IL253189B - A system and method for assigning a rating to defects found in a chip manufacturing substrate - Google Patents
A system and method for assigning a rating to defects found in a chip manufacturing substrateInfo
- Publication number
- IL253189B IL253189B IL253189A IL25318917A IL253189B IL 253189 B IL253189 B IL 253189B IL 253189 A IL253189 A IL 253189A IL 25318917 A IL25318917 A IL 25318917A IL 253189 B IL253189 B IL 253189B
- Authority
- IL
- Israel
- Prior art keywords
- rating
- assigning
- chip manufacturing
- manufacturing substrate
- defects found
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/317—Testing of digital circuits
- G01R31/31718—Logistic aspects, e.g. binning, selection, sorting of devices under test, tester/handler interaction networks, Test management software, e.g. software for test statistics or test evaluation, yield analysis
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
- H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Quality & Reliability (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Theoretical Computer Science (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Tests Of Electronic Circuits (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73794705P | 2005-11-18 | 2005-11-18 | |
| US73829005P | 2005-11-18 | 2005-11-18 | |
| US11/561,659 US7570796B2 (en) | 2005-11-18 | 2006-11-20 | Methods and systems for utilizing design data in combination with inspection data |
| PCT/US2006/061113 WO2007120280A2 (en) | 2005-11-18 | 2006-11-20 | Methods and systems for utilizing design data in combination with inspection data |
| US11/561,735 US7676077B2 (en) | 2005-11-18 | 2006-11-20 | Methods and systems for utilizing design data in combination with inspection data |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL253189A0 IL253189A0 (en) | 2017-08-31 |
| IL253189B true IL253189B (en) | 2018-11-29 |
Family
ID=38610775
Family Applications (14)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL191527A IL191527A (en) | 2005-11-18 | 2008-05-18 | Methods and systems for utilizing design data in combination with inspection data |
| IL230235A IL230235A (en) | 2005-11-18 | 2013-12-29 | Systems and methods for using planning information together with test information |
| IL230260A IL230260A (en) | 2005-11-18 | 2013-12-31 | Systems and methods for using planning information together with test information |
| IL234290A IL234290A (en) | 2005-11-18 | 2014-08-25 | Methods and systems for utilizing design data in combination with inspection data |
| IL234289A IL234289A (en) | 2005-11-18 | 2014-08-25 | Systems and methods for using planning information together with test information |
| IL234319A IL234319A (en) | 2005-11-18 | 2014-08-26 | Methods and systems for utilizing design data in combination with inspection data |
| IL234316A IL234316A (en) | 2005-11-18 | 2014-08-26 | Systems and methods for using planning information together with test information |
| IL234317A IL234317A (en) | 2005-11-18 | 2014-08-26 | Systems and methods for using planning information together with test information |
| IL234318A IL234318A (en) | 2005-11-18 | 2014-08-26 | Systems and methods for using planning information together with test information |
| IL234344A IL234344A (en) | 2005-11-18 | 2014-08-27 | Systems and methods for using planning information together with test information |
| IL234345A IL234345A (en) | 2005-11-18 | 2014-08-27 | Systems and methods for using planning information together with test information |
| IL234346A IL234346A (en) | 2005-11-18 | 2014-08-27 | Methods and systems for utilizing design data in combination with inspection data |
| IL234343A IL234343A (en) | 2005-11-18 | 2014-08-27 | Systems and methods for using planning information together with test information |
| IL253189A IL253189B (en) | 2005-11-18 | 2017-06-27 | A system and method for assigning a rating to defects found in a chip manufacturing substrate |
Family Applications Before (13)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL191527A IL191527A (en) | 2005-11-18 | 2008-05-18 | Methods and systems for utilizing design data in combination with inspection data |
| IL230235A IL230235A (en) | 2005-11-18 | 2013-12-29 | Systems and methods for using planning information together with test information |
| IL230260A IL230260A (en) | 2005-11-18 | 2013-12-31 | Systems and methods for using planning information together with test information |
