CN101533225A - Glass mask and position alignment apparatus of mask retainer - Google Patents

Glass mask and position alignment apparatus of mask retainer Download PDF

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Publication number
CN101533225A
CN101533225A CN200910007136A CN200910007136A CN101533225A CN 101533225 A CN101533225 A CN 101533225A CN 200910007136 A CN200910007136 A CN 200910007136A CN 200910007136 A CN200910007136 A CN 200910007136A CN 101533225 A CN101533225 A CN 101533225A
Authority
CN
China
Prior art keywords
mask
glass
mark
reference mark
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200910007136A
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Chinese (zh)
Inventor
目黑崇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ADITECH ENGINEERING Co Ltd
Adtec Engineering Co Ltd
Original Assignee
ADITECH ENGINEERING Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ADITECH ENGINEERING Co Ltd filed Critical ADITECH ENGINEERING Co Ltd
Publication of CN101533225A publication Critical patent/CN101533225A/en
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Abstract

The invention provides a glass mask capable of aligning the positions of the glass mask and a mask retainer highly accurately and a position alignment apparatus of the mask retainer. The mask retainer (51) provided with the glass mask (50) is installed on a base (1), the mask retainer (51) tightly compresses an X reference position sheet (10) and a Y reference position sheet (11) that are fixed by using fixed cylinders (12, 13), the mask retainer (51) is positioned so that a lifter (21) raises, the glass mask (50) is absorbed and fixed by using an absorption layer (23), and an alignment tool (2) is moved according to images sent from a CCD camera (18) so that mask mark (60) is matched with reference mark 61. After matching, the glass mask (50) is fixed by using the mask retainer (51), the fixation of the mask retainer (51) is relieved, and the mask retainer is sent to the next working procedure.

