IL211092A - Polishing pad and method of manufacture - Google Patents
Polishing pad and method of manufactureInfo
- Publication number
- IL211092A IL211092A IL211092A IL21109211A IL211092A IL 211092 A IL211092 A IL 211092A IL 211092 A IL211092 A IL 211092A IL 21109211 A IL21109211 A IL 21109211A IL 211092 A IL211092 A IL 211092A
- Authority
- IL
- Israel
- Prior art keywords
- polishing pad
- polishing
- polymeric elastomer
- fibers
- ultrafine
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- D—TEXTILES; PAPER
- D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
- D04H—MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
- D04H3/00—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length
- D04H3/016—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the fineness
-
- D—TEXTILES; PAPER
- D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
- D04H—MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
- D04H3/00—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length
- D04H3/08—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the method of strengthening or consolidating
- D04H3/10—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the method of strengthening or consolidating with bonds between yarns or filaments made mechanically
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Textile Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008205981 | 2008-08-08 | ||
PCT/JP2009/063802 WO2010016486A1 (ja) | 2008-08-08 | 2009-08-04 | 研磨パッド及び研磨パッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
IL211092A0 IL211092A0 (en) | 2011-04-28 |
IL211092A true IL211092A (en) | 2014-03-31 |
Family
ID=41663704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL211092A IL211092A (en) | 2008-08-08 | 2011-02-06 | Polishing pad and method of manufacture |
Country Status (9)
Country | Link |
---|---|
US (2) | US20110171890A1 (zh) |
EP (1) | EP2316614B1 (zh) |
JP (1) | JP5411862B2 (zh) |
KR (1) | KR101410116B1 (zh) |
CN (1) | CN102119069B (zh) |
HK (1) | HK1154828A1 (zh) |
IL (1) | IL211092A (zh) |
TW (1) | TWI460052B (zh) |
WO (1) | WO2010016486A1 (zh) |
Families Citing this family (58)
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US8513147B2 (en) | 2003-06-19 | 2013-08-20 | Eastman Chemical Company | Nonwovens produced from multicomponent fibers |
US20040260034A1 (en) | 2003-06-19 | 2004-12-23 | Haile William Alston | Water-dispersible fibers and fibrous articles |
US7892993B2 (en) | 2003-06-19 | 2011-02-22 | Eastman Chemical Company | Water-dispersible and multicomponent fibers from sulfopolyesters |
US8512519B2 (en) | 2009-04-24 | 2013-08-20 | Eastman Chemical Company | Sulfopolyesters for paper strength and process |
CN101624511B (zh) * | 2009-08-14 | 2012-08-29 | 上海震旦办公设备有限公司 | 碎纸机刀片锋利研磨组合物、由其制造的研磨片、研磨包和相关制造工艺 |
US8068011B1 (en) | 2010-08-27 | 2011-11-29 | Q Street, LLC | System and method for interactive user-directed interfacing between handheld devices and RFID media |
US20120302142A1 (en) * | 2010-09-16 | 2012-11-29 | San Fang Chemical Industry Co., Ltd. | Polishing pad and method of producing the same |
US20120183861A1 (en) | 2010-10-21 | 2012-07-19 | Eastman Chemical Company | Sulfopolyester binders |
JP5729720B2 (ja) * | 2011-06-08 | 2015-06-03 | 株式会社クラレ | 研磨布及び該研磨布を用いた研磨方法 |
JP5945874B2 (ja) * | 2011-10-18 | 2016-07-05 | 富士紡ホールディングス株式会社 | 研磨パッド及びその製造方法 |
WO2013115094A1 (ja) * | 2012-01-31 | 2013-08-08 | 株式会社クラレ | 複合繊維、ポリウレタンエラストマー布帛の製造方法、およびポリウレタンエラストマー布帛 |
US8906200B2 (en) | 2012-01-31 | 2014-12-09 | Eastman Chemical Company | Processes to produce short cut microfibers |
JP5844189B2 (ja) * | 2012-03-26 | 2016-01-13 | 富士紡ホールディングス株式会社 | 研磨パッド及び研磨パッドの製造方法 |
EP2830829B1 (en) * | 2012-03-30 | 2018-01-10 | Saint-Gobain Abrasives, Inc. | Abrasive products having fibrillated fibers |
JP6033652B2 (ja) | 2012-11-23 | 2016-11-30 | 光洋機械工業株式会社 | 両面研削装置における静圧パッドの熱変形防止装置および両面研削装置 |
US9617685B2 (en) | 2013-04-19 | 2017-04-11 | Eastman Chemical Company | Process for making paper and nonwoven articles comprising synthetic microfiber binders |
CN105452559B (zh) * | 2013-09-13 | 2017-11-21 | 东丽株式会社 | 片状物及其制造方法 |
US9605126B2 (en) | 2013-12-17 | 2017-03-28 | Eastman Chemical Company | Ultrafiltration process for the recovery of concentrated sulfopolyester dispersion |