| IL234290A IL234290A (en) | 2005-11-18 | 2014-08-25 | Methods and systems for utilizing design data in combination with inspection data |
| IL234289A IL234289A (en) | 2005-11-18 | 2014-08-25 | Systems and methods for using planning information together with test information |
| IL234319A IL234319A (en) | 2005-11-18 | 2014-08-26 | Methods and systems for utilizing design data in combination with inspection data |
| IL234316A IL234316A (en) | 2005-11-18 | 2014-08-26 | Systems and methods for using planning information together with test information |
| IL234317A IL234317A (en) | 2005-11-18 | 2014-08-26 | Systems and methods for using planning information together with test information |
| IL234318A IL234318A (en) | 2005-11-18 | 2014-08-26 | Systems and methods for using planning information together with test information |
| IL234344A IL234344A (en) | 2005-11-18 | 2014-08-27 | Systems and methods for using planning information together with test information |
| IL234345A IL234345A (en) | 2005-11-18 | 2014-08-27 | Systems and methods for using planning information together with test information |
| IL234346A IL234346A (en) | 2005-11-18 | 2014-08-27 | Methods and systems for utilizing design data in combination with inspection data |
| IL234343A IL234343A (en) | 2005-11-18 | 2014-08-27 | Systems and methods for using planning information together with test information |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1955225A4 (en) |
| JP (12) | JP5465880B2 (en) |
| KR (11) | KR101613048B1 (en) |
| IL (14) | IL191527A (en) |
| WO (2) | WO2007120279A2 (en) |
Families Citing this family (104)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9002497B2 (en) * | 2003-07-03 | 2015-04-07 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of wafers and reticles using designer intent data |
| KR101613048B1 (en) * | 2005-11-18 | 2016-04-15 | 케이엘에이-텐코 코포레이션 | Methods and systems for utilizing design data in combination with inspection data |
| CN101821635B (en) * | 2007-08-03 | 2017-07-28 | 弗莱尔系统公司 | Wireless remote detector systems and method |
| JP6185693B2 (en) * | 2008-06-11 | 2017-08-23 | ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation | Systems and methods for detection of design and process defects on wafers, inspection of defects on wafers, selection to use one or more features in the design as process monitoring features, or some combination thereof |
| WO2010014609A2 (en) * | 2008-07-28 | 2010-02-04 | Kla-Tencor Corporation | Computer-implemented methods, computer-readable media, and systems for classifying defects detected in a memory device area on a wafer |
| WO2011004534A1 (en) * | 2009-07-09 | 2011-01-13 | 株式会社 日立ハイテクノロジーズ | Semiconductor defect classifying method, semiconductor defect classifying apparatus, and semiconductor defect classifying program |
| KR101732750B1 (en) * | 2009-07-17 | 2017-05-24 | 케이엘에이-텐코 코포레이션 | Scanner performance comparison and matching using design and defect data |
| WO2011152303A1 (en) * | 2010-05-31 | 2011-12-08 | 株式会社日立ハイテクノロジーズ | Charged particle beam device provided with automatic aberration correction method |
| EP2447889A1 (en) * | 2010-10-29 | 2012-05-02 | Siemens Aktiengesellschaft | Method for modeling a defect management in a manufacturing process and for handling the defect during the production process based on said modeled defect management |
| TWI574136B (en) * | 2012-02-03 | 2017-03-11 | 應用材料以色列公司 | Method and system for designing defect based on design |
| US8718353B2 (en) * | 2012-03-08 | 2014-05-06 | Kla-Tencor Corporation | Reticle defect inspection with systematic defect filter |
| JP5943722B2 (en) | 2012-06-08 | 2016-07-05 | 三菱重工業株式会社 | Defect determination apparatus, radiation imaging system, and defect determination method |
| JP6092602B2 (en) * | 2012-12-04 | 2017-03-08 | 株式会社安永 | Defect inspection apparatus and defect inspection method |
| US9202763B2 (en) | 2013-01-16 | 2015-12-01 | Kabushiki Kaisha Toshiba | Defect pattern evaluation method, defect pattern evaluation apparatus, and recording media |
| JP6152281B2 (en) | 2013-02-25 | 2017-06-21 | 株式会社ニューフレアテクノロジー | Pattern inspection method and pattern inspection apparatus |
| US10114368B2 (en) * | 2013-07-22 | 2018-10-30 | Applied Materials Israel Ltd. | Closed-loop automatic defect inspection and classification |
| US9401016B2 (en) * | 2014-05-12 | 2016-07-26 | Kla-Tencor Corp. | Using high resolution full die image data for inspection |
| CN106574901B (en) * | 2014-07-08 | 2020-03-03 | 奥博泰克有限公司 | Improved system and method for computerized direct writing |
