JP2001516525A - 無線アーキテクチャ - Google Patents
無線アーキテクチャInfo
- Publication number
- JP2001516525A JP2001516525A JP53370698A JP53370698A JP2001516525A JP 2001516525 A JP2001516525 A JP 2001516525A JP 53370698 A JP53370698 A JP 53370698A JP 53370698 A JP53370698 A JP 53370698A JP 2001516525 A JP2001516525 A JP 2001516525A
- Authority
- JP
- Japan
- Prior art keywords
- digital
- analog
- transistor
- transistors
- threshold voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000005540 biological transmission Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 239000007943 implant Substances 0.000 claims 1
- 230000008901 benefit Effects 0.000 description 6
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- WURBVZBTWMNKQT-UHFFFAOYSA-N 1-(4-chlorophenoxy)-3,3-dimethyl-1-(1,2,4-triazol-1-yl)butan-2-one Chemical compound C1=NC=NN1C(C(=O)C(C)(C)C)OC1=CC=C(Cl)C=C1 WURBVZBTWMNKQT-UHFFFAOYSA-N 0.000 description 1
- 241000282376 Panthera tigris Species 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/06—Receivers
- H04B1/16—Circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Signal Processing (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Amplifiers (AREA)
- Transceivers (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Logic Circuits (AREA)
- Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
- Executing Machine-Instructions (AREA)
- Mobile Radio Communication Systems (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. ディジタル無線トランシーバ内に使用される集積回路であって、高しきい 値電圧を持つ第1MOSトランジスタと、低減しきい値電圧を持つ第2MOSト ランジスタとを含む集積回路。 2. 請求項1記載のディジタル無線トランシーバ内に使用される集積回路にお いて、前記第2MOSトランジスタのうちのNMOSトランジスタが負のしきい 値電圧を有し、前記第2MOSトランジスタのうちのPMOSトランジスタが正 のしきい値電圧を有する集積回路。 3. 請求項1又は2記載の集積回路を含む移動電話機。 4. ディジタル無線トランシーバ内に使用される集積回路であって、少なくと も或るいくつかが高しきい値電圧を有する複数個のMOSトランジスタを含むア ナログ・デバイスと、少なくとも或るいくつかが低減しきい値電圧を有する複数 個のMOSトランジスタを含むディジタル・デバイスとを備える集積回路。 5. MOSトランジスタを含むアナログ無線受信機および送信機構成要素と、 MOSトランジスタを含むアナログ−ディジタル変換器と、MOSトランジスタ を含むディジタル−アナログ変換器とを有し、前記アナログ無線受信機および送 信機構成要素と、前記アナログ−ディジタル変換器と、前記ディジタル−アナロ グ変換器とが同一の集積回路の部分を形成し、及び前記アナログ−ディジタル変 換器内および前記ディジタル−アナログ変換器内の前記MOSトランジスタが高 しきい値電圧を有しかつ前記アナログ構成要素内の前記MOSトランジスタの少 なくとも或るいくつかが低しきい値電圧を有するディジタル無線トランシーバ。 6. 請求項5記載のトランシーバを含む移動電話機。 7. それぞれMOSトランジスタを含むアナログ・デバイスとディジタル・デ バイスとを有し、前記ディジタル・デバイス内のMOSトランジスタが高しきい 値電圧を有し、かつ前記アナログ・デバイス内の前記MOSトランジスタの少な くとも或るいくつかが低しきい値電圧を有するディジタル無線トランシーバ。 8. 請求項7記載のディジタル無線トランシーバにおいて、前記アナログ・デ バイスと前記ディジタル・デバイスとが同一の集積回路の部分として形成される ディジタル無線トランシーバ。 9. それぞれMOSトランジスタを含むアナログ構成要素とディジタル構成要 素とを有し、前記ディジタル構成要素内の前記MOSトランジスタが前記アナロ グ構成要素内の前記MOSトランジスタの少なくとも或るいくつかよりも高いし きい値電圧を有するディジタル無線トランシーバ。 10.