Description

The position alignment device of glass mask and mask holder
Technical field
The present invention relates to the position alignment device of glass mask and mask holder.
Background technology
At the exposure device of manufacturing that is used for tellite etc., be the mask of circuit substrate etc. as the pattern of having described to expose, mainly use glass mask.This glass mask is fixed on usually on the setting tool of the shaped as frame shape that is called as mask holder and uses.When being fixed on glass mask on the mask holder, carrying out the location of glass mask end face and use line to carry out visual position alignment etc.
2004-No. 247718 communiques of [patent documentation 1] TOHKEMY
Yet, cut apart the high exposures of precision prescribed in the exposure of tellite such as exposure method in the past, for glass mask with as the position alignment of circuit substrate of exposure object thing etc., developed accurate position alignment method and apparatus.
Yet, in the position alignment of glass mask and mask holder, owing to carry out the location of glass mask end face as mentioned above and use line to carry out visual position alignment etc., thereby, hindered the raising of exposure accuracy because of deviation of the physical dimension of glass mask etc. is difficult to carry out the high position alignment of precision.
Summary of the invention
The objective of the invention is to solve above-mentioned existing issue.
In order to achieve the above object, the invention provides the position alignment device of a kind of glass mask and mask holder, it is characterized in that, this position alignment device has: pedestal, and its mask holder with the support glass mask remains on assigned position; Reference mark, it is located on this pedestal, has the position relation of regulation with the mask holder of described maintenance; Alignment tool, it is held in described glass mask at least and can moves towards xy direction and above-below direction; The mask mark that position alignment is used, it is located on the described glass mask; Locating device, it is according to described mask mark and described reference mark, described glass mask is moved be positioned at the assigned position that is predetermined at mask holder; And will be fixed on device on the mask holder by the glass mask that described locating device is located.
According to said structure, can carry out the position alignment of glass mask and mask holder accurately, and then can improve exposure accuracy.
What expect is that described reference mark constitutes and can be depicted on the reference mark plate, and overlaps with the mask mark.
And expectation is, described locating device constitutes has image processing apparatus, and this image processing apparatus is taken described mask mark and described reference mark, and can show the position relation of this mask mark and reference mark.By using this image processing apparatus, can be simply and the precision position alignment of carrying out the coincidence etc. of mask mark and described reference mark well.
Described mask holder generally is the shaped as frame shape, and alignment tool constitutes from the downside of the mask holder of shaped as frame shape and extends to the top of mask holder by the hollow bulb of this shaped as frame shape, can constitute the top that glass mask is remained on mask holder thus.According to this structure, constituent apparatus integral body compactly, but implement device dwindling of area etc. be set.
Expectation is that described alignment tool constitutes and can move towards the θ direction, and constitutes rotatable glass mask in addition.
According to the position alignment device of glass mask of the present invention and mask holder, has the effect that to carry out the position alignment of glass mask and mask holder accurately.
Description of drawings
Fig. 1 is the outline elevation that an embodiment of the invention are shown.
Fig. 2 is the approximate vertical view that an embodiment of the invention are shown.
Fig. 3 is the key diagram that the action of an embodiment of the invention is shown.
Fig. 4 is the reference mark plate 17 of an embodiment of the invention and the details drawing of CCD camera 18.
Fig. 5 is the key diagram that the action of an embodiment of the invention is shown.
Label declaration
1: pedestal; 2: alignment tool; 5: control device; 10:X reference position sheet; 11:Y reference position sheet; 12: fixing cylinder; 13: fixedly cylinder 15: upper surface 16: space; 17: the reference mark plate; The 18:CCD camera; 19: monitor 20: travel mechanism; 21: lifter; 22: the lifter cylinder; 23: absorption layer; 50: glass mask; 51: mask holder; 60: the mask mark; 61: reference mark.
Embodiment
Below, embodiments of the present invention are described with reference to the accompanying drawings.
Fig. 1 is a front elevation, and Fig. 2 is a vertical view.
This position alignment device has pedestal 1 and alignment tool 2.Pedestal 1 constitutes thereon and is placed with the mask holder 51 that glass mask 50 is housed on the surface 15, and is positioned at assigned position.
Upper surface 15 is made of 2 parts that are parallel to each other, and is space 16 therebetween.
Mask holder 51 is placed with and is erected between 2 upper surfaces 15,15.
As shown in Figure 2, on upper surface 15, be provided with X reference position sheet 10 and Y reference position sheet 11, by utilize fixedly cylinder 12 and fixedly cylinder 13 make mask holder 51 compress this X reference position sheet 10 and Y reference position sheet 11, can make mask holder 51 precision be positioned at the assigned position that is predetermined well.
On pedestal 1, also be provided with reference mark plate 17, on this reference mark plate 17, be provided with reference mark 61 as shown in Figure 4 and Figure 5.Reference mark plate 17 is located at the assigned position that is predetermined of pedestal 1, thereby the position of mask holder 51 of being located according to described X reference position sheet 10 and Y reference position sheet 11 and reference mark plate 17 has the position relation of regulation.Therefore, be located at the position relation that reference mark 61 on the reference mark plate 17 and mask holder 51 also have regulation, the position of mask holder 51 is represented in the position of reference mark 61.
Reference mark plate 17 is arranged to be positioned at the top of the end of the glass mask 50 that is fixed on the mask holder 51 in the present embodiment, thereby the mask mark 60 and the reference mark 61 that are located on the glass mask 50 are overlapped.
Also be provided with CCD camera 18 above reference mark plate 17, this CCD camera 18 constitutes, and mask mark 60 and reference mark 61 coincidences is taken, and as shown in Figure 5 this image is reflected on the monitor 19 that is connected with CCD camera 18.
The signal of this image constitutes and is sent to control device 5, carries out various data processing.
In addition, in the present embodiment, be provided with 2 reference mark plates 17 and 2 CCD cameras 18 as shown in Figure 2, yet this quantity can increase and decrease suitably.
Alignment tool 2 is installed in the downside of upper surface 15, thereby glass mask 50 is held in by travel mechanism 20 and can moves and can rotate towards the θ direction towards the xy direction.Alignment tool 2 also has lifter 21, this lifter 21 can be by lifter cylinder 22 towards upper and lower to lifting.On lifter 21, be provided with a plurality of absorption layers 23, constitute and on this absorption layer 23, to adsorb maintenance glass mask 50.
Absorption layer 23 on the lifter 21 is the hollow bulb of the mask holder 51 by space 16 and shaped as frame shape as shown in Figure 3, contact with the lower surface of glass mask 50 on being placed on mask holder 51, thus this lower surface of absorption maintenance.Constitute then, glass mask 50 is moved towards xy direction and θ direction, can carry out the position alignment of glass mask 50 and mask holder 51 by travel mechanism 20.
Mask mark 60 is located at the end of glass mask 50 as shown in Figure 4, when with the plane of reference mark 61 on position consistency the time, the mutual alignment of glass mask 50 and mask holder 51 is formed on the position of the assigned position that is positioned to be predetermined.
Mask mark 60 and reference mark 61 are taken by CCD camera 18, and coincidence is presented on the monitor 19 as shown in Figure 5.Constitute, when the user confirms on monitor 19 alignment tool 2 is moved, by making mask mark 60 and the reference mark 61 consistent position alignment that make glass mask 50 and mask holder 51.In addition, aforesaid operations can also constitute automatically and carry out.
Locating device is formed by above-mentioned alignment tool 2, CCD camera 18, monitor 19, mask mark 60 and reference mark 61.
Constitute, after the position alignment of glass mask 50 and mask holder 51 finishes, lifter 21 is descended, under the state after the position alignment glass mask 50 is being placed on the mask holder 51 once more, use the stationary installation of regulation that glass mask 50 and mask holder 51 is fixing.Should fixing expectation be, be not only the physical fixation of standing finish etc., but also comprise and use the fixing of vacuum suction in the lump, the position deviation after can not mating thus can be delivered to the exposure device of subsequent processing.
The following describes action.
At first, the mask holder 51 that glass mask 50 is housed is encased on the pedestal 1, utilize fixedly cylinder 12 and fixedly cylinder 13 make mask holder 51 compress X reference position sheet 10 and Y reference position sheet 11 fixes, carry out the location of mask holder 51 thus.
Then, lifter 21 is risen come support glass mask 50, use absorption layer 23 that glass mask 50 absorption are fixing, lifter 21 is risen, aim at the focus of CCD camera 18.
Then, when monitor 19 was confirmed, control travel mechanism 20 moved alignment tool 2, makes mask mark 60 and reference mark 61 couplings at the image that will send from CCD camera 18.This alignment function can be used manual alignment as mentioned above or aim at these two kinds automatically.
After mask mark 60 and reference mark 61 couplings, lifter 21 is descended glass mask 50 is contained on the mask holder 51, the vacuum suction that disconnects absorption layer 23 makes glass mask 50 separate with lifter 21.
Then, use mask holder 51 that glass mask 50 is fixing, disconnect fixedly cylinder 12 and fixedly cylinder 13, remove the fixing of mask holder 51, glass mask 50 and mask holder 51 are taken out from pedestal 1, deliver to subsequent processing.