| US10712289B2 (en) * | 2014-07-29 | 2020-07-14 | Kla-Tencor Corp. | Inspection for multiple process steps in a single inspection process |
| US10267746B2 (en) * | 2014-10-22 | 2019-04-23 | Kla-Tencor Corp. | Automated pattern fidelity measurement plan generation |
| CN107078074B (en) * | 2014-11-25 | 2021-05-25 | 科磊股份有限公司 | Analyze and utilize landscapes |
| US9830421B2 (en) * | 2014-12-31 | 2017-11-28 | Kla-Tencor Corp. | Alignment of inspection to design using built in targets |
| US9799575B2 (en) | 2015-12-16 | 2017-10-24 | Pdf Solutions, Inc. | Integrated circuit containing DOEs of NCEM-enabled fill cells |
| US10199283B1 (en) | 2015-02-03 | 2019-02-05 | Pdf Solutions, Inc. | Method for processing a semiconductor wager using non-contact electrical measurements indicative of a resistance through a stitch, where such measurements are obtained by scanning a pad comprised of at least three parallel conductive stripes using a moving stage with beam deflection to account for motion of the stage |
| US9875536B2 (en) | 2015-03-31 | 2018-01-23 | Kla-Tencor Corp. | Sub-pixel and sub-resolution localization of defects on patterned wafers |
| US10539612B2 (en) * | 2015-05-20 | 2020-01-21 | Kla-Tencor Corporation | Voltage contrast based fault and defect inference in logic chips |
| US9639645B2 (en) | 2015-06-18 | 2017-05-02 | Globalfoundries Inc. | Integrated circuit chip reliability using reliability-optimized failure mechanism targeting |
| US9940704B2 (en) | 2015-06-19 | 2018-04-10 | KLA—Tencor Corporation | Pre-layer defect site review using design |
| US9891275B2 (en) | 2015-06-24 | 2018-02-13 | International Business Machines Corporation | Integrated circuit chip reliability qualification using a sample-specific expected fail rate |
| TWI684225B (en) * | 2015-08-28 | 2020-02-01 | 美商克萊譚克公司 | Self directed metrology and pattern classification |
| US9576772B1 (en) * | 2015-08-31 | 2017-02-21 | Fei Company | CAD-assisted TEM prep recipe creation |
| KR102387459B1 (en) | 2015-11-20 | 2022-04-15 | 삼성전자주식회사 | A method for forming pattern of a semiconductor device |
| US10387601B2 (en) * | 2015-11-26 | 2019-08-20 | Kla-Tencor Corporation | Methods to store dynamic layer content inside a design file |
| US10593604B1 (en) | 2015-12-16 | 2020-03-17 | Pdf Solutions, Inc. | Process for making semiconductor dies, chips, and wafers using in-line measurements obtained from DOEs of NCEM-enabled fill cells |
| US10978438B1 (en) | 2015-12-16 | 2021-04-13 | Pdf Solutions, Inc. | IC with test structures and E-beam pads embedded within a contiguous standard cell area |
| TWI737659B (en) | 2015-12-22 | 2021-09-01 | 以色列商應用材料以色列公司 | Method of deep learning - based examination of a semiconductor specimen and system thereof |
| US10656531B2 (en) | 2015-12-22 | 2020-05-19 | Asml Netherlands B.V. | Apparatus and method for process-window characterization |
| WO2017117568A1 (en) * | 2015-12-31 | 2017-07-06 | Kla-Tencor Corporation | Accelerated training of a machine learning based model for semiconductor applications |
| WO2017114662A1 (en) * | 2015-12-31 | 2017-07-06 | Asml Netherlands B.V. | Selection of measurement locations for patterning processes |
| KR102451650B1 (en) * | 2016-02-05 | 2022-10-11 | 에스케이하이닉스 주식회사 | Stacked type seniconductor apparatus |
| KR102483787B1 (en) * | 2016-02-25 | 2023-01-04 | 에스케이하이닉스 주식회사 | Apparatus and Method for Modeling of Defect to Semiconductor Apparatus, and Computer Program Therefor, and System for Inspection of Defect to Semiconductor Apparatus |
| US10339262B2 (en) * | 2016-03-29 | 2019-07-02 | Kla-Tencor Corporation | System and method for defining care areas in repeating structures of design data |
| US9929063B1 (en) | 2016-04-04 | 2018-03-27 | Pdf Solutions, Inc. | Process for making an integrated circuit that includes NCEM-Enabled, tip-to-side gap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates |
| US9905553B1 (en) | 2016-04-04 | 2018-02-27 | Pdf Solutions, Inc. | Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, AACNT-short-configured, GATECNT-short-configured, and metal-short-configured, NCEM-enabled fill cells |
| US9627370B1 (en) | 2016-04-04 | 2017-04-18 | Pdf Solutions, Inc. | Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, GATE-short-configured, GATECNT-short-configured, and TS-short-configured, NCEM-enabled fill cells |
| US10740888B2 (en) * | 2016-04-22 | 2020-08-11 | Kla-Tencor Corporation | Computer assisted weak pattern detection and quantification system |
