IN2014MN01920A - - Google Patents
Info
- Publication number
- IN2014MN01920A IN2014MN01920A IN1920MUN2014A IN2014MN01920A IN 2014MN01920 A IN2014MN01920 A IN 2014MN01920A IN 1920MUN2014 A IN1920MUN2014 A IN 1920MUN2014A IN 2014MN01920 A IN2014MN01920 A IN 2014MN01920A
- Authority
- IN
- India
- Prior art keywords
- compounds
- salts
- compound
- group
- copper
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/058—Alloys based on nickel or cobalt based on nickel with chromium without Mo and W
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
- C22C30/02—Alloys containing less than 50% by weight of each constituent containing copper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012095956 | 2012-04-19 | ||
PCT/JP2013/061667 WO2013157639A1 (ja) | 2012-04-19 | 2013-04-19 | 銅-ニッケル合金電気めっき浴及びめっき方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014MN01920A true IN2014MN01920A (pt) | 2015-07-10 |
Family
ID=49383587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN1920MUN2014 IN2014MN01920A (pt) | 2012-04-19 | 2013-04-19 |
Country Status (15)
Country | Link |
---|---|
US (1) | US9828686B2 (pt) |
EP (1) | EP2840169B1 (pt) |
JP (1) | JP6119053B2 (pt) |
KR (1) | KR101649435B1 (pt) |
CN (1) | CN104321470B (pt) |
BR (1) | BR112014026009A2 (pt) |
ES (1) | ES2620115T3 (pt) |
IN (1) | IN2014MN01920A (pt) |
MX (1) | MX355999B (pt) |
MY (1) | MY167239A (pt) |
PH (1) | PH12014502330B1 (pt) |
RU (1) | RU2588894C2 (pt) |
SG (1) | SG11201406599RA (pt) |
TW (1) | TWI580822B (pt) |
WO (1) | WO2013157639A1 (pt) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015060449A1 (ja) * | 2013-10-25 | 2015-04-30 | オーエム産業株式会社 | めっき品の製造方法 |
JP6439172B2 (ja) * | 2014-08-08 | 2018-12-19 | ディップソール株式会社 | 銅−ニッケル合金電気めっき浴 |
JP6435546B2 (ja) * | 2014-10-17 | 2018-12-12 | ディップソール株式会社 | 銅−ニッケル合金電気めっき装置 |
CN104911656A (zh) * | 2015-06-13 | 2015-09-16 | 梁胜光 | 一种金属合金电镀液 |
CN105018986A (zh) * | 2015-08-11 | 2015-11-04 | 江苏金曼科技有限责任公司 | 一种无氰无磷合金打底液 |
CN105506686A (zh) * | 2015-12-23 | 2016-04-20 | 苏州市金星工艺镀饰有限公司 | 一种装饰性镍铜金三元合金电镀液的电镀方法 |
KR102611763B1 (ko) * | 2016-01-29 | 2023-12-07 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 흑화 도금액 및 도전성 기판 제조방법 |
JP6796243B2 (ja) * | 2016-04-30 | 2020-12-09 | 日本製鉄株式会社 | 銅−ニッケル合金材料を被覆した機械部品 |
CN106283132B (zh) * | 2016-08-26 | 2018-07-10 | 湖北吉和昌化工科技有限公司 | 一种微酸性体系电镀光亮铜的柔软分散剂 |
US10711360B2 (en) * | 2017-07-14 | 2020-07-14 | Rohm And Haas Electronic Materials Llc | Nickel electroplating compositions with copolymers of arginine and bisepoxides and methods of electroplating nickel |
JP2019044231A (ja) * | 2017-09-01 | 2019-03-22 | 株式会社Jcu | 低熱膨張係数を有する鉄−ニッケル合金用電気メッキ液およびこれを用いた電気メッキ方法 |
US10205170B1 (en) * | 2017-12-04 | 2019-02-12 | Chang Chun Petrochemical Co., Ltd. | Copper foil for current collector of lithium secondary battery |
CN110607541B (zh) * | 2019-08-17 | 2021-07-16 | 山东理工大学 | 一种电火花加工金刚石用铜镍复合电极及其制备方法 |
CN111321437B (zh) * | 2020-03-31 | 2021-04-27 | 安徽铜冠铜箔集团股份有限公司 | 铜镍合金箔及其电沉积制备方法 |
CN114214677A (zh) * | 2021-12-30 | 2022-03-22 | 佛山亚特表面技术材料有限公司 | 一种酸性镀铜深孔剂及其制备方法与电镀方法 |
CN115787053A (zh) * | 2022-11-21 | 2023-03-14 | 南通赛可特电子有限公司 | 一种高稳定型电镀添加剂及其制备方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1750092A (en) * | 1921-11-26 | 1930-03-11 | Crawford Robert Brace Penn | Electroplating process |
BE518763A (pt) * | 1952-03-29 | |||
GB957808A (en) * | 1962-02-09 | 1964-05-13 | Ass Elect Ind | Electrodeposition of copper-nickel alloy |
US3338804A (en) * | 1964-09-03 | 1967-08-29 | Kewanee Oil Co | Electrodeposition of stress-free metal deposits |
US3833481A (en) | 1972-12-18 | 1974-09-03 | Buckbel Mears Co | Electroforming nickel copper alloys |
US3833486A (en) | 1973-03-26 | 1974-09-03 | Lea Ronal Inc | Cyanide-free electroplating |
JPS5224133A (en) | 1975-08-20 | 1977-02-23 | Nisshin Steel Co Ltd | Plating method of nickellcopper alloy |