Claims (5)

1. the position alignment device of glass mask and mask holder is characterized in that this position alignment device has:
Pedestal, its mask holder with the support glass mask remains on assigned position;
Reference mark, it is located on this pedestal, has the position relation of regulation with the mask holder of described maintenance;
Alignment tool, it is held in described glass mask at least and can moves towards xy direction and above-below direction;
The mask mark that position alignment is used, it is located on the described glass mask;
Locating device, it is according to described mask mark and described reference mark, described glass mask is moved be positioned on the assigned position that is predetermined at mask holder; And
To be fixed on the device on the mask holder by the glass mask that described locating device is located.
2. position alignment device according to claim 1, described reference mark is depicted on the reference mark plate, and can overlap with described mask mark.
3. position alignment device according to claim 1 and 2, described locating device has image processing apparatus, and this image processing apparatus is taken described mask mark and described reference mark, and can show the position relation of this mask mark and reference mark.
4. according to claim 1 or 2 or 3 described position alignment devices, described mask holder is the shaped as frame shape,
Described alignment tool remains on from the downside of the mask holder of shaped as frame shape glass mask the top of mask holder by the hollow bulb of this shaped as frame shape.
5. according to claim 1 or 2 or 3 or 4 described position alignment devices, described alignment tool can move towards the θ direction.
CN200910007136A 2008-03-11 2009-02-09 Glass mask and position alignment apparatus of mask retainer Pending CN101533225A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008061048 2008-03-11
JP2008061048A JP2009217008A (en) 2008-03-11 2008-03-11 Aligning device for glass mask and mask holder

