CN215219413U - Photoetching machine - Google Patents
Photoetching machine Download PDFInfo
- Publication number
- CN215219413U CN215219413U CN202121493943.4U CN202121493943U CN215219413U CN 215219413 U CN215219413 U CN 215219413U CN 202121493943 U CN202121493943 U CN 202121493943U CN 215219413 U CN215219413 U CN 215219413U
- Authority
- CN
- China
- Prior art keywords
- base
- exposure
- driving assembly
- driving
- lithography machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Abstract
The utility model discloses a lithography machine, include: the gantry is arranged on the base, the aligning device is arranged on the gantry and can move transversely and vertically, the exposure device is arranged on the gantry and can move transversely and vertically, the first moving platform can be arranged on the base in a longitudinal moving mode, the second moving platform can be arranged on the base in a longitudinal moving mode and is lower than the first moving platform in the vertical direction, and the first moving platform and the second moving platform are alternately aligned and exposed in an exposure area. Through setting up two first mobile stations and the second mobile station that can independent motion, when the base plate on the first mobile station carries out counterpoint exposure in the exposure area, the base plate can receive and release the base plate in waiting to examine the district on the second mobile station, and first mobile station and second mobile station alternate exposure can greatly reduce the idle time of the work of each system of lithography machine to can promote the productivity of lithography machine effectively.
Description
Technical Field
The utility model belongs to the technical field of lithography apparatus technique and specifically relates to a lithography machine is related to.
Background
Photolithography is a technique used to print a pattern having features on a surface of a substrate. Such substrates may include substrates used in the manufacture of semiconductor devices, various integrated circuits, flat panel displays (e.g., liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. The direct writing photoetching technology is used for replacing the traditional image direct transfer technology of exposure of a mask plate, a film negative film and the like, and plays a very important role in the field of semiconductor and PCB production. The exposure capacity is an important index of the customer demand, and the improvement of the exposure capacity of the direct-write lithography machine becomes important.
In the related art, the single-stage lithography machine has low productivity and long production period, the exposure of each substrate needs to complete the processes of loading, aligning, exposing, unloading and the like, the whole process time is long, and the working efficiency of the lithography machine is low.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides a lithography machine through setting up two first mobile stations and the second mobile station that can independent motion for first mobile station and second mobile station can expose in turn, promote lithography machine's work efficiency.
According to the utility model discloses lithography machine, include: the gantry is arranged on the base, the alignment device is arranged on the gantry and can move transversely and vertically, the exposure device is arranged on the gantry and can move transversely and vertically, an exposure area is arranged below the exposure device, the first moving table is used for placing a substrate, the first moving table can be longitudinally movably arranged on the base, the second moving table is used for placing the substrate, the second moving table can be longitudinally movably arranged on the base and is vertically lower than the first moving table, and the electric control system is electrically connected with the first moving table and the second moving table respectively so that the first moving table and the second moving table can be aligned and exposed in the exposure area alternatively.
According to the utility model discloses lithography machine, through setting up two first mobile station and the second mobile station that can independent motion, when the base plate on first mobile station carries out counterpoint exposure in the exposure area, base plate on the second mobile station can receive and release the base plate in waiting to examine the district, first mobile station and second mobile station are exposed in turn, can greatly promote lithography machine's utilization efficiency, the idle time of the work of each system of lithography machine has been reduced, thereby can promote lithography machine's productivity effectively.
According to some embodiments of the invention, the first mobile station and the second mobile station each comprise: support pedestal, first drive assembly and sucking disc, the support pedestal set up in the base, first mobile station the support pedestal is higher than the second mobile station the support pedestal, first drive assembly set up in base and drive the support pedestal is along longitudinal motion, the sucking disc set up in the support pedestal, the sucking disc is used for adsorbing the base plate.