請求項9記載のディジタル無線トランシーバにおいて、前記アナログ構成 要素内のNMOSトランジスタが負のしきい値電圧を有しかつ前記アナログ構成 要素内のPMOSトランジスタが正のしきい値電圧を有するディジタル無線トラ ンシーバ。 11.MOSトランジスタを含むアナログ無線受信機および送信機構成要素と、 MOSトランジスタを含むアナログ−ディジタル変換器と、MOSトランジスタ を含むディジタル−アナログ変換器とを有し、前記アナログ−ディジタル変換器 内と前記ディジタル−アナログ変換器内の前記MOSトランジスタが高しきい値 電圧を有しかつ前記アナログ構成要素内の前記MOSトランジスタが低しきい値 電圧を有するディジタル無線トランシーバ。 12.請求項11記載のディジタル無線トランシーバにおいて、前記アナログ無 線受信機および送信機構成要素と、前記アナログ−ディジタル変換器と、前記デ ィジタル−アナログ変換器とが同一の集積回路の部分として形成されるディジタ ル無線トランシーバ。 13.請求項11又は12記載のディジタル無線トランシーバにおいて、前記ア ナログ受信機および送信機構成要素内のNMOSトランジスタが負のしきい値電 圧を有しかつ前記アナログ受信機および送信機構成要素内のPMOSトランジス タが正のしきい値電圧を有するディジタル無線トランシーバ。 14.それぞれMOSトランジスタを含むアナログ構成要素およびディジタル構 成要素とを有するディジタル無線トランシーバ集積回路を製造する方法であって 、前記ディジタル構成要素内の前記MOSトランジスタが高しきい値電圧を有し かつ前記アナログ構成要素内の前記MOSトランジスタの少なくとも或るいくつ かが低しきい値電圧を有するようにしきい値打込み濃度を変更することを含む方 法。 15.一対の共通ゲートMOSFETトランジスタと、入力信号が印加される一 対の入力MOSFETトランジスタとを有し、前記入力トランジスタが電源電圧 と接地とに接続され、かつ前記共通ゲート・トランジスタが前記入力トランジス タ間でカスコードされ、前記共通ゲート・トランジスタが低減しきい値電圧を有 する無線受信機増幅回路。 16.請求項15記載の無線受信機増幅回路において、前記入力トランジスタが 正規しきい値を有する無線受信機増幅回路。 17.それぞれが一対のMOSトランジスタを含む一対の伝送ゲートを有し、各 局部発振器信号が前記トランジスタのゲートに供給され、かつ入力信号が前記伝 送ゲートの入力に供給され、前記伝送ゲートの前記トランジスタが低減しきい値 を有する無線周波混合回路。 18.請求項17記載の無線周波混合回路において、前記伝送ゲートへの前記局 部発振器信号がそれぞれ一対のトランジスタで構成される一対の局部発振器ドラ イバを通して供給され、前記局部発振器ドライバの前記トランジスタが通常しき い値を有する無線周波混合回路。 19.請求項15又は16記載の増幅器と請求項17又は18記載の混合回路と を含む無線受信機。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9702375A GB2322042B (en) | 1997-02-05 | 1997-02-05 | Radio architecture |
GB9702375.8 | 1997-02-05 | ||
PCT/EP1998/000422 WO1998035386A1 (en) | 1997-02-05 | 1998-01-26 | Radio architecture |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001516525A true JP2001516525A (ja) | 2001-09-25 |
Family
ID=10807155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53370698A Ceased JP2001516525A (ja) | 1997-02-05 | 1998-01-26 | 無線アーキテクチャ |
Country Status (21)
Country | Link |
---|---|
US (2) | US6611680B2 (ja) |
EP (3) | EP1742268A3 (ja) |
JP (1) | JP2001516525A (ja) |
KR (2) | KR100686413B1 (ja) |
CN (1) | CN1165998C (ja) |
AU (1) | AU746534B2 (ja) |
BR (1) | BR9807551A (ja) |
CA (1) | CA2280128C (ja) |
DE (1) | DE69839512D1 (ja) |
DK (1) | DK0970523T3 (ja) |
EE (1) | EE9900342A (ja) |
ES (1) | ES2306470T3 (ja) |
GB (1) | GB2322042B (ja) |
HK (1) | HK1024098A1 (ja) |
ID (1) | ID22766A (ja) |
MY (1) | MY126413A (ja) |
NO (1) | NO993778L (ja) |
PL (1) | PL334808A1 (ja) |
RU (1) | RU2217862C2 (ja) |
TR (3) | TR199901818T2 (ja) |
WO (1) | WO1998035386A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006095581A1 (ja) * | 2005-03-10 | 2006-09-14 | Niigata Seimitsu Co., Ltd. | 半導体装置 |
