JP5411862B2 - 研磨パッド及び研磨パッドの製造方法 - Google Patents
研磨パッド及び研磨パッドの製造方法 Download PDFInfo
- Publication number
- JP5411862B2 JP5411862B2 JP2010523862A JP2010523862A JP5411862B2 JP 5411862 B2 JP5411862 B2 JP 5411862B2 JP 2010523862 A JP2010523862 A JP 2010523862A JP 2010523862 A JP2010523862 A JP 2010523862A JP 5411862 B2 JP5411862 B2 JP 5411862B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing pad
- elastic body
- polishing
- polymer elastic
- ultrafine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- D—TEXTILES; PAPER
- D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
- D04H—MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
- D04H3/00—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length
- D04H3/016—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the fineness
-
- D—TEXTILES; PAPER
- D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
- D04H—MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
- D04H3/00—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length
- D04H3/08—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the method of strengthening or consolidating
- D04H3/10—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the method of strengthening or consolidating with bonds between yarns or filaments made mechanically
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Textile Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010523862A JP5411862B2 (ja) | 2008-08-08 | 2009-08-04 | 研磨パッド及び研磨パッドの製造方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008205981 | 2008-08-08 | ||
JP2008205981 | 2008-08-08 | ||
JP2010523862A JP5411862B2 (ja) | 2008-08-08 | 2009-08-04 | 研磨パッド及び研磨パッドの製造方法 |
PCT/JP2009/063802 WO2010016486A1 (ja) | 2008-08-08 | 2009-08-04 | 研磨パッド及び研磨パッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2010016486A1 JPWO2010016486A1 (ja) | 2012-01-26 |
JP5411862B2 true JP5411862B2 (ja) | 2014-02-12 |
Family
ID=41663704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010523862A Active JP5411862B2 (ja) | 2008-08-08 | 2009-08-04 | 研磨パッド及び研磨パッドの製造方法 |
Country Status (9)
Country | Link |
---|---|
US (2) | US20110171890A1 (zh) |
EP (1) | EP2316614B1 (zh) |
JP (1) | JP5411862B2 (zh) |
KR (1) | KR101410116B1 (zh) |
CN (1) | CN102119069B (zh) |
HK (1) | HK1154828A1 (zh) |
IL (1) | IL211092A (zh) |
TW (1) | TWI460052B (zh) |
WO (1) | WO2010016486A1 (zh) |
Families Citing this family (58)
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US8513147B2 (en) | 2003-06-19 | 2013-08-20 | Eastman Chemical Company | Nonwovens produced from multicomponent fibers |
US7892993B2 (en) | 2003-06-19 | 2011-02-22 | Eastman Chemical Company | Water-dispersible and multicomponent fibers from sulfopolyesters |
US20040260034A1 (en) | 2003-06-19 | 2004-12-23 | Haile William Alston | Water-dispersible fibers and fibrous articles |
US8512519B2 (en) | 2009-04-24 | 2013-08-20 | Eastman Chemical Company | Sulfopolyesters for paper strength and process |
CN101624511B (zh) * | 2009-08-14 | 2012-08-29 | 上海震旦办公设备有限公司 | 碎纸机刀片锋利研磨组合物、由其制造的研磨片、研磨包和相关制造工艺 |