According to some embodiments of the present invention, the base is provided with a first slide rail and a second slide rail, the first slide rail and the second slide rail are arranged along a longitudinal extension and at a transverse interval, the support pedestal of the first mobile station is arranged in the first slide rail, the support pedestal of the second mobile station is arranged in the second slide rail.
According to some embodiments of the invention, the first drive assembly comprises: the first driving motor is electrically connected with the electric control system; the first lead screw is in transmission connection with the first driving motor; the first sliding block is in threaded fit with the first lead screw and is arranged on the supporting pedestal.
According to some embodiments of the present invention, the aligning device comprises: the second driving assembly is arranged on the gantry and is electrically connected with the electric control system; the third driving assembly is arranged on the second driving assembly and transversely moves under the driving action of the second driving assembly, and the third driving assembly is electrically connected with the electric control system; and the aligner is arranged on the third driving assembly and vertically moves under the driving action of the third driving assembly.
According to some embodiments of the invention, the aligner comprises: the CCD camera and the reference lens are arranged oppositely, the illuminating source is arranged on the reference lens, and the reference lens or the CCD camera is arranged on the third driving component.
According to some embodiments of the invention, the exposure apparatus comprises: the fourth driving assembly is arranged on the gantry and is electrically connected with the electric control system; the fifth driving assembly is arranged on the fourth driving assembly and transversely moves under the driving action of the fourth driving assembly, and the fifth driving assembly is electrically connected with the electric control system; and the exposure lens is arranged on the fifth driving component and vertically moves under the driving action of the fifth driving component.
According to some embodiments of the invention, the gantry comprises: the exposure device is arranged on the first beam, the alignment device is arranged on the second beam, and the second beam is lower than the first beam.
According to some embodiments of the present invention, the exposure device is a plurality of, a plurality of the exposure device is in interval setting on the first crossbeam.
According to some embodiments of the present invention, the base is a marble base.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic diagram of a lithography machine according to an embodiment of the present invention;
fig. 2 shows a step of using the lithography machine according to an embodiment of the present invention.
Reference numerals:
100. a lithography machine;
10. an alignment device;
20. an exposure device;
31. a first mobile station; 32. a second mobile station; 33. a support pedestal; 34. a suction cup;
41. a base; 42. a gantry; 43. a first cross member; 44. a second cross member.
Detailed Description
Embodiments of the present invention are described in detail below, and the embodiments described with reference to the drawings are exemplary.
A lithography machine 100 according to an embodiment of the invention is described below with reference to fig. 1-2.
As shown in fig. 1, a lithography machine 100 according to an embodiment of the present invention includes: the apparatus comprises a base 41, a gantry 42, an aligning device 10, an exposure device 20, a first moving table 31 and a second moving table 32, wherein the gantry 42 is arranged on the base 41, the aligning device 10 is arranged on the gantry 42, the aligning device 10 can move transversely and vertically, the exposure device 20 is arranged on the gantry 42, and the exposure device 20 can move transversely and vertically. In this manner, the aligning device 10 and the exposure device 20 can be moved both laterally and vertically. Wherein, first mobile station 31 and second mobile station 32 all can be used for placing the base plate, and the base plate needs earlier to use aligning device 10 to counterpoint before the exposure, through setting up aligning device 10 horizontal and vertical motion for the position of base plate on first mobile station 31 or second mobile station 32 is different, and aligning device 10 all can realize the counterpoint to the base plate. Also, the exposure device 20 may be moved in the lateral and vertical directions so that the exposure device 20 may perform exposure of the substrate.
As shown in fig. 1, below the exposure device 20 is an exposure area, a first moving stage 31 is longitudinally movably provided on a base 41, and a second moving stage 32 is longitudinally movably provided on the base 41. That is to say, by providing the first moving stage 31 and the second moving stage 32 capable of moving independently, when the substrate on the first moving stage 31 is aligned and exposed in the exposure area, the substrate on the second moving stage 32 can be placed and released in the area to be inspected, and the first moving stage 31 and the second moving stage 32 are alternately exposed, so that the waiting time of the substrate in each process is greatly reduced, the utilization efficiency of the lithography machine 100 can be greatly improved, the idle time of the work of each system of the lithography machine 100 is reduced, and the productivity of the lithography machine 100 is effectively improved.