| US11443083B2 (en) * | 2016-05-12 | 2022-09-13 | Asml Netherlands B.V. | Identification of hot spots or defects by machine learning |
| US11010886B2 (en) * | 2016-05-17 | 2021-05-18 | Kla-Tencor Corporation | Systems and methods for automatic correction of drift between inspection and design for massive pattern searching |
| US10192302B2 (en) * | 2016-05-25 | 2019-01-29 | Kla-Tencor Corporation | Combined patch and design-based defect detection |
| US10304177B2 (en) * | 2016-06-29 | 2019-05-28 | Kla-Tencor Corporation | Systems and methods of using z-layer context in logic and hot spot inspection for sensitivity improvement and nuisance suppression |
| US10902576B2 (en) * | 2016-08-12 | 2021-01-26 | Texas Instruments Incorporated | System and method for electronic die inking after automatic visual defect inspection |
| US10204290B2 (en) * | 2016-10-14 | 2019-02-12 | Kla-Tencor Corporation | Defect review sampling and normalization based on defect and design attributes |
| US10395358B2 (en) * | 2016-11-10 | 2019-08-27 | Kla-Tencor Corp. | High sensitivity repeater defect detection |
| US11047806B2 (en) * | 2016-11-30 | 2021-06-29 | Kla-Tencor Corporation | Defect discovery and recipe optimization for inspection of three-dimensional semiconductor structures |
| US11237119B2 (en) * | 2017-01-10 | 2022-02-01 | Kla-Tencor Corporation | Diagnostic methods for the classifiers and the defects captured by optical tools |
| US9748153B1 (en) | 2017-03-29 | 2017-08-29 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second does of standard cell compatible, NCEM-enabled fill cells, with the first DOE including side-to-side short configured fill cells, and the second DOE including tip-to-side short configure |
| US9773774B1 (en) | 2017-03-30 | 2017-09-26 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including chamfer short configured fill cells, and the second DOE including corner short configured fill cells |
| US10598617B2 (en) * | 2017-05-05 | 2020-03-24 | Kla-Tencor Corporation | Metrology guided inspection sample shaping of optical inspection results |
| JP6819451B2 (en) * | 2017-05-08 | 2021-01-27 | 信越化学工業株式会社 | Large synthetic quartz glass substrate and its evaluation method and manufacturing method |
| CN110622287B (en) * | 2017-05-22 | 2023-11-03 | 科磊股份有限公司 | Area analysis for recipe optimization and measurement |
| KR102440742B1 (en) * | 2017-05-25 | 2022-09-05 | 삼성전자주식회사 | Inspecting system for semiconductor device and operating method of the same |
| US10648925B2 (en) * | 2017-06-05 | 2020-05-12 | Kla-Tencor Corporation | Repeater defect detection |
| KR102447611B1 (en) * | 2017-06-06 | 2022-09-26 | 케이엘에이 코포레이션 | Reticle Optimization Algorithms and Optimal Target Design |
| US9768083B1 (en) | 2017-06-27 | 2017-09-19 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including snake open configured fill cells |
| US9786649B1 (en) | 2017-06-27 | 2017-10-10 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including via open configured fill cells, and the second DOE including stitch open configured fill cells |
| US9865583B1 (en) | 2017-06-28 | 2018-01-09 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including snake open configured fill cells, and the second DOE including stitch open configured fill cells |
| US10096530B1 (en) | 2017-06-28 | 2018-10-09 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including stitch open configured fill cells |
| US10620135B2 (en) * | 2017-07-19 | 2020-04-14 | Kla-Tencor Corp. | Identifying a source of nuisance defects on a wafer |
| KR102614266B1 (en) * | 2017-08-22 | 2023-12-14 | 삼성전자주식회사 | A method for wafer inspection, and a method for manufacturing a semiconductor device using the same |
| US11037286B2 (en) * | 2017-09-28 | 2021-06-15 | Applied Materials Israel Ltd. | Method of classifying defects in a semiconductor specimen and system thereof |
| KR20190073756A (en) | 2017-12-19 | 2019-06-27 | 삼성전자주식회사 | Semiconductor defect classification device, method for classifying defect of semiconductor, and semiconductor defect classification system |
| KR102340166B1 (en) | 2018-02-26 | 2021-12-16 | 에프. 호프만-라 로슈 아게 | Methods and systems for calibrating and using a camera to detect an analyte in a sample |
| US10585049B2 (en) * | 2018-03-10 | 2020-03-10 | Kla-Tencor Corporation | Process-induced excursion characterization |
| US10677588B2 (en) * | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| US11797950B2 (en) * | 2018-08-27 | 2023-10-24 | Basf Corporation | Method and system to digitally track and monitor an automotive refinish repair process |
