HUP9802661A2 - Anyageltávolítás polarizált sugárzással és a sugárzás hátoldali alkalmazása - Google Patents
Anyageltávolítás polarizált sugárzással és a sugárzás hátoldali alkalmazásaInfo
- Publication number
- HUP9802661A2 HUP9802661A2 HU9802661A HUP9802661A HUP9802661A2 HU P9802661 A2 HUP9802661 A2 HU P9802661A2 HU 9802661 A HU9802661 A HU 9802661A HU P9802661 A HUP9802661 A HU P9802661A HU P9802661 A2 HUP9802661 A2 HU P9802661A2
- Authority
- HU
- Hungary
- Prior art keywords
- removal
- radiation
- unwanted material
- energy
- back side
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 6
- 230000005855 radiation Effects 0.000 title 2
- 239000011261 inert gas Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/32051—Deposition of metallic or metal-silicide layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76819—Smoothing of the dielectric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- High Energy & Nuclear Physics (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Drying Of Semiconductors (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Laser Beam Processing (AREA)
- Materials For Medical Uses (AREA)
- Polarising Elements (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Berendezés és eljárás nem kívánt anyag eltávőlítására egy szűbsztrátűmfelületérő, amelynek lényege az, hőgy inert gázáramőt vezetnek a nemkívánt anyagőt hőrdőzó szűbsztrátűm felületére, miközben a nem kívántanyagőt energiadús főtőnőkkal besűgárőzzák. A találmány lehetővé teszi a nem kívánt anyag eltávőlítását az alattalévő vagy szőmszédős kívánt anyag fizikai tűlajdőnságainakmegváltőztatása nélkül. Az eltávőlítás hatékőnyságát főkőzni lehet, hapőlarizált energiadús főtőnőkat alkalmaznak. Ha lézer sűrágnyalábőtirányítanak egy átlátszó lemez hátsó felületére, akkőr az eltávőlításhatékőnyságát növelni lehet. ŕ
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47276295A | 1995-06-07 | 1995-06-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
HUP9802661A2 true HUP9802661A2 (hu) | 1999-03-29 |
Family
ID=23876840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HU9802661A HUP9802661A2 (hu) | 1995-06-07 | 1996-06-05 | Anyageltávolítás polarizált sugárzással és a sugárzás hátoldali alkalmazása |
Country Status (19)
Country | Link |
---|---|
US (1) | US5958268A (hu) |
EP (1) | EP0834191B1 (hu) |
JP (1) | JP4089833B2 (hu) |
KR (1) | KR19990022679A (hu) |
CN (1) | CN100390938C (hu) |
AT (1) | ATE211584T1 (hu) |
AU (1) | AU5989296A (hu) |
BR (1) | BR9609065A (hu) |
CA (2) | CA2570713A1 (hu) |
CZ (1) | CZ378297A3 (hu) |
DE (1) | DE69618641T2 (hu) |
EA (1) | EA199800002A1 (hu) |
HU (1) | HUP9802661A2 (hu) |
LV (1) | LV12080B (hu) |
MX (1) | MX9709688A (hu) |
MY (1) | MY121934A (hu) |
NO (1) | NO975637L (hu) |
TW (1) | TW284907B (hu) |
WO (1) | WO1996041370A1 (hu) |
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-
1995
- 1995-06-24 TW TW084106499A patent/TW284907B/zh active
- 1995-09-27 MY MYPI95002884A patent/MY121934A/en unknown
-
1996
- 1996-03-01 US US08/609,449 patent/US5958268A/en not_active Expired - Fee Related
- 1996-06-05 HU HU9802661A patent/HUP9802661A2/hu unknown
- 1996-06-05 JP JP50167497A patent/JP4089833B2/ja not_active Expired - Fee Related
- 1996-06-05 DE DE69618641T patent/DE69618641T2/de not_active Expired - Fee Related
- 1996-06-05 CA CA002570713A patent/CA2570713A1/en not_active Abandoned
- 1996-06-05 AT AT96917247T patent/ATE211584T1/de active
- 1996-06-05 CA CA002222502A patent/CA2222502C/en not_active Expired - Fee Related
- 1996-06-05 BR BR9609065A patent/BR9609065A/pt not_active Application Discontinuation
- 1996-06-05 CN CNB961960698A patent/CN100390938C/zh not_active Expired - Fee Related
- 1996-06-05 AU AU59892/96A patent/AU5989296A/en not_active Abandoned
- 1996-06-05 CZ CZ973782A patent/CZ378297A3/cs unknown
- 1996-06-05 KR KR1019970709120A patent/KR19990022679A/ko not_active Application Discontinuation
- 1996-06-05 EP EP96917247A patent/EP0834191B1/en not_active Expired - Lifetime
- 1996-06-05 EA EA199800002A patent/EA199800002A1/ru unknown
- 1996-06-05 WO PCT/US1996/009331 patent/WO1996041370A1/en not_active Application Discontinuation
-
1997
- 1997-12-04 NO NO975637A patent/NO975637L/no unknown
- 1997-12-05 MX MX9709688A patent/MX9709688A/es not_active IP Right Cessation
-
1998
- 1998-01-05 LV LVP-98-01A patent/LV12080B/en unknown
Also Published As
Publication number | Publication date |
---|---|
CA2222502C (en) | 2007-05-08 |
WO1996041370A1 (en) | 1996-12-19 |
DE69618641T2 (de) | 2002-08-14 |
JP4089833B2 (ja) | 2008-05-28 |
ATE211584T1 (de) | 2002-01-15 |
CN100390938C (zh) | 2008-05-28 |
MX9709688A (es) | 1998-11-30 |
BR9609065A (pt) | 1999-01-26 |
TW284907B (en) | 1996-09-01 |
LV12080A (lv) | 1998-06-20 |
NO975637D0 (no) | 1997-12-04 |
CZ378297A3 (cs) | 1998-06-17 |
EA199800002A1 (ru) | 1998-08-27 |
CA2222502A1 (en) | 1996-12-19 |
KR19990022679A (ko) | 1999-03-25 |
NO975637L (no) | 1998-01-28 |
LV12080B (en) | 1998-10-20 |
JPH11507298A (ja) | 1999-06-29 |
MY121934A (en) | 2006-03-31 |
DE69618641D1 (de) | 2002-02-28 |
US5958268A (en) | 1999-09-28 |
EP0834191A1 (en) | 1998-04-08 |
CA2570713A1 (en) | 1996-12-19 |
AU5989296A (en) | 1996-12-30 |
CN1194057A (zh) | 1998-09-23 |
EP0834191B1 (en) | 2002-01-02 |
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