CN201820072U - Double-sided exposure device - Google Patents
Double-sided exposure device Download PDFInfo
- Publication number
- CN201820072U CN201820072U CN2010202906446U CN201020290644U CN201820072U CN 201820072 U CN201820072 U CN 201820072U CN 2010202906446 U CN2010202906446 U CN 2010202906446U CN 201020290644 U CN201020290644 U CN 201020290644U CN 201820072 U CN201820072 U CN 201820072U
- Authority
- CN
- China
- Prior art keywords
- module
- exposure
- double
- taken
- frame module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model discloses a double-sided exposure device, which comprises a machine platform, an exposure module, a platform frame module, a first image-taking module and a second image-taking module. The platform frame module comprises a platform frame body arranged on the machine platform and an upper photographic plate and a lower photographic plate arranged on the platform frame body, and the platform frame module is used for allowing a to-be-exposed substrate to be placed between the upper photographic plate and the lower photographic plate and to be driven to move to a first position and a second position; the first image-taking module comprises a plurality of image-taking units for obtaining the position images of the to-be-exposed substrate and the lower photographic plate of the platform frame module when the platform frame module is positioned in the first position; and the second image-taking module comprises a plurality of image-taking units for obtaining the position images of the to-be-exposed substrate and the platform frame module when the upper photographic plate of the platform frame module is positioned in the second position. The double-sided exposure device can improve the double-sided exposure precision of the to-be-exposed substrate.
Description
Technical field
The utility model relates to a kind of exposure device, particularly relates to a kind of double-sided exposure device.
Background technology
General in order to circuit board is carried out in the exposure machine of double-sided exposure, comprise platform frame mechanism, and platform frame mechanism has the exposure of the going up egative film and the egative film that exposes down, circuit board to be exposed is to be placed on the exposure egative film and to expose between the egative film down, then exposed in the end face and the bottom surface of circuit board respectively by last exposure light source and following exposure light source again, as TaiWan, China utility model patent notification number 559438 disclosed contents.
In addition, general double-sided exposure chance is provided with one group of image-taking device (comprising CCD camera) below platform frame mechanism, when circuit board to be exposed is placed in the platform frame mechanism and is sending into before exposure room exposes, can obtain the site error for the treatment of between exposure base bottom surface and the following exposure egative film by this image-taking device, and then carry out error correction, yet, can not carry out capture for follow-up correction owing to have image-taking device between the end face for the treatment of exposure base and the last exposure egative film in the past, therefore, treat that the exposure accuracy of end face of exposure base is relatively poor usually.
Summary of the invention
The purpose of this utility model is to overcome the defective of prior art, and a kind of double-sided exposure device that improves the two sides exposure accuracy for the treatment of exposure base is provided.
Its technical scheme is as follows:
A kind of double-sided exposure device comprises:
Board;
The exposure module is arranged in this board, in order to treat the exposure base exposure;
Platform frame module, comprise the platform frame body that is arranged at this board and be arranged at winding the film and lower master film of this frame body, this frame module use for this treat exposure base be positioned over this wind the film and this lower master film between and be subjected to drive displacement to primary importance and to the second place of the module that should expose;
First taken module comprises a plurality of taking units, deserves this frame module when being in this primary importance, and taking unit is in order to obtain the position images that this treats the lower master film of exposure base and this frame module; And
Second taken module comprises a plurality of taking units, and when this frame module was in this second place, this taking unit was in order to obtain the position images of winding the film that this treats exposure base and this frame module.
Further structure is:
This second taken module more comprises a plurality of displacement mechanisms, and this taking unit is arranged at this displacement mechanism respectively, and each taking unit can be driven along X-axis, Y-axis and Z-direction displacement by this displacement mechanism.
This second taken module more comprises the framework that is arranged at this board, and this displacement mechanism and this taking unit are arranged at this framework.
Also comprise the guide rail mechanism that is arranged at this board, this frame module is arranged at this guide rail mechanism and can be along this guide rail mechanism displacement in this primary importance and this second place, this first taken module is positioned at this guide rail mechanism below, and this second taken module is positioned at this guide rail mechanism top.