| WO2020079809A1 (en) * | 2018-10-18 | 2020-04-23 | 株式会社図研 | Design aid device, design aid method, and program |
| US11049745B2 (en) * | 2018-10-19 | 2021-06-29 | Kla Corporation | Defect-location determination using correction loop for pixel alignment |
| US11600505B2 (en) | 2018-10-31 | 2023-03-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Systems and methods for systematic physical failure analysis (PFA) fault localization |
| CN109583721B (en) * | 2018-11-16 | 2024-06-18 | 北京奇虎科技有限公司 | Channel assessment method and device and electronic equipment |
| JP2020161769A (en) * | 2019-03-28 | 2020-10-01 | Tasmit株式会社 | Image generation method |
| TWI700644B (en) * | 2019-04-02 | 2020-08-01 | 精英電腦股份有限公司 | Synchronous positioning device and method for circuit board or plate member |
| JP7245733B2 (en) * | 2019-06-26 | 2023-03-24 | 株式会社日立ハイテク | Wafer observation device and wafer observation method |
| JP7660100B2 (en) * | 2019-08-16 | 2025-04-10 | シノプシス, インコーポレイテッド | Application of reticle enhancement technology recipes based on failure modes predicted by artificial neural networks |
| US11410292B2 (en) * | 2019-09-27 | 2022-08-09 | Kla Corporation | Equi-probability defect detection |
| US11526152B2 (en) * | 2019-12-19 | 2022-12-13 | X Development Llc | Techniques for determining fabricability of designs by searching for forbidden patterns |
| US11360030B2 (en) | 2020-02-04 | 2022-06-14 | Applied Materials Isreal Ltd | Selecting a coreset of potential defects for estimating expected defects of interest |
| KR102782977B1 (en) * | 2020-04-29 | 2025-03-18 | 에스케이텔레콤 주식회사 | Method and Apparatus for Image Transform to Build Learning Database |
| CN113820922B (en) * | 2020-06-18 | 2024-08-02 | 台湾积体电路制造股份有限公司 | Hot spot prediction method, hot spot prediction device and recording medium |
| CN111708255B (en) * | 2020-06-19 | 2023-03-07 | 上海华虹宏力半导体制造有限公司 | Method for forming SSA table of OPC |
| US11782809B2 (en) * | 2020-06-30 | 2023-10-10 | Tektronix, Inc. | Test and measurement system for analyzing devices under test |
| JP7526940B2 (en) * | 2020-09-11 | 2024-08-02 | パナソニックIpマネジメント株式会社 | Information processing method and information processing device |
| JP7443268B2 (en) | 2021-01-05 | 2024-03-05 | 株式会社ニューフレアテクノロジー | Defect inspection method |
| CN117157648A (en) * | 2021-03-30 | 2023-12-01 | 西门子工业软件有限公司 | Method and system for detecting false errors on components of an AOI machine inspected board |
| KR102877633B1 (en) | 2021-09-01 | 2025-10-28 | 에스케이하이닉스 주식회사 | Method for failure analysis on semiconductor wafer and system thereof |
| US12111355B2 (en) | 2021-11-22 | 2024-10-08 | Onto Innovation Inc. | Semiconductor substrate yield prediction based on spectra data from multiple substrate dies |
| KR102672272B1 (en) * | 2022-02-11 | 2024-06-04 | 큐알티 주식회사 | Beam inspection apparatus comprising plurality of a guide concentric circle for testing of semiconductor, and method of inspection for beam |
| KR102547617B1 (en) * | 2022-06-23 | 2023-06-26 | 큐알티 주식회사 | Semiconductor device test apparatus that provides an accelerated environment and method for testing semiconductor devices in an accelerated environment using the same |
| US20240112326A1 (en) * | 2022-09-30 | 2024-04-04 | Kla Corporation | Inspection of adaptive patterned workpieces with dynamic design and deep learning-based rendering |
| JP7832359B2 (en) | 2022-11-11 | 2026-03-17 | 株式会社日立ハイテク | Pattern length measurement and defect inspection method, image data processing system, and computer-readable recording medium. |
| KR102594471B1 (en) * | 2022-12-07 | 2023-10-26 | 주식회사디아이 | Multi-test zone controller for semiconductor test equipment |
| WO2025027758A1 (en) * | 2023-07-31 | 2025-02-06 | 株式会社日立ハイテク | Method and program for operating semiconductor device evaluation device by means of character string |
| WO2025216787A1 (en) * | 2024-04-11 | 2025-10-16 | Applied Materials, Inc. | Using patterns as alignment markers |
| US20260057547A1 (en) * | 2024-08-26 | 2026-02-26 | Applied Materials, Inc. | Identifying and locating multiple alignment marks within a single image |
| KR102831180B1 (en) * | 2024-12-18 | 2025-07-10 | 주식회사 에이치비테크놀러지 | Generative AI-based PCB defect classification device and method |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02110565A (en) * | 1988-10-20 | 1990-04-23 | Matsushita Electron Corp | Method and device for photo-mask inspection |
