BR9005430A - Composicao foto-resistente que atua no positivo e processo para produzir imagens reticuladas positivas em superficies de substratos - Google Patents

Composicao foto-resistente que atua no positivo e processo para produzir imagens reticuladas positivas em superficies de substratos

Info

Publication number
BR9005430A
BR9005430A BR909005430A BR9005430A BR9005430A BR 9005430 A BR9005430 A BR 9005430A BR 909005430 A BR909005430 A BR 909005430A BR 9005430 A BR9005430 A BR 9005430A BR 9005430 A BR9005430 A BR 9005430A
Authority
BR
Brazil
Prior art keywords
positive
photo
works
substrate surfaces
resistant composition
Prior art date
Application number
BR909005430A
Other languages
English (en)
Inventor
Mark Robert Winkle
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of BR9005430A publication Critical patent/BR9005430A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BR909005430A 1989-10-27 1990-10-26 Composicao foto-resistente que atua no positivo e processo para produzir imagens reticuladas positivas em superficies de substratos BR9005430A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/428,820 US5650261A (en) 1989-10-27 1989-10-27 Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system

Publications (1)

Publication Number Publication Date
BR9005430A true BR9005430A (pt) 1991-09-17

Family

ID=23700535

Family Applications (1)

Application Number Title Priority Date Filing Date
BR909005430A BR9005430A (pt) 1989-10-27 1990-10-26 Composicao foto-resistente que atua no positivo e processo para produzir imagens reticuladas positivas em superficies de substratos

Country Status (14)

Country Link
US (1) US5650261A (pt)
EP (1) EP0425142A3 (pt)
KR (1) KR910008493A (pt)
CN (1) CN1054838A (pt)
AU (1) AU642915B2 (pt)
BR (1) BR9005430A (pt)
CA (1) CA2027628A1 (pt)
FI (1) FI905314A0 (pt)
IE (1) IE903882A1 (pt)
IL (1) IL96109A (pt)
MX (1) MX173338B (pt)
MY (1) MY106633A (pt)
NO (1) NO904562L (pt)
ZA (1) ZA908251B (pt)

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MY106633A (en) 1995-06-30
IL96109A (en) 1995-03-15
CA2027628A1 (en) 1991-04-28
EP0425142A2 (en) 1991-05-02
CN1054838A (zh) 1991-09-25
IE903882A1 (en) 1991-05-08
AU642915B2 (en) 1993-11-04
US5650261A (en) 1997-07-22
MX173338B (es) 1994-02-17
EP0425142A3 (en) 1991-10-16
FI905314A0 (fi) 1990-10-26
AU6469890A (en) 1991-05-02
NO904562D0 (no) 1990-10-23
ZA908251B (en) 1991-07-31
KR910008493A (ko) 1991-05-31
IL96109A0 (en) 1991-07-18
NO904562L (no) 1991-04-29

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