 증착 장치를 사용하여 분말 입자 표면을 균일하게 코팅하는 방법
CN115261816A (zh) * 2022-09-05 2022-11-01 西安交通大学 粉体表面类金刚石沉积的悬臂梁式振动等离子体流化床
EP4573228A1 (en) * 2023-05-26 2025-06-25 Argor-Aljba SA Support structure of pieces to be covered, in particular by means of a pvd (physical vapor deposition), dlc (diamond like carbon), cvd (chemical vapor deposition), pa-cvd (plasma assisted chemical vapor deposition) or pe-cvd (plasma enhanced chemical vapor deposition) covering

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59137311A (ja) * 1983-01-21 1984-08-07 Natl Inst For Res In Inorg Mater 多結晶質ダイヤモンドの合成法
DE3546113A1 (de) * 1985-12-24 1987-06-25 Santrade Ltd Verbundpulverteilchen, verbundkoerper und verfahren zu deren herstellung
US4806246A (en) * 1986-04-11 1989-02-21 Applied Membrane Technology, Inc. Pore size control using plasma polymerization techniques
US5080975A (en) * 1987-03-23 1992-01-14 Showa Denko K. K. Composite diamond granules
US4859493A (en) * 1987-03-31 1989-08-22 Lemelson Jerome H Methods of forming synthetic diamond coatings on particles using microwaves
JPS63270394A (ja) * 1987-04-28 1988-11-08 Showa Denko Kk 流動式ダイヤモンド合成方法及び合成装置
JPH0340953A (ja) * 1989-07-06 1991-02-21 Tomoegawa Paper Co Ltd 超伝導体成形物の製造方法
DE69021821T2 (de) * 1989-09-20 1996-05-30 Sumitomo Electric Industries Verfahren und Anlage zum Herstellen von Hartstoff.
JP3381916B2 (ja) * 1990-01-04 2003-03-04 マトソン テクノロジー，インコーポレイテッド 低周波誘導型高周波プラズマ反応装置
US5132105A (en) * 1990-02-02 1992-07-21 Quantametrics, Inc. Materials with diamond-like properties and method and means for manufacturing them
JP2739129B2 (ja) * 1990-02-21 1998-04-08 日本碍子株式会社 複合部材の製造方法
US5156885A (en) * 1990-04-25 1992-10-20 Minnesota Mining And Manufacturing Company Method for encapsulating electroluminescent phosphor particles
JP2967559B2 (ja) * 1991-03-29 1999-10-25 日亜化学工業株式会社 蛍光体及びその製造方法
DE4122834A1 (de) * 1991-07-10 1993-01-14 Siemens Ag Verfahren zur beschichtung von lwl-fasern
US5234529A (en) * 1991-10-10 1993-08-10 Johnson Wayne L Plasma generating apparatus employing capacitive shielding and process for using such apparatus
JPH06184533A (ja) * 1992-12-21 1994-07-05 Mitsubishi Cable Ind Ltd 被覆蛍光体の製造方法
JPH06299146A (ja) * 1993-04-20 1994-10-25 Mitsubishi Cable Ind Ltd シリカ被覆蛍光体の製造方法
DE69420774T2 (de) * 1993-05-13 2000-01-13 Applied Materials, Inc. Kontrolle der Kontamination in einem Plasma durch Ausgestaltung des Plasmaschildes unter Verwendung von Materialien mit verschiedenen RF-Impedanzen
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
US5811022A (en) * 1994-11-15 1998-09-22 Mattson Technology, Inc. Inductive plasma reactor
JP2838831B2 (ja) * 1994-12-27 1998-12-16 関西日本電気株式会社 分散型ｅｌ用蛍光体の被覆処理方法
US5556521A (en) * 1995-03-24 1996-09-17 Sony Corporation Sputter etching apparatus with plasma source having a dielectric pocket and contoured plasma source
JPH08316205A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd プラズマ処理方法及びプラズマ処理装置
JP3758203B2 (ja) * 1995-05-26 2006-03-22 日亜化学工業株式会社 真空紫外線励起発光蛍光体およびその製造方法
JP3585591B2 (ja) * 1995-07-29 2004-11-04 株式会社半導体エネルギー研究所 エッチング装置及びエッチング方法
EP0949200A1 (en) * 1996-06-05 1999-10-13 R-Amtech International, Inc. Method for forming conformal diamond-type carbon coatings, hard diamond-type carbon coating and porous filtration element using the same
US5948166A (en) * 1996-11-05 1999-09-07 3M Innovative Properties Company Process and apparatus for depositing a carbon-rich coating on a moving substrate
JP3040953U (ja) 1997-02-26 1997-09-05 株式会社 サン・マテック コンクリート打設用の床トラス鉄筋付き床構成材
JPH10261371A (ja) * 1997-03-17 1998-09-29 Futaba Corp 蛍光体及び表示管
US6015597A (en) * 1997-11-26 2000-01-18 3M Innovative Properties Company Method for coating diamond-like networks onto particles

Similar Documents

Publication Publication Date Title
JP2001524603A5 (enExample)
US10975472B2 (en) Nano-coating protection method for electrical connectors
TW328138B (en) Chamber etching method of plasma processing apparatus and plasma apparatus using such method
TW200509246A (en) Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith
WO2004063422A3 (en) Method for curing low dielectric constant film using direct current bias
TW362118B (en) Method for depositing amorphous SiNC coatings
US20190276933A1 (en) Plasma polymerization coating with uniformity control
WO2001045141A3 (en) Method and apparatus for smoothing thin conductive films by gas cluster ion beam
EP1134773A3 (en) Method and apparatus for generating a plasma and semiconductor device fabrication method and apparatus
TW363223B (en) A method for improving the quality of a titanium nitride layer including carbon and oxygen
JPH0950040A (ja) プラズマエッチング方法及び液晶表示パネルの製造方法
TW362337B (en) Plasma treatment methods and apparatus for treatment of a large-area work surface
JP2009526129A (ja) 短パルス大気圧グロー放電方法及び装置
TW363220B (en) Etching organic antireflective coating from a substrate
JP2571957B2 (ja) バッファ層を介した炭素または炭素を主成分とする被膜及びその作製方法
JP2003077904A5 (enExample)
WO1998059355A3 (fr) Cathode froide et procedes de fabrication
JPH03229886A (ja) 大気圧グロープラズマエッチング方法
Schram et al. Plasma processing and chemistry
JPS62136579A (ja) エツチング方法
EP1039519A3 (en) Method and apparatus for forming a porous SiO2 interlayer insulating film
GB2283461A (en) Etching thin coatings
JPH06291067A (ja) タングステン膜の成膜方法及びタングステンｃｖｄ装置
JP3148495B2 (ja) プラズマ発生装置およびその動作方法
JPS5756923A (en) Manufacture of thin film