| US5054097A (en) * | 1988-11-23 | 1991-10-01 | Schlumberger Technologies, Inc. | Methods and apparatus for alignment of images |
| US5252507A (en) * | 1990-03-30 | 1993-10-12 | Tactical Fabs, Inc. | Very high density wafer scale device architecture |
| JP3017839B2 (en) * | 1991-06-10 | 2000-03-13 | 東芝機械株式会社 | Defect inspection method and inspection device |
| JP3730263B2 (en) * | 1992-05-27 | 2005-12-21 | ケーエルエー・インストルメンツ・コーポレーション | Apparatus and method for automatic substrate inspection using charged particle beam |
| JPH06119452A (en) * | 1992-10-02 | 1994-04-28 | Fujitsu Ltd | Image processing apparatus and image processing method |
| JPH06265480A (en) * | 1993-03-12 | 1994-09-22 | Toshiba Corp | Pattern defect inspection method and inspection apparatus |
| JP3370379B2 (en) * | 1993-03-19 | 2003-01-27 | 株式会社日立製作所 | Method for manufacturing semiconductor device |
| JP3051279B2 (en) * | 1993-05-13 | 2000-06-12 | シャープ株式会社 | Bump appearance inspection method and bump appearance inspection device |
| US5544256A (en) | 1993-10-22 | 1996-08-06 | International Business Machines Corporation | Automated defect classification system |
| JP3466286B2 (en) * | 1994-08-09 | 2003-11-10 | 富士通株式会社 | Pattern inspection method and pattern inspection device |
| US5991699A (en) | 1995-05-04 | 1999-11-23 | Kla Instruments Corporation | Detecting groups of defects in semiconductor feature space |
| JPH0915161A (en) * | 1995-06-27 | 1997-01-17 | Hitachi Ltd | Defect inspection method and apparatus |
| JPH10260011A (en) * | 1997-03-19 | 1998-09-29 | Olympus Optical Co Ltd | Positioning device |
| JP3564958B2 (en) * | 1997-08-07 | 2004-09-15 | 株式会社日立製作所 | Inspection method and inspection apparatus using electron beam |
| JPH11251377A (en) * | 1998-03-02 | 1999-09-17 | Hitachi Ltd | Defect inspection method and apparatus, defect observation or analysis method and system |
| JP4073088B2 (en) * | 1998-08-20 | 2008-04-09 | 株式会社ルネサステクノロジ | Manufacturing method of semiconductor substrate |
| JP2000065747A (en) * | 1998-08-26 | 2000-03-03 | Toshiba Corp | Pattern defect inspection apparatus and pattern defect inspection method |
| JP2000306964A (en) * | 1999-04-22 | 2000-11-02 | Hitachi Ltd | Inspection data processing method and inspection data processing device |
| JP2000200356A (en) * | 1999-01-08 | 2000-07-18 | Hitachi Ltd | Defect classification method and device |
| JP3350477B2 (en) * | 1999-04-02 | 2002-11-25 | セイコーインスツルメンツ株式会社 | Wafer inspection equipment |
| JP2001230289A (en) * | 2000-02-15 | 2001-08-24 | Hitachi Ltd | Defect analysis method and defect analysis system |
| US7120285B1 (en) * | 2000-02-29 | 2006-10-10 | Advanced Micro Devices, Inc. | Method for evaluation of reticle image using aerial image simulator |
| US6862142B2 (en) * | 2000-03-10 | 2005-03-01 | Kla-Tencor Technologies Corporation | Multi-detector microscopic inspection system |
| US6507800B1 (en) * | 2000-03-13 | 2003-01-14 | Promos Technologies, Inc. | Method for testing semiconductor wafers |
| JP3920003B2 (en) * | 2000-04-25 | 2007-05-30 | 株式会社ルネサステクノロジ | Inspection data processing method and apparatus |
| FR2813145B1 (en) * | 2000-08-18 | 2002-11-29 | St Microelectronics Sa | METHOD FOR MANUFACTURING A CAPACITOR WITHIN AN INTEGRATED CIRCUIT, AND CORRESPONDING INTEGRATED CIRCUIT |
| US6634018B2 (en) * | 2000-08-24 | 2003-10-14 | Texas Instruments Incorporated | Optical proximity correction |
| JP3678133B2 (en) * | 2000-10-30 | 2005-08-03 | 株式会社日立製作所 | Inspection system and semiconductor device manufacturing method |
| AU2002227965A1 (en) * | 2000-11-30 | 2002-06-11 | Sigma-C Gmbh | Method and device for determining the properties of an integrated circuit |
| JP2002244275A (en) * | 2001-02-15 | 2002-08-30 | Toshiba Corp | Photomask defect inspection method, photomask defect inspection apparatus, and recording medium |
| JP4014379B2 (en) * | 2001-02-21 | 2007-11-28 | 株式会社日立製作所 | Defect review apparatus and method |
| JP2003023056A (en) * | 2001-07-10 | 2003-01-24 | Hitachi Ltd | Semiconductor device defect classification method, semiconductor device yield prediction method, semiconductor device manufacturing method, semiconductor device defect classification system, semiconductor device classification device, and program and recording medium used therefor |
| JP4122735B2 (en) * | 2001-07-24 | 2008-07-23 | 株式会社日立製作所 | Semiconductor device inspection method and inspection condition setting method |
| JP3904419B2 (en) * | 2001-09-13 | 2007-04-11 | 株式会社日立製作所 | Inspection device and inspection system |