Moreover, the second moving stage 32 is vertically lower than the first moving stage 31, that is, the first moving stage 31 and the second moving stage 32 are vertically installed on the base 41 at intervals, so that the size of the lithography machine 100 in the front-back direction can be effectively reduced, and the space required by the lithography machine 100 can be saved.
Furthermore, the lithography machine 100 further comprises: and the electric control system is electrically connected with the first moving table 31 and the second moving table 32 respectively so as to enable the first moving table 31 and the second moving table 32 to carry out alignment and exposure alternately in the exposure area. That is, the electronic control system may control the movement of the first and second moving stages 31 and 32 so that the alternate exposure of the first and second moving stages 31 and 32 may be realized.
Therefore, by arranging the two first moving tables 31 and the second moving tables 32 which can move independently, when the substrate on the first moving table 31 is aligned and exposed in the exposure area, the substrate on the second moving table 32 can be stored and released in the area to be detected, and the first moving tables 31 and the second moving tables 32 are alternately exposed, the utilization efficiency of the photoetching machine 100 can be greatly improved, the idle time of the work of each system of the photoetching machine 100 can be reduced, and the productivity of the photoetching machine 100 can be effectively improved.
As shown in fig. 1, each of the first mobile station 31 and the second mobile station 32 includes: a support pedestal 33, a first driving component and a suction cup 34, wherein the support pedestal 33 is arranged on the base 41, the support pedestal 33 of the first moving platform 31 is higher than the support pedestal 33 of the second moving platform 32, the first driving component is arranged on the base 41, the first driving component drives the support pedestal 33 to move along the longitudinal direction, the suction cup 34 is arranged on the support pedestal 33, and the suction cup 34 is used for absorbing the substrate. That is, the first and second moving stages 31 and 32 each include a support pedestal 33 and a suction cup 34, wherein the suction cup 34 is disposed on the support pedestal 33, and the suction cup 34 may be used to suck the substrate. Further, a first driving assembly is provided under the support base 33 so that the first driving assembly can drive the support base 33 to move in the front-rear direction. Specifically, one of the first driving assemblies can drive the first moving stage 31 to move from the exposure area to the inspected area, and the other first driving assembly can drive the second moving stage 32 to move from the inspected area to the exposure area, that is, by driving the first driving assemblies, the alternating exposure of the first moving stage 31 and the second moving stage 32 can be realized.
Specifically, the base 41 is provided with a first slide rail and a second slide rail, which extend in the longitudinal direction and are disposed at a lateral interval, the support base 33 of the first mobile station 31 is disposed on the first slide rail, and the support base 33 of the second mobile station 32 is disposed on the second slide rail. That is, one of the first driving assemblies can drive the first moving stage 31 to move on the first slide rail, the other first driving assembly can drive the second moving stage 32 to move on the second slide rail, one end of the first slide rail and one end of the second slide rail extend to the inspection area, and the other end of the first slide rail and the other end of the second slide rail extend to the exposure area, so that the first driving assembly can drive the first moving stage 31 or the second moving stage 32 to move between the inspection area and the exposure area, namely, the alternating exposure of the first moving stage 31 and the second moving stage 32 can be realized.
Further, the first drive assembly includes: first driving motor, first lead screw and first slider, first driving motor is connected with electrical system is automatically controlled, first lead screw is connected with first driving motor transmission, and first slider screw-thread fit is on first lead screw to first slider sets up in support pedestal 33. That is to say, the first driving motor can drive the first lead screw to rotate, and the first lead screw is provided with the first slider in threaded connection with the first lead screw, so that the first driving motor can drive the first slider to move back and forth on the first lead screw, and the first slider is connected with the support pedestal 33, so that the support pedestal 33 can move in the front-back direction. For example, when the first drive motor is rotated forward, the first slider may be moved from back to front, that is, the support stage 33 is moved from the exposure area to the inspection area, and when the first drive motor is rotated backward, the first slider may be moved from front to back, that is, the support stage 33 is moved from the inspection area to the exposure area.