The fore side that this board comprises exposure room and is positioned at this exposure room the place ahead, when this frame module is positioned at this primary importance, be positioned at this fore side, when this frame module is positioned at this second place, be positioned at this exposure room, this first taken module is positioned at this fore side, and this second taken module is positioned at this exposure room.
The taking unit of the taking unit of this first taken module and this second taken module is a CCD camera.
Effect of the present utility model is, utilize first taken module to cooperate second taken module, can only not obtain position images between the lower master film for the treatment of exposure base bottom surface and platform frame module so that carry out error correction, also can obtain and treat the position images between the winding the film of exposure base end face and platform frame module, and then improve the whole exposure accuracy for the treatment of exposure base so that carry out error correction.
Description of drawings
Fig. 1 is the stereographic map of a preferred embodiment of double-sided exposure device described in the utility model;
Fig. 2 is the side view of this preferred embodiment;
Fig. 3 is the stereographic map of this preferred embodiment, and the board of this double-sided exposure device is removed by the part and can demonstrate first taken module and second taken module;
Fig. 4 is the partial enlarged drawing of the first taken module position among Fig. 3;
Fig. 5 is the front view of second taken module of this preferred embodiment;
Fig. 6 is the stereographic map of this second taken module.
Description of reference numerals:
1, board, 101, fore-and-aft direction, 11, exposure room, 12, fore side, 13, light source chamber, 2, guide rail mechanism, 21, guide rail, 3, platform frame module, 31, platform frame body, 311, framework, 4, first taken module, 41, framework, 42, displacement mechanism, 421, motor, 422, the sliding-rail sliding group, 423, the ball lead screw, 43, taking unit, 5, second taken module, 51, framework, 52, displacement mechanism, 521, motor, 522, the sliding-rail sliding group, 523, the ball lead screw, 53, taking unit.
Embodiment
Below in conjunction with accompanying drawing embodiment of the present utility model is elaborated:
Consult Fig. 1 and Fig. 2, a kind of double-sided exposure device comprises board 1 and is arranged on the exposure module (figure do not show), guide rail mechanism 2 of board 1, two frame modules 3, first taken module 4, second taken module 5.
Board 1 defines exposure room 11 along fore-and-aft direction 101, the light source chamber 13 that is positioned at the fore side 12 in exposure room 11 the place aheads and is positioned at exposure room 11 rears, the exposure module is arranged in the exposure room 11, guide rail mechanism 2 comprises guide rail 21 (see figure 6)s that are arranged on board 1 about a pair of separately, this is extended to the left and right sides of exposure room 11 backward by fore side 12 left and right sides to guide rail 21, two frame modules 3 be erected at guide rail mechanism 2 this between the guide rail 21 and can be subjected to drive and replace displacement along guide rail mechanism 2 front and back and be in fore side 12 or move in the exposure room 11, in more detail, wind the film (figure does not show) and lower master film (figure does not show) that each frame module 3 comprises platform frame body 31 and is arranged on platform frame body 31, platform frame body 31 comprises two rectangular frame shapes and the framework 311 that is articulated up and down, wind the film and lower master film is separately positioned on two frameworks 311, thereby the framework 311 of top can be covered on the framework 311 of below or up lifts off with respect to the framework 311 of below, treat exposure base be can be for being placed between two frameworks 311 and wind the film and lower master film between, be convenient following explanation, defining the position that each frame module 3 moves to fore side 12 is primary importance, and the position that moves to exposure room 11 is the second place.
And the usefulness why two frame modules 3 are set is intended to, owing to treat that exposure base is to be positioned over platform frame module 3 when platform frame module 3 is moved to fore side 12 (being primary importance), and being moved in the exposure room 11 (being the second place) time at platform frame module 3 exposes, no matter but be to treat that exposure base is placed on platform frame module 3 or carries out exposure operation, all need a period of time, therefore, by being set, two frame modules 3 make it can replace displacement at fore side 12 and exposure room 11, when wherein a frame module 3 enters exposure room 11 exposures, another frame module 3 just can move to fore side 12 and treat exposure base and carry out other preparation works for placing another sheet, saves time by this, improve production capacity.