US8068011B1 (en) | 2010-08-27 | 2011-11-29 | Q Street, LLC | System and method for interactive user-directed interfacing between handheld devices and RFID media |
US20120302142A1 (en) * | 2010-09-16 | 2012-11-29 | San Fang Chemical Industry Co., Ltd. | Polishing pad and method of producing the same |
US9273417B2 (en) | 2010-10-21 | 2016-03-01 | Eastman Chemical Company | Wet-Laid process to produce a bound nonwoven article |
JP5729720B2 (ja) * | 2011-06-08 | 2015-06-03 | 株式会社クラレ | 研磨布及び該研磨布を用いた研磨方法 |
JP5945874B2 (ja) * | 2011-10-18 | 2016-07-05 | 富士紡ホールディングス株式会社 | 研磨パッド及びその製造方法 |
CN104136670B (zh) * | 2012-01-31 | 2016-06-01 | 可乐丽股份有限公司 | 复合纤维、聚氨酯弹性体布帛的制造方法及聚氨酯弹性体布帛 |
US8840758B2 (en) | 2012-01-31 | 2014-09-23 | Eastman Chemical Company | Processes to produce short cut microfibers |
JP5844189B2 (ja) * | 2012-03-26 | 2016-01-13 | 富士紡ホールディングス株式会社 | 研磨パッド及び研磨パッドの製造方法 |
US9242346B2 (en) * | 2012-03-30 | 2016-01-26 | Saint-Gobain Abrasives, Inc. | Abrasive products having fibrillated fibers |
JP6033652B2 (ja) | 2012-11-23 | 2016-11-30 | 光洋機械工業株式会社 | 両面研削装置における静圧パッドの熱変形防止装置および両面研削装置 |
US9617685B2 (en) | 2013-04-19 | 2017-04-11 | Eastman Chemical Company | Process for making paper and nonwoven articles comprising synthetic microfiber binders |
WO2015037528A1 (ja) * | 2013-09-13 | 2015-03-19 | 東レ株式会社 | シート状物およびその製造方法 |
US9605126B2 (en) | 2013-12-17 | 2017-03-28 | Eastman Chemical Company | Ultrafiltration process for the recovery of concentrated sulfopolyester dispersion |
US9598802B2 (en) | 2013-12-17 | 2017-03-21 | Eastman Chemical Company | Ultrafiltration process for producing a sulfopolyester concentrate |
US9873180B2 (en) * | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
KR102436416B1 (ko) | 2014-10-17 | 2022-08-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
JP2016087770A (ja) | 2014-11-11 | 2016-05-23 | 株式会社東芝 | 研磨布および研磨方法 |
JP6541683B2 (ja) * | 2014-11-28 | 2019-07-10 | 株式会社クラレ | 研磨層用成形体及び研磨パッド |
CN105297161B (zh) * | 2015-09-22 | 2018-06-29 | 四川大学 | 一种以水可溶聚氨酯弹性体为海的海岛纤维在温和条件下的减量方法 |
WO2017053685A1 (en) * | 2015-09-25 | 2017-03-30 | Cabot Microelectronics Corporation | Polyurethane cmp pads having a high modulus ratio |
US10618141B2 (en) | 2015-10-30 | 2020-04-14 | Applied Materials, Inc. | Apparatus for forming a polishing article that has a desired zeta potential |
US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
TWI656199B (zh) | 2016-06-29 | 2019-04-11 | 臺灣永光化學工業股份有限公司 | 聚氨酯型高分子紫外線吸收劑 |
MX2019001885A (es) * | 2016-08-17 | 2019-06-03 | A&At Uk Ltd | Dispersiones de poliuretano acuosas, prepolimeros, y articulos conformados fabricados a partir de estos. |
CN106223058A (zh) * | 2016-08-29 | 2016-12-14 | 福建华阳超纤有限公司 | 一种耐光老化及耐磨的水性绒面超纤革的制作方法 |
EP3542957B1 (en) | 2016-11-16 | 2021-04-28 | Teijin Frontier Co., Ltd. | Polishing pad and method for manufacturing same |
JP2018108612A (ja) * | 2016-12-28 | 2018-07-12 | 花王株式会社 | 研磨パッド |
US11053339B2 (en) * | 2017-05-12 | 2021-07-06 | Kuraray Co., Ltd. | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method |
