IL203477A - Polishing composition and method utilizing abrasive particles treated with an aminosilane - Google Patents

Polishing composition and method utilizing abrasive particles treated with an aminosilane

Info

Publication number
IL203477A
IL203477A IL203477A IL20347710A IL203477A IL 203477 A IL203477 A IL 203477A IL 203477 A IL203477 A IL 203477A IL 20347710 A IL20347710 A IL 20347710A IL 203477 A IL203477 A IL 203477A
Authority
IL
Israel
Prior art keywords
polishing composition
ppm
polishing
substrate
acid
Prior art date
Application number
IL203477A
Other languages
English (en)
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of IL203477A publication Critical patent/IL203477A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
IL203477A 2007-09-21 2010-01-20 Polishing composition and method utilizing abrasive particles treated with an aminosilane IL203477A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97434007P 2007-09-21 2007-09-21
PCT/US2008/010896 WO2009042072A2 (en) 2007-09-21 2008-09-19 Polishing composition and method utilizing abrasive particles treated with an aminosilane

Publications (1)

Publication Number Publication Date
IL203477A true IL203477A (en) 2013-03-24

Family

ID=40472131

Family Applications (1)

Application Number Title Priority Date Filing Date
IL203477A IL203477A (en) 2007-09-21 2010-01-20 Polishing composition and method utilizing abrasive particles treated with an aminosilane

Country Status (9)

Country Link
US (1) US7994057B2 (enExample)
EP (1) EP2197972B1 (enExample)
JP (1) JP5519507B2 (enExample)
KR (1) KR101232585B1 (enExample)
CN (1) CN101802125B (enExample)
IL (1) IL203477A (enExample)
MY (1) MY147729A (enExample)
TW (1) TWI428436B (enExample)
WO (1) WO2009042072A2 (enExample)

Families Citing this family (63)

* Cited by examiner, † Cited by third party
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JP5209284B2 (ja) * 2007-11-28 2013-06-12 日本ミクロコーティング株式会社 研磨シートおよび研磨シートの製造方法
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Also Published As

Publication number Publication date
EP2197972A2 (en) 2010-06-23
CN101802125A (zh) 2010-08-11
WO2009042072A3 (en) 2009-06-18
KR101232585B1 (ko) 2013-02-12
TWI428436B (zh) 2014-03-01
EP2197972B1 (en) 2020-04-01
MY147729A (en) 2013-01-15
US20090081871A1 (en) 2009-03-26
US7994057B2 (en) 2011-08-09
CN101802125B (zh) 2013-11-06
EP2197972A4 (en) 2011-06-01
TW200918658A (en) 2009-05-01
JP5519507B2 (ja) 2014-06-11
JP2010541203A (ja) 2010-12-24
WO2009042072A2 (en) 2009-04-02
KR20100074207A (ko) 2010-07-01

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