JP2000514475A - 金属含有過塩基性清浄剤 - Google Patents

金属含有過塩基性清浄剤

Info

Publication number
JP2000514475A
JP2000514475A JP10500176A JP50017698A JP2000514475A JP 2000514475 A JP2000514475 A JP 2000514475A JP 10500176 A JP10500176 A JP 10500176A JP 50017698 A JP50017698 A JP 50017698A JP 2000514475 A JP2000514475 A JP 2000514475A
Authority
JP
Japan
Prior art keywords
acid
overbased detergent
weight
surfactant
derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10500176A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000514475A5 (cg-RX-API-DMAC7.html
Inventor
フィリップ スキーナー
アラン レナック
Original Assignee
エクソン ケミカル パテンツ インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エクソン ケミカル パテンツ インコーポレイテッド filed Critical エクソン ケミカル パテンツ インコーポレイテッド
Publication of JP2000514475A publication Critical patent/JP2000514475A/ja
Publication of JP2000514475A5 publication Critical patent/JP2000514475A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M159/00Lubricating compositions characterised by the additive being of unknown or incompletely defined constitution
    • C10M159/12Reaction products
    • C10M159/20Reaction mixtures having an excess of neutralising base, e.g. so-called overbasic or highly basic products
    • C10M159/24Reaction mixtures having an excess of neutralising base, e.g. so-called overbasic or highly basic products containing sulfonic radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07GCOMPOUNDS OF UNKNOWN CONSTITUTION
    • C07G99/00Subject matter not provided for in other groups of this subclass
    • C07G99/002Compounds of unknown constitution containing sulfur
    • C07G99/0024Overbased compounds
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M159/00Lubricating compositions characterised by the additive being of unknown or incompletely defined constitution
    • C10M159/12Reaction products
    • C10M159/20Reaction mixtures having an excess of neutralising base, e.g. so-called overbasic or highly basic products
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M159/00Lubricating compositions characterised by the additive being of unknown or incompletely defined constitution
    • C10M159/12Reaction products
    • C10M159/20Reaction mixtures having an excess of neutralising base, e.g. so-called overbasic or highly basic products
    • C10M159/22Reaction mixtures having an excess of neutralising base, e.g. so-called overbasic or highly basic products containing phenol radicals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Lubricants (AREA)
  • Detergent Compositions (AREA)
JP10500176A 1996-05-31 1997-05-16 金属含有過塩基性清浄剤 Withdrawn JP2000514475A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9611424.4 1996-05-31
GBGB9611424.4A GB9611424D0 (en) 1996-05-31 1996-05-31 Overbased metal-containing detergents
PCT/EP1997/002697 WO1997046644A1 (en) 1996-05-31 1997-05-16 Overbased metal-containing detergents

Publications (2)

Publication Number Publication Date
JP2000514475A true JP2000514475A (ja) 2000-10-31
JP2000514475A5 JP2000514475A5 (cg-RX-API-DMAC7.html) 2005-01-13

Family

ID=10794596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10500176A Withdrawn JP2000514475A (ja) 1996-05-31 1997-05-16 金属含有過塩基性清浄剤

Country Status (9)

Country Link
US (1) US6153565A (cg-RX-API-DMAC7.html)
EP (2) EP0909310A1 (cg-RX-API-DMAC7.html)
JP (1) JP2000514475A (cg-RX-API-DMAC7.html)
CN (1) CN1101847C (cg-RX-API-DMAC7.html)
AR (1) AR008223A1 (cg-RX-API-DMAC7.html)
BR (1) BR9709045A (cg-RX-API-DMAC7.html)
CA (1) CA2256539A1 (cg-RX-API-DMAC7.html)
GB (1) GB9611424D0 (cg-RX-API-DMAC7.html)
WO (1) WO1997046644A1 (cg-RX-API-DMAC7.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000514474A (ja) * 1996-05-31 2000-10-31 エクソン ケミカル パテンツ インコーポレイテッド 金属含有過塩基性清浄剤
JP2002256278A (ja) * 2001-02-16 2002-09-11 Infineum Internatl Ltd 過塩基化清浄剤添加剤
JP2004331973A (ja) * 2003-05-01 2004-11-25 Ethyl Corp 過塩基オレイン酸カルシウムを用いた低硫黄で低灰分で低燐の潤滑添加剤パッケージ
JP2005179684A (ja) * 2003-12-22 2005-07-07 Chevron Oronite Sa 潤滑油用の過塩基性清浄剤
JP2006316272A (ja) * 2005-05-10 2006-11-24 Infineum Internatl Ltd 清浄剤

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* Cited by examiner, † Cited by third party
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