Publications (1)

Publication Number Publication Date
CN101533225A true CN101533225A (en) 2009-09-16

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN200910007136A Pending CN101533225A (en) 2008-03-11 2009-02-09 Glass mask and position alignment apparatus of mask retainer

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JP (1) JP2009217008A (en)
KR (1) KR20090097772A (en)
CN (1) CN101533225A (en)
TW (1) TW200947157A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101928936A (en) * 2009-06-23 2010-12-29 周星工程股份有限公司 Apparatus for substrate alignment, apparatus for substrate processing having the same, and substrate alignment method
CN103205682A (en) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 Indirect alignment method for mask assembly
CN103241677A (en) * 2013-05-08 2013-08-14 武汉理工大学 Jacking device
CN105984700A (en) * 2015-03-16 2016-10-05 塔工程有限公司 Substrate delivery system
CN108118291A (en) * 2017-12-25 2018-06-05 信利（惠州）智能显示有限公司 A kind of vapor deposition contraposition effect detection device and method
CN109440061A (en) * 2018-11-12 2019-03-08 京东方科技集团股份有限公司 The preparation method of mask plate, mask device, mask plate
CN110249071A (en) * 2017-02-10 2019-09-17 株式会社日本显示器 Deposition mask fixes device
CN110777327A (en) * 2018-07-25 2020-02-11 株式会社日本显示器 Mask device manufacturing apparatus

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JP5799207B2 (en) * 2011-12-07 2015-10-21 パナソニックＩｐマネジメント株式会社 Mask holder
CN102540699A (en) * 2012-01-18 2012-07-04 上海华力微电子有限公司 Novel photomask reference mark pattern
KR102254042B1 (en) 2013-08-12 2021-05-21 어플라이드 머티리얼즈 이스라엘 리미티드 System and method for attaching a mask to a mask holder
CN105939575B (en) * 2016-06-24 2018-09-28 广东华恒智能科技有限公司 A kind of single side subregion ink aligning machine and its alignment method

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101928936A (en) * 2009-06-23 2010-12-29 周星工程股份有限公司 Apparatus for substrate alignment, apparatus for substrate processing having the same, and substrate alignment method
CN103205682A (en) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 Indirect alignment method for mask assembly
CN103205682B (en) * 2012-01-16 2017-03-15 昆山允升吉光电科技有限公司 The method of the indirect para-position of mask assembly
CN103241677A (en) * 2013-05-08 2013-08-14 武汉理工大学 Jacking device
CN103241677B (en) * 2013-05-08 2015-10-28 武汉理工大学 A kind of jacking system
CN105984700A (en) * 2015-03-16 2016-10-05 塔工程有限公司 Substrate delivery system
CN105984700B (en) * 2015-03-16 2020-06-26 塔工程有限公司 Substrate conveying system
CN110249071A (en) * 2017-02-10 2019-09-17 株式会社日本显示器 Deposition mask fixes device
CN108118291A (en) * 2017-12-25 2018-06-05 信利（惠州）智能显示有限公司 A kind of vapor deposition contraposition effect detection device and method
CN110777327A (en) * 2018-07-25 2020-02-11 株式会社日本显示器 Mask device manufacturing apparatus
CN110777327B (en) * 2018-07-25 2022-04-19 株式会社日本显示器 Mask device manufacturing apparatus
US11484971B2 (en) 2018-07-25 2022-11-01 Japan Display Inc. Manufacturing device for mask unit
CN109440061A (en) * 2018-11-12 2019-03-08 京东方科技集团股份有限公司 The preparation method of mask plate, mask device, mask plate

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Publication number Publication date
JP2009217008A (en) 2009-09-24
TW200947157A (en) 2009-11-16
KR20090097772A (en) 2009-09-16

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Open date: 20090916