Wherein, aligning device 10 includes: the second driving assembly is arranged on the gantry 42 and is electrically connected with the electric control system, the third driving assembly is arranged on the second driving assembly and transversely moves under the driving action of the second driving assembly, the third driving assembly is electrically connected with the electric control system, the aligner is arranged on the third driving assembly and vertically moves under the driving action of the third driving assembly. So set up, can realize the removal of counterpoint ware in upper and lower direction and in the left and right sides orientation to can make things convenient for the counterpoint ware to adjust exposure device 20's focal plane, make things convenient for the counterpoint of counterpoint ware promptly. Specifically, the aligner may be moved in the up-and-down direction by the second driving assembly according to different heights of the first moving stage 31 or the second moving stage 32; or, the aligner is moved in the left and right directions by the third driving unit according to the position of the substrate on the first moving stage 31 or the second moving stage 32, thereby facilitating the alignment of the aligner.
Specifically, the aligner includes: the CCD camera and the reference lens are arranged oppositely, the illuminating light source is arranged on the reference lens, and the reference lens or the CCD camera is arranged on the third driving assembly. Wherein, CCD camera and benchmark camera lens are used for counterpointing, and the CCD camera has small, light in weight, not influenced by magnetic field, has the advantage of anti-vibration and striking, and light source can be used for giving CCD camera and benchmark camera lens light filling, promotes the counterpoint precision of counterpoint ware.
Further, the exposure device 20 includes: the fourth driving component is arranged at the gantry 42 and is electrically connected with the electric control system, the fifth driving component is arranged at the fourth driving component and transversely moves under the driving action of the fourth driving component, the fifth driving component is electrically connected with the electric control system, the exposure lens is arranged at the fifth driving component, and the exposure lens vertically moves under the driving action of the fifth driving component. So set up, can realize that exposure lens is in the upper and lower direction and at the ascending removal of left and right sides to can make things convenient for exposure lens adjustment focal plane, make things convenient for exposure of exposure lens promptly. Specifically, the exposure lens may move up and down under the driving of the fourth driving assembly, and may also move in the left and right directions by the driving of the fifth driving assembly, so that the exposure lens may correspond to the substrate on the first moving stage 31 or the second moving stage 32, thereby facilitating the exposure of the exposure lens.
The second driving assembly, the third driving assembly, the fourth driving assembly and the fifth driving assembly can be composed of a driving motor, a lead screw and a sliding block, and can also be composed of a driving motor, a gear and a rack.
As shown in fig. 1, the gantry 42 includes: the exposure device 20 is disposed on the first beam 43, the alignment device 10 is disposed on the second beam 44, and the second beam 44 is lower than the first beam 43. With this arrangement, the exposure device 20 and the aligning device 10 can be mounted by mounting the exposure device 20 on the first beam 43 and mounting the aligning device 10 on the second beam 44.
Referring to fig. 1, the exposure device 20 may be plural, and a plurality of exposure devices 20 are provided at intervals on the first beam 43. So set up, set up a plurality of exposure devices 20 interval on first crossbeam 43 for a plurality of exposure devices 20 carry out concatenation scanning exposure to the base plate, can realize the seamless concatenation between the exposure figure, and the exposure visual field of large tracts of land can be realized to the concatenation of a plurality of exposure devices 20, thereby can improve the production efficiency of lithography machine. The second driving assembly is disposed on the second beam 44, and the fourth driving assembly is disposed on the first beam 43.