US9598802B2 (en) | 2013-12-17 | 2017-03-21 | Eastman Chemical Company | Ultrafiltration process for producing a sulfopolyester concentrate |
US9873180B2 (en) * | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
KR102436416B1 (ko) | 2014-10-17 | 2022-08-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
JP2016087770A (ja) | 2014-11-11 | 2016-05-23 | 株式会社東芝 | 研磨布および研磨方法 |
CN107000157B (zh) * | 2014-11-28 | 2019-12-13 | 株式会社可乐丽 | 抛光层用成型体及抛光垫 |
CN105297161B (zh) * | 2015-09-22 | 2018-06-29 | 四川大学 | 一种以水可溶聚氨酯弹性体为海的海岛纤维在温和条件下的减量方法 |
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US10618141B2 (en) | 2015-10-30 | 2020-04-14 | Applied Materials, Inc. | Apparatus for forming a polishing article that has a desired zeta potential |
US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
TWI656199B (zh) * | 2016-06-29 | 2019-04-11 | 臺灣永光化學工業股份有限公司 | 聚氨酯型高分子紫外線吸收劑 |
ES2857706T3 (es) * | 2016-08-17 | 2021-09-29 | The Lycra Company Uk Ltd | Dispersiones de poliuretano acuosas, prepolímeros, y artículos conformados elaborados a partir de los mismos |
CN106223058A (zh) * | 2016-08-29 | 2016-12-14 | 福建华阳超纤有限公司 | 一种耐光老化及耐磨的水性绒面超纤革的制作方法 |
CN110023034B (zh) * | 2016-11-16 | 2021-04-30 | 帝人富瑞特株式会社 | 研磨垫及其制造方法 |
JP2018108612A (ja) * | 2016-12-28 | 2018-07-12 | 花王株式会社 | 研磨パッド |
US11053339B2 (en) * | 2017-05-12 | 2021-07-06 | Kuraray Co., Ltd. | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method |
JP6951895B2 (ja) * | 2017-07-25 | 2021-10-20 | ニッタ・デュポン株式会社 | 研磨布 |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
CN107604533B (zh) * | 2017-09-19 | 2019-10-18 | 四川大学 | 一种弹力超细纤维合成革及其环境友好的制备方法 |
JP7081351B2 (ja) * | 2018-07-10 | 2022-06-07 | 日本電気硝子株式会社 | ガラス板の製造方法およびガラス板の洗浄装置 |
CN112654655A (zh) | 2018-09-04 | 2021-04-13 | 应用材料公司 | 先进抛光垫配方 |
WO2020085502A1 (ja) * | 2018-10-25 | 2020-04-30 | 三井化学株式会社 | 不織布積層体、並びに、伸縮性不織布積層体、繊維製品、吸収性物品及び衛生マスク |
EP3878897A4 (en) * | 2018-11-09 | 2022-07-20 | Kuraray Co., Ltd. | POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND POLISHING LAYER MODIFICATION METHOD |
SG11202104629QA (en) * | 2018-12-03 | 2021-06-29 | Kuraray Co | Polyurethane for polishing layers, polishing layer and polishing pad |
CN109648451B (zh) * | 2018-12-29 | 2020-12-01 | 徐州鑫晶半导体科技有限公司 | 硅晶圆的最终抛光方法和最终抛光装置 |
KR102174958B1 (ko) * | 2019-03-27 | 2020-11-05 | 에스케이씨 주식회사 | 결함 발생을 최소화시키는 연마패드 및 이의 제조방법 |
JP2020200543A (ja) * | 2019-06-07 | 2020-12-17 | セイコーエプソン株式会社 | 繊維体成形方法および繊維結着処理液 |
US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
CN111098218A (zh) * | 2019-12-31 | 2020-05-05 | 杭州中欣晶圆半导体股份有限公司 | 用于硅片的中、精抛布的活化方法 |
US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
CN113510613B (zh) * | 2021-03-12 | 2022-05-13 | 安徽禾臣新材料有限公司 | 一种显示屏抛光用白垫及其生产方法 |
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-
2009
- 2009-08-04 EP EP09804969.5A patent/EP2316614B1/en active Active
- 2009-08-04 WO PCT/JP2009/063802 patent/WO2010016486A1/ja active Application Filing
- 2009-08-04 US US13/058,016 patent/US20110171890A1/en not_active Abandoned
- 2009-08-04 CN CN200980131008.9A patent/CN102119069B/zh active Active
- 2009-08-04 JP JP2010523862A patent/JP5411862B2/ja active Active
- 2009-08-04 KR KR1020117005315A patent/KR101410116B1/ko active IP Right Grant
- 2009-08-06 TW TW098126513A patent/TWI460052B/zh not_active IP Right Cessation
-
2011
- 2011-02-06 IL IL211092A patent/IL211092A/en active IP Right Grant
- 2011-08-24 HK HK11108960.6A patent/HK1154828A1/zh unknown
-
2019
- 2019-03-28 US US16/368,190 patent/US20190218697A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN102119069A (zh) | 2011-07-06 |
WO2010016486A1 (ja) | 2010-02-11 |
TW201016393A (en) | 2010-05-01 |
KR20110042213A (ko) | 2011-04-25 |
KR101410116B1 (ko) | 2014-06-25 |
US20110171890A1 (en) | 2011-07-14 |
HK1154828A1 (zh) | 2012-05-04 |
US20190218697A1 (en) | 2019-07-18 |
EP2316614B1 (en) | 2019-07-17 |
CN102119069B (zh) | 2015-04-15 |
JPWO2010016486A1 (ja) | 2012-01-26 |
TWI460052B (zh) | 2014-11-11 |
EP2316614A1 (en) | 2011-05-04 |
IL211092A0 (en) | 2011-04-28 |
EP2316614A4 (en) | 2014-08-20 |
JP5411862B2 (ja) | 2014-02-12 |
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