US4036709A (en) * | 1975-09-22 | 1977-07-19 | M & T Chemicals Inc. | Electroplating nickel, cobalt, nickel-cobalt alloys and binary or ternary alloys of nickel, cobalt and iron |
JPS5426962A (en) | 1977-08-03 | 1979-02-28 | Nippon Kokan Kk <Nkk> | Temperature-detecting device for grate of heat treating apparatus of downward suction type and grate operation control unit using it |
US4134802A (en) | 1977-10-03 | 1979-01-16 | Oxy Metal Industries Corporation | Electrolyte and method for electrodepositing bright metal deposits |
JPS54155331A (en) * | 1978-05-26 | 1979-12-07 | Hitachi Ltd | Operation of water wheel or pump water wheel |
US4234802A (en) * | 1978-09-11 | 1980-11-18 | Kollmorgen Technologies Corporation | Current limiter |
US4167459A (en) * | 1979-01-08 | 1979-09-11 | The United States Of America As Represented By The Secretary Of The Interior | Electroplating with Ni-Cu alloy |
JPS58133391A (ja) | 1982-02-01 | 1983-08-09 | Oosakashi | 光沢銅−ニツケル合金電気めつき浴 |
JPH02285091A (ja) | 1989-04-26 | 1990-11-22 | Kobe Steel Ltd | ニッケル―銅合金めっき浴 |
US5431803A (en) * | 1990-05-30 | 1995-07-11 | Gould Electronics Inc. | Electrodeposited copper foil and process for making same |
JPH0598488A (ja) * | 1991-06-05 | 1993-04-20 | Daiwa Kasei Kenkyusho:Kk | 銅−ニツケル合金電気メツキ浴 |
JPH06173075A (ja) | 1992-12-03 | 1994-06-21 | Daiwa Kasei Kenkyusho:Kk | 銅−ニッケル合金めっき浴 |
TW317575B (pt) * | 1994-01-21 | 1997-10-11 | Olin Corp | |
RU2106436C1 (ru) * | 1996-07-22 | 1998-03-10 | Тюменский государственный нефтегазовый университет | Электролит для осаждения сплава медь - никель |
US6183619B1 (en) * | 1999-03-19 | 2001-02-06 | Technic, Inc. | Metal alloy sulfonic acid electroplating baths |
US6562220B2 (en) * | 1999-03-19 | 2003-05-13 | Technic, Inc. | Metal alloy sulfate electroplating baths |
KR100485808B1 (ko) * | 2002-01-30 | 2005-04-28 | 한현섭 | 동-니켈 합금의 박막 도금액 및 상기 용액을 이용한 박막제조 방법 |
JP4249438B2 (ja) * | 2002-07-05 | 2009-04-02 | 日本ニュークローム株式会社 | 銅―錫合金めっき用ピロリン酸浴 |
CN101054699B (zh) * | 2007-02-12 | 2010-05-19 | 伟业重工(安徽)有限公司 | 一种替代铜及铜合金化学氧化的电镀工艺 |
-
2013
- 2013-04-19 IN IN1920MUN2014 patent/IN2014MN01920A/en unknown
- 2013-04-19 TW TW102114163A patent/TWI580822B/zh active
- 2013-04-19 JP JP2014511260A patent/JP6119053B2/ja active Active
- 2013-04-19 SG SG11201406599RA patent/SG11201406599RA/en unknown
- 2013-04-19 MY MYPI2014002954A patent/MY167239A/en unknown
- 2013-04-19 CN CN201380020656.3A patent/CN104321470B/zh active Active
- 2013-04-19 ES ES13779037.4T patent/ES2620115T3/es active Active
- 2013-04-19 WO PCT/JP2013/061667 patent/WO2013157639A1/ja active Application Filing
- 2013-04-19 US US14/395,776 patent/US9828686B2/en active Active
- 2013-04-19 BR BR112014026009A patent/BR112014026009A2/pt not_active Application Discontinuation
- 2013-04-19 EP EP13779037.4A patent/EP2840169B1/en active Active
- 2013-04-19 MX MX2014012027A patent/MX355999B/es active IP Right Grant
- 2013-04-19 RU RU2014146285/02A patent/RU2588894C2/ru active
- 2013-04-19 KR KR1020147027765A patent/KR101649435B1/ko active IP Right Grant
-
2014
- 2014-10-17 PH PH12014502330A patent/PH12014502330B1/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP2840169B1 (en) | 2017-03-01 |
BR112014026009A2 (pt) | 2017-06-27 |
TWI580822B (zh) | 2017-05-01 |
CN104321470A (zh) | 2015-01-28 |
MX355999B (es) | 2018-05-08 |
KR20140130546A (ko) | 2014-11-10 |
WO2013157639A1 (ja) | 2013-10-24 |
US9828686B2 (en) | 2017-11-28 |
KR101649435B1 (ko) | 2016-08-19 |
CN104321470B (zh) | 2017-03-15 |
MX2014012027A (es) | 2014-12-05 |
SG11201406599RA (en) | 2014-11-27 |
US20150090600A1 (en) | 2015-04-02 |
RU2588894C2 (ru) | 2016-07-10 |
EP2840169A4 (en) | 2015-12-30 |
JP6119053B2 (ja) | 2017-04-26 |
TW201402878A (zh) | 2014-01-16 |
EP2840169A1 (en) | 2015-02-25 |
RU2014146285A (ru) | 2016-06-10 |
MY167239A (en) | 2018-08-14 |
JPWO2013157639A1 (ja) | 2015-12-21 |
PH12014502330A1 (en) | 2015-01-12 |
ES2620115T3 (es) | 2017-06-27 |
PH12014502330B1 (en) | 2015-01-12 |
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