| US6751519B1 (en) * | 2001-10-25 | 2004-06-15 | Kla-Tencor Technologies Corporation | Methods and systems for predicting IC chip yield |
| US6918101B1 (en) * | 2001-10-25 | 2005-07-12 | Kla -Tencor Technologies Corporation | Apparatus and methods for determining critical area of semiconductor design data |
| US6886153B1 (en) | 2001-12-21 | 2005-04-26 | Kla-Tencor Corporation | Design driven inspection or measurement for semiconductor using recipe |
| JP2003215060A (en) * | 2002-01-22 | 2003-07-30 | Tokyo Seimitsu Co Ltd | Pattern inspection method and inspection apparatus |
| JP2004031709A (en) * | 2002-06-27 | 2004-01-29 | Seiko Instruments Inc | Waferless measuring recipe generating system |
| JP4073265B2 (en) * | 2002-07-09 | 2008-04-09 | 富士通株式会社 | Inspection apparatus and inspection method |
| US6959251B2 (en) | 2002-08-23 | 2005-10-25 | Kla-Tencor Technologies, Corporation | Inspection system setup techniques |
| JP2004117016A (en) * | 2002-09-24 | 2004-04-15 | Nec Kansai Ltd | Semiconductor wafer defect inspecting apparatus |
| US7457736B2 (en) * | 2002-11-21 | 2008-11-25 | Synopsys, Inc. | Automated creation of metrology recipes |
| US6882745B2 (en) * | 2002-12-19 | 2005-04-19 | Freescale Semiconductor, Inc. | Method and apparatus for translating detected wafer defect coordinates to reticle coordinates using CAD data |
| JP2004227886A (en) * | 2003-01-22 | 2004-08-12 | Hitachi High-Technologies Corp | Scanning electron microscope |
| JP2004296592A (en) * | 2003-03-26 | 2004-10-21 | Dainippon Screen Mfg Co Ltd | Defect classification equipment, defect classification method, and program |
| JP4230838B2 (en) * | 2003-06-27 | 2009-02-25 | 株式会社日立ハイテクノロジーズ | Inspection recipe setting method and defect inspection method in defect inspection apparatus |
| JP2004294358A (en) * | 2003-03-28 | 2004-10-21 | Hitachi High-Technologies Corp | Defect inspection method and apparatus |
| US6952653B2 (en) | 2003-04-29 | 2005-10-04 | Kla-Tencor Technologies Corporation | Single tool defect classification solution |
| JP2004333386A (en) * | 2003-05-09 | 2004-11-25 | Nec Corp | Reticle inspection apparatus and reticle inspection method |
| JP4229767B2 (en) * | 2003-06-30 | 2009-02-25 | 株式会社東京精密 | Image defect inspection method, image defect inspection apparatus, and appearance inspection apparatus |
| US9002497B2 (en) * | 2003-07-03 | 2015-04-07 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of wafers and reticles using designer intent data |
| US7135344B2 (en) * | 2003-07-11 | 2006-11-14 | Applied Materials, Israel, Ltd. | Design-based monitoring |
| KR20050072166A (en) * | 2004-01-02 | 2005-07-11 | 삼성전자주식회사 | Method for testing wafer |
| JP4771714B2 (en) * | 2004-02-23 | 2011-09-14 | 株式会社Ngr | Pattern inspection apparatus and method |
| US7194709B2 (en) | 2004-03-05 | 2007-03-20 | Keith John Brankner | Automatic alignment of integrated circuit and design layout of integrated circuit to more accurately assess the impact of anomalies |
| JP4778685B2 (en) * | 2004-03-10 | 2011-09-21 | 株式会社日立ハイテクノロジーズ | Pattern shape evaluation method and apparatus for semiconductor device |
| JP2005283326A (en) * | 2004-03-30 | 2005-10-13 | Hitachi High-Technologies Corp | Defect review method and apparatus |
| US7137083B2 (en) * | 2004-04-01 | 2006-11-14 | Verigy Ipco | Verification of integrated circuit tests using test simulation and integrated circuit simulation with simulated failure |
| JP4154374B2 (en) * | 2004-08-25 | 2008-09-24 | 株式会社日立ハイテクノロジーズ | Pattern matching device and scanning electron microscope using the same |
| US7760347B2 (en) * | 2005-05-13 | 2010-07-20 | Applied Materials, Inc. | Design-based method for grouping systematic defects in lithography pattern writing system |
| KR101613048B1 (en) * | 2005-11-18 | 2016-04-15 | 케이엘에이-텐코 코포레이션 | Methods and systems for utilizing design data in combination with inspection data |
-
2006
- 2006-11-20 KR KR1020157000055A patent/KR101613048B1/en active Active
- 2006-11-20 KR KR1020167033159A patent/KR101789004B1/en active Active
- 2006-11-20 KR KR1020137006368A patent/KR101665168B1/en active Active
- 2006-11-20 WO PCT/US2006/061112 patent/WO2007120279A2/en not_active Ceased
- 2006-11-20 KR KR1020177029140A patent/KR101885585B1/en active Active
- 2006-11-20 KR KR1020157030359A patent/KR101672157B1/en active Active
- 2006-11-20 KR KR1020087014775A patent/KR101285967B1/en active Active
- 2006-11-20 KR KR1020137009231A patent/KR101370154B1/en active Active