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US6871057B2 (en) * | 2000-03-08 | 2005-03-22 | Nippon Telegraph And Telephone Corporation | Mixer circuit |
JP2004040735A (ja) * | 2002-07-08 | 2004-02-05 | Toyota Industries Corp | 半導体集積回路及び半導体集積回路の製造方法 |
KR100446004B1 (ko) * | 2002-07-12 | 2004-08-25 | 한국과학기술원 | 깊은 엔 웰 씨모스 공정으로 구현된 수직형 바이폴라 정션트랜지스터를 사용한 직접 변환 수신기 |
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US20090088124A1 (en) * | 2007-09-27 | 2009-04-02 | Nanoamp Solutions, Inc. (Cayman) | Radio Frequency Receiver Architecture |
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1998
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- 1998-01-26 CN CNB98802294XA patent/CN1165998C/zh not_active Expired - Fee Related
- 1998-01-26 DK DK98904147T patent/DK0970523T3/da active
- 1998-01-26 PL PL98334808A patent/PL334808A1/xx unknown
- 1998-01-26 ID IDW990733A patent/ID22766A/id unknown
- 1998-01-26 TR TR1999/01818T patent/TR199901818T2/xx unknown
- 1998-01-26 EP EP06020260A patent/EP1742267A3/en not_active Withdrawn
- 1998-01-26 ES ES98904147T patent/ES2306470T3/es not_active Expired - Lifetime
- 1998-01-26 DE DE69839512T patent/DE69839512D1/de not_active Expired - Fee Related
- 1998-01-26 JP JP53370698A patent/JP2001516525A/ja not_active Ceased
- 1998-01-26 EP EP98904147A patent/EP0970523B1/en not_active Expired - Lifetime
- 1998-01-26 WO PCT/EP1998/000422 patent/WO1998035386A1/en active IP Right Grant
- 1998-01-26 TR TR2000/00320T patent/TR200000320T2/xx unknown
- 1998-01-26 KR KR1019997006858A patent/KR100686413B1/ko not_active IP Right Cessation
- 1998-01-26 RU RU99119093/28A patent/RU2217862C2/ru not_active IP Right Cessation
- 1998-01-26 EE EEP199900342A patent/EE9900342A/xx unknown
- 1998-01-26 CA CA002280128A patent/CA2280128C/en not_active Expired - Fee Related
- 1998-01-26 BR BR9807551-9A patent/BR9807551A/pt not_active Application Discontinuation
- 1998-01-26 TR TR2000/00321T patent/TR200000321T2/xx unknown
- 1998-01-26 AU AU62135/98A patent/AU746534B2/en not_active Ceased
- 1998-01-26 KR KR1020057019195A patent/KR20050111639A/ko active Search and Examination
- 1998-02-04 MY MYPI98000443A patent/MY126413A/en unknown
- 1998-02-05 US US09/018,937 patent/US6611680B2/en not_active Expired - Lifetime
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1999
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2003
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2006095581A1 (ja) * | 2005-03-10 | 2006-09-14 | Niigata Seimitsu Co., Ltd. | 半導体装置 |
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