HK1245417B - Substrate processing method and substrate-processing apparatus - Google Patents

Substrate processing method and substrate-processing apparatus

Info

Publication number
HK1245417B
HK1245417B HK18104840.4A HK18104840A HK1245417B HK 1245417 B HK1245417 B HK 1245417B HK 18104840 A HK18104840 A HK 18104840A HK 1245417 B HK1245417 B HK 1245417B
Authority
HK
Hong Kong
Prior art keywords
substrate
processing apparatus
processing method
processing
substrate processing
Prior art date
Application number
HK18104840.4A
Other languages
Chinese (zh)
Inventor
加藤正紀
奈良圭
鈴木智也
渡邊智行
鬼頭義昭
堀正和
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Priority to HK18107244.9A priority Critical patent/HK1247996A1/en
Publication of HK1245417B publication Critical patent/HK1245417B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
HK18104840.4A 2014-04-01 2017-04-06 Substrate processing method and substrate-processing apparatus HK1245417B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
HK18107244.9A HK1247996A1 (en) 2014-04-01 2017-04-06 Pattern drawing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014075841 2014-04-01

Publications (1)

Publication Number Publication Date
HK1245417B true HK1245417B (en) 2020-03-27

Family

ID=54240539

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18107244.9A HK1247996A1 (en) 2014-04-01 2017-04-06 Pattern drawing apparatus
HK18104876.1A HK1245420A1 (en) 2014-04-01 2017-04-06 Substrate-processing method
HK18104840.4A HK1245417B (en) 2014-04-01 2017-04-06 Substrate processing method and substrate-processing apparatus

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18107244.9A HK1247996A1 (en) 2014-04-01 2017-04-06 Pattern drawing apparatus
HK18104876.1A HK1245420A1 (en) 2014-04-01 2017-04-06 Substrate-processing method

Country Status (6)

Country Link
JP (3) JP6597602B2 (en)
KR (2) KR102430139B1 (en)
CN (4) CN107272353B (en)
HK (3) HK1247996A1 (en)
TW (6) TWI639064B (en)
WO (1) WO2015152218A1 (en)

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JP6607002B2 (en) * 2015-11-30 2019-11-20 株式会社ニコン Pattern drawing device
JP6690214B2 (en) * 2015-12-09 2020-04-28 株式会社ニコン Pattern drawing device
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TWI736621B (en) * 2016-10-04 2021-08-21 日商尼康股份有限公司 Pattern drawing device and pattern drawing method
JP7070542B2 (en) * 2017-03-10 2022-05-18 株式会社ニコン Pattern drawing device and pattern exposure device
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JP2020021079A (en) * 2019-09-04 2020-02-06 株式会社ニコン Pattern drawing apparatus
JP2020024443A (en) * 2019-10-17 2020-02-13 株式会社ニコン Pattern drawing apparatus
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JP2022052111A (en) * 2020-09-23 2022-04-04 株式会社Ｓｃｒｅｅｎホールディングス Substrate position detecting method, drawing method, substrate position detecting device, and drawing device
JP7334708B2 (en) * 2020-10-20 2023-08-29 株式会社豊田自動織機 Autonomous mobile

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Also Published As

Publication number Publication date
CN106133610A (en) 2016-11-16
KR20170002375A (en) 2017-01-06
TW201932996A (en) 2019-08-16
CN107255913B (en) 2019-10-11
CN107272353B (en) 2019-06-14
TW201842419A (en) 2018-12-01
TWI661280B (en) 2019-06-01
TWI674484B (en) 2019-10-11
TW202004368A (en) 2020-01-16
CN107272353A (en) 2017-10-20
TWI684836B (en) 2020-02-11
TWI709006B (en) 2020-11-01
HK1247996A1 (en) 2018-10-05
KR102377752B1 (en) 2022-03-24
TW201600941A (en) 2016-01-01
JPWO2015152218A1 (en) 2017-04-13
TW202018436A (en) 2020-05-16
TW201842420A (en) 2018-12-01
TWI639064B (en) 2018-10-21
CN107957660A (en) 2018-04-24
TWI695235B (en) 2020-06-01
WO2015152218A1 (en) 2015-10-08
HK1245420A1 (en) 2018-08-24
JP2019215588A (en) 2019-12-19
KR102430139B1 (en) 2022-08-08
JP6597602B2 (en) 2019-10-30
CN107957660B (en) 2020-10-23
JP2019023764A (en) 2019-02-14
CN106133610B (en) 2017-12-29
CN107255913A (en) 2017-10-17
KR20220038545A (en) 2022-03-28

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230329