- 2006-11-20 KR KR1020137009234A patent/KR101530456B1/en active Active
- 2006-11-20 KR KR1020157002473A patent/KR101682838B1/en active Active
- 2006-11-20 WO PCT/US2006/061113 patent/WO2007120280A2/en not_active Ceased
- 2006-11-20 EP EP06850792A patent/EP1955225A4/en not_active Withdrawn
- 2006-11-20 KR KR1020147015035A patent/KR101565071B1/en active Active
- 2006-11-20 JP JP2008541507A patent/JP5465880B2/en active Active
- 2006-11-20 KR KR1020187021977A patent/KR20180088924A/en not_active Withdrawn
-
2008
- 2008-05-18 IL IL191527A patent/IL191527A/en active IP Right Grant
-
2012
- 2012-05-15 JP JP2012111262A patent/JP5466264B2/en active Active
-
2013
- 2013-06-27 JP JP2013134798A patent/JP5932723B2/en active Active
- 2013-06-27 JP JP2013134802A patent/JP5763712B2/en active Active
- 2013-12-29 IL IL230235A patent/IL230235A/en active IP Right Grant
- 2013-12-31 IL IL230260A patent/IL230260A/en active IP Right Grant
-
2014
- 2014-04-04 JP JP2014077804A patent/JP6023116B2/en active Active
- 2014-08-25 IL IL234290A patent/IL234290A/en active IP Right Grant
- 2014-08-25 IL IL234289A patent/IL234289A/en active IP Right Grant
- 2014-08-26 IL IL234319A patent/IL234319A/en active IP Right Grant
- 2014-08-26 IL IL234316A patent/IL234316A/en active IP Right Grant
- 2014-08-26 IL IL234317A patent/IL234317A/en active IP Right Grant
- 2014-08-26 IL IL234318A patent/IL234318A/en active IP Right Grant
- 2014-08-27 IL IL234344A patent/IL234344A/en active IP Right Grant
- 2014-08-27 IL IL234345A patent/IL234345A/en active IP Right Grant
- 2014-08-27 IL IL234346A patent/IL234346A/en active IP Right Grant
- 2014-08-27 IL IL234343A patent/IL234343A/en active IP Right Grant
- 2014-12-17 JP JP2014255558A patent/JP5965467B2/en active Active
- 2014-12-17 JP JP2014255556A patent/JP5869657B2/en active Active
-
2015
- 2015-09-17 JP JP2015184050A patent/JP6312641B2/en active Active
- 2015-09-17 JP JP2015184061A patent/JP6312642B2/en active Active
-
2016
- 2016-02-24 JP JP2016033027A patent/JP6127170B2/en active Active
- 2016-02-24 JP JP2016033030A patent/JP6364036B2/en active Active
- 2016-02-24 JP JP2016033028A patent/JP6360845B2/en active Active
-
2017
- 2017-06-27 IL IL253189A patent/IL253189B/en active IP Right Grant
Also Published As
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IL253189B (en) | A system and method for assigning a rating to defects found in a chip manufacturing substrate | |
| FI20041524L (en) | Method for manufacturing an electronic module | |
| TWI372244B (en) | Method for characterizing defects in a transparent substrate | |
| FI20050646L (en) | Circuit board structure and method for manufacturing circuit board structure | |
| FI20050842L (en) | Positioning method in elevator system | |
| FI20050645L (en) | Method for manufacturing a circuit board structure and circuit board structure | |
| EP1738417A4 (en) | PHOTOVOLTAIC SYSTEM AND MANUFACTURING METHOD THEREFOR | |
| ATE518856T1 (en) | MANUFACTURING PROCESS | |
| EP2064732A4 (en) | SEMICONDUCTOR COMPONENT AND MANUFACTURING METHOD THEREFOR | |
| DE602005019524D1 (en) | Manufacturing method of an integrated chip substrate | |
| FI20085443L (en) | Circuit module and method for manufacturing a circuit module | |
| DE602007005822D1 (en) | MANUFACTURING METHOD FOR SEMICONDUCTOR COMPONENTS | |
| GB0718102D0 (en) | Semiconductor luminous element and method for manufacture thereof | |
| TWI339883B (en) | Substrate structure for semiconductor package and manufacturing method thereof | |
| FI20040011L (en) | Method for treating surfaces | |
| TWI319615B (en) | Package substrate and manufacturing method thereof | |
| TWI420605B (en) | Semiconductor component and manufacturing method | |
| DE602007009885D1 (en) | Semiconductor arrangement and method for its production | |
| FI20050707L (en) | Semiconductor structure and method for manufacturing a semiconductor structure | |
| DE102006052910A8 (en) | Wafer manufacturing process and apparatus | |
| DE502004012360D1 (en) | SEMICONDUCTOR MEMORY CELL AND RELATED MANUFACTURING METHOD | |
| FI20040191L (en) | Method for manufacturing three-dimensional optical components | |
| EP1810385A4 (en) | MICROELECTRONIC MODULE AND ASSOCIATED METHOD | |
| FR2869455B1 (en) | METHOD OF MANUFACTURING CHIPS AND SUPPORT THEREFOR | |
| FI20040503L (en) | Method for manufacturing load-bearing elements |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FF | Patent granted | ||
| KB | Patent renewed | ||
| KB | Patent renewed |