TW528880B - Projection exposure lens with aspheric elements - Google Patents
Projection exposure lens with aspheric elements Download PDFInfo
- Publication number
- TW528880B TW528880B TW089128337A TW89128337A TW528880B TW 528880 B TW528880 B TW 528880B TW 089128337 A TW089128337 A TW 089128337A TW 89128337 A TW89128337 A TW 89128337A TW 528880 B TW528880 B TW 528880B
- Authority
- TW
- Taiwan
- Prior art keywords
- lens
- projection exposure
- item
- patent application
- scope
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 48
- 239000011521 glass Substances 0.000 claims description 21
- 238000012937 correction Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 18
- 230000004075 alteration Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 claims description 7
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000005499 meniscus Effects 0.000 claims description 4
- 230000021615 conjugation Effects 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 238000005286 illumination Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 229910001632 barium fluoride Inorganic materials 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 1
- 230000002708 enhancing effect Effects 0.000 claims 1
- 210000002784 stomach Anatomy 0.000 claims 1
- 102100032986 CCR4-NOT transcription complex subunit 8 Human genes 0.000 description 12
- 101000942586 Homo sapiens CCR4-NOT transcription complex subunit 8 Proteins 0.000 description 12
- 238000013461 design Methods 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- DTAFLBZLAZYRDX-UHFFFAOYSA-N OOOOOO Chemical compound OOOOOO DTAFLBZLAZYRDX-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 102100021879 Adenylyl cyclase-associated protein 2 Human genes 0.000 description 1
- 101000897856 Homo sapiens Adenylyl cyclase-associated protein 2 Proteins 0.000 description 1
- 101000836079 Homo sapiens Serpin B8 Proteins 0.000 description 1
- 101000798702 Homo sapiens Transmembrane protease serine 4 Proteins 0.000 description 1
- HFEFMUSTGZNOPY-UHFFFAOYSA-N OOOOOOOOOOOOOOOO Chemical compound OOOOOOOOOOOOOOOO HFEFMUSTGZNOPY-UHFFFAOYSA-N 0.000 description 1
- ZMAKCCXIFPCMEE-UHFFFAOYSA-N OOOOOOOOOOOOOOOOOOOO Chemical compound OOOOOOOOOOOOOOOOOOOO ZMAKCCXIFPCMEE-UHFFFAOYSA-N 0.000 description 1
- 241000315040 Omura Species 0.000 description 1
- 101100095302 Streptococcus gordonii secA1 gene Proteins 0.000 description 1
- 208000020990 adrenal cortex carcinoma Diseases 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- XTKDAFGWCDAMPY-UHFFFAOYSA-N azaperone Chemical compound C1=CC(F)=CC=C1C(=O)CCCN1CCN(C=2N=CC=CC=2)CC1 XTKDAFGWCDAMPY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 101150108659 secA gene Proteins 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17352399P | 1999-12-29 | 1999-12-29 | |
| US22279800P | 2000-08-02 | 2000-08-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW528880B true TW528880B (en) | 2003-04-21 |
Family
ID=26869245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089128337A TW528880B (en) | 1999-12-29 | 2000-12-29 | Projection exposure lens with aspheric elements |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6665126B2 (enExample) |
| EP (1) | EP1115019A3 (enExample) |
| JP (1) | JP2001221950A (enExample) |
| KR (1) | KR100876153B1 (enExample) |
| TW (1) | TW528880B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7703928B2 (en) | 2005-09-29 | 2010-04-27 | Young Optics Inc. | Optical projection apparatus |