Wherein the base 41 may be a marble base 41. The base 41 adopts a marble base, so that the stability of the base 41 is good, the marble base is not deformed, the hardness is high, and the wear resistance is strong. Compared with a metal base, the marble base is not afraid of acid and alkali corrosion, is not rusty, is not easy to stick micro dust, and is convenient and simple to maintain and long in service life.
With reference to fig. 1 and 2, and the above embodiments, the method of using the lithography machine 100 includes the following steps:
(1) the first moving stage 31 is moved to the exposure area, the second moving stage 32 is moved to the inspection area, and the aligning device 10 aligns one of the substrates of the first moving stage 31, that is, the focal plane of the exposure device 20 is aligned with one of the substrates of the first moving stage 31;
(2) the exposure device 20 exposes one of the substrates on the first moving stage 31, and the second moving stage 32 stores the other substrate in the inspection area;
(3) one of the substrates on the first moving stage 31 is exposed, and is moved to the inspection area by the first driving means,
(4) the second moving table 32 is driven by the first driving component to move to the exposure area, and the alignment device 10 aligns the other substrate of the second moving table 32;
(5) the exposure device 20 exposes another substrate on the second movable stage 32, and the first movable stage 31 stores the substrate in the waiting area;
(6) the other substrate on the second moving stage 32 is exposed and moved to the inspection area, and the first moving stage 31 receives and stores the substrate and moves to the exposure area.
So, through setting up two first mobile station 31 and second mobile station 32 that can independent motion, when the base plate on first mobile station 31 carries out counterpoint exposure in the exposure area, base plate on the second mobile station 32 can receive and release the base plate in waiting to examine the district, thereby the latency of base plate at each flow significantly reduces, can greatly promote lithography machine 100's utilization efficiency, can reduce the idle time of each system work of lithography machine 100, thereby can promote lithography machine 100's productivity effectively.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (10)
1. A lithography machine, comprising:
a base;
the gantry is arranged on the base;
the alignment device is arranged on the gantry and can move transversely and vertically;
the exposure device is arranged on the gantry and can move transversely and vertically, and an exposure area is arranged below the exposure device;
the first moving table is used for placing a substrate and is arranged on the base in a longitudinally movable manner;
the second moving table is used for placing a substrate, and is longitudinally movably arranged on the base and is vertically lower than the first moving table;
and the electric control system is electrically connected with the first moving table and the second moving table respectively so as to enable the first moving table and the second moving table to carry out alignment and exposure alternately in the exposure area.
2. The lithography machine according to claim 1, wherein said first and second moving stages each comprise:
a support pedestal provided to the base, the support pedestal of the first mobile station being higher than the support pedestal of the second mobile station;
the first driving assembly is arranged on the base and drives the supporting pedestal to move along the longitudinal direction;
the sucking disc, the sucking disc set up in the support pedestal, the sucking disc is used for adsorbing the base plate.
3. The apparatus according to claim 2, wherein the base has a first slide rail and a second slide rail, the first slide rail and the second slide rail extending in a longitudinal direction and being spaced apart in a transverse direction, the support base of the first movable stage being disposed on the first slide rail, and the support base of the second movable stage being disposed on the second slide rail.
4. The lithography machine according to claim 3, wherein said first drive assembly comprises:
the first driving motor is electrically connected with the electric control system;
the first lead screw is in transmission connection with the first driving motor;
the first sliding block is in threaded fit with the first lead screw and is arranged on the supporting pedestal.
5. The lithography machine according to claim 1, wherein said alignment device comprises:
the second driving assembly is arranged on the gantry and is electrically connected with the electric control system;
the third driving assembly is arranged on the second driving assembly and transversely moves under the driving action of the second driving assembly, and the third driving assembly is electrically connected with the electric control system;
and the aligner is arranged on the third driving assembly and vertically moves under the driving action of the third driving assembly.
6. The lithography machine according to claim 5, wherein said aligner comprises: the CCD camera and the reference lens are arranged oppositely, the illuminating source is arranged on the reference lens, and the reference lens or the CCD camera is arranged on the third driving component.