Consult Fig. 1, Fig. 3, Fig. 4, first taken module 4 be arranged on board 1 fore side 12 and the position below guide rail mechanism 2, first taken module 4 of present embodiment comprises framework 41, a plurality of displacement mechanism 42 and a plurality of taking units 43 that are separately positioned on this displacement mechanism 42 that are arranged on framework 41, wherein, framework 41 is that the below that is fixed on board 1 and is positioned at guide rail mechanism 2 is set, each moving mechanism 42 comprises motor 421, sliding-rail sliding group 422 and ball lead screw 423, motor 421 all is arranged on framework 41 with sliding-rail sliding group 422, before and after each group sliding-rail sliding group 422 of present embodiment all has, about, (or X-axis up and down, Y-axis, the Z axle) activity of three-dimensional, ball lead screw 423 connects motor 421 and sliding-rail sliding group 422, this taking unit 43 is respectively the CCD camera of the sliding-rail sliding group 422 that is arranged on this displacement mechanism 42, and the camera lens of this CCD camera up, the power that is provided by motor 421, and see through the transmission of ball lead screw 423, just can drive taking unit 43 with respect to framework 41 displacements.
Consult Fig. 1, Fig. 5, Fig. 6, second taken module 5 be arranged on board 1 exposure room 11 and the position above guide rail mechanism 2, second taken module 5 of present embodiment comprises framework 51, a plurality of displacement mechanism 52 and a plurality of taking units 53 that are separately positioned on this displacement mechanism 52 that are arranged on framework 51, wherein, framework 51 is the tops that are provided with in the exposure room 11 that is fixed on board 1 and are positioned at guide rail mechanism 2, each moving mechanism 52 comprises motor 521, sliding-rail sliding group 522 and ball lead screw 523, before and after each group sliding-rail sliding group 522 all has, about, (or X-axis up and down, Y-axis, the Z axle) activity of three-dimensional, motor 521 all is arranged on framework 51 with sliding-rail sliding group 522, ball lead screw 523 connects motor 521 and sliding-rail sliding group 522, this taking unit 53 is respectively the CCD camera of the sliding-rail sliding group 522 that is arranged on this displacement mechanism 52, and the camera lens of this CCD camera down, the power that is provided by motor 521, and see through the transmission of ball lead screw 523, just can drive taking unit 53 with respect to framework 51 displacements.
When placement remains the platform frame module 3,4 of exposure base when being in the first position, this taking unit 43 by first taken module 3, just can obtain the position images of the lower master film for the treatment of exposure base and platform frame module 3,4, and then judge whether there is error between the two and whether needs to proofread and correct between the two relative position.
And the setting by second taken module 5, when platform frame module 3,4 is moved in the exposure room 11 and is in the second place, this taking unit 53 by second taken module 5, just can obtain the position images of winding the film for the treatment of exposure base and platform frame module 3,4, and then judge whether there is error between the two and whether needs to proofread and correct between the two relative position.
Certainly, when treating that exposure base moves into exposure room 11 when carrying out the end face exposure, the setting of this displacement mechanism 52 by second taken module 5 can be shifted out this taking unit 53 outside the exposure range, avoids taking unit 53 impaired.And may be different owing to be placed on the size for the treatment of exposure base of platform frame module 3,4 at every turn, so pass through the setting of this displacement mechanism 52 of second taken module 5, also this taking unit 53 can be moved to more suitable position and carry out capture, in other words, when carrying out the base plate exposure of different size size, equally all can utilize this second taken module 5 to carry out capture.
Additional disclosure be, when the lower master film of platform frame module 3 and when treating to need between the exposure base to carry out the error correction of position, be to be undertaken by the position adjusting mechanism (figure does not show) that is arranged on platform frame module 3, this position adjusting mechanism mainly is to utilize motor to drive to treat the lower master film displacement of exposure base with respect to platform frame module 3, correlation technique can with reference to this case same Applicant on November 22nd, 2007 carry the Shen, in the content of TaiWan, China utility model certificate number M333594 disclosed " exposure machine stage apparatus " of bulletin on June 1st, 2008.And the winding the film and treat error correction between the exposure base end face of platform frame module 3, the aligning gear (figure does not show) of framework 311 carries out above then can being arranged on by another group, and it equally also is that the similar driving drive that sees through motor treats that exposure base reaches the effect of correction with respect to winding the film displacement.
Therefore, as shown in the above, the utility model utilizes first taken module 4 to cooperate second taken module 5, can only not obtain position images between the lower master film for the treatment of exposure base bottom surface and platform frame module 3 so that carry out error correction, also can obtain the position images treated between the winding the film of exposure base end face and platform frame module 3 so that carry out error correction, therefore, just can improve the whole exposure accuracy for the treatment of exposure base, so can reach the purpose of this utility model really, and thus, this double-sided exposure device also can be used for needing the HDI processing procedure that higher exposure accuracy requires.
Only be specific embodiment of the utility model below, do not limit protection domain of the present utility model with this; Any replacement and the improvement done on the basis of not violating the utility model design all belong to protection domain of the present utility model.
Claims (6)
1. a double-sided exposure device is characterized in that, comprises:
Board;
The exposure module is arranged in this board, in order to treat the exposure base exposure;
Platform frame module, comprise the platform frame body that is arranged at this board and be arranged at winding the film and lower master film of this frame body, this frame module use for this treat exposure base be positioned over this wind the film and this lower master film between and be subjected to drive displacement to primary importance and to the second place of the module that should expose;
First taken module comprises a plurality of taking units, deserves this frame module when being in this primary importance, and taking unit is in order to obtain the position images that this treats the lower master film of exposure base and this frame module; And
Second taken module comprises a plurality of taking units, and when this frame module was in this second place, this taking unit was in order to obtain the position images of winding the film that this treats exposure base and this frame module.
2. double-sided exposure device according to claim 1, it is characterized in that, this second taken module more comprises a plurality of displacement mechanisms, and this taking unit is arranged at this displacement mechanism respectively, and each taking unit can be driven along X-axis, Y-axis and Z-direction displacement by this displacement mechanism.
3. as double-sided exposure device as described in the claim 2, it is characterized in that this second taken module more comprises the framework that is arranged at this board, this displacement mechanism and this taking unit are arranged at this framework.
4. as double-sided exposure device as described in the claim 3, it is characterized in that, also comprise the guide rail mechanism that is arranged at this board, this frame module is arranged at this guide rail mechanism and can be along this guide rail mechanism displacement in this primary importance and this second place, this first taken module is positioned at this guide rail mechanism below, and this second taken module is positioned at this guide rail mechanism top.
5. as double-sided exposure device as described in the claim 4, it is characterized in that, the fore side that this board comprises exposure room and is positioned at this exposure room the place ahead, when this frame module is positioned at this primary importance, be positioned at this fore side, when this frame module is positioned at this second place, be positioned at this exposure room, this first taken module is positioned at this fore side, and this second taken module is positioned at this exposure room.
6. as double-sided exposure device as described in the claim 5, it is characterized in that the taking unit of the taking unit of this first taken module and this second taken module is a CCD camera.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202906446U CN201820072U (en) | 2010-08-12 | 2010-08-12 | Double-sided exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202906446U CN201820072U (en) | 2010-08-12 | 2010-08-12 | Double-sided exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201820072U true CN201820072U (en) | 2011-05-04 |
Family
ID=43918021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010202906446U Expired - Fee Related CN201820072U (en) | 2010-08-12 | 2010-08-12 | Double-sided exposure device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201820072U (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105278263A (en) * | 2015-11-25 | 2016-01-27 | 四川聚能核技术工程有限公司 | 8CCD double-side simultaneous aligning method for exposure machine |
| CN106527061A (en) * | 2017-01-04 | 2017-03-22 | 广东海圣科技有限公司 | Automatic three-frame exposure machine |
| CN106681108A (en) * | 2015-11-09 | 2017-05-17 | 川宝科技股份有限公司 | Target image alignment device and exposure machine with same |
| CN106997159A (en) * | 2016-01-22 | 2017-08-01 | 上海微电子装备有限公司 | Wafer pre-alignment mechanism, exposure device and exposure method |
| CN107272353A (en) * | 2014-04-01 | 2017-10-20 | 株式会社尼康 | Substrate processing method using same and substrate board treatment |
| CN113835300A (en) * | 2020-06-23 | 2021-12-24 | 志圣科技（广州）有限公司 | Double-sided exposure apparatus and exposure device |
| TWI770537B (en) * | 2020-06-23 | 2022-07-11 | 志聖工業股份有限公司 | Double exposure equipment and exposure device |
-
2010
- 2010-08-12 CN CN2010202906446U patent/CN201820072U/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107272353A (en) * | 2014-04-01 | 2017-10-20 | 株式会社尼康 | Substrate processing method using same and substrate board treatment |
| CN107272353B (en) * | 2014-04-01 | 2019-06-14 | 株式会社尼康 | Substrate processing method using same and substrate board treatment |
| CN106681108A (en) * | 2015-11-09 | 2017-05-17 | 川宝科技股份有限公司 | Target image alignment device and exposure machine with same |
| CN105278263A (en) * | 2015-11-25 | 2016-01-27 | 四川聚能核技术工程有限公司 | 8CCD double-side simultaneous aligning method for exposure machine |
| CN106997159A (en) * | 2016-01-22 | 2017-08-01 | 上海微电子装备有限公司 | Wafer pre-alignment mechanism, exposure device and exposure method |
| CN106997159B (en) * | 2016-01-22 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | Wafer pre-alignment mechanism, exposure device and exposure method |
| CN106527061A (en) * | 2017-01-04 | 2017-03-22 | 广东海圣科技有限公司 | Automatic three-frame exposure machine |
| CN106527061B (en) * | 2017-01-04 | 2019-07-16 | 广东海圣科技有限公司 | A kind of automatic three frames exposure machine |
| CN113835300A (en) * | 2020-06-23 | 2021-12-24 | 志圣科技（广州）有限公司 | Double-sided exposure apparatus and exposure device |
| TWI770537B (en) * | 2020-06-23 | 2022-07-11 | 志聖工業股份有限公司 | Double exposure equipment and exposure device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN201820072U (en) | Double-sided exposure device | |
| CN102615950B (en) | Screen printer and contraposition method for same | |
| CN106194943B (en) | The assembled machine table of main camera module active alignment | |
| CN202528550U (en) | Screen printing machine | |
| CN106442520B (en) | PCB hole position detection equipment | |
| CN102548240B (en) | Double-arm multi-head chip mounting system for light-emitting diode (LED) chip mounter | |
| CN101533225A (en) | Glass mask and position alignment apparatus of mask retainer | |
| CN102472711A (en) | Substrate inspecting apparatus | |
| CN102179996A (en) | Substrate positioning method suitable for screen printing technology | |
| CN113126449B (en) | Laser direct-writing photoetching system and method for green oil photoetching | |
| CN101676102A (en) | Automatic aligning device | |
| CN105388707A (en) | Drawing apparatus | |
| CN201893321U (en) | BGA (ball grid array) chip repair device | |
| CN102756539B (en) | Pattern contraposition method based on double printing stations and device thereof | |
| CN104898310A (en) | Substrate laminating apparatus, substrate laminating method, and stereoscopic display device | |
| CN105479152A (en) | Alignment adjusting mechanism | |
| TW201907235A (en) | Silicon wafer processing device and method | |
| CN105093853A (en) | Automatic solder-mask exposure table frame module and exposure machine | |
| CN207434528U (en) | A kind of new-type secondary positioning FPC automatic plate loaders | |
| CN215219413U (en) | Photoetching machine | |
| CN207207384U (en) | A kind of vision calibration device of photovoltaic cell printing equipment | |
| CN203053874U (en) | Microscope device for printed circuit board (PCB) detection | |
| CN205193432U (en) | Mark target image aligning device and have device's exposure machine | |
| CN204466067U (en) | Based on flexible circuit board hot-press arrangement and the system of processing of glass circuit board | |
| CN104749895A (en) | Double air floatation large-scale substrate transmission apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110504 Termination date: 20150812 |
|
| EXPY | Termination of patent right or utility model |