| CN110249265A (zh) * | 2016-12-07 | 2019-09-17 | 卡尔蔡司Smt有限责任公司 | 反射折射投射镜头和制造其的方法 |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6157498A (en) | 1996-06-19 | 2000-12-05 | Nikon Corporation | Dual-imaging optical system |
| US7130129B2 (en) | 1996-12-21 | 2006-10-31 | Carl Zeiss Smt Ag | Reticle-masking objective with aspherical lenses |
| US6680803B2 (en) * | 1996-12-21 | 2004-01-20 | Carl-Zeiss Smt Ag | Partial objective in an illuminating systems |
| EP1293832A1 (en) * | 1998-06-08 | 2003-03-19 | Nikon Corporation | Projection exposure apparatus and method |
| US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
| JP2002350774A (ja) * | 2001-05-29 | 2002-12-04 | Minolta Co Ltd | 投影光学系とその光学調整方法 |
| US6683710B2 (en) | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| US20040218271A1 (en) * | 2001-07-18 | 2004-11-04 | Carl Zeiss Smt Ag | Retardation element made from cubic crystal and an optical system therewith |
| TW559885B (en) * | 2001-10-19 | 2003-11-01 | Nikon Corp | Projection optical system and exposure device having the projection optical system |
| US6970232B2 (en) | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
| US6844972B2 (en) | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
| US6995908B2 (en) | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
| US7453641B2 (en) | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
| JP4292497B2 (ja) * | 2002-04-17 | 2009-07-08 | 株式会社ニコン | 投影光学系、露光装置および露光方法 |
| US6898025B2 (en) * | 2002-06-04 | 2005-05-24 | Pentax Corporation | Projection aligner and optical system therefor |
| US7289277B2 (en) * | 2002-07-09 | 2007-10-30 | Asml Holding N.V. | Relay lens used in an illumination system of a lithography system |
| JP2005533285A (ja) * | 2002-07-18 | 2005-11-04 | カール・ツァイス・エスエムティー・アーゲー | 反射屈折投影対物レンズ |
| US6958864B2 (en) * | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| TWI249082B (en) | 2002-08-23 | 2006-02-11 | Nikon Corp | Projection optical system and method for photolithography and exposure apparatus and method using same |
| US7869121B2 (en) * | 2003-02-21 | 2011-01-11 | Kla-Tencor Technologies Corporation | Small ultra-high NA catadioptric objective using aspheric surfaces |
| SG10201405231YA (en) | 2003-05-06 | 2014-09-26 | Nippon Kogaku Kk | Projection optical system, exposure apparatus, and exposure method |
| US7348575B2 (en) | 2003-05-06 | 2008-03-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US7236232B2 (en) * | 2003-07-01 | 2007-06-26 | Nikon Corporation | Using isotopically specified fluids as optical elements |
| US7551361B2 (en) * | 2003-09-09 | 2009-06-23 | Carl Zeiss Smt Ag | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US6906866B2 (en) * | 2003-10-15 | 2005-06-14 | Carl Zeiss Smt Ag | Compact 1½-waist system for sub 100 nm ArF lithography |
| US7023524B2 (en) | 2003-12-18 | 2006-04-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR20170129271A (ko) | 2004-05-17 | 2017-11-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| US7511798B2 (en) * | 2004-07-30 | 2009-03-31 | Asml Holding N.V. | Off-axis catadioptric projection optical system for lithography |
| JP4780412B2 (ja) * | 2004-09-13 | 2011-09-28 | 株式会社ニコン | 投影光学系、投影光学系の製造方法、露光装置及び露光方法 |
| US7184124B2 (en) * | 2004-10-28 | 2007-02-27 | Asml Holding N.V. | Lithographic apparatus having an adjustable projection system and device manufacturing method |
