IL96109A - Active-positive photoresist preparation and its production - Google Patents

Active-positive photoresist preparation and its production

Info

Publication number
IL96109A
IL96109A IL9610990A IL9610990A IL96109A IL 96109 A IL96109 A IL 96109A IL 9610990 A IL9610990 A IL 9610990A IL 9610990 A IL9610990 A IL 9610990A IL 96109 A IL96109 A IL 96109A
Authority
IL
Israel
Prior art keywords
acid
film
photoresist
composition
generating
Prior art date
Application number
IL9610990A
Other languages
English (en)
Hebrew (he)
Other versions
IL96109A0 (en
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of IL96109A0 publication Critical patent/IL96109A0/xx
Publication of IL96109A publication Critical patent/IL96109A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IL9610990A 1989-10-27 1990-10-25 Active-positive photoresist preparation and its production IL96109A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/428,820 US5650261A (en) 1989-10-27 1989-10-27 Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system

Publications (2)

Publication Number Publication Date
IL96109A0 IL96109A0 (en) 1991-07-18
IL96109A true IL96109A (en) 1995-03-15

Family

ID=23700535

Family Applications (1)

Application Number Title Priority Date Filing Date
IL9610990A IL96109A (en) 1989-10-27 1990-10-25 Active-positive photoresist preparation and its production

Country Status (14)

Country Link
US (1) US5650261A (xx)
EP (1) EP0425142A3 (xx)
KR (1) KR910008493A (xx)
CN (1) CN1054838A (xx)
AU (1) AU642915B2 (xx)
BR (1) BR9005430A (xx)
CA (1) CA2027628A1 (xx)
FI (1) FI905314A0 (xx)
IE (1) IE903882A1 (xx)
IL (1) IL96109A (xx)
MX (1) MX173338B (xx)
MY (1) MY106633A (xx)
NO (1) NO904562L (xx)
ZA (1) ZA908251B (xx)

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MX173338B (es) 1994-02-17
IE903882A1 (en) 1991-05-08
IL96109A0 (en) 1991-07-18
US5650261A (en) 1997-07-22
ZA908251B (en) 1991-07-31
CA2027628A1 (en) 1991-04-28
EP0425142A2 (en) 1991-05-02
NO904562D0 (no) 1990-10-23
CN1054838A (zh) 1991-09-25
NO904562L (no) 1991-04-29
MY106633A (en) 1995-06-30
EP0425142A3 (en) 1991-10-16
FI905314A0 (fi) 1990-10-26
BR9005430A (pt) 1991-09-17
KR910008493A (ko) 1991-05-31
AU6469890A (en) 1991-05-02
AU642915B2 (en) 1993-11-04

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