IT951496B - Composizione fotoresistente posi tiva a base epossidica partico larmente per la stampa di micro circuiti - Google Patents

Composizione fotoresistente posi tiva a base epossidica partico larmente per la stampa di micro circuiti

Info

Publication number
IT951496B
IT951496B IT23244/72A IT2324472A IT951496B IT 951496 B IT951496 B IT 951496B IT 23244/72 A IT23244/72 A IT 23244/72A IT 2324472 A IT2324472 A IT 2324472A IT 951496 B IT951496 B IT 951496B
Authority
IT
Italy
Prior art keywords
composition
particular epoxy
micro circuit
circuit print
photoresistant
Prior art date
Application number
IT23244/72A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT951496B publication Critical patent/IT951496B/it

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Organic Insulating Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
IT23244/72A 1971-06-28 1972-04-18 Composizione fotoresistente posi tiva a base epossidica partico larmente per la stampa di micro circuiti IT951496B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15762571A 1971-06-28 1971-06-28

Publications (1)

Publication Number Publication Date
IT951496B true IT951496B (it) 1973-06-30

Family

ID=22564554

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23244/72A IT951496B (it) 1971-06-28 1972-04-18 Composizione fotoresistente posi tiva a base epossidica partico larmente per la stampa di micro circuiti

Country Status (5)

Country Link
JP (1) JPS5037531B1 (it)
DE (1) DE2231297A1 (it)
FR (1) FR2143706B1 (it)
GB (1) GB1330100A (it)
IT (1) IT951496B (it)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137216A (it) * 1974-09-26 1976-03-29 Asahi Chemical Ind
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water
US5650261A (en) * 1989-10-27 1997-07-22 Rohm And Haas Company Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system
JP2739726B2 (ja) 1990-09-27 1998-04-15 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 多層プリント回路板
US6168898B1 (en) * 1998-02-17 2001-01-02 Isola Laminate Systems Corp. Positive acting photodielectric composition

Also Published As

Publication number Publication date
DE2231297A1 (de) 1973-01-11
JPS4815059A (it) 1973-02-26
FR2143706A1 (it) 1973-02-09
FR2143706B1 (it) 1976-06-11
JPS5037531B1 (it) 1975-12-03
GB1330100A (en) 1973-09-12

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