JP2001221950A - 非球面要素を有する投射露光レンズ - Google Patents

非球面要素を有する投射露光レンズ

Info

Publication number
JP2001221950A
JP2001221950A JP2000402836A JP2000402836A JP2001221950A JP 2001221950 A JP2001221950 A JP 2001221950A JP 2000402836 A JP2000402836 A JP 2000402836A JP 2000402836 A JP2000402836 A JP 2000402836A JP 2001221950 A JP2001221950 A JP 2001221950A
Authority
JP
Japan
Prior art keywords
lens
projection exposure
lenses
lens according
exposure lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000402836A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001221950A5 (enExample
Inventor
David R Shafer
デヴィッド・アール・シェイファー
Wilhelm Ulrich
ヴィルヘルム・ウルリッヒ
Helmut Beierl
バイエル・ヘルムート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss AG
Original Assignee
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss AG filed Critical Carl Zeiss AG
Publication of JP2001221950A publication Critical patent/JP2001221950A/ja
Publication of JP2001221950A5 publication Critical patent/JP2001221950A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000402836A 1999-12-29 2000-12-28 非球面要素を有する投射露光レンズ Pending JP2001221950A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US17352399P 1999-12-29 1999-12-29
US22279800P 2000-08-02 2000-08-02
US222.798 2000-08-02
US173.523 2000-08-02

Publications (2)

Publication Number Publication Date
JP2001221950A true JP2001221950A (ja) 2001-08-17
JP2001221950A5 JP2001221950A5 (enExample) 2008-02-14

Family

ID=26869245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000402836A Pending JP2001221950A (ja) 1999-12-29 2000-12-28 非球面要素を有する投射露光レンズ

Country Status (5)

Country Link
US (1) US6665126B2 (enExample)
EP (1) EP1115019A3 (enExample)
JP (1) JP2001221950A (enExample)
KR (1) KR100876153B1 (enExample)
TW (1) TW528880B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007114024A1 (ja) * 2006-04-03 2007-10-11 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
JP2008177575A (ja) * 2007-01-17 2008-07-31 Carl Zeiss Smt Ag マイクロリソグラフィのための投影光学系
US7511885B2 (en) 2002-08-22 2009-03-31 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US6680803B2 (en) * 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
EP1293832A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP2002350774A (ja) * 2001-05-29 2002-12-04 Minolta Co Ltd 投影光学系とその光学調整方法
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US20040218271A1 (en) * 2001-07-18 2004-11-04 Carl Zeiss Smt Ag Retardation element made from cubic crystal and an optical system therewith
TW559885B (en) * 2001-10-19 2003-11-01 Nikon Corp Projection optical system and exposure device having the projection optical system
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6844972B2 (en) 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
US6898025B2 (en) * 2002-06-04 2005-05-24 Pentax Corporation Projection aligner and optical system therefor
US7289277B2 (en) * 2002-07-09 2007-10-30 Asml Holding N.V. Relay lens used in an illumination system of a lithography system
JP2005533285A (ja) * 2002-07-18 2005-11-04 カール・ツァイス・エスエムティー・アーゲー 反射屈折投影対物レンズ
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US7869121B2 (en) * 2003-02-21 2011-01-11 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective using aspheric surfaces
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US7236232B2 (en) * 2003-07-01 2007-06-26 Nikon Corporation Using isotopically specified fluids as optical elements
US7551361B2 (en) * 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6906866B2 (en) * 2003-10-15 2005-06-14 Carl Zeiss Smt Ag Compact 1½-waist system for sub 100 nm ArF lithography
US7023524B2 (en) 2003-12-18 2006-04-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
JP4780412B2 (ja) * 2004-09-13 2011-09-28 株式会社ニコン 投影光学系、投影光学系の製造方法、露光装置及び露光方法
US7184124B2 (en) * 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
TWI305107B (en) 2005-09-29 2009-01-01 Young Optics Inc Optical projection apparatus
WO2007123586A2 (en) * 2006-01-19 2007-11-01 The Regents Of The University Of California Biomimetic microfabricated compound eyes
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
DE102008023765A1 (de) 2007-05-15 2008-11-20 Carl Zeiss Smt Ag Verfahren zum Korrigieren von einwelligen Abbildungsfehlern eines Projektionsobjektivs einer mikrolithographischen Projektionsbelichtungsanlage, Projektionsobjektiv einer solchen Belichtungsanlage sowie Herstellungsverfahren für mikrostrukturierte Bauelemente
DE102008041144A1 (de) 2007-08-21 2009-03-05 Carl Zeiss Smt Ag Optische Anordnung und optisches Abbildungssystem damit, Verfahren zu deren Optimierung und Verfahren zum Herstellen eines optischen Elements
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
DE102007054731A1 (de) * 2007-11-14 2009-05-20 Carl Zeiss Smt Ag Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
DE102007055567A1 (de) * 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
US8345350B2 (en) * 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
US20090316256A1 (en) * 2008-06-20 2009-12-24 Carl Zeiss Smt Ag Chromatically corrected objective and projection exposure apparatus including the same
WO2011116792A1 (en) 2010-03-26 2011-09-29 Carl Zeiss Smt Gmbh Optical system, exposure apparatus, and waverfront correction method
JP6282742B2 (ja) 2013-09-09 2018-02-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びそのような装置における光学波面変形を補正する方法
DE102014204171A1 (de) 2014-03-06 2015-09-24 Carl Zeiss Smt Gmbh Optisches Element und optische Anordnung damit
DE102015218328B4 (de) 2015-09-24 2019-01-17 Carl Zeiss Smt Gmbh Optisches System zur Feldabbildung und/oder Pupillenabbildung
DE102016224400A1 (de) * 2016-12-07 2018-06-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv und Verfahren zu seiner Herstellung
DE102017207582A1 (de) * 2017-05-05 2018-11-08 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
CN112269256B (zh) * 2020-10-21 2022-07-05 麦克奥迪实业集团有限公司 一种显微镜物镜

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03282527A (ja) * 1990-03-30 1991-12-12 Nikon Corp 反射屈折縮小投影光学系
JPH0862502A (ja) * 1994-08-23 1996-03-08 Nikon Corp 反射屈折縮小投影光学系
JPH10284365A (ja) * 1997-04-01 1998-10-23 Nikon Corp 反射屈折光学系

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US4953960A (en) * 1988-07-15 1990-09-04 Williamson David M Optical reduction system
USRE36740E (en) * 1990-03-30 2000-06-20 Nikon Corporation Cata-dioptric reduction projection optical system
US5220454A (en) * 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
JPH08203812A (ja) * 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
US5969882A (en) * 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
JPH11326767A (ja) * 1998-05-07 1999-11-26 Nikon Corp 反射屈折縮小光学系
EP1293832A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH03282527A (ja) * 1990-03-30 1991-12-12 Nikon Corp 反射屈折縮小投影光学系
JPH0862502A (ja) * 1994-08-23 1996-03-08 Nikon Corp 反射屈折縮小投影光学系
JPH10284365A (ja) * 1997-04-01 1998-10-23 Nikon Corp 反射屈折光学系

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7511885B2 (en) 2002-08-22 2009-03-31 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
US7656582B2 (en) 2002-08-22 2010-02-02 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
JP4831967B2 (ja) * 2002-08-22 2011-12-07 エーエスエムエル ネザーランズ ビー．ブイ． 光学系、光学装置、光学的に結像する方法、固有複屈折によって生じたリターダンスを低減する方法、フォトリソグラフィ・システム、および、半導体デバイスを形成する方法
WO2007114024A1 (ja) * 2006-04-03 2007-10-11 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
JP2008177575A (ja) * 2007-01-17 2008-07-31 Carl Zeiss Smt Ag マイクロリソグラフィのための投影光学系

Also Published As

Publication number Publication date
EP1115019A2 (en) 2001-07-11
US20020039175A1 (en) 2002-04-04
US6665126B2 (en) 2003-12-16
TW528880B (en) 2003-04-21
KR100876153B1 (ko) 2008-12-29
EP1115019A3 (en) 2004-07-28
KR20010062830A (ko) 2001-07-07

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