| WO2007123586A2 (en) * | 2006-01-19 | 2007-11-01 | The Regents Of The University Of California | Biomimetic microfabricated compound eyes |
| EP2003478A4 (en) * | 2006-04-03 | 2009-06-24 | Nikon Corp | OPTICAL PROJECTION SYSTEM, ALIGNMENT DEVICE, AND METHOD OF MANUFACTURING THE SAME |
| DE102006022958A1 (de) * | 2006-05-11 | 2007-11-22 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs |
| US7929114B2 (en) | 2007-01-17 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection optics for microlithography |
| DE102008023765A1 (de) | 2007-05-15 | 2008-11-20 | Carl Zeiss Smt Ag | Verfahren zum Korrigieren von einwelligen Abbildungsfehlern eines Projektionsobjektivs einer mikrolithographischen Projektionsbelichtungsanlage, Projektionsobjektiv einer solchen Belichtungsanlage sowie Herstellungsverfahren für mikrostrukturierte Bauelemente |
| DE102008041144A1 (de) | 2007-08-21 | 2009-03-05 | Carl Zeiss Smt Ag | Optische Anordnung und optisches Abbildungssystem damit, Verfahren zu deren Optimierung und Verfahren zum Herstellen eines optischen Elements |
| US7760425B2 (en) * | 2007-09-05 | 2010-07-20 | Carl Zeiss Smt Ag | Chromatically corrected catadioptric objective and projection exposure apparatus including the same |
| DE102007054731A1 (de) * | 2007-11-14 | 2009-05-20 | Carl Zeiss Smt Ag | Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit |
| DE102007055567A1 (de) * | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
| US8345350B2 (en) * | 2008-06-20 | 2013-01-01 | Carl Zeiss Smt Gmbh | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same |
| US20090316256A1 (en) * | 2008-06-20 | 2009-12-24 | Carl Zeiss Smt Ag | Chromatically corrected objective and projection exposure apparatus including the same |
| WO2011116792A1 (en) | 2010-03-26 | 2011-09-29 | Carl Zeiss Smt Gmbh | Optical system, exposure apparatus, and waverfront correction method |
| JP6282742B2 (ja) | 2013-09-09 | 2018-02-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置及びそのような装置における光学波面変形を補正する方法 |
| DE102014204171A1 (de) | 2014-03-06 | 2015-09-24 | Carl Zeiss Smt Gmbh | Optisches Element und optische Anordnung damit |
| DE102015218328B4 (de) | 2015-09-24 | 2019-01-17 | Carl Zeiss Smt Gmbh | Optisches System zur Feldabbildung und/oder Pupillenabbildung |
| DE102017207582A1 (de) * | 2017-05-05 | 2018-11-08 | Carl Zeiss Smt Gmbh | Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren |
| CN112269256B (zh) * | 2020-10-21 | 2022-07-05 | 麦克奥迪实业集团有限公司 | 一种显微镜物镜 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4953960A (en) * | 1988-07-15 | 1990-09-04 | Williamson David M | Optical reduction system |
| JP2847883B2 (ja) * | 1990-03-30 | 1999-01-20 | 株式会社ニコン | 反射屈折縮小投影光学系 |
| USRE36740E (en) * | 1990-03-30 | 2000-06-20 | Nikon Corporation | Cata-dioptric reduction projection optical system |
| US5220454A (en) * | 1990-03-30 | 1993-06-15 | Nikon Corporation | Cata-dioptric reduction projection optical system |
| JP3085481B2 (ja) * | 1991-09-28 | 2000-09-11 | 株式会社ニコン | 反射屈折縮小投影光学系、及び該光学系を備えた露光装置 |
| JP3635684B2 (ja) * | 1994-08-23 | 2005-04-06 | 株式会社ニコン | 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置 |
| JPH08203812A (ja) * | 1995-01-30 | 1996-08-09 | Nikon Corp | 反射屈折縮小投影光学系及び露光装置 |
| JPH10284365A (ja) * | 1997-04-01 | 1998-10-23 | Nikon Corp | 反射屈折光学系 |
| US5969882A (en) * | 1997-04-01 | 1999-10-19 | Nikon Corporation | Catadioptric optical system |
| EP1079253A4 (en) * | 1998-04-07 | 2004-09-01 | Nikon Corp | DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION |
| JPH11326767A (ja) * | 1998-05-07 | 1999-11-26 | Nikon Corp | 反射屈折縮小光学系 |
| EP1293832A1 (en) * | 1998-06-08 | 2003-03-19 | Nikon Corporation | Projection exposure apparatus and method |
| EP0989434B1 (en) * | 1998-07-29 | 2006-11-15 | Carl Zeiss SMT AG | Catadioptric optical system and exposure apparatus having the same |
-
2000
- 2000-12-19 EP EP00127786A patent/EP1115019A3/en not_active Withdrawn
- 2000-12-27 US US09/751,352 patent/US6665126B2/en not_active Expired - Lifetime
- 2000-12-28 JP JP2000402836A patent/JP2001221950A/ja active Pending
- 2000-12-28 KR KR1020000084568A patent/KR100876153B1/ko not_active Expired - Fee Related
- 2000-12-29 TW TW089128337A patent/TW528880B/zh not_active IP Right Cessation
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7703928B2 (en) | 2005-09-29 | 2010-04-27 | Young Optics Inc. | Optical projection apparatus |
| CN110249265A (zh) * | 2016-12-07 | 2019-09-17 | 卡尔蔡司Smt有限责任公司 | 反射折射投射镜头和制造其的方法 |
| CN110249265B (zh) * | 2016-12-07 | 2021-11-16 | 卡尔蔡司Smt有限责任公司 | 反射折射投射镜头和制造其的方法 |
| US11360293B2 (en) | 2016-12-07 | 2022-06-14 | Carl Zeiss Smt Gmbh | Catadioptric projection lens and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1115019A2 (en) | 2001-07-11 |
| US20020039175A1 (en) | 2002-04-04 |
| US6665126B2 (en) | 2003-12-16 |
| KR100876153B1 (ko) | 2008-12-29 |
| EP1115019A3 (en) | 2004-07-28 |
| KR20010062830A (ko) | 2001-07-07 |
| JP2001221950A (ja) | 2001-08-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW528880B (en) | Projection exposure lens with aspheric elements | |
| EP1709472B1 (en) | Catadioptric projection objective | |
| US7712905B2 (en) | Imaging system with mirror group | |
| US6636350B2 (en) | Microlithographic reduction projection catadioptric objective | |
| TW503466B (en) | Reflection/refraction optical system and projection exposure apparatus comprising the optical system, exposure method and manufacturing method of micro-device | |
| US5071240A (en) | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image | |
| KR100615068B1 (ko) | 반사 굴절 광학 시스템 및 이를 구비하는 노광 장치 | |
| US6863403B2 (en) | Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus | |
| US6879383B2 (en) | Large-field unit-magnification projection system | |
| WO2002035273A1 (en) | Catadioptric system and exposure device having this system | |
| JP2005519347A (ja) | 最大開口型の投影対物レンズ | |
| US7116496B1 (en) | High NA large-field unit-magnification projection optical system | |
| CN100547448C (zh) | 一种投影光学系统及投影曝光装置 | |
| JP3258382B2 (ja) | 構成要素レンズ間にギャップを有する屈折レンズアセンブリを含む光学投射システム | |
| CN102707415B (zh) | 光刻投影物镜 | |
| WO2005040890A2 (en) | Catadioptric projection objective with real intermediate images | |
| CN100587544C (zh) | 一种折反射投影光学系统 | |
| CN102200624B (zh) | 光刻投影物镜 | |
| JPWO2007086220A1 (ja) | 反射屈折結像光学系、露光装置、およびデバイスの製造方法 | |
| US20060238732A1 (en) | High-NA unit-magnification projection optical system having a beamsplitter | |
| CN102707414B (zh) | 光刻投影物镜 | |
| US20080037111A1 (en) | Catadioptric Projection Objective | |
| JPS62210415A (ja) | 精密複写用投影光学系 | |
| CN103713379A (zh) | 一种大数值孔径的折反射的干式投影光学系统 | |
| JP2007206319A (ja) | 反射屈折光学系、露光装置及びマイクロデバイスの製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |