JP2001007045A5 - - Google Patents

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Publication number
JP2001007045A5
JP2001007045A5 JP1999179233A JP17923399A JP2001007045A5 JP 2001007045 A5 JP2001007045 A5 JP 2001007045A5 JP 1999179233 A JP1999179233 A JP 1999179233A JP 17923399 A JP17923399 A JP 17923399A JP 2001007045 A5 JP2001007045 A5 JP 2001007045A5
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JP
Japan
Prior art keywords
laser
heat treatment
optical system
intensity distribution
substrate
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JP1999179233A
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English (en)
Japanese (ja)
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JP2001007045A (ja
JP3562389B2 (ja
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Priority claimed from JP17923399A external-priority patent/JP3562389B2/ja
Priority to JP17923399A priority Critical patent/JP3562389B2/ja
Priority to CA002312223A priority patent/CA2312223A1/en
Priority to CNB001187449A priority patent/CN1146027C/zh
Priority to DE60027820T priority patent/DE60027820T2/de
Priority to US09/599,645 priority patent/US6437284B1/en
Priority to TW089112338A priority patent/TW469539B/zh
Priority to EP00113378A priority patent/EP1063049B1/en
Priority to KR10-2000-0035042A priority patent/KR100371986B1/ko
Publication of JP2001007045A publication Critical patent/JP2001007045A/ja
Publication of JP3562389B2 publication Critical patent/JP3562389B2/ja
Application granted granted Critical
Publication of JP2001007045A5 publication Critical patent/JP2001007045A5/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP17923399A 1999-06-25 1999-06-25 レーザ熱処理装置 Expired - Lifetime JP3562389B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP17923399A JP3562389B2 (ja) 1999-06-25 1999-06-25 レーザ熱処理装置
EP00113378A EP1063049B1 (en) 1999-06-25 2000-06-23 Apparatus with an optical system for laser heat treatment and method for producing semiconductor devices by using the same
CNB001187449A CN1146027C (zh) 1999-06-25 2000-06-23 光学系统及其装置和使用该光学系统制造半导体装置的方法
DE60027820T DE60027820T2 (de) 1999-06-25 2000-06-23 Vorrichtung mit einem optischen System zur Laserwärmebehandlung und ein diese Vorrichtung verwendendes Verfahren zur Herstellung von Halbleiteranordnungen
US09/599,645 US6437284B1 (en) 1999-06-25 2000-06-23 Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
TW089112338A TW469539B (en) 1999-06-25 2000-06-23 Optical system for laser heat treatment, laser heat treating apparatus, and method for producing semiconductor devices by using the same
CA002312223A CA2312223A1 (en) 1999-06-25 2000-06-23 Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
KR10-2000-0035042A KR100371986B1 (ko) 1999-06-25 2000-06-24 레이저 열처리용 광학장치, 레이저 열처리 장치 및 반도체의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17923399A JP3562389B2 (ja) 1999-06-25 1999-06-25 レーザ熱処理装置

Publications (3)

Publication Number Publication Date
JP2001007045A JP2001007045A (ja) 2001-01-12
JP3562389B2 JP3562389B2 (ja) 2004-09-08
JP2001007045A5 true JP2001007045A5 (https=) 2004-10-28

Family

ID=16062280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17923399A Expired - Lifetime JP3562389B2 (ja) 1999-06-25 1999-06-25 レーザ熱処理装置

Country Status (8)

Country Link
US (1) US6437284B1 (https=)
EP (1) EP1063049B1 (https=)
JP (1) JP3562389B2 (https=)
KR (1) KR100371986B1 (https=)
CN (1) CN1146027C (https=)
CA (1) CA2312223A1 (https=)
DE (1) DE60027820T2 (https=)
TW (1) TW469539B (https=)

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