JP6951895B2 (ja) * | 2017-07-25 | 2021-10-20 | ニッタ・デュポン株式会社 | 研磨布 |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
CN107604533B (zh) * | 2017-09-19 | 2019-10-18 | 四川大学 | 一种弹力超细纤维合成革及其环境友好的制备方法 |
JP7081351B2 (ja) * | 2018-07-10 | 2022-06-07 | 日本電気硝子株式会社 | ガラス板の製造方法およびガラス板の洗浄装置 |
CN112654655A (zh) | 2018-09-04 | 2021-04-13 | 应用材料公司 | 先进抛光垫配方 |
CN112805430B (zh) * | 2018-10-25 | 2023-09-15 | 三井化学株式会社 | 非织造布层叠体以及伸缩性非织造布层叠体、纤维制品、吸收性物品和卫生口罩 |
EP3878897A4 (en) * | 2018-11-09 | 2022-07-20 | Kuraray Co., Ltd. | POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND POLISHING LAYER MODIFICATION METHOD |
US20210388234A1 (en) * | 2018-12-03 | 2021-12-16 | Kuraray Co., Ltd. | Polyurethane for polishing layers, polishing layer and polishing pad |
CN109648451B (zh) * | 2018-12-29 | 2020-12-01 | 徐州鑫晶半导体科技有限公司 | 硅晶圆的最终抛光方法和最终抛光装置 |
KR102174958B1 (ko) * | 2019-03-27 | 2020-11-05 | 에스케이씨 주식회사 | 결함 발생을 최소화시키는 연마패드 및 이의 제조방법 |
JP2020200543A (ja) * | 2019-06-07 | 2020-12-17 | セイコーエプソン株式会社 | 繊維体成形方法および繊維結着処理液 |
US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
CN111098218A (zh) * | 2019-12-31 | 2020-05-05 | 杭州中欣晶圆半导体股份有限公司 | 用于硅片的中、精抛布的活化方法 |
US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
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2009
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- 2009-08-04 CN CN200980131008.9A patent/CN102119069B/zh active Active
- 2009-08-04 US US13/058,016 patent/US20110171890A1/en not_active Abandoned
- 2009-08-04 WO PCT/JP2009/063802 patent/WO2010016486A1/ja active Application Filing
- 2009-08-04 KR KR1020117005315A patent/KR101410116B1/ko active IP Right Grant
- 2009-08-04 JP JP2010523862A patent/JP5411862B2/ja active Active
- 2009-08-06 TW TW098126513A patent/TWI460052B/zh not_active IP Right Cessation
-
2011
- 2011-02-06 IL IL211092A patent/IL211092A/en active IP Right Grant
- 2011-08-24 HK HK11108960.6A patent/HK1154828A1/zh unknown
-
2019
- 2019-03-28 US US16/368,190 patent/US20190218697A1/en not_active Abandoned
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JP2002079472A (ja) * | 2000-06-19 | 2002-03-19 | Kuraray Co Ltd | テクスチャー加工用研磨シート及びその製造方法 |
JP2006526902A (ja) * | 2003-06-03 | 2006-11-24 | ネオパッド テクノロジーズ コーポレイション | 化学機械的平坦化のための機能的に漸次的変化されたパッドの組み立て |
JP2006028659A (ja) * | 2004-07-13 | 2006-02-02 | Kuraray Co Ltd | スエード調人工皮革およびその製造方法 |
WO2008093850A1 (ja) * | 2007-02-01 | 2008-08-07 | Kuraray Co., Ltd. | 研磨パッド及び研磨パッドの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI460052B (zh) | 2014-11-11 |
CN102119069B (zh) | 2015-04-15 |
KR101410116B1 (ko) | 2014-06-25 |
US20110171890A1 (en) | 2011-07-14 |
WO2010016486A1 (ja) | 2010-02-11 |
HK1154828A1 (zh) | 2012-05-04 |
KR20110042213A (ko) | 2011-04-25 |
CN102119069A (zh) | 2011-07-06 |
US20190218697A1 (en) | 2019-07-18 |
EP2316614A4 (en) | 2014-08-20 |
EP2316614B1 (en) | 2019-07-17 |
TW201016393A (en) | 2010-05-01 |
JPWO2010016486A1 (ja) | 2012-01-26 |
EP2316614A1 (en) | 2011-05-04 |
IL211092A (en) | 2014-03-31 |
IL211092A0 (en) | 2011-04-28 |
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