7. The lithography machine according to claim 1, wherein said exposure device comprises:
the fourth driving assembly is arranged on the gantry and is electrically connected with the electric control system;
the fifth driving assembly is arranged on the fourth driving assembly and transversely moves under the driving action of the fourth driving assembly, and the fifth driving assembly is electrically connected with the electric control system;
and the exposure lens is arranged on the fifth driving component and vertically moves under the driving action of the fifth driving component.
8. The lithography machine according to claim 1, wherein said gantry comprises: the exposure device is arranged on the first beam, the alignment device is arranged on the second beam, and the second beam is lower than the first beam.
9. The lithography machine according to claim 8, wherein said exposure device is plural, and plural exposure devices are provided at intervals on said first beam.
10. The lithography machine according to claim 1, wherein said base is a marble base.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121493943.4U CN215219413U (en) | 2021-06-30 | 2021-06-30 | Photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121493943.4U CN215219413U (en) | 2021-06-30 | 2021-06-30 | Photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215219413U true CN215219413U (en) | 2021-12-17 |
Family
ID=79432870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121493943.4U Active CN215219413U (en) | 2021-06-30 | 2021-06-30 | Photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215219413U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115373231A (en) * | 2022-09-30 | 2022-11-22 | 广东科视光学技术股份有限公司 | Gantry double-sided photoetching system |
| CN115524942A (en) * | 2022-09-30 | 2022-12-27 | 广东科视光学技术股份有限公司 | Exposure method of gantry double-sided lithography system |
-
2021
- 2021-06-30 CN CN202121493943.4U patent/CN215219413U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115373231A (en) * | 2022-09-30 | 2022-11-22 | 广东科视光学技术股份有限公司 | Gantry double-sided photoetching system |
| CN115524942A (en) * | 2022-09-30 | 2022-12-27 | 广东科视光学技术股份有限公司 | Exposure method of gantry double-sided lithography system |
| CN115373231B (en) * | 2022-09-30 | 2023-03-14 | 广东科视光学技术股份有限公司 | Gantry double-sided photoetching system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN215219413U (en) | Photoetching machine | |
| CN104375388A (en) | Multi-workpiece table direct-writing photoetching system | |
| CN101063824A (en) | Exposure apparatus and exposure method | |
| CN108502543B (en) | Substrate transmission device and method | |
| CN114047674A (en) | Pressing device for photoetching machine | |
| CN109240048A (en) | A kind of multistation work stage single exposure molding direct-write photoetching system | |
| JP5125739B2 (en) | XY step exposure system | |
| JP5670725B2 (en) | Electronic component allocation method and electronic component mounting method | |
| CN212823383U (en) | Welding and cutting integrated machine for stainless steel skip printing stepped template | |
| CN209962089U (en) | Direct-writing type exposure machine | |
| KR101098221B1 (en) | PCB borad manufacture turner | |
| CN213023938U (en) | Double-sided exposure device | |
| CN111221223B (en) | Inner-layer plate exposure machine and marking method thereof | |
| CN210803974U (en) | Exposure machine | |
| TWM448706U (en) | Automatic load and unload apparatus of exposure machine | |
| CN210453766U (en) | Semi-automatic flaky flexible film transfer device | |
| CN102271489A (en) | Translation mechanism of component inserter | |
| CN117457563B (en) | Silicon wafer positioning and feeding device and positioning and feeding method thereof | |
| CN220591933U (en) | Plate micropore processing equipment | |
| CN218476165U (en) | Marking device | |
| CN218538360U (en) | Feeding and discharging mechanism for full-automatic exposure machine | |
| CN114779596B (en) | High-precision double-sided exposure machine | |
| CN212384192U (en) | Cell-phone screen backplate washs feed mechanism | |
| CN216154846U (en) | Potsherd automatic alignment and feeding mechanism | |
| CN219608738U (en) | High-precision IC carrier plate 15um double-sided detector |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |