JP5603956B2 - Lithographic apparatus - Google Patents

Description

This application claims the benefit of US Provisional Application No. 61 / 307,394, filed February 23, 2010, which is hereby incorporated by reference in its entirety. Also claims the benefit of US Provisional Application No. 61 / 322,505, filed April 9, 2010, the entirety of which is incorporated herein by reference.

  The present invention relates to a lithographic apparatus, a programmable patterning device, a device manufacturing method, and a method for alignment of two or more optical columns of a lithographic apparatus.

  A lithographic apparatus is a machine that applies a desired pattern onto a substrate or part of a substrate. Lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs), flat panel displays, other devices or structures having fine geometries. In conventional lithographic apparatus, patterning devices, also referred to as masks or reticles, may be used to generate circuit patterns that correspond to the individual layers of the IC, flat panel display, or other device. This pattern is transferred to the substrate (for example, a silicon wafer or glass plate) by imaging onto a radiation sensitive material (resist) layer provided on the substrate.

  In some cases, the patterning device is used to generate other patterns, such as a color filter pattern or a matrix of dots, instead of a circuit pattern. Instead of a conventional mask, the patterning device may comprise a patterning array comprising an array of individually controllable elements that produce a circuit pattern or other applicable pattern. Such a “maskless” method has an advantage that a pattern can be prepared or changed quickly and at a lower cost than a method using a conventional mask.

  Thus, maskless systems include programmable patterning devices (eg, spatial light modulators, contrast devices, etc.). The programmable patterning device is programmed (eg, electronically or optically) to form a beam with a desired pattern using an array of individually controllable elements. Types of programmable patterning devices include micromirror arrays, liquid crystal display (LCD) arrays, grating light valve arrays, and the like.

  In certain embodiments, the maskless lithographic apparatus may be provided with, for example, an optical column configured to generate a pattern on a target portion of the substrate. The optical column may include a self-radiating contrast device configured to emit a plurality of beams, and a projection system configured to project at least a portion of the plurality of beams onto a target portion. Good. The apparatus may be provided with an actuator configured to move the optical column or part thereof relative to the substrate.

  A maskless lithographic apparatus of the type described above is provided with a number of optical columns in one embodiment, which project the projection beam substantially simultaneously onto different target portions on the substrate. In practice, the substrate surface is divided into a plurality of elongated portions in a direction substantially perpendicular to the scanning direction, each of which is associated with an optical column. Each elongate portion is further divided into several target portions in a direction parallel to the scanning direction, and a pattern is subsequently projected onto these target portions as the substrate moves to the optical column.

  When projecting a pattern onto a substrate, it is desirable that the patterned beam projected onto the substrate be accurately aligned and focused on the surface of the substrate where the pattern is to be generated.

  In a lithographic apparatus of the type described above, a pattern may be generated using multiple optical columns across the entire width of the substrate simultaneously or substantially simultaneously. Each of the optical columns is configured to generate a pattern on the target portion of the elongated portion on the associated substrate. In order to produce a continuous and accurate pattern across the substrate, it is desirable that the optical columns be aligned with each other and the substrate during the lithographic process.

  It would be desirable to provide a lithographic apparatus that is configured to align each of a number of optical columns of the lithographic apparatus with a substrate.

  According to one embodiment of the present invention, two or more optical columns configured to project a beam onto a target portion of a substrate, each of the two or more optical columns being Two or more optical columns comprising one or more radiation sources for providing the beam and a projection system for projecting the beam onto the target portion, and the two or more A scanning movement actuator configured to move the substrate at a scanning speed in a scanning direction with respect to a number of optical columns, and the position of the corresponding two or more optical columns to a certain reference object There are provided lithographic apparatus comprising two or more position measurement devices configured as described above.

  According to an embodiment of the invention, there is provided a method for aligning an optical column of a lithographic apparatus, wherein the position of a target portion of a number of optical columns is measured with respect to a reference object; A method is provided comprising comparing the positions of the target portions of the columns with each other and adjusting the patterns projected onto the target portions to align the optical column.

  What is desired is to provide a flexible and low cost lithographic apparatus that includes, for example, a programmable patterning device.

  In one embodiment, a modulator configured to expose an exposure area of a substrate with a plurality of beams modulated according to a desired pattern, and a projection system configured to project the modulated beam onto the substrate A lithographic apparatus is disclosed. The modulator may be movable with respect to the exposure area and / or the projection system may have a lens array that receives a plurality of beams, and the lens array may be movable with respect to the exposure area.

  The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate certain embodiments of the present invention, together with the detailed description of the invention, explain the principles of the invention and allow the person skilled in the art to make the invention. Served to be usable. Like reference symbols in the various drawings indicate identical or functionally similar elements.

1 is a schematic side view of a lithographic apparatus according to an embodiment of the present invention.

1 is a schematic top view of a lithographic apparatus according to an embodiment of the invention. FIG.

1 is a schematic top view of a lithographic apparatus according to an embodiment of the invention. FIG.

1 is a schematic top view of a lithographic apparatus according to an embodiment of the invention. FIG.

1 is a schematic top view of a lithographic apparatus according to an embodiment of the invention. FIG.

1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention.

1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view and schematic top view of a portion of a lithographic apparatus according to an embodiment of the invention.

4 is a power / forward current graph for individually addressable elements according to an embodiment of the invention.

1 is a schematic side view of a lithographic apparatus according to an embodiment of the present invention.

1 is a schematic side view of a lithographic apparatus according to an embodiment of the present invention.

1 is a schematic side view of a lithographic apparatus according to an embodiment of the present invention.

1 is a schematic top view of an individually controllable element array for a lithographic apparatus according to an embodiment of the invention. FIG.

It is a figure which shows the mode which transfers a pattern to a board | substrate using one embodiment of this invention.

It is a figure which shows the outline of the arrangement | sequence of an optical engine.

1 is a schematic side view of a portion of a lithographic apparatus according to an embodiment of the invention. 1 is a schematic side view of a portion of a lithographic apparatus according to an embodiment of the invention.

1 is a schematic top view of a lithographic apparatus according to an embodiment of the invention. FIG.

1 is a schematic side view of a portion of a lithographic apparatus according to an embodiment of the invention.

It is a figure which shows the outline of the position of the detection area of the sensor with respect to a board | substrate.

1 is a schematic top view of a lithographic apparatus according to an embodiment of the invention. FIG.

1 is a schematic side sectional view of a lithographic apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic top view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, in accordance with an embodiment of the present invention.

FIG. 20 is a schematic three-dimensional view of a portion of the lithographic apparatus of FIG.

FIG. 2 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention, 3 shows three different rotational positions of the optical element set 242 for individually controllable elements.

FIG. 2 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention, 3 shows three different rotational positions of the optical element set 242 for individually controllable elements.

FIG. 2 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention, 5 shows five different rotational positions of the optical element set 242 for individually controllable elements.

FIG. 6 is a schematic layout of a portion of individually controllable element 102 when using a standard 5.6 mm diameter laser diode to cover the entire width of the substrate.

It is a schematic layout which shows the detail of FIG.

FIG. 2 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, in accordance with an embodiment of the present invention.

FIG. 2 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, in accordance with an embodiment of the present invention.

FIG. 2 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention, 5 shows five different rotational positions of the optical element set 242 for individually controllable elements.

FIG. 29 is a schematic three-dimensional view of a portion of the lithographic apparatus of FIG.

FIG. 30 schematically illustrates a configuration of eight lines written simultaneously by the single movable optical element set 242 of FIGS. 28 and 29.

It is a figure which shows schematic structure which performs focus control using a movable rooftop in the structure of FIG.28 and FIG.29.

An approximate side of a lithographic apparatus according to an embodiment of the invention, comprising individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention It is sectional drawing.

FIG. 2 shows a part of a lithographic apparatus according to an embodiment of the invention.

FIG. 34 is a top view of the lithographic apparatus of FIG. 33 according to an embodiment of the present invention.

1 is a schematic side view of a position measuring device according to an embodiment of the present invention.

  Described herein are one or more embodiments of a maskless lithographic apparatus, maskless lithographic method, programmable patterning device and other apparatus, product and method. In certain embodiments, a low cost and / or flexible maskless lithographic apparatus is provided. Because it is maskless, a conventional mask is not required to expose, for example, an IC or flat panel display. Similarly, one or more rings are not required in packaging applications. That is, the programmable patterning device can provide a digital edge processing “ring” to avoid edge projection for packaging applications. Maskless (digital patterning) can also be used for flexible substrates.

  In certain embodiments, the lithographic apparatus is capable of extremely unlimited applications. In an embodiment, the lithographic apparatus is capable of a resolution of 0.1 μm or higher, for example, a resolution of 0.5 μm or higher, or a resolution of 1 μm or higher. In an embodiment, the lithographic apparatus is capable of a resolution of 20 μm or less, such as a resolution of 10 μm or less, or a resolution of 5 μm or less. In one embodiment, the lithographic apparatus is capable of a resolution of approximately 0.1 μm to 10 μm. In certain embodiments, the lithographic apparatus is capable of 50 nm or greater overlay, eg, 100 nm or greater overlay, 200 nm or greater overlay, or 300 nm or greater overlay. In certain embodiments, the lithographic apparatus can have an overlay of 500 nm or less, such as an overlay of 400 nm or less, an overlay of 300 nm or less, or an overlay of 200 nm or less. These overlay and resolution values may be independent of substrate dimensions and materials.

  In certain embodiments, the lithographic apparatus is highly flexible. In certain embodiments, the lithographic apparatus can be extended to substrates of various sizes, types and properties. In an embodiment, the lithographic apparatus has a virtually unlimited field size. As such, the lithographic apparatus can enable many applications (eg, ICs, flat panel displays, packaging, etc.) in a single lithographic apparatus or with multiple lithographic apparatuses using a common lithographic platform. In certain embodiments, the lithographic apparatus allows automated job generation to provide flexible manufacturing. In certain embodiments, the lithographic apparatus provides three-dimensional integration.

  In certain embodiments, the lithographic apparatus is low cost. In some embodiments, only common off-the-shelf components are used (eg, emitting light emitting diodes, simple movable substrate holders, lens arrays). In some embodiments, pixel grid imaging is used, allowing for simple projection optics. In some embodiments, a substrate holder having a single scan direction is used, reducing cost and / or complexity.

  FIG. 1 schematically depicts a lithographic projection apparatus 100 according to an embodiment of the invention. The apparatus 100 includes a patterning device 104, an object holder 106 (for example, an object table, for example, a substrate table), and a projection system 108.

  In certain embodiments, the patterning device 104 comprises a plurality of individually controllable elements 102 for modulating radiation to impart a pattern to the beam 110. In some embodiments, the position of the plurality of individually controllable elements 102 can be fixed relative to the projection system 108. However, in an alternative configuration, the plurality of individually controllable elements 102 is a positioning device for accurately positioning one or more of the elements (eg, relative to the projection system 108) according to certain parameters. (Not shown) may be connected.

In some embodiments, the patterning device 104 is a self-radiating contrast device. Such a patterning device 104 eliminates the need for a radiation system, thus reducing the cost and size of the lithographic apparatus, for example. For example, each individually controllable element 102 is a radiant light emitting diode (eg, a light emitting diode (LED), an organic LED (OLED), a polymer LED (PLED)), or a laser diode (eg, a solid state laser diode). . In one embodiment, each individually controllable element 102 is a laser diode. In one embodiment, each individually controllable element 102 is a blue-violet laser diode (eg, Sanyo model number DL-3146-151). Such diodes are supplied by companies such as Sanyo, Nichia, OSRAM, and Nitride. In some embodiments, the diode emits radiation having a wavelength of about 365 nm or about 405 nm. In some embodiments, the diode can provide an output power selected from the range of 0.5 mW to 100 mW. In one embodiment, the size of the laser diode (bare die) is selected from the range of 250 μm to 600 μm. In some embodiments, the laser diode has a light emitting region selected from the range of 1 μm to 5 μm. In some embodiments, the laser diode has a divergence angle selected from the range of 7 degrees to 44 degrees. In some embodiments, the patterning device 104 has 1 × 10 ⁵ diodes, which generally provide a brightness of about 6.4 × 10 ⁸ W / (m ² · sr) or more. (For example, light emitting region, divergence angle, output power, etc.).

  In one embodiment, the self-radiating contrast device comprises more individual controllable elements 102 than necessary to allow “redundant” individually controllable elements 102. Redundant individually controllable elements 102 are used when other individually controllable elements 102 are inoperable or not operating properly. In certain embodiments, redundant individually controllable elements may be advantageously used in embodiments that use movable individually controllable elements 102 (which will be described below with respect to FIG. 5, for example).

  In one embodiment, the individually controllable element 102, which is a self-radiating contrast device, is operated on the slope portion of the power / forward current curve of the individually controllable element 102 (eg, a laser diode). This is more efficient and can lead to lower power consumption / heat generation. In certain embodiments, in use, the light output per individually controllable element is at least 1 mW, such as at least 10 mW, at least 25 mW, at least 50 mW, at least 100 mW, or at least 200 mW. In certain embodiments, in use, the light output per individually controllable element is less than 300 mW, less than 250 mW, less than 200 mW, less than 150 mW, less than 100 mW, less than 50 mW, less than 25 mW, or less than 10 mW. In certain embodiments, in use, power consumption per programmable patterning device that activates individually controllable elements is less than 10 kW, such as less than 5 kW, less than 1 kW, or less than 0.5 kW. In some embodiments, in use, the power consumption per programmable patterning device that activates individually controllable elements is at least 100 W, such as at least 300 W, at least 500 W, or at least 1 kW.

  The lithographic apparatus 100 includes an object holding unit 106. In this embodiment, the object holding unit includes an object table 106 that holds a substrate 114 (for example, a silicon wafer or a glass substrate coated with a resist). The object table 106 may be movable and may be connected to a positioning device 116 for accurately positioning the substrate 114 according to certain parameters. For example, the positioning device 116 may accurately position the substrate 114 relative to the projection system 108 and / or the patterning device 104. In one embodiment, the movement of the object table 106 is not explicitly shown in FIG. 1, but comprises a positioning device 116 comprising a long stroke module (coarse positioning) and optionally a short stroke module (fine positioning). May be realized. In some embodiments, the apparatus lacks at least a short stroke module that moves the object table 106. Similar systems may be used to position the individually controllable element 102. What the beam 110 may alternatively or additionally move with, along with the object table 106 and / or the individually controllable element 102 having a fixed position, may provide the necessary relative movement Please understand. Such a configuration can help limit the size of the device. In some embodiments (which may be applicable, for example, in the manufacture of flat panel displays), the object table 106 may be stationary and the positioning device 116 is relative to the object table 106 (eg, above). The substrate 114 is configured to move. For example, the object table 106 may be provided with a system that scans the substrate 114 across the table at a substantially constant speed. In this case, the object table 106 may be provided with a large number of openings on the flat top surface, and a gas cushion capable of supporting the substrate 114 may be provided by sending gas through these openings. . This is conventionally referred to as a gas bearing configuration. The substrate 114 is moved over the object table 106 using one or more actuators (not shown) that can accurately position the substrate 114 relative to the path of the beam 110. Alternatively, the substrate 114 may be moved relative to the object table 106 by selectively starting and stopping gas paths through the openings. In an embodiment, the object holding unit 106 may be a roll system that winds up a substrate, and the positioning device 116 may be a motor that rotates the roll system to supply the substrate to the object table 106. .

Projection system 108 (e.g., a quartz and / or CaF ₂ lens system or a catadioptric system comprising lens elements made from such materials, or a mirror system), a beam modulated pattern is imparted by the individually controllable elements 102 It can be used to project onto a target portion 120 (eg, one or more dies) of the substrate 114. The projection system 108 may project an image of the pattern provided by the plurality of individually controllable elements 102 so that the pattern is formed on the substrate 114 coherently. Alternatively, the projection system 108 may project an image of the secondary light source, and each of the plurality of individually controllable elements 102 operates as a shutter for those secondary light sources.

  In this regard, the projection system may be a focusing element such as a microlens array (known as MLA) or a Fresnel lens array, for example, to form a secondary light source and image a spot on the substrate 114 or a plurality of A focusing element (generally referred to herein as a lens array) may be provided. In certain embodiments, the lens array (eg, MLA) has at least 10, such as at least 100, at least 1,000, at least 10,000, at least 100,000, or at least 1,000,000. Individual focusing elements may be provided. In some embodiments, the number of individually controllable elements in the patterning device is equal to the number of focusing elements in the lens array, or the number of individually controllable elements in the patterning device is the number of focusing elements in the lens array. More than. In some embodiments, the lens array comprises focusing elements optically associated with one or more individually controllable elements in the individually controllable element array, eg, one individual in the individually controllable element array. 2 or more (eg, 3 or more, 5 or more, 10 or more, 20 or more, 25 or more, 35 or more, or 50 or more) individually controllable elements that relate only to controllable elements or in an array of individually controllable elements is connected with. In some embodiments, the focusing element is optically associated with less than 5000, eg, less than 2500, less than 1000, less than 500, or less than 100 individually controllable elements. In some embodiments, the lens array is two or more optically associated with one or more individually controllable elements in the individually controllable element array (eg, often more than 1000 or nearly all). The focusing element is provided.

  In some embodiments, the lens array can be moved, for example, using one or more actuators, at least in a direction toward and away from the substrate. When the lens array can be moved in a direction approaching or moving away from the substrate, for example, focus adjustment can be performed without requiring the substrate to move. In some embodiments, the individual lens elements of the lens array, for example, each of the individual lens elements of the lens array are at least in a direction toward and away from the substrate (eg, for local focus adjustment on a non-flat substrate). Or to move each optical column to the same focal length).

  In one embodiment, the lens array comprises a plastic focusing element (eg, easy to make by injection molding and affordable, for example when the wavelength of radiation is about 400 nm or more (eg, 405 nm). Because there is). In some embodiments, the wavelength of radiation is selected from the range of 400 nm to 500 nm. In one embodiment, the lens array comprises a quartz focusing element. In some embodiments, each or more focusing elements may be asymmetric lenses. The asymmetry may be the same for a plurality of focusing elements, or one or a plurality of focusing elements different from that of a plurality of focusing elements in one or a plurality of focusing elements. May be different. An asymmetric lens can help convert an elliptical radiation output into a circular projection spot (or vice versa).

  In certain embodiments, the focusing element has a high numerical aperture adapted to project radiation onto the substrate out of focus to obtain a low numerical aperture (NA) for the system. High NA lenses may be more economical, popular, and / or higher quality than available low NA lenses. In some embodiments, the low NA is 0.3 or less, and in some embodiments, 0.18 or 0.15 or less. Thus, a high NA lens has a NA that is greater than the system design NA, eg, greater than 0.3, greater than 0.18, or greater than 0.15.

  In some embodiments, the projection system 108 is separate from the patterning device 104, but this is not required. Projection system 108 may be integrated into patterning device 104. For example, a lens array block or lens array plate may be attached (integrated) to the patterning device 104. In some embodiments, the lens array may be in the form of spatially separated individual lenslets. Each lenslet is attached (integrated) to an individually addressable element of the patterning device 104, as will be described in detail below.

  Optionally, the lithographic apparatus may comprise a radiation system that supplies radiation (eg, ultraviolet (UV) radiation) to a plurality of individually controllable elements 102. If the patterning device itself is a radiation source, for example a laser diode array or an LED array, the lithographic apparatus has a design without a radiation source, i.e. a design without a radiation source other than the patterning device itself, or at least simple. It may be designed with a radiation system.

  The radiation system includes an illumination system (illuminator) configured to receive radiation from a radiation source. The illumination system includes a radiation transport system (eg, an appropriate reorienting mirror), a radiation adjustment device (eg, a beam expander), an adjustment device for setting the angular intensity distribution of the radiation (usually in the pupil plane of the illuminator) At least the radial outer diameter and / or inner diameter values (referred to as “sigma-outer” and “sigma-inner”, respectively) of the illumination distribution are adjusted), integrators, and And / or includes one or more elements of a capacitor. The illumination system may be used to adjust the radiation so that it has the desired uniformity and illumination distribution in the cross section of the radiation applied to the individually controllable element 102. The illumination system may be configured to split the radiation into a plurality of sub-beams. For example, each sub-beam is associated with one or more individually controllable elements in the individually controllable element array. For example, a two-dimensional diffraction grating may be used to split the radiation into sub-beams. As used herein, the terms “beam of radiation” and “radiation beam” include, but are not limited to, situations in which the beam is comprised of a plurality of such sub-beams.

  The radiation system may also include a radiation source (eg, an excimer laser) that generates radiation for supply to a plurality of individually controllable elements 102 or that generates radiation by a plurality of individually controllable elements 102. For example, if the radiation source is an excimer laser, the radiation source and the lithographic apparatus 100 may be separate. In this case, the radiation source is not considered to form part of the lithographic apparatus 100 and the radiation is passed from the radiation source to the illuminator. Alternatively, if the radiation source is a mercury lamp, the radiation source may be integrated into the lithographic apparatus 100. Both of these forms should be considered to be within the scope of the present invention.

  In certain embodiments, the radiation source may be a plurality of individually controllable elements 102 in certain embodiments, but at least 5 nm, such as at least 10 nm, at least 50 nm, at least 100 nm, at least 150 nm, at least 175 nm, at least 200 nm. Radiation having a wavelength of at least 250 nm, at least 275 nm, at least 300 nm, at least 325 nm, at least 350 nm, or at least 360 nm. In some embodiments, the radiation is at most 450 nm, such as at most 425 nm, at most 375 nm, at most 360 nm, at most 325 nm, at most 275 nm, at most 250 nm, at most 225 nm Have a wavelength of at most 200 nm, or at most 175 nm. In certain embodiments, the radiation has a wavelength that includes 436 nm, 405 nm, 365 nm, 355 nm, 248 nm, 193 nm, 157 nm, 126 nm, and / or 13.5 nm. In some embodiments, the radiation includes a wavelength near 365 nm or near 355 nm. In certain embodiments, the radiation includes a broadband wavelength, including, for example, 365 nm, 405 nm, and 436 nm. A 355 nm laser source may be usable. In certain embodiments, the radiation has a wavelength of about 405 nm.

  In some embodiments, radiation is transmitted from the illumination system to the patterning device 104 between 0 and 90 degrees, such as between 5 and 85 degrees, between 15 and 75 degrees, between 25 and 65 degrees, Or oriented at an angle between 35 and 55 degrees. Radiation from the illumination system may be provided directly to the patterning device 104. In an alternative embodiment, radiation may be directed from the illumination system to the patterning device 104 by a beam splitter (not shown). The beam splitter is configured such that the radiation is first reflected by the beam splitter and directed to the patterning device 104. The patterning device 104 modulates the beam and reflects it back towards the beam splitter again. The beam splitter transmits the modulated beam to the substrate 114. However, it will be appreciated that alternative configurations are possible where the radiation is directed at the patterning device 104 and is incident upon the substrate 114 as is. In particular, if a transmissive patterning device 104 (eg, an LCD array) is used, or if the patterning device 104 is self-emitting (eg, multiple diodes), an illumination system configuration may not be required.

  In operation of the lithographic apparatus 100, if the patterning device 104 does not emit radiation (eg, comprises an LED), the radiation is emitted from the radiation system (illumination system and / or radiation source) from the patterning device 104 (eg, a plurality of patterns). Is incident on an individually controllable element and modulated by the patterning device 104. The beam 110 provided with the pattern generated by the plurality of individually controllable elements 102 passes through the projection system 108. Projection system 108 focuses beam 110 onto target portion 120 of substrate 114.

  Positioning device 116 (and optionally position sensor 134 on base 136 (eg, an interferometric device, linear encoder, or capacitive sensor that receives interference beam 138) causes substrate 114 to be accurately moved, and so on. For example, different target portions 120 are each positioned in the path of the beam 110. If used, a positioning device for the plurality of individually controllable elements 102 is, for example, relative to the path of the beam 110 during scanning. And may be used to accurately correct the position of the plurality of individually controllable elements 102.

  Although lithographic apparatus 100 according to an embodiment of the invention is described as exposing a resist on a substrate, apparatus 100 projects a patterned beam 110 for use in resistless lithography. May be used.

  As shown, the lithographic apparatus 100 is of a reflective type (eg, employing a reflective individually controllable element). Alternatively, the device may be transmissive (eg, using transmissive individually controllable elements).

  The illustrated apparatus 100 can be used in one or more illustrated modes.

  1. In step mode, the individually controllable element 102 and the substrate 114 are substantially stationary (ie, 1) while the entire pattern imparted to the radiation beam 110 is projected onto the target portion 120 with a single exposure. Times static exposure). The substrate 114 is then moved in the X and / or Y direction so that different target portions 120 are exposed with the pattern radiation beam 110. In step mode, the maximum size of the exposure field limits the size of the target portion 120 imaged in a single static exposure.

  2. In scan mode, the individually controllable element 102 and the substrate 114 are scanned synchronously (ie, one dynamic exposure) while the pattern radiation beam 110 is projected onto the target portion 120. The velocity and direction of the substrate relative to the individually controllable element is determined by the enlargement (reduction) characteristic and the image reversal characteristic of the projection system PS. In the scan mode, the maximum size of the exposure field limits the width (in the non-scanning direction) of the target portion in one dynamic exposure, and the scanning movement distance determines the length (in the scanning direction) of the target portion.

  3. In the pulsed mode, the individually controllable element 102 is substantially stationary and is applied to the target portion 120 of the substrate 114 by a pulse (eg, provided by a pulsed radiation source or a pulse of the individually controllable element). The entire pattern is projected. As the substrate 114 moves at a substantially constant speed, the pattern beam 110 is scanned linearly over the substrate 114. The pattern provided by the individually controllable elements is updated as needed between pulses. The timing of pulse irradiation is adjusted so that a plurality of continuous target portions 120 are exposed at a required place on the substrate 114. As a result, the pattern beam 110 scans the substrate 114 so that the pattern is completely exposed to one strip-shaped region on the substrate 114. The entire substrate 114 is exposed by sequentially repeating the exposure of the strip-shaped region.

  4). The continuous scan mode is basically the same as the pulse mode. The difference is that the substrate 114 is scanned at substantially constant speed relative to the modulated radiation beam 110, and the pattern beam 110 scans and exposes the substrate 114 and the pattern on the individually controllable element array is updated. It is. A substantially constant radiation source or pulsed radiation source can be used that is synchronized to the pattern update of the individually controllable element array.

  The modes described above may be operated in combination, may be operated with a mode change, and may be used in a completely different mode.

  FIG. 2 depicts a schematic top view of a lithographic apparatus used with a wafer (eg, a 300 mm wafer) in accordance with an embodiment of the present invention. As shown in FIG. 2, the lithographic apparatus 100 comprises a substrate table 106 that holds a substrate 114. Accompanying the substrate table 106 is a positioning device 116 that moves the substrate table 106 at least in the X direction. Optionally, the positioning device 116 may move the substrate table 106 in the Y direction and / or the Z direction. The positioning device 116 may rotate the substrate table 106 around the X direction, around the Y direction, and / or around the Z direction. Accordingly, the positioning device 116 may provide up to six degrees of freedom of motion. In some embodiments, the substrate table 106 provides motion in the X direction only. The advantage is lower cost and complexity. In some embodiments, the substrate table 106 includes relay optics.

  The lithographic apparatus 100 further comprises a plurality of individually addressable elements 102 disposed on the frame 160. The frame 160 may be mechanically isolated from the substrate table 106 and its positioning device 116. Mechanical isolation may be provided, for example, by connecting the frame 160 to the ground or to a rigid foundation separated from the frame for the substrate table 106 and its positioning device 116. Additionally or alternatively, a damper may be provided between the frame 160 and the structure connected to it (the ground, a solid foundation, or a frame that supports the substrate table 106 and its positioning device 116).

  In this embodiment, each of the individually addressable elements 102 is a radiant light emitting diode, such as a blue-violet laser diode. As shown in FIG. 2, the individual addressable elements 102 are an array of at least three individual addressable elements 102, which may be arranged along the Y direction. In one embodiment, the array of individually addressable elements 102 is offset in the X direction from the array of adjacent individual addressable elements 102. The lithographic apparatus 100, in particular the individually addressable elements 102, may be configured to provide pixel grid imaging as described in detail below.

  Each of the arrays of individually addressable elements 102 may be part of a separate optical engine component and may be manufactured as an easily replicated unit. The frame 160 may also be configured to be expandable and may be configured to easily fit any number of such optical engine components. The optical engine component may comprise a combination of an array of individually addressable elements 102 and a lens array 170 (see FIG. 8). For example, in FIG. 2, three optical engine components are depicted (each array of individually addressable elements 102 is associated with a lens array 170 described below). Thus, in some embodiments, each optical engine may form one column to provide a multi-column optical configuration.

  The lithographic apparatus 100 also includes an alignment sensor 150. The alignment sensor is used to determine the alignment between the individually addressable element 102 and the substrate 114 before and / or during exposure of the substrate 114. The result of the alignment sensor 150 can be used, for example, to control a positioning device 116 that positions the substrate table 106 by a controller of the lithographic apparatus 100 to improve alignment. In addition or alternatively, the controller may, for example, control a positioning device associated with the individually addressable element 102 to position one or more individual addressable elements 102 to improve alignment. In some embodiments, alignment sensor 150 may include a pattern recognition function / software to perform alignment.

  The lithographic apparatus 100 additionally or alternatively comprises a level sensor 150. The level sensor 150 is used to determine whether the substrate 106 is horizontal with respect to the projection of the pattern from the individually addressable element 102. The level sensor 150 can determine the height of the substrate 114 before and / or during exposure. The result of the level sensor 150 can be used, for example, to control a positioning device 116 that positions the substrate table 106 by a controller of the lithographic apparatus 100 to improve leveling. In addition, or alternatively, the controller may, for example, control a positioning device associated with the projection system 108 (eg, lens array) to position certain elements (eg, lens array) of the projection system 108 to improve leveling. May be. In some embodiments, the level sensor may operate by projecting an ultrasonic beam onto the substrate 106 and / or projecting an electromagnetic radiation beam onto the substrate 106.

  In some embodiments, the results from the alignment sensor and / or level sensor may be used to modify the pattern provided by the individually addressable element 102. The pattern corrects for example distortions that may be caused by, for example, the optics between the individually addressable element 102 and the substrate 114 (if present), irregularities in the positioning of the substrate 114, non-uniformities in the substrate 114, etc. It may be changed to. Thus, the results from the alignment sensor and / or level sensor may be used to modify the projection pattern to provide a non-linear distortion correction effect. Non-linear distortion correction may be useful, for example, for flexible displays that may not have consistent linearity or non-linear distortion.

  In the operation of the lithographic apparatus 100, the substrate 114 is carried into the substrate table 106 using, for example, a robot handler (not shown). The substrate 114 is then moved under the frame 160 and the individually addressable elements 102 in the X direction. The substrate 114 is measured by the level sensor and / or alignment sensor 150, after which the pattern is exposed using the individually addressable elements 102. For example, the substrate 114 is scanned on the focal plane (image plane) of the projection system 108. At this time, the sub-beam, i.e. the image spot S (see e.g. FIG. 12), is at least partially switched on or completely switched on or off by the patterning device 104. Features corresponding to the pattern of the patterning device 104 are formed on the substrate 114. Individual addressable elements 102 may operate, for example, to provide pixel grid imaging as described herein.

  In some embodiments, the substrate 114 may be fully scanned in the positive X direction and then fully scanned in the negative X direction. In such embodiments, an additional level sensor and / or alignment sensor 150 may be required on the opposite side of the individually addressable element 102 for negative X-direction scanning.

  FIG. 3 shows a schematic top view of a lithographic apparatus for exposing a substrate in the manufacture of eg a flat panel display (eg LCD display, OLED display etc.) according to an embodiment of the invention. Similar to the lithographic apparatus 100 shown in FIG. 2, the lithographic apparatus 100 includes a substrate table 106 that holds a flat panel display substrate 114, a positioning device 116 that moves the substrate table 106 with up to six degrees of freedom, and an individually addressable element 102. An alignment sensor 150 for determining the alignment between the substrate 114 and the level sensor 150 for determining whether the substrate 114 is horizontal with respect to the projection of the pattern from the individually addressable element 102.

  The lithographic apparatus 100 further comprises a plurality of individually addressable elements 102 disposed on the frame 160. In this embodiment, each of the individually addressable elements 102 is a radiant light emitting diode, such as a blue-violet laser diode. As shown in FIG. 3, the individual addressable elements 102 may be arranged in an array of several (at least eight) statically separated individual addressable elements 102 extending in the Y direction. . In certain embodiments, the arrays are substantially stationary, i.e., do not move significantly during projection. Also, in some embodiments, some arrays of individually addressable elements 102 are alternately offset in the X direction from adjacent arrays of individually addressable elements 102. The lithographic apparatus 100 may in particular be configured such that the individually addressable elements 102 provide pixel grid imaging.

  In the operation of the lithography apparatus 100, the panel display substrate 114 is carried into the substrate table 106 using, for example, a robot handler (not shown). The substrate 114 is then moved under the frame 160 and the individually addressable elements 102 in the X direction. The substrate 114 is measured by the level sensor and / or alignment sensor 150, after which the pattern is exposed using the individually addressable elements 102. Individual addressable elements 102 may operate, for example, to provide pixel grid imaging as described herein.

  FIG. 4 shows a schematic top view of a lithographic apparatus used in a roll-to-roll flexible display / electronic device according to an embodiment of the invention. Similar to the lithographic apparatus 100 shown in FIG. 3, the lithographic apparatus 100 comprises a plurality of individually addressable elements 102 arranged in a frame 160. In this embodiment, each of the individually addressable elements 102 is a radiant light emitting diode, such as a blue-violet laser diode. The lithographic apparatus also determines an alignment sensor 150 for determining the alignment between the individually addressable element 102 and the substrate 114 and whether the substrate 114 is horizontal with respect to the projection of the pattern from the individually addressable element 102. Level sensor 150.

  The lithographic apparatus may also include an object holder having an object table 106 on which the substrate 114 is moved. The substrate 114 is flexible and is wound into a roll connected to the positioning device 116. The positioning device 116 may be a motor that rotates the roll. In certain embodiments, the substrate 114 may additionally or alternatively be wound from a roll connected to the positioning device 116, which may be a motor that rotates the roll. . In one embodiment, there are at least two rolls, and the substrate is wound from one to the other where the substrate is wound. In some embodiments, the object table 106 may not be provided, for example, if the substrate 114 is sufficiently rigid between the rolls. Even in such a case, an object holding part (for example, one or a plurality of rolls) may be provided. In certain embodiments, a lithographic apparatus can provide substrate carrierless (eg, carrierless foil (CLF)) and / or roll-to-roll manufacturing. In certain embodiments, the lithographic apparatus can provide sheet to sheet manufacturing.

  In operation of the lithographic apparatus 100, the flexible substrate 114 is wound under and onto the roll 160 and individually addressable elements 102 in the X direction to and / or from the roll. Substrate 114 is measured by level sensor and / or alignment sensor 150, after which the pattern is exposed using individually addressable elements 102. Individual addressable elements 102 may operate, for example, to provide pixel grid imaging as described herein.

  FIG. 5 depicts a schematic top view of a lithographic apparatus having individually addressable elements 102 that are movable according to an embodiment of the invention. Similar to the lithographic apparatus 100 shown in FIG. 2, the lithographic apparatus 100 includes a substrate table 106 that holds a substrate 114, a positioning device 116 that moves the substrate table 106 with up to six degrees of freedom, an individually addressable element 102 and a substrate 114. , And a level sensor 150 for determining whether the substrate 114 is horizontal with respect to the projection of the pattern from the individually addressable element 102.

  The lithographic apparatus 100 further comprises a plurality of individually addressable elements 102 disposed on the frame 160. In this embodiment, each of the individually addressable elements 102 is a radiant light emitting diode, for example a laser diode, for example a violet laser diode. As shown in FIG. 5, the individual addressable elements 102 are an array 200 of several segmented individual addressable elements 102, which may be arranged along the Y direction. Also, in some embodiments, several arrays 200 of individually addressable elements 102 are alternately offset in the X direction from arrays 200 of adjacent individual addressable elements 102. The lithographic apparatus 100 may in particular be configured such that the individually addressable elements 102 provide pixel grid imaging. However, in certain embodiments, it is not essential for lithographic apparatus 100 to provide pixel grid imaging. Rather, the lithographic apparatus 100 projects the diode radiation onto the substrate so as to form a substantially continuous image for projection onto the substrate, rather than forming individual pixels for projection onto the substrate. May be.

  In some embodiments, one or more of the plurality of individually addressable elements 102 includes an exposure area in which one or more individual addressable elements are used to project all or a portion of the beam 110; Outside the exposure area, one or more individually addressable elements are movable between where no beam 110 is projected. In one embodiment, the one or more individually addressable elements 102 are turned on or at least partially turned on in the exposure area 204 (light shaded area in FIG. 5) (ie, the element emits radiation). Emitting), a radiation emitting device that is switched off (ie, the element does not emit radiation) when located outside the exposure area 204.

  In some embodiments, the one or more individually addressable elements 102 are radiation emitting devices that can be switched on inside and outside the exposure area 204. In such a situation, one or more individually addressable elements 102 may be switched on outside exposure area 204 to provide a compensated exposure. Compensated exposure occurs, for example, when radiation is not properly projected at the exposure area 204 by one or more individually addressable elements 102. For example, referring to FIG. 5, one or more individual addressable elements 102 on the opposite side of the exposure area 204 in one array may correct a failed or incorrect radiation projection at the exposure area 204. It may be switched on.

  In some embodiments, the exposure area 204 is an elongated line. In some embodiments, the exposure area 204 is a one-dimensional array of one or more individually addressable elements 102. In some embodiments, the exposure area 204 is a two-dimensional array of one or more individually addressable elements 102. In some embodiments, the exposure area 204 is elongated.

  In some embodiments, each of the movable individually addressable elements 102 can be moved separately and need not be movable together as a unit.

  In some embodiments, the one or more individually addressable elements are movable in a direction that intersects the propagation direction of the beam 110 at least during projection of the beam 110 and are moved in use. For example, in one embodiment, the one or more individually addressable elements 102 are radiation emitting devices that move in a direction substantially perpendicular to the propagation direction of the beam 110 during the projection of the beam 110.

  In one embodiment, each of the arrays 200 is a laterally displaceable plate and includes a plurality of spatially separated individual addressable elements 102 arranged along the plate, as shown in FIG. Have. In use, each plate translates along direction 208. In use, the timing of movement is appropriately adjusted so that the individually addressable element 102 is positioned in the exposure area 204 (indicated by the dark shaded area in FIG. 6), thereby projecting all or part of the beam 110. Is done. For example, in one embodiment, the one or more individually addressable elements 102 are emissive light emitting devices, and the on / off switching of the individual addressable elements 102 is such that the one or more individual addressable elements 102 are exposed to the exposure area 204. The timing is adjusted so that it is switched on when it is at and off when it is outside the exposure area 204. For example, in FIG. 6A, a plurality of two-dimensional arrays 200 of emissive light emitting diodes are moved in a direction 208 (two arrays are in a positive direction 208 and an intermediate array between the two arrays is negative). Direction 208). The on / off switching of the radiating light emitting diodes 102 is timed so that one radiating light emitting diode 102 of each array 200 is switched on when in the exposure area 204 and switched off when outside the area 204. Of course, the array 200 moves in the opposite direction (ie, the two arrays are in the negative direction 208 and the middle array of the two arrays is in the positive direction 208) when, for example, the end of the travel range of the array 200 is reached. can do. In some other embodiments, in FIG. 6B, a plurality of interleaved radiating light emitting diode one-dimensional arrays 200 are moved in direction 208 (the positive direction 208 and the negative direction 208 alternate. Is). The on / off switching of the radiating light emitting diodes 102 is timed so that one radiating light emitting diode 102 of each array 200 is switched on when in the exposure area 204 and switched off when outside the area 204. Of course, the array 200 can move in the opposite direction. In certain other embodiments, in FIG. 6C, a single emitting light emitting diode array 200 (shown in one dimension, but not required) is moved in direction 208. The on / off switching of the radiating light emitting diodes 102 is timed so that one radiating light emitting diode 102 of each array 200 is switched on when in the exposure area 204 and switched off when outside the area 204.

  In one embodiment, each array 200 is a rotatable plate and has a plurality of spatially separated individual addressable elements 102 arranged around the plate. In use, each plate rotates about its own axis 206, for example, in the direction indicated by the arrow in FIG. That is, the array 200 may rotate alternately in the clockwise and counterclockwise directions as shown in FIG. Alternatively, each of the arrays 200 may rotate clockwise or may rotate counterclockwise. In some embodiments, the array 200 rotates all around. In some embodiments, the array 200 rotates an arc that is less than the entire circumference. In some embodiments, the array 200 may rotate about an axis extending in the X or Y direction, for example, when the substrate scans in the Z direction. In one embodiment, referring to FIG. 6D, the individually addressable elements 102 of the array 200 may be arranged at the ends and projected radially toward the substrate 114. The substrate 114 may extend around at least a portion of the side of the array 200. In this case, the array 200 rotates around an axis extending in the X direction, and the substrate 114 moves in the X direction.

  In use, the motion of the individually addressable element 102 is appropriately timed so that it is positioned in the exposure area 204 to project all or part of the beam 110. For example, in one embodiment, the one or more individually addressable elements 102 are emissive light emitting devices, and the on / off switching of the individual addressable elements 102 is such that the one or more individual addressable elements 102 are exposed to the exposure area 204. The timing is adjusted so that it is switched on when it is at and off when it is outside the zone 204. Thus, in some embodiments, all of the luminescent devices 102 may be kept on during movement, and then some of the luminescent devices 102 may be modulated off at the exposure area 204. A suitable shield outside the exposure area 204 between the radiation emitting device 102 and the substrate may be required to shield the exposure area 204 from the radiation emitting device 102 switched on outside the exposure area 204. unknown. Consistently turning on the luminescent device 102 helps to bring the luminescent device 102 to a substantially uniform temperature during use. In certain embodiments, the luminescent device 102 is kept off for most of the time, and one or more of the luminescent devices 102 may be switched on in the exposure area 204.

  In some embodiments, the rotatable plate may have the configuration shown in FIG. For example, FIG. 7A shows a schematic top view of a rotatable plate. The rotatable plate may have an array 200 having multiple sub-arrays 210 of individual addressable elements 102 arranged around the plate (the rotatable plate of FIG. 5 is an individual addressable element arranged around the plate. (Compare to schematically show one array 200 of 102). The subarray 210 shown in FIG. 7A is offset from one another such that one individual addressable element 102 of one subarray 210 is between two individual addressable elements 102 of another subarray 210. However, the individually addressable elements 102 of the subarray 210 may be aligned with each other. The individually addressable elements 102 may be rotated individually or together by the motor 216 about the axis (in this example, about the axis passing through the motor 216 in the Z direction in FIG. 7A). The motor 216 may be attached to a rotatable plate and connected to a frame (eg, frame 160), or may be attached to a frame (eg, frame 160) and connected to the rotatable plate. In some embodiments, the motors 216 (or any motors located elsewhere, for example) may be separate or together, but individually addressable elements 102. Other movements may be brought about. For example, the motor 216 may provide translation of one or more individually addressable elements 102 in the X, Y, and / or Z directions. Additionally or alternatively, the motor 216 may provide rotation (ie, Rx motion and / or Ry motion) of the one or more individually addressable elements 102 about the X and / or Y direction.

  In one embodiment of the rotatable plate, the rotatable plate has an opening 212 in its central region and is arranged in the plate outside the opening 212, as shown in a schematic top view in FIG. There may be an array 200 of individually addressable elements 102. Thus, for example, the rotatable plate may form an annular disk having an array 200 of individually addressable elements 102 arranged around the disk, as shown in FIG. 7B. Providing openings reduces the weight of the rotatable plate and / or helps cool the individually addressable elements 102.

  In some embodiments, the rotatable plate may be supported at the outer periphery using a support 214. The support 214 may be a bearing such as a roller bearing or a gas bearing. Rotated by motor 216 as shown in FIG. 7A (and / or other motion, eg, translation in X, Y, and / or Z direction, and / or Rx motion and / or Ry motion) May be provided. Additionally or alternatively, the support 214 rotates the individually addressable element 102 about axis A (and / or other movements, such as translation in the X, Y, and / or Z directions, and (Or provide a Rx motion and / or Ry motion).

  In some embodiments, referring to FIGS. 7D and 7E, a rotatable plate having an array 200 of individually addressable elements 102 may be attached to the rotatable structure 218. . The rotatable structure 218 may be rotated about the axis B by the motor 220. The rotatable plate may be rotated with respect to the rotatable structure 218 by a motor 216 (a motor that rotates the rotatable plate around the axis A). In an embodiment, as shown in FIGS. 7D and 7E, the rotation axes A and B are not coincident and are spatially separated. In one embodiment, the rotation axes A and B are substantially parallel to each other. In use during exposure, both the rotatable structure 218 and the rotatable plate rotate. This rotation may be coordinated so that the individually addressable elements 102 can be substantially aligned in the exposure area 204. This can be compared, for example, with the embodiment of FIG. 5 where the individually addressable elements 102 cannot be substantially linear in the exposure area 204.

  By having the movable individually addressable elements described above, the number of individually addressable elements can be reduced by moving the individually addressable elements to the exposure area 204 when necessary. Therefore, the heat load can be reduced.

  In some embodiments, a greater number of moveable individually addressable elements may be provided than is theoretically required (eg, on a rotatable plate). A potential advantage of such a configuration is that if one or more moveable individually addressable elements are broken or inoperable, one or more other moveable individually addressable elements can be used instead. It is in. Additionally or alternatively, an extra movable individually addressable element can be advantageous for thermal load control of the individually addressable element. This is because the greater the number of movable individually addressable elements, the greater the chance that the movable individually addressable elements will be cooled outside the exposure area 204.

  In one embodiment, the movable individually addressable element 102 is embedded in a material with low thermal conductivity. For example, the material may be a ceramic, such as cordierite or cordierite-based ceramic, and / or a zerodur ceramic. In one embodiment, the movable individually addressable element 102 is embedded in a material having high thermal conductivity, such as a metal, such as a relatively light metal, such as aluminum or titanium.

  In some embodiments, the array 200 may include a temperature control configuration. For example, referring to FIG. 7F, the array 200 has a fluid (eg, liquid) conduit 222 for transporting cooling fluid that cools the array into contact with, in proximity to, or through the array 200. May be. The conduit 222 may be connected to a suitable heat exchanger and pump 228 for circulating fluid through the conduit. A supply 224 and a return 226 connected between the conduit 222 and the heat exchanger and pump 228 assist in fluid circulation and temperature control. A sensor 234 may be provided inside, on or near the array to measure certain parameters of the array 200 and the measurement results may be used to control the temperature of the fluid flow supplied by, for example, a heat exchanger and pump. Good. In some embodiments, the sensor 234 may be used to measure the expansion and / or contraction of the body of the array 200 and the measurement results to control the temperature of the fluid flow supplied by the heat exchanger and pump. . Such expansion and / or contraction can be a substitute for temperature. In some embodiments, sensor 234 may be integrated into array 200 (as sensor 234 is illustrated as a dot) or from array 200 (as sensor 234 is illustrated as a box). It may be separated. The sensor 234 separated from the array 200 may be an optical sensor.

  In one embodiment, referring to FIG. 7G, the array 200 may have one or more fins 230 to increase the surface area for heat dissipation. The fins 230 may be on the top surface of the array 200 and / or the side surfaces of the array 200, for example. Optionally, one or more additional fins 232 may be provided to cooperate with the fins 230 to facilitate heat dissipation. For example, the fins 232 may absorb heat from the fins 230 and may include a heat exchanger / pump associated with a fluid (eg, liquid) conduit similar to that shown and described with respect to FIG. Good.

  In some embodiments, referring to FIG. 7H, the array 200 may be disposed at or near the fluid confinement structure 236. The fluid confinement structure 236 is configured to maintain the fluid 238 in contact with the array 200 body to facilitate heat dissipation by the fluid 238. In certain embodiments, the fluid 238 may be a liquid, such as water. In some embodiments, the fluid confinement structure 236 provides a seal with the array 200 body. In some embodiments, the seal may be a non-contact seal provided by, for example, gas flow or capillary force. In certain embodiments, fluid 238 circulates to enhance heat dissipation, similar to that described with respect to fluid conduit 222. The fluid 238 may be supplied by the fluid supply device 240.

In one embodiment, referring to FIG. 7H, the array 200 is configured to project fluid 238 toward the array 200 body to facilitate heat dissipation by the fluid 238. It may be arranged at 240 or in the vicinity thereof. In some embodiments, fluid 238 is a gas, such as clean dry air, N ₂ , an inert gas, or the like. Although FIG. 7H illustrates the fluid confinement structure 236 and the fluid supply device 240 together, they need not be provided together.

  In certain embodiments, the array 200 body is a substantially solid structure, for example, having a cavity for the fluid conduit 222. In one embodiment, the array 200 body is a substantially frame-type structure that is largely open and to which various components such as individually addressable elements 102 and fluid conduits 222 are attached. This open structure facilitates gas flow and / or increases surface area. In certain embodiments, the array 200 body has a plurality of cavities that penetrate into or penetrate the body to facilitate gas flow and / or to increase surface area. It is a solid structure.

  Although cooling is provided in the above-described embodiments, heating may be provided instead or in addition thereto.

  In some embodiments, the array 200 is desirably maintained at a substantially constant steady state temperature during exposure use. Thus, for example, all or many individually addressable elements 102 of array 200 are powered on prior to exposure to reach or near the desired steady state temperature and the array is maintained to maintain the steady state temperature during exposure. Any one or more temperature control configurations may be used to cool and / or heat 200. In certain embodiments, any one or more temperature control arrangements may be used to heat the array 200 prior to exposure to reach or near the desired steady state temperature. Thus, during exposure, any one or more temperature control arrangements may be used to cool and / or heat the array 200 to maintain a steady state temperature. Measurement results from sensor 234 may be used for feedforward or feedback to maintain steady state temperature. In some embodiments, each of the plurality of arrays 200 may have the same steady state temperature, or one of the plurality of arrays 200 or one of the plurality of arrays 200 may be the other of the plurality of arrays 200. One or more arrays 200 may have different steady state temperatures. In certain embodiments, the array 200 is heated above a desired steady state temperature and then cooled by any of one or more temperature control configurations and / or below a desired steady state temperature. However, since the individual addressable element 102 is not used to such an extent that the temperature is kept high, the temperature is lowered during the exposure.

  In some embodiments, the number of array 200 bodies is increased along and / or across the exposure area to improve temperature control and overall cooling. Therefore, for example, instead of the four arrays 200 shown in FIG. 5, five, six, seven, eight, nine, ten, or more arrays 200 may be provided. There may be fewer arrays, eg, one array 200, in which case a single large array may span the entire width of the substrate.

  In certain embodiments, the lens arrays described herein are associated with or integrated with movable individually addressable elements. For example, a lens array plate may be attached to each of the movable arrays 200 and movable (eg, rotatable) with the individually addressable elements 102. As described above, the lens array plate may be displaceable (eg, in the Z direction) relative to the individually addressable element 102. In some embodiments, a plurality of lens array plates may be provided in one array 200 and each of the lens array plates may be associated with a separate subset of the plurality of individually addressable elements 102.

  In one embodiment, referring to FIG. 7 (I), a single individual lens 242 is mounted in front of each individual addressable element 102 and is movable with that individual addressable element 102 (eg, axis A). It can be rotated around). Also, the lens 242 may be displaceable (eg, in the Z direction) relative to the individually addressable element 102 by using an actuator 244. In one embodiment, referring to FIG. 7J, the individually addressable element 102 and the lens 242 may be displaced together relative to the body 246 of the array 200 by an actuator 244. In some embodiments, the actuator 244 is configured only to displace the lens 242 (ie, relative to or with the individual addressable element 102) in the Z direction.

  In some embodiments, the actuator 244 is configured to displace the lens 242 with a maximum of three degrees of freedom (Z direction, rotation about the X axis, and / or rotation about the Y axis). In some embodiments, the actuator 244 is configured to displace the lens 242 with a maximum of 6 degrees of freedom. If the lens 242 is movable relative to the individually addressable element 102, the lens 242 may be moved by the actuator 244 to change the focal position of the lens 242 relative to the substrate. When the lens 242 is movable with the individually addressable element 102, the focal position of the lens 242 is substantially constant but displaced with respect to the substrate. In some embodiments, the movement of the lens 242 is controlled individually for each lens 242 associated with each individual addressable element 102 of the array 200. In some embodiments, a subset of the plurality of lenses 242 can move together relative to or with an associated subset of the plurality of individually addressable elements 102. In the latter case, focus control accuracy may be sacrificed to reduce data overhead and / or speed response. In some embodiments, the size of the radiation spot provided by an individual addressable element 102 may be adjusted by defocusing. That is, the spot size increases with defocusing.

  In one embodiment, referring to FIG. 7 (K), an aperture structure 248 having an aperture on the inside may be disposed below the lens 242. In some embodiments, the aperture structure 248 may be disposed above the lens 242 and between the lens 242 and the associated individually addressable element 102. Aperture structure 248 can limit the diffractive effects of lens 242, associated individually addressable element 102, and / or adjacent lens 242 / individually addressable element 102.

  In some embodiments, the individually addressable element 102 may be a radiant light emitting device such as a laser diode. Speckle can be a problem because this radiation-emitting device can have high spatial coherence. In order to avoid such speckle problems, the radiation emitted by the radiation-emitting device should be scrambled by shifting the phase of one beam part relative to the other beam part. In one embodiment, referring to FIGS. 7L and 7M, the plate 250 is disposed, for example, in the frame 160 and the individually addressable element 102 moves relative to the plate 250. As the individually addressable element 102 moves upward relative to the plate 250, the plate 250 disturbs the spatial coherence of the radiation emitted by the individual addressable element 102 to the substrate. In one embodiment, as the individual addressable element 102 moves over it relative to the plate 250, the plate 250 is disposed between the lens 242 and the associated individual addressable element 102. In some embodiments, the plate 250 may be disposed between the lens 242 and the substrate.

  In some embodiments, referring to FIG. 7N, a spatial coherence disruption device 252 may be disposed between the substrate and at least the individually addressable element 102 that projects radiation onto the exposure area. Good. In certain embodiments, the spatial coherence disruption device 252 may be disposed between the individually addressable element 102 and the lens 242 and attached to the body 246. In some embodiments, the spatial coherence disruption device 252 is a phase modulator, a vibrating plate, or a rotating plate. As the individual addressable element 102 projects radiation onto the substrate, the spatial coherence destruction device 252 disturbs the spatial coherence of the radiation emitted by the individual addressable element 102.

  In certain embodiments, the lens array (together as a unit or as individual lenses) preferably promotes heat transfer from the lens array to the array 200, thereby advantageously providing cooling. It is attached to the array 200 via a material having high thermal conductivity.

  In some embodiments, the array 200 may include one or more focus sensors or level sensors 254 similar to the level sensor 150. For example, the sensor 254 may be configured to measure focus for each individual addressable element 102 of the array 200 or for a plurality of individual addressable elements 102 of the array 200. Accordingly, the focus may be corrected for each individual addressable element 102 of the array 200 or for a plurality of individual addressable elements 102 of the array 200 when an out-of-focus condition is detected. For example, the focus may be corrected by moving the lens 242 in the Z direction (and / or around the X axis and / or around the Y axis).

  In some embodiments, the sensor 254 is integrated into an individual addressable element 102 (or may be integrated into multiple individual addressable elements 102 of the array 200). Referring to FIG. 7 (O), a schematic of an exemplary sensor 254 is shown. Focus detection beam 256 is directed (eg, reflected) from the substrate, passes through lens 242, and is directed to detector 262 by translucent mirror 258. In some embodiments, focus detection beam 256 is radiation used for exposure and may be redirected at the substrate. In an embodiment, the focus detection beam 256 may be a beam 256 in which a dedicated beam directed to the substrate is redirected on the substrate. A knife edge 260 (which may also be an aperture) is in the path of the beam 256 just before the beam 256 is incident on the detector 262. In this example, detector 262 comprises at least two radiation sensitive portions (eg, regions or detectors), as illustrated by the division of detector 262 in FIG. When the substrate is in focus, a sharp image is formed at the edge 260 and the radiation sensitive portion of the detector 262 receives an equal amount of radiation. When the substrate is out of focus, the beam 256 will shift and an image will be formed in front of or behind the edge 260. As such, the edge 260 blocks one portion of the beam 256 and one radiation sensitive portion of the detector 262 receives a smaller amount of radiation than the other radiation sensitive portion. By comparing the output signals from the radiation sensitive part of the detector 262, it is possible to obtain how much and in what direction the substrate surface where the orientation of the beam 256 is changed differs from the desired position. The signal may be processed electronically to generate, for example, a control signal that adjusts the lens 242. The mirror 258, the edge 260, and the detector 262 may be mounted on the array 200. In some embodiments, detector 262 may be a quad cell.

  In one embodiment, there may be 400 individually addressable elements 102 that have 133 active at any given moment. In some embodiments, 600 to 1200 operating individually addressable elements 102 may optionally include additional individually addressable elements 102, eg, for spare and / or correction exposures (eg, as described above). In addition, it may be provided. The number of individually addressable elements 102 that operate may depend, for example, on the resist. This is because a certain radiation dose is required for patterning. If the individual addressable element 102 is rotatable, the individual addressable element 102 may be rotated at a frequency of 6 Hz with 1200 individual addressable elements 102 operating. A small number of individually addressable elements 102 can be rotated at a high frequency, and a large number of individually addressable elements 102 can be rotated at a low frequency.

  In some embodiments, the number of individually addressable elements 102 can be reduced compared to an array of individually addressable elements 102 by using movable individual addressable elements 102. For example, 600 to 1200 individually addressable elements 102 that operate (at any one time) are provided. It can also produce results that are substantially similar to an array of individually addressable elements 102 at a reduced number, with one or more advantages. For example, an array of 100,000 diodes (eg, arranged in 200 × 500) may be required to obtain sufficient exposure capability using blue-violet diodes. When operating at a frequency of 10 kHz, the optical power per laser diode can be 0.33 mW. The power per laser diode may be 150 mW = 35 mA × 4.1V. Then, the power for the array can be 15 kW. In some embodiments using movable individually addressable elements, 400 blue-violet diodes (of which 133 are active) may be provided. When operating at a frequency of 9 MHz, the optical power per laser diode can be 250 mW. The power per laser diode may be 1000 mW = 240 mA × 4.2V. Then the power for the array can be 133W. Accordingly, the movable individually addressable element configuration of the diode is operated at the gradient portion of the output optical power versus forward current curve (240 mA vs. 35 mA) as illustrated in FIG. While increasing power (250 mW vs. 0.33 mW), power for multiple individually addressable elements can be reduced (133 W vs. 15 kW). Therefore, the diode can be used more efficiently, and the power consumption and / or heat generation can be reduced.

  Thus, in one embodiment, the diode is operated on the slope portion of the power / forward current curve. Operating in the non-gradient part of the power / forward current curve can lead to radiation incoherence. In some embodiments, the diode is operated with optical power greater than 5 mW and less than or equal to 20 mW, or less than or equal to 30 mW, or less than or equal to 40 mW. In some embodiments, the diode is not operated with optical power above 300 mW. In some embodiments, the diode is operated in single mode rather than multimode.

  Factors that determine the number of individually addressable elements 102 on an array 200 include, among other things (with respect to the ranges described above) the length of the exposure area that the array 200 is intended to cover, the speed at which the array moves during exposure. The spot size (ie, the cross-sectional dimension of a spot projected from one individual addressable element 102 onto the substrate, eg, width / diameter), the desired intensity that each individual addressable element 102 should provide (eg, resist on the substrate or substrate) Whether it is desired to provide the intended dose to the spot on the substrate across multiple individually addressable elements to avoid damage to the substrate), desired substrate scanning speed, cost considerations, and individually addressable elements The frequency to be switched on and off, the requirement for redundant individually addressable elements 102 (eg, For positive, or, for example, one or more individual addressable elements is as a reserve) in the case of failure. In some embodiments, the array 200 includes at least 100 individually addressable elements 102, such as at least 200 individually addressable elements, at least 400 individually addressable elements, at least 600 individually addressable elements, It comprises 1000 individually addressable elements, at least 1500 individually addressable elements, at least 2500 individually addressable elements, or at least 5000 individually addressable elements. In some embodiments, the array 200 includes less than 50000 individually addressable elements 102, eg, less than 25000 individually addressable elements, less than 15000 individually addressable elements, less than 10000 individually addressable elements, 7500 Less than 5,000 individually addressable elements, less than 5000 individually addressable elements, less than 2500 individually addressable elements, less than 1200 individually addressable elements, less than 600 individually addressable elements, or less than 300 individual addresses An addressable element is provided.

  In one embodiment, the array 200 has at least 100 individual addresses for every 10 cm of exposure area length (ie, normalizing the number of individual addressable elements of an array to 10 cm of exposure area length). Possible elements 102, for example at least 200 individually addressable elements, at least 400 individually addressable elements, at least 600 individually addressable elements, at least 1000 individually addressable elements, at least 1500 individually addressable elements, At least 2500 individually addressable elements or at least 5000 individually addressable elements. In one embodiment, the array 200 is less than 50000 individual addresses every 10 cm of exposure area length (ie, normalizing the number of individual addressable elements of an array to 10 cm of exposure area length). Possible elements 102, for example less than 25000 individually addressable elements, less than 15000 individually addressable elements, less than 10000 individually addressable elements, less than 7500 individually addressable elements, less than 5000 individually addressable elements, Less than 2500 individually addressable elements, less than 1200 individually addressable elements, less than 600 individually addressable elements, or less than 300 individually addressable elements.

  In some embodiments, the array 200 is less than 75%, such as 67% or less, 50% or less, about 33% or less, 25% or less, 20% or less, 10% or less, or 5 % Of redundant individually addressable elements 102. In some embodiments, the array 200 includes at least 5%, such as at least 10%, at least 25%, at least 33%, at least 50%, or at least 65% redundant, individually addressable elements 102. Is provided. In one embodiment, the array comprises about 67% redundant individually addressable elements.

  In some embodiments, the spot size on a substrate by an individual addressable element is 10 microns or less, 5 microns or less, such as 3 microns or less, 2 microns or less, 1 micron or less, 0.5 microns or less,. 3 microns or less, or about 0.1 microns. In some embodiments, the spot size on the substrate by an individual addressable element is 0.1 microns or greater, 0.2 microns or greater, 0.3 microns or greater, 0.5 microns or greater, 0.7 microns or greater. 1 micron or more, 1.5 microns or more, 2 microns or more, or 5 microns or more. In some embodiments, the spot size is about 0.1 microns. In some embodiments, the spot size is about 0.5 microns. In some embodiments, the spot size is about 1 micron.

  In the operation of the lithographic apparatus 100, the substrate 114 is carried into the substrate table 106 using, for example, a robot handler (not shown). The substrate 114 is then moved under the frame 160 and the individually addressable elements 102 in the X direction. The substrate 114 is measured by a level sensor and / or alignment sensor 150, after which the pattern is exposed using the individual addressable elements 102 described above. Individual addressable elements 102 may operate, for example, to provide pixel grid imaging as described herein.

  FIG. 8 shows a schematic side view of a lithographic apparatus according to an embodiment of the invention. As shown in FIG. 8, the lithographic apparatus 100 includes a patterning device 104 and a projection system 108. The projection system 108 includes two lenses 176 and 172. The first lens 176 is arranged to receive the modulated radiation beam 110 from the patterning device 104 and focus it through the contrast aperture of the aperture stop 174. Another lens (not shown) may be disposed in the aperture. The radiation beam 110 then diverges and is focused by a second lens 172 (eg, a field lens).

  Projection system 108 further comprises an array 170 of lenses arranged to receive the modulated radiation beam 110. Each portion of the modulated radiation beam 110 corresponds to one or more individually controllable elements of the patterning device 104, where one portion of the beam 110 passes through a lens in the lens array 170 and another portion of the beam 110. Goes through another lens. Each lens focuses a corresponding portion of the modulated radiation beam 110 onto a point located on the substrate. Thus, the array of radiation spots S (see FIG. 12) is exposed on the substrate. Although only five lenses are shown in the illustrated lens array 170, it should be understood that the lens array may comprise hundreds or thousands of lenses (the same is the individual control used as the patterning device 104). This also applies to possible elements).

  As shown in FIG. 8, a free working distance FWD is provided between the substrate 114 and the lens array 170. This distance allows the substrate 114 and / or the lens array 170 to move, for example for focus correction. In some embodiments, the free working distance is in the range of 1 mm to 3 mm, for example about 1.4 mm. The individually addressable elements of the patterning device 104 are arranged at a pitch P, and the associated pitch P is applied to the image spot on the substrate 114. In some embodiments, lens array 170 can provide a NA of 0.15 or 0.18. In one embodiment, the image spot size is approximately 1.6 μm.

  In this embodiment, the projection system 108 may be an equal magnification projection system, and the image spot arrangement interval on the substrate 114 is the same as the pixel arrangement interval of the patterning device 104. In order to obtain improved resolution, the image spot may be significantly smaller than the pixels of the patterning device 104.

  FIG. 9 shows a schematic side view of a lithographic apparatus according to an embodiment of the invention. In this embodiment, there is no optical system between the patterning device 104 and the substrate 114 other than the lens array 170.

  The lithographic apparatus 100 of FIG. 9 includes a patterning device 104 and a projection system 108. In this case, the projection system 108 comprises only an array 170 of lenses arranged to receive the modulated radiation beam 110. Each portion of the modulated radiation beam 110 corresponds to one or more individually controllable elements of the patterning device 104, where one portion of the beam 110 passes through a lens in the lens array 170 and another portion of the beam 110. Goes through another lens. Each lens focuses a corresponding portion of the modulated radiation beam 110 onto a point located on the substrate. Thus, the array of radiation spots S (see FIG. 12) is exposed on the substrate. Although only five lenses are shown in the illustrated lens array 170, it should be understood that the lens array may comprise hundreds or thousands of lenses (the same is the individual control used as the patterning device 104). This also applies to possible elements).

  Similar to FIG. 8, a free working distance FWD is provided between the substrate 114 and the lens array 170. This distance allows the substrate 114 and / or the lens array 170 to move, for example for focus correction. The individually addressable elements of the patterning device 104 are arranged at a pitch P, and the associated pitch P is applied to the image spot on the substrate 114. In some embodiments, lens array 170 can provide a NA of 0.15. In one embodiment, the image spot size is approximately 1.6 μm.

  FIG. 10 shows a schematic side view of a lithographic apparatus that uses the movable individually addressable elements 102 described with reference to FIG. 5 according to an embodiment of the invention. In this embodiment, there is no optical system between the patterning device 104 and the substrate 114 other than the lens array 170.

  The lithographic apparatus 100 of FIG. 10 includes a patterning device 104 and a projection system 108. In this case, the projection system 108 comprises only an array 170 of lenses arranged to receive the modulated radiation beam 110. Each portion of the modulated radiation beam 110 corresponds to one or more individually controllable elements of the patterning device 104, where one portion of the beam 110 passes through a lens in the lens array 170 and another portion of the beam 110. Goes through another lens. Each lens focuses a corresponding portion of the modulated radiation beam 110 onto a point located on the substrate. Thus, the array of radiation spots S (see FIG. 12) is exposed on the substrate. Although only five lenses are shown in the illustrated lens array 170, it should be understood that the lens array may comprise hundreds or thousands of lenses (the same is the individual control used as the patterning device 104). This also applies to possible elements).

  Similar to FIG. 8, a free working distance FWD is provided between the substrate 114 and the lens array 170. This distance allows the substrate 114 and / or the lens array 170 to move, for example for focus correction. The individually addressable elements of the patterning device 104 are arranged at a pitch P, and the associated pitch P is applied to the image spot on the substrate 114. In some embodiments, lens array 170 can provide a NA of 0.15. In one embodiment, the image spot size is approximately 1.6 μm.

  FIG. 11 shows a plurality of individually addressable elements 102, specifically six individually addressable elements 102. In this embodiment, each individually addressable element 102 is a radiant light emitting diode, such as a blue-violet laser diode. Each emitting light-emitting diode bridges two wires that supply current to the diode for control of the diode. The diode thus forms an addressable lattice. The width between the two wires is approximately 250 μm, and the light emitting diodes have a pitch of approximately 500 μm.

  FIG. 12 is a diagram schematically showing how a pattern is generated on the substrate 114. Black circles in the figure indicate the arrangement of spots S projected on the substrate 114 by the lens array MLA of the projection system 108. The substrate 114 moves in the X direction with respect to the projection system 108 as exposure on the substrate proceeds. White circles in the figure indicate exposure spots SE that have already been exposed on the substrate. As shown in the drawing, an exposure spot row R is exposed on the substrate by each spot projected onto the substrate by the lens array 170 of the projection system 108. A pattern is completely formed on the substrate 114 by combining all the exposure spot rows R exposed by the spots S. Such a method is often referred to as “pixel grid imaging”. Since FIG. 12 is a schematic diagram, it should be understood that the spots S may actually overlap.

  A state in which the array of radiation spots S is arranged at an angle θ with respect to the substrate 114 is shown (the ends of the substrate 114 are parallel to the X direction and the Y direction, respectively). This is because when the substrate 114 moves in the scanning direction (X direction), each radiation spot passes through a different region of the substrate. As a result, the entire region of the substrate is covered by the arrangement of the radiation spots S. In some embodiments, the angle θ is at most 20 °, 10 °, for example at most 5 °, at most 3 °, at most 1 °, at most 0.5 °, at most 0. .25 °, at most 0.10 °, at most 0.05 °, or at most 0.01 °. In some embodiments, the angle θ is at least 0.0001 °, such as at least 0.001 °. The tilt angle θ and the array width in the scanning direction are determined according to the image spot size and the array spacing in the direction perpendicular to the scanning direction to ensure that the entire surface area of the substrate 114 is processed.

  FIG. 13 is a diagram schematically showing how the entire substrate 114 is exposed in one scan using a plurality of optical engines. Each optical engine comprises one or more individually addressable elements. Eight arrays SA of radiation spots S (not shown) are formed by eight optical engines. The optical engine is configured so as to be like a chess board or so that the end of one array of radiation spots S is slightly shifted from the end of the array of adjacent radiation spots S. Is arranged. In some embodiments, the optical engines are arranged in at least 3 rows, for example 4 rows or 5 rows. In this way, the radiation band extends across the width of the substrate W, and exposure of the entire substrate is realized in one scan. This “full width” single pass exposure helps to avoid stitching problems that arise when connecting two or more passes, and requires the substrate to be moved in a direction that intersects the substrate pass direction. It is also possible to reduce the apparatus footprint in that there is no problem. It should be understood that any suitable number of optical engines may be used. In some embodiments, the number of optical engines is at least one, for example at least 2, at least 4, at least 8, at least 10, at least 12, at least 14, or at least 17. In some embodiments, the number of optical engines is less than 40, such as less than 30 or less than 20. Each optical engine may comprise a separate patterning device 104 as described above and optionally a projection system 108 and / or a radiation system. However, it should also be understood that two or more optical engines may share at least a portion of one or more radiation systems, patterning device 104, and / or projection system.

  In the embodiment described herein, a controller is provided for controlling the individually addressable elements. For example, in embodiments where the individually addressable elements are emissive light emitting devices, the controller may control when the individually addressable elements are switched on or off to allow high frequency modulation of the individually addressable elements. . The controller may control the power of radiation emitted by one or more individually addressable elements. The controller may modulate the intensity of the radiation emitted by one or more individually addressable elements. The controller may control or adjust intensity uniformity across all or part of the individually addressable element array. The controller may adjust the radiation output of the individually addressable elements to correct for imaging errors (eg etendue and optical aberrations (eg coma, astigmatism, etc.)).

  In lithography, desired features can be generated on a substrate by selectively exposing the resist layer on the substrate with radiation, for example, by exposing the resist layer with patterned radiation. A chemical reaction occurs in the resist region that receives a certain minimum radiation dose (dose threshold), while the other regions remain unchanged. Thus, development of the resist is allowed by the chemical difference generated in the resist layer. That is, at least one of the region that has received the minimum dose and the region that has not received the minimum dose can be selectively removed. As a result, a portion of the substrate is still protected by the resist while the substrate area from which the resist has been removed is exposed, for example allowing further processing steps. For example, selective etching of a substrate, selective metal film formation, and the like. In this way, the desired features are generated. Giving a pattern to the radiation may be effected by setting individually controllable elements of the patterning device. In other words, the intensity of the radiation transmitted to the resist layer region inside the desired feature on the substrate is set so as to be substantially higher during the exposure to receive a radiation dose amount exceeding the dose threshold in that region. The On the other hand, other regions on the substrate receive a radiation dose below the dose threshold by setting the corresponding individually controllable element to provide zero or significantly lower radiation intensity.

  In practice, the radiation dose at the desired feature edge does not change abruptly from a given maximum dose to zero. Even if the individually controllable elements are set so that the radiation intensity to one side of the feature boundary is maximized and the radiation intensity to the other side of the feature boundary is minimized It does not change. This is because the magnitude of the radiation dose decreases through the transition section due to the influence of diffraction. The boundary position of the desired feature is finally formed by developing the resist. The boundary position is determined by the position where the irradiated dose amount falls below the radiation dose threshold value. The dose reduction profile in this transition zone, and hence the exact location of the feature boundary, can be controlled more precisely by setting individually controllable elements that emit radiation to each point on or near the feature boundary. It will be possible. Therefore, not only the maximum or minimum value of the intensity level is controlled, but also the intensity level between the maximum value and the minimum value is controlled. This is usually called “gray scaling” or “gray leveling”.

  Gray scaling can improve the control of feature boundary positions over a lithographic system in which a given individually controllable element provides only binary radiation intensity (ie, maximum and minimum) to a substrate. it can. In some embodiments, at least three different radiant intensity values, such as at least four radiant intensity values, at least eight radiant intensity values, at least sixteen radiant intensity values, at least thirty two radiant intensity values, Sixty-four radiant intensity values, at least 100 radiant intensity values, at least 128 radiant intensity values, or at least 256 radiant intensity values may be projected onto the substrate. If the patterning device itself is a radiation source (eg, an array of light emitting diodes or laser diodes), for example, controlling the intensity level of the emitted radiation may result in gray scaling. If the contrast device is a micromirror device, gray scaling may be provided, for example, by controlling the tilt angle of the micromirror. Grouping a plurality of programmable elements in a contrast device and controlling the number of elements that can be turned on or off at a given time within the group may provide gray scaling.

  In some embodiments, the patterning device may have a series of states including: (A) Black state. In this case, the applied radiation gives a minimal contribution (or no contribution) to the intensity distribution at the corresponding pixel. (B) The whitest state. In this case, the given radiation gives the greatest contribution. (C) A plurality of intermediate states. In this case, the applied radiation gives an intermediate contribution. These states are divided into a normal set (usually used for beam patterning / printing) and a compensation set (used to compensate for the effects of defective elements). The normal set includes a black state and a first group including a plurality of intermediate states. This first group will be called a gray state. These can be selected to gradually increase the contribution to the corresponding pixel intensity from the minimum black value to some normal maximum value. The compensation set includes the second group of remaining intermediate states and the whitest state. This second group in the intermediate state will be called a white state. These are usually selectable to give a contribution that is greater than the maximum value and gradually increase to a true maximum value corresponding to the whitest state. It should be understood that the intermediate state of the second group is referred to as a white state merely to help distinguish between a normal exposure step and a compensation exposure step. Alternatively, the whole of the multiple states can be referred to as a series of gray states that can be selected to provide gray scale printing between black and white.

  Gray scaling may be used in addition to or in place of the above-described purpose. For example, the processing on the substrate after exposure may be adjusted so that there are two or more potential reactions in the substrate region depending on the dose level irradiated. For example, a first type of reaction occurs at a portion of the substrate that has received a radiation dose that is below a first threshold, and a substrate that has received a radiation dose that exceeds the first threshold and is below the second threshold. A second type of reaction may occur at the site, and a third type of reaction may occur at the site of the substrate that has received a radiation dose greater than or equal to the second threshold. Thus, gray scaling may be used to provide a radiation dose profile on a substrate having two or more desirable dose levels. In some embodiments, the radiation dose profile includes at least two desired dose levels, such as at least three desired dose levels, at least four desired dose levels, at least six desired dose levels, Or at least eight desired dose levels.

  The radiation dose profile can be controlled by a method other than the method of simply controlling the radiation intensity received at each point on the substrate as described above. For example, the radiation dose received by each point on the substrate can be controlled by alternatively or additionally controlling the exposure time for each point. As another example, each point on the substrate may receive radiation by successive multiple exposures. By selecting and irradiating a part of the exposures from such continuous multiple exposures, the radiation dose received by each point can be controlled alternatively or additionally.

  In order to form a pattern on a substrate, each individually controllable element of the patterning device must be set to the required state at each stage in the exposure process. Therefore, a control signal representing the required state must be transmitted to each individually controllable element. Preferably, the lithographic apparatus includes a controller 400 that generates a control signal. The pattern to be formed on the substrate is supplied to the lithographic apparatus in a vector-defined format, for example GDSII. In order to convert the design information into control signals for each individually controllable element, the controller may comprise one or more data processing devices. Each data processing device is configured to perform certain processing steps on the data stream representing the pattern. Hereinafter, these data processing apparatuses may be collectively referred to as “data path”.

  The data processing device of the data path may be configured to perform one or more of the following functions. The functions include converting vector-based design information into bitmap pattern data, and a radiation dose map that requires bitmap pattern data (that is, a radiation dose profile required on the board). Converting the required radiation dose map into the required radiation intensity value for each individually controllable element, and converting the required radiation intensity value for each individually controllable element into a corresponding control signal. is there.

  In certain embodiments, the control signal may be provided to the individually controllable element 102 and / or one or more other devices (eg, sensors) via wired or wireless communication. Also, signals from individually controllable element 102 and / or one or more other devices (eg, sensors) may be communicated to controller 400.

  Referring to FIG. 14A, in a wireless embodiment, a transceiver (or simply transmitter) 406 embodies the control signal for reception by the transceiver (or simply receiver) 402. Send a signal. A control signal is transmitted to each individually controllable element 102 by one or more wires 404. In some embodiments, the signal from the transceiver 406 may be embodied as a multiplex control signal, and the transceiver 402 converts the signals in the multiplex control signal to each individually controllable element 102 and / or other one. It can be separated for one or more devices (eg sensors). In some embodiments, wireless transmission may be by radio frequency (RF).

  Referring to FIG. 14B, in a wired embodiment, one or more wires 404 connect the controller 400 to the individually controllable element 102 and / or one or more other devices (eg, sensors). You may connect. In some embodiments, a single wire 404 may be provided to carry control signals to and / or from the array 200 body. Control signals at the array 200 body may be provided individually to individually controllable elements 102 and / or one or more other devices (eg, sensors). For example, as in the wireless embodiment, control signals are multiplexed over the single line for transmission and provided to the individually controllable element 102 and / or one or more other devices (eg, sensors). May be separated. In some embodiments, a plurality of wires 404 may be provided to carry individual control signals of individually controllable element 102 and / or one or more other devices (eg, sensors). In the embodiment in which the array 200 is rotatable, the wiring 404 may be provided along the rotation axis A. In some embodiments, the signal may be provided by sliding contact with the motor 216 to or from the array 200 body. This is advantageous for rotatable embodiments. Sliding contact is possible, for example, with a brush that contacts the plate.

  In an embodiment, the wiring 404 may be an optical wiring. In that case, the signal may be an optical signal. Here, for example, different control signals may be carried at different wavelengths.

  Similar to the control signal, power may be supplied to the individually controllable element 102 and / or one or more other devices (eg, sensors) by wired or wireless means. For example, in a wired embodiment, power may be supplied by one or more wires 404. It does not matter whether it is the same as that carrying the signal. The sliding contact configuration described above may be provided to transmit power. In wireless embodiments, power may be carried by RF coupling.

  Although the foregoing discussion has focused on control signals supplied to the individually controllable element 102 and / or one or more other devices (eg, sensors), they may additionally or alternatively be appropriate It should be understood that the configuration covers signal transmission from the individually controllable element 102 and / or one or more other devices (eg, sensors) to the controller 400. As such, the communication may be unidirectional (eg, only individually controllable element 102 and / or one or more other devices (eg, sensors) on or off) or bi-directional (ie, individually controllable). It may be the element 102 and / or one or more other devices (e.g. sensors). For example, the transceiver 402 may multiplex multiple signals from the individually controllable element 102 and / or one or more other devices (eg, sensors) for transmission to the transceiver 406. The transceiver 406 may be capable of being separated into separate signals.

  In some embodiments, the control signal for providing the pattern may be modified to take into account factors that may affect the proper supply and / or realization of the pattern on the substrate. For example, some correction may be applied to the control signal taking into account heating of the one or more arrays 200. Such heating can cause changes in the indicated direction of the individually controllable element 102, the uniformity of radiation from the individually controllable element 102, and the like. In some embodiments, a measured temperature and / or expansion / contraction associated with the array 200 (eg, one or more individually controllable elements 102) from the sensor 234, for example, is otherwise provided for patterning. It may be used to change the control signal that would have been. For example, the temperature of the individually controllable element 102 can change during exposure, but the variation causes a change from the projection pattern that would have been given at one constant temperature. Thus, the control signal may be changed to take into account such variations. Similarly, in certain embodiments, the results from the alignment sensor and / or leveling sensor 150 may be used to alter the pattern provided by the individually controllable element 102. The pattern corrects for example distortions that may be caused by, for example, the optical system (if any) between the individually controllable element 102 and the substrate 114, irregularities in the positioning of the substrate 114, non-uniformities in the substrate 114, etc. It may be changed to.

  In some embodiments, the amount of change in the control signal is determined based on theoretical physical / optical results in the desired pattern resulting from measured parameters (eg, measured temperature, measured distance by level sensor, etc.). May be. In some embodiments, the amount of change in the control signal may be determined based on experimental or empirical models of physical / optical results in the desired pattern resulting from the measurement parameters. In some embodiments, the amount of change in the control signal may be applied to feedforward and / or feedback.

  In an embodiment, the lithographic apparatus may comprise a sensor 500 that measures the nature of the radiation that is or will be transmitted to the substrate by one or more individually controllable elements 102. Such a sensor may be a spot sensor or a transmission image sensor. This sensor may be, for example, the intensity of radiation from one individually controllable element 102, the uniformity of radiation from one individual controllable element 102, the size or area of the cross-section of the spot of radiation from one individual controllable element 102, and Alternatively, it may be used to determine the position (in the XY plane) of the spot of radiation from some individually controllable element 102.

  FIG. 15 is a schematic top view of a lithographic apparatus according to an embodiment of the invention, which shows some exemplary arrangements of sensors 500. In some embodiments, one or more sensors 500 are provided in or on the substrate table 106 that holds the substrate 114. For example, the sensor 500 may be provided at the leading edge of the substrate table 106 and / or the trailing edge of the substrate table 106. In this embodiment, four sensors 500 are shown, and one sensor is provided in one array 200. Desirably, they are located where they are not covered by the substrate 114. In alternative or additional embodiments, the sensors may be provided on the side edges of the substrate table 106, preferably where they are not covered by the substrate 114. The sensor 500 at the leading edge of the substrate table 106 can be used for pre-exposure detection of the individually controllable element 102. A sensor 500 at the trailing edge of the substrate table 106 can be used for post-exposure detection of the individually controllable element 102. The sensor 500 on the side edge of the substrate table 106 can be used for detection during exposure of the individually controllable element 102 (so-called on-the-fly detection).

  Referring to FIG. 16A, there is shown a schematic side view of a portion of a lithographic apparatus according to an embodiment of the present invention. In this embodiment, only one array 200 is shown, and other parts of the lithographic apparatus are omitted for clarity. Thus, the sensors described herein may be applied to each of the arrays 200 or to several arrays 200. Additional or alternative embodiments of sensor 500 placement are shown in FIG. 16A (in addition to sensor 500 on substrate table 106). In the first embodiment, a sensor 500 in the frame 160 receives radiation from an individually controllable element 102 via a beam redirecting structure 502 (eg, an array of reflecting mirrors). In this first example, the individually controllable elements 102 can be arranged to move in the XY plane so that different individually controllable elements 102 provide radiation to the beam redirecting structure 502. In a second additional or alternative embodiment, the sensor 500 in the frame 160 transmits radiation from an individual controllable element 102 to the back side of that individual controllable element 102 (ie exposure radiation is provided). Receive from the other side. In this second example, the individually controllable elements 102 can be arranged to move in the XY plane so that different individually controllable elements 102 provide radiation to the sensor 500. In the second example, sensor 500 is shown in the path of individually controllable element 102 in exposure area 204, but sensor 500 may be located at the location indicated by sensor 510. In some embodiments, the sensor 500 in the frame 160 is in a fixed location, but may be movable by an associated actuator, for example. These first and second embodiments may be used to provide “on-the-fly” detection in addition to or instead of pre-exposure and / or post-exposure detection. In the third embodiment, the structure 504, 506 has a sensor 500. Structures 504, 506 may be movable by actuator 508. In one embodiment, the structure 504 is located below (in FIG. 16A) or to the side of the path that the substrate table will travel. In some embodiments, the structure 504 may be moved by the actuator 508 to a location showing the sensor 500 of the substrate table 106 in FIG. 16A, assuming that the substrate table 106 was not there. Such movement may be in the Z direction (as shown in FIG. 16A), or in the X and / or Y direction if the structure 504 is to the side of the path. . In one embodiment, the structure 506 is positioned above (in FIG. 16A) or to the side of the path that the substrate table will travel. In some embodiments, the structure 506 may be moved by the actuator 508 to a location showing the sensor 500 of the substrate table 106 in FIG. 16A, assuming that the substrate table 106 is not there. The structure 506 is attached to the frame 160 and may be displaceable relative to the frame 160.

  In the operation of measuring the nature of the radiation that is or will be transmitted to the substrate by one or more individually controllable elements 102, sensor 500 is placed in the path of radiation from one individually controllable element 102. Arranged by moving 500 and / or moving the radiation beam of its individually controllable element 102. Therefore, as an example, the substrate table 106 may move the position sensor 500 along the path of radiation from the individually controllable element 102 as shown in FIG. In this case, the sensor 500 is positioned in the path of the individually controllable element 102 in the exposure area 204. In some embodiments, the sensor 500 may be positioned in the path of the individually controllable element 102 outside the exposure area 204 (eg, the individual control illustrated on the left side if the beam redirecting structure 502 is not there). Possible element 102). When placed in the radiation path, the sensor 500 can detect the radiation and measure the nature of the radiation. Sensor 500 may be moved relative to individually controllable element 102 and / or individually controllable element 102 may be moved relative to sensor 500 to facilitate sensing.

  As another example, the individually controllable element 102 may be moved to a position where radiation from the individual controllable element 102 is incident on the beam redirecting structure 502. Beam redirecting structure 502 directs the beam to sensor 500 on frame 160. Sensor 500 may be moved relative to individually controllable element 102 and / or individually controllable element 102 may be moved relative to sensor 500 to facilitate sensing. In this embodiment, individually controllable element 102 is measured outside exposure area 204.

  In some embodiments, sensor 500 may be fixed or moved. If fixed, the individually controllable element 102 is desirably movable relative to the fixed sensor 500 to facilitate detection. To facilitate detection by sensor 500, for example, array 200 may be moved (eg, rotated or translated) relative to sensor 500 (eg, sensor 500 on frame 160). If the sensor 500 is movable (eg, when the sensor 500 is on the substrate table 106), the individually controllable element 102 may be stationary for detection or moved, for example, to speed up detection. May be.

  Sensor 500 may be used to calibrate one or more individually controllable elements 102. For example, the spot position of a certain individually controllable element 102 can be detected by the sensor 500 prior to exposure and the system can be calibrated accordingly. Then, the exposure can be managed based on the planned spot position (for example, the position of the substrate 114 is controlled, the position of the individually controllable element 102 is controlled, or the on / off switching of the individually controllable element 102 is controlled. ) A plurality of calibrations may be performed sequentially. For example, a calibration may be performed using, for example, the sensor 500 at the trailing edge of the substrate table 106 immediately after exposure and before another exposure. The calibration may be performed before each exposure or after a certain number of exposures. Further, the spot position of the individually controllable element 102 may be detected on the fly using the sensor 500, and the current exposure may be managed accordingly. The individually controllable element 102 may be recalibrated based on on-the-fly detection.

  In one embodiment, one or more individually controllable elements 102 are provided with a sign so as to be able to detect which individual controllable element 102 is in a position and in use. Also good. In some embodiments, individually controllable element 102 has a marker and sensor 510 may be used to detect the marker. The marker may be an RFID, a barcode, or the like. For example, each of the plurality of individually controllable elements 102 may be moved adjacent to a sensor 510 for reading a marker. By knowing which individually controllable element 102 is adjacent to the sensor 510, it becomes possible to know in the exposure area 204 or the like which individual controllable element 102 is adjacent to the sensor 500. In one embodiment, each individually controllable element 102 is used to provide radiation having a different frequency, and sensors 500, 510 detect which individual controllable element 102 is adjacent to sensor 500, 510. It may be possible. For example, each of the plurality of individually controllable elements 102 is moved adjacent to a sensor 500, 510 that receives radiation from the individually controllable element 102, and the sensors 500, 510 isolate the received radiation to provide a specific It may be determined which individually controllable element 102 was adjacent to the sensors 500, 510 at the time. By knowing this, it becomes possible to know which individually controllable element 102 is adjacent to the sensor 500 in the exposure area 204 or the like.

  In some embodiments, as described above, position sensors may be provided to determine the position of one or more individually controllable elements 102 with up to six degrees of freedom. For example, the sensor 510 may be used for position detection. In certain embodiments, sensor 510 may comprise an interferometer. In certain embodiments, sensor 510 may comprise an encoder that may be used to detect one or more one-dimensional encoder gratings and / or one or more two-dimensional encoder gratings.

  In certain embodiments, a sensor 520 may be provided to determine the nature of the radiation transmitted to the substrate. In this embodiment, sensor 520 captures radiation redirected by the substrate. In one exemplary use, the redirected radiation captured by sensor 520 may cause the position of a radiation spot from one individually controllable element 102 (eg, a misalignment of the radiation spot from one individually controllable element 102). May be used to facilitate the determination of In particular, the sensor 520 may capture redirected radiation from just the exposed portion of the substrate (ie, the latent image). Such tail intensity measurements of redirected radiation can provide an indication of whether the spot has been properly aligned. For example, this repeated measurement of the tail gives a repetitive signal, which can give a deviation that would represent a spot misregistration (eg, an out-of-phase signal could represent a misregistration). FIG. 16B schematically shows the position of the detection area of the sensor 520 relative to the exposed area 522 of the substrate 114. In this embodiment, three detection zones are shown and these results may be compared and / or combined to facilitate misregistration recognition. Only one detection zone needs to be used, for example the left one. In some embodiments, the detector 262 of the individually controllable element 102 may be used in the same manner as the sensor 520. For example, the right one or more individually controllable elements 102 outside the exposure area 204 of the array 200 may be used to detect redirected radiation from the latent image on the substrate.

  FIG. 17 depicts an embodiment of a lithographic apparatus. In this embodiment, a plurality of individually controllable elements 102 direct radiation toward the rotatable polygon 600. The surface 604 of the polygon 600 on which the radiation is incident redirects the radiation into the lens array 170. Lens array 170 directs radiation toward substrate 114. During exposure, polygon 600 rotates about axis 602 and moves the beam from each of the plurality of individually controllable elements 102 across lens array 170 in the Y direction. Specifically, each time the radiation is incident on a new facet of the polygon, each beam repeatedly scans the lens array 170 in the positive Y direction. The individually controllable elements 102 are modulated during exposure to provide the desired pattern described herein. The polygon may have any suitable number of sides. In addition, the individually controllable element 102 is modulated in synchronization with the rotating polygon 600 so that each beam is incident on the lens of the lens array 170. In one embodiment, another set of multiple individually controllable elements 102 may be provided on the opposite side (ie, on the right side) of the polygon so that radiation is incident on the surface 606 of the polygon 600.

  In an embodiment, a vibrating optical element may be used instead of the polygon 600. The oscillating optical element may have a fixed angle with respect to the lens array 170, and may reciprocate in the Y direction to cause each beam to reciprocate in the Y direction. In some embodiments, an optical element that reciprocates around an axis 602 about an arc may be used in place of the polygon 600. Each beam reciprocally scans the lens array 170 in the Y direction by reciprocatingly rotating an arc with an optical element. In some embodiments, polygon 600, oscillating optical element, and / or rotating optical element have one or more mirror surfaces. In some embodiments, polygon 600, oscillating optical element, and / or rotating optical element comprises a prism. In some embodiments, an acousto-optic modulator may be used in place of polygon 600. An acousto-optic modulator can be used to cause each beam to scan the lens array 170. In some embodiments, the lens array 170 may be disposed in a radiation path between the plurality of individually controllable elements 102 and the polygon 600, oscillating optical elements, rotating optical elements, and / or acousto-optic modulators. Good.

  Therefore, in general, the width of the exposure region can be covered with a small number of radiation outputs, compared to dividing the width of the exposure region (for example, the substrate) by the width of the radiation output. In certain embodiments, this may include moving the radiation beam source relative to the exposure area, or moving the radiation beam relative to the exposure area.

  FIG. 18 shows a schematic cross-sectional side view of a lithographic apparatus having moveable individually controllable elements 102 according to an embodiment of the invention. Similar to the lithographic apparatus 100 shown in FIG. 5, the lithographic apparatus 100 comprises a substrate table 106 for holding a substrate and a positioning device 116 for moving the substrate table 106 with a maximum of 6 degrees of freedom.

  The lithographic apparatus 100 further comprises a plurality of individually controllable elements 102 arranged on the frame 160. In this embodiment, each individually controllable element 102 is a radiant light emitting diode, for example a laser diode, for example a violet laser diode. The individually controllable elements 102 are arranged in an array 200 of individually controllable elements 102 that extend along the Y direction. Although one array 200 is shown, the lithographic apparatus may have a plurality of arrays 200, for example as shown in FIG.

  In this embodiment, the array 200 is a rotatable plate having a plurality of spatially separated individually controllable elements 102 arranged around the plate. In use, the plate rotates about its own axis 206, for example in the direction indicated by the arrow in FIG. The plates of array 200 are rotated about axis 206 using motor 216. The plates of array 200 may also be moved in the Z direction by motor 216 so that individually controllable elements 102 can be displaced relative to substrate table 106.

  In this embodiment, the array 200 may have one or more fins 230 to increase the surface area for heat dissipation. The fins 230 may be on the top surface of the array 200, for example. Optionally, one or more additional fins 232 may be provided to cooperate with the fins 230 to facilitate heat dissipation. For example, the fins 232 may absorb heat from the fins 230 and may include a heat exchanger / pump associated with a fluid (eg, liquid) conduit similar to that shown and described with respect to FIG. Good.

  In this embodiment, the lens 242 may be mounted in front of each individually controllable element 102 and movable with the individually controllable element 102 (for example, rotatable about the axis A). In FIG. 18, two lenses 242 are shown and attached to the array 200. The lens 242 may be displaceable with respect to the individually controllable element 102 (for example, in the Z direction).

  In this embodiment, an aperture structure 248 having an aperture on the inside may be disposed above the lens 242 and between the lens 242 and the associated individually controllable element 102. Aperture structure 248 can limit the diffractive effects of lens 242, associated individually controllable element 102, and / or adjacent lens 242 / individually controllable element 102.

  In this embodiment, a sensor 254 may be provided on one individually controllable element 102 (or on a plurality of individually controllable elements 102 of the array 200). In this embodiment, sensor 254 is configured to detect focus. A focus detection beam 256 is directed (eg, reflected) from the substrate surface, passes through the lens 242, and is directed to the detector 262, for example, by a translucent mirror 258. In some embodiments, focus detection beam 256 is radiation used for exposure and may be redirected at the substrate. In an embodiment, the focus detection beam 256 may be a beam 256 in which a dedicated beam directed to the substrate is redirected on the substrate. One exemplary focus sensor is described with respect to FIG. A mirror 258 and a detector 262 may be mounted on the array 200.

  In this embodiment, the control signal may be supplied to the individually controllable element 102 and / or one or more other devices (eg, sensors) by wired or wireless communication. Also, signals from individually controllable element 102 and / or one or more other devices (eg, sensors) may be communicated to the controller. In FIG. 18, the wiring 404 may be provided along the rotation axis 206. In an embodiment, the wiring 404 may be an optical wiring. In that case, the signal may be an optical signal. Here, for example, different control signals may be carried at different wavelengths. Similar to the control signal, power may be supplied to the individually controllable element 102 and / or one or more other devices (eg, sensors) by wired or wireless means. For example, in a wired embodiment, power may be supplied by one or more wires 404. It does not matter whether it is the same as that carrying the signal. In wireless embodiments, power may be carried by RF coupling, as illustrated at 700.

  In this embodiment, the lithographic apparatus may comprise a sensor 500 that measures the nature of the radiation that is or is to be transmitted to the substrate by one or more individually controllable elements 102. Such a sensor may be a spot sensor or a transmission image sensor. This sensor may be, for example, the intensity of radiation from one individually controllable element 102, the uniformity of radiation from one individual controllable element 102, the size or area of the cross-section of the spot of radiation from one individual controllable element 102, and Alternatively, it may be used to determine the position (in the XY plane) of the spot of radiation from some individually controllable element 102. In this embodiment, sensor 500 is on frame 160 and may be adjacent to or accessible through substrate table 106.

  In some embodiments, rather than allowing the individually controllable element 102 to move in the XY plane, the individually controllable element 102 is substantially stationary in the XY plane during exposure of the substrate. This does not mean that the controllable element 102 is not movable in the XY plane. For example, it may be movable in the XY plane in order to correct the position of the element. A potential advantage of making controllable element 102 substantially stationary is that it facilitates the transmission of power and / or data to controllable element 102. A further or other potential advantage is improved local focusing ability to compensate for substrate height differences that are greater than the depth of focus of the system and higher than the pitch of the movement controllable elements. Is Rukoto.

  In this embodiment, the controllable element 102 is substantially stationary and there is at least one optical element that moves relative to the individually controllable element 102. Various configurations are described below in which the individually controllable element 102 is substantially stationary in the XY plane and the optical element is movable relative thereto.

  In the description of this document, the term “lens” refers to one or more of various optical components including refractive optical components, reflective optical components, magnetic optical components, electromagnetic optical components, electrostatic optical components, as the context allows. It should be generally understood to encompass combinations of Such an optical component may be any refractive, reflective and / or diffractive optical element that provides the same function as the lens mentioned. For example, the imaging lens may be embodied in the form of a conventional refractive lens having optical magnification, a Schwarzschild reflection system having optical magnification, and / or a zone plate having optical magnification. The imaging lens may also include a non-imaging optical system when the resulting effect provides a convergent beam on the substrate.

  Also, in the description herein, reference is made to a plurality of individually controllable elements 102, such as a mirror of a mirror array modulator or a plurality of radiation sources. However, it should be understood that this document more generally refers to a modulator configured to output multiple beams. For example, the modulator may be an acousto-optic modulator that outputs a plurality of beams from a beam provided by one radiation source.

  FIG. 19 illustrates a lithographic apparatus having a plurality of individually controllable elements 102 (eg, laser diodes) substantially stationary in the XY plane and an optical element 242 movable relative thereto according to an embodiment of the invention. The schematic top view of the layout of this part is shown. In this embodiment, a plurality of individually controllable elements 102 are attached to the frame and are substantially stationary in the XY plane, and a plurality of imaging lenses 242 are substantially XY with respect to these individually controllable elements 102. Moving in-plane (as represented by the rotation of wheel 801 in FIG. 19), the substrate moves in direction 803. In some embodiments, the imaging lens 242 moves relative to the individually controllable element 102 by rotating about an axis. In some embodiments, the imaging lenses 242 are mounted in a structure that rotates about an axis (eg, in the direction shown in FIG. 19) and are arranged in a circle (eg, partially shown in FIG. 19). .

  Each of the individually controllable elements 102 provides a collimated beam to an imaging lens 242 that moves. In one embodiment, the individually controllable element 102 is associated with one or more collimating lenses that provide a collimated beam. In one embodiment, the collimating lens is substantially stationary in the XY plane and is attached to a frame to which the individually controllable element 102 is attached.

  In this embodiment, the cross-sectional width of the collimated beam is smaller than the cross-sectional width of the imaging lens 242. Therefore, as soon as the collimated beam is completely contained inside the optically transmissive part of the imaging lens 242, the individually controllable element 102 (for example, a laser diode) is turned on. When the beam comes outside the optically transmissive part of the imaging lens 242, the individually controllable element 102 (for example, a laser diode) is switched off. Thus, in some embodiments, a beam from an individually controllable element 102 passes through one imaging lens 242 at any one instant. The imaging lens 242 traverses the beam from the individually controllable element 102, resulting in a corresponding imaging line 800 on each of the individually controllable elements 102 that are switched on. In FIG. 19, three imaging lines 800 are shown for each of the three exemplary individually controllable elements 102 in FIG. Obviously, the other individually controllable elements 102 in FIG. 19 also produce corresponding imaging lines 800 on the substrate.

  In the layout of FIG. 19, the pitch of the imaging lenses 242 may be 1.5 mm, and the cross-sectional width (for example, diameter) of the beam from each individually controllable element 102 is slightly smaller than 0.5 mm. According to this configuration, it is possible to write a line having a length of about 1 mm by each individually controllable element 102. Thus, in this configuration where the beam diameter is 0.5 mm and the imaging lens 242 has a diameter of 1.5 mm, the duty cycle is 67% high. With proper positioning of the individually controllable element 102 relative to the imaging lens 242, the full width of the substrate can be completely covered. Thus, for example, when only a standard 5.6 mm diameter laser diode is used, several concentric rings as shown in FIG. 19 of the laser diode may be used to cover the entire width of the substrate. it can. Thus, in this embodiment, a smaller number than simply using an array of fixed individually controllable elements 102, or perhaps using a movable individually controllable element 102 as described herein. It may be possible to use several individually controllable elements 102 (eg laser diodes).

  In this embodiment, each of the imaging lenses 242 should be the same. This is because each individually controllable element 102 is imaged by all the moving imaging lenses 242. In this embodiment, a lens with a large NA, eg, greater than 0.3, greater than 0.18, or greater than 0.15 is required, but all imaging lenses 242 need to image the field of view. There is no. This single element optical system enables imaging with limited diffraction.

  The focus of the beam on the substrate is fixed to the optical axis of the imaging lens 242 and does not depend on where the collimated beam enters the lens (see, eg, FIG. 20, which is part of the lithographic apparatus of FIG. 19). This is a schematic three-dimensional view). The disadvantage of this configuration is that the beam from the imaging lens 242 toward the substrate is not telecentric, and as a result, focus errors can lead to overlay errors.

  In this embodiment, focus adjustment using elements that are not moving in the XY plane (eg, in individually controllable element 102) can cause vignetting. Accordingly, the desired focus adjustment should be made at the moving imaging lens 242. This may require an actuator with a higher frequency than the moving imaging lens 242.

  FIG. 21 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention. And shows three different rotational positions of the imaging lens set 242 for an individual controllable element. In this embodiment, the lithographic apparatus of FIGS. 19 and 20 is expanded such that the imaging lens 242 that receives the collimated beam from one individually controllable element 102 comprises two lenses 802, 804. Similarly to FIG. 19, the imaging lens 242 moves in the XY plane with respect to the individually controllable element 102 (for example, the imaging lens 242 rotates around an axis at least partially arranged in a ring shape). In this embodiment, the beam from the individually controllable element 102 is collimated by the lens 806 before reaching the imaging lens 242. However, in some embodiments, such a lens may not be provided. The lens 806 is substantially stationary in the XY plane. The substrate moves in the X direction.

  The two lenses 802, 804 are arranged to make the beam to the substrate telecentric in the optical path of the collimated beam from the individually controllable element 102 to the substrate. A lens 802 between the individually controllable element 102 and the lens 804 includes two lenses 802A and 802B having substantially the same focal length. The collimated beam from the individually controllable element 102 is focused between the two lenses 802A, 802B so that the lens 802B collimates the beam to the imaging lens 804. The imaging lens 804 images the beam on the substrate.

  In this embodiment, the lens 802 moves with respect to the individually controllable element 102 at a speed in the XY plane (for example, at a certain rotation speed (rpm) per minute). Therefore, in this embodiment, if the imaging lens 804 moves at the same speed as the lens 802, the collimated beam emitted from the lens 802 has twice the speed of the moving imaging lens 804 in the XY plane. Will. Therefore, in this embodiment, the imaging lens 804 moves at a speed different from that of the lens 802 with respect to the individually controllable element 102. In particular, the imaging lens 804 moves in the XY plane at twice the speed of the lens 802 (at twice the rpm of the lens 802), so that the beam is telecentricly focused on the substrate. Such alignment of the collimated beam emanating from lens 802 to imaging lens 804 is schematically illustrated in FIG. 21 at three exemplary positions. Further, since actual writing on the substrate is performed twice as fast as the example of FIG. 19, the power of the individually controllable element 102 should be doubled.

  In this embodiment, focus adjustment using elements that are not moving in the XY plane (eg, in the individually controllable element 102) can impair telecentricity and cause vignetting. Accordingly, the desired focus adjustment should be made at the moving imaging lens 242.

  In this embodiment, it is not necessary for all the imaging lenses 242 to image the field of view. This single element optical system enables imaging with limited diffraction. A duty cycle of about 65% is possible. In some embodiments, these lenses 806, 802A, 802B, and 804 may comprise two aspheric lenses and two spherical lenses.

  In some embodiments, about 380 individually controllable elements 102 (eg, standard laser diodes) may be used. In some embodiments, about 1400 imaging lens sets 242 may be used. In some embodiments using standard laser diodes, about 4200 imaging lens sets 242 may be used and these may be arranged in six concentric rings in a ring. In one embodiment, the imaging lens wheel can rotate at about 12000 rpm.

  FIG. 22 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto according to an embodiment of the invention. And shows three different rotational positions of the imaging lens set 242 for an individual controllable element. In this embodiment, the so-called 4f telecentric in / telecentric out imaging system is used as shown in FIG. 22 in order to avoid moving the lens at different speeds as described with reference to FIG. 242 can be used. The moving imaging lens 242 moves at substantially the same speed in the XY plane (e.g., rotates about an axis in which the imaging lens 242 is at least partially arranged in a ring shape). And receiving a telecentric beam as input and outputting a telecentric imaging beam to the substrate. In this configuration, when the magnification is 1, the image on the substrate moves twice as fast as the moving imaging lens 242. The substrate moves in the X direction. In this configuration, the optical system may need to image the field of view with a relatively large NA, eg, NA greater than 0.3, NA greater than 0.18, or NA greater than 0.15. In this configuration, two single element optics may not be possible. Six or more elements with very precise alignment tolerances may be necessary to obtain a diffraction limited image. A duty cycle of about 65% is possible. In this embodiment, it is also relatively easy to focus locally using elements that do not move along or in conjunction with the moving imaging lens 242.

  FIG. 23 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto according to an embodiment of the invention. And shows five different rotational positions of the imaging lens set 242 for a certain individually controllable element. In this embodiment, the lens is prevented from moving at different speeds as described with reference to FIG. 21, and the optical system that does not form the field of view as described with reference to FIG. 22 is provided in the XY plane. A substantially stationary lens combination is coupled to the moving imaging lens 242. Referring to FIG. 23, an individually controllable element 102 is provided, which is substantially stationary in the XY plane. An optional collimating lens 806 that is substantially stationary in the XY plane collimates the beam from the individually controllable element 102 and has its collimated beam (eg having a cross-sectional width (eg, diameter) of 0.5 mm). Provided for feeding to the lens 812.

  The lens 812 is also substantially stationary in the XY plane and focuses the collimated beam onto the field lens 814 of the moving imaging lens 242 (eg, having a cross-sectional width (eg, diameter) of 1.5 mm). The lens 814 has a relatively long focal length (eg, f = 20 mm).

  The field lens 814 of the movable imaging lens 242 moves relative to the individually controllable element 102 (e.g., rotates about an axis where the imaging lens 242 is at least partially arranged in a ring). The field lens 814 directs the beam to the imaging lens 818 of the movable imaging lens 242. Similar to the field lens 814, the imaging lens 818 moves relative to the individually controllable element 102 (e.g., rotates about an axis in which the imaging lens 242 is at least partially arranged in a ring). In this embodiment, the field lens 814 moves at substantially the same speed as the imaging lens 818. A pair of field lens 814 and imaging lens 818 are aligned with each other. The substrate moves in the X direction.

  There is a lens 816 between the field lens 814 and the imaging lens 818. The lens 816 is substantially stationary in the XY plane and collimates the beam from the field lens 814 to the imaging lens 818. The lens 816 has a relatively long focal length (eg, f = 20 mm).

  In this embodiment, the optical axis of the field lens 814 should coincide with the optical axis of the corresponding imaging lens 816. The field lens 814 is designed such that the beam is bent so that the principal ray of the beam collimated by the lens 816 coincides with the optical axis of the imaging lens 818. In this way, the beam toward the substrate becomes telecentric.

  The lenses 812 and 816 may be simple spherical lenses due to their large F values. The field lens 814 should not affect the imaging quality and may also be a spherical element. In this embodiment, the collimating lens 806 and the imaging lens 818 are lenses that do not need to image the field of view. Using such a single-element optical system, imaging with limited diffraction is possible. A duty cycle of about 65% is possible.

  In one embodiment, when the movable imaging lens 242 is rotatable, at least two concentric rings of lenses and individually controllable elements 102 are provided to cover the full width of the substrate. In one embodiment, the individually controllable elements 102 on these rings are arranged with a pitch of 1.5 mm. If a standard laser diode with a diameter of 5.6 mm is used, at least 6 concentric rings may be required to cover the full width. 24 and 25 show the configuration of concentric rings of individually controllable elements 102 according to these configurations. In some embodiments, this may be approximately 380 individually controllable elements 102 that are substantially stationary in the XY plane and have corresponding lenses. The moving imaging lens 242 may have 4200 sets of lenses 814, 818 in a 700 × 6 ring. With this configuration, it is possible to write a line of about 1 mm in length using each individually controllable element 102. In some embodiments, about 1400 imaging lens sets 242 may be used. In some embodiments, lenses 812, 814, 816, and 818 may comprise four aspheric lenses.

  In this embodiment, focus adjustment using elements that are not moving in the XY plane (eg, in the individually controllable element 102) can impair telecentricity and cause vignetting. Accordingly, the desired focus adjustment should be made at the moving imaging lens 242. This may require an actuator with a higher frequency than the moving imaging lens 242.

  FIG. 26 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention. It is. In this embodiment, an optical derotator is used to connect the individually controllable element 102 substantially stationary in the XY plane to the moving imaging lens 242.

  In this embodiment, the individually controllable element 102 is arranged in a ring together with an optional collimating lens. Two parabolic mirrors 820, 822 reduce the ring of collimated beams from the individually controllable elements 102 to a diameter acceptable to the derotator 824. In FIG. 26, a Pechan prism is used as the derotator 824. When the derotator rotates at half the speed of the imaging lens 242, each individually controllable element 102 appears to be substantially stationary with respect to the corresponding imaging lens 242. Two additional parabolic mirrors 826, 828 expand the ring of the derotated beam from the derotator 824 to a diameter acceptable to the moving imaging lens 242. The substrate moves in the X direction.

  In this embodiment, each individually controllable element 102 is paired with one imaging lens 242. Thus, it may not be possible to mount all individually controllable elements 102 in a concentric ring, and therefore may not be able to cover the full width of the substrate. A duty cycle of about 33% is possible. In this embodiment, the imaging lens 242 is a lens that does not need to image the field of view.

  FIG. 27 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the invention. It is. In this embodiment, the imaging lens 242 is arranged to rotate around a direction extending in the XY plane (for example, a rotating drum rather than the rotating wheel described with reference to FIGS. 19 to 26). ). Referring to FIG. 27, the movable imaging lens 242 is disposed on a drum configured to rotate around the Y direction, for example. The movable imaging lens 242 receives radiation from the individually controllable elements 102 extending in a line in the Y direction between the rotation axis of the drum and the movable imaging lens 242. In principle, the lines written by the drum movable imaging lens 242 are parallel to the substrate scanning direction 831. Accordingly, the derotator 830 mounted at an angle of 45 ° is configured to rotate the line created by the movable imaging lens 242 of the drum by 90 °. Thereby, the imaged line becomes perpendicular to the scanning direction of the substrate. The substrate moves in the X direction.

  For each stripe on the substrate, a circular array of movable imaging lenses 242 will be required on the drum. If one of the circles has a stripe of 3 mm width on the substrate and the substrate is 300 mm wide, 700 (optical system provided on the circumference of the drum) × 100 and 70000 optical assemblies are required on the drum Can be done. This may be less if cylindrical optics are used for the drum. Also, the imaging optical system in this embodiment may need to image a certain field of view, which may further complicate the optical system. A duty cycle of about 95% is possible. The advantage of this embodiment is that all the fringes that are imaged are of substantially equal length and can be substantially parallel straight lines. In this embodiment, it is relatively easy to focus locally using elements that do not move along or in conjunction with the movable imaging lens 242.

  FIG. 28 is a schematic side view of a layout of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto, according to an embodiment of the present invention. And shows five different rotational positions of the optical element set 242 for a certain individually controllable element.

  Referring to FIG. 28, an individually controllable element 102 is provided, which is substantially stationary in the XY plane. The movable imaging lens 242 includes a plurality of lens sets. Each lens set includes a field lens 814 and an imaging lens 818. The substrate moves in the X direction.

  A field lens 814 (eg, a spherical lens) of the movable imaging lens 242 moves in a direction 815 relative to the individually controllable element 102 (eg, rotates about an axis at least partially imaging the imaging lens 242 in a ring shape). ). The field lens 814 directs the beam to the imaging lens 818 of the movable imaging lens 242 (eg, an aspheric lens such as a double-sided aspheric lens). Similar to the field lens 814, the imaging lens 818 moves relative to the individually controllable element 102 (e.g., rotates about an axis in which the imaging lens 242 is at least partially arranged in a ring). In this embodiment, the field lens 814 moves at substantially the same speed as the imaging lens 818.

  The focal plane of the field lens 814 coincides with the back focal plane of the imaging lens 818 at position 815, providing a telecentric in / telecentric out system. Unlike the configuration of FIG. 23, the imaging lens 818 images a certain field. The focal length of the field lens 814 is such that the field size of the imaging lens 818 is smaller than a half angle of 2 to 3 degrees. Even in this case, it is possible to obtain an image in which diffraction is limited by a single element optical system (for example, a single double-sided aspheric element). The field lens 814 is arranged so that the individual field lenses 814 are mounted without gaps. In this case, the duty cycle of the individually controllable element 102 can be about 95%.

  The focal length of the imaging lens 818 is such that these lenses do not exceed the diameter of the field lens 814 when the substrate has an NA of 0.2. When the focal length of the imaging lens 818 is equal to the diameter of the field lens 814, the diameter of the imaging lens 818 provides sufficient space to mount the imaging lens 818.

  A line slightly longer than the pitch of the field lens 814 is written for the field angle. Thus, although depending on the focal length of the imaging lens 818, an overlap is given to the line imaged on the substrate of the adjacent individually controllable element 102. Accordingly, the individually controllable elements 102 may be attached at the same pitch as the imaging lenses 242 on one ring.

  FIG. 29 is a schematic three-dimensional view of a portion of the lithographic apparatus of FIG. In this figure, five individually controllable elements 102 are shown along with five associated movable imaging lens sets 242. As will be apparent, an individually controllable element 102 and an associated movable imaging lens set 242 may further be provided. The substrate moves in the X direction as indicated by arrow 829. In one embodiment, the field lenses 814 are arranged without gaps. The pupil plane is located at 817.

  In this embodiment, to avoid a relatively small double-sided aspheric imaging lens 818, reduce the amount of optical system of the moving imaging lens 242 and use a standard laser diode as the individually controllable element 102, Multiple individually controllable elements 102 may be imaged with a single lens set of movable imaging lens 242. As long as one individually controllable element 102 is telecentrically imaged on the field lens 814 of each movable imaging lens 242, the corresponding imaging lens 818 re-images the beam from that individually controllable element 102 onto the substrate telecentricly. To do. For example, if eight lines are written simultaneously, the diameter of the field lens 814 and the focal length of the imaging lens 818 are increased eight times and the amount of the movable imaging lens 242 is reduced by a factor of eight with the same throughput. Become. Also, the optical system that is substantially stationary on the XY plane can be reduced. This is because a part of the optical system required for imaging the individually controllable element 102 on the field lens 814 can be shared. FIG. 30 shows an outline of a configuration example in which eight lines are simultaneously written by one movable imaging lens set 242. The rotation axis 821 of the imaging lens set 242 and the radius 823 from the rotation axis 821 to the imaging lens set 242 are also illustrated. Increasing the pitch from 1.5 mm to 12 mm (when eight lines are written simultaneously by one movable imaging lens set 242) is sufficient to mount a standard laser diode as individually controllable element 102 Space is given. In some embodiments, 224 individually controllable elements 102 (eg, standard laser diodes) may be used. In some embodiments, 120 imaging lens sets 242 may be used. In some embodiments, 28 substantially stationary optics may be used with 224 individually controllable elements 102.

In this embodiment, it is also relatively easy to focus locally using elements that do not move along or in conjunction with the movable imaging lens 242. As long as the telecentric image of the individually controllable element 102 at the field lens 814 is moved along the optical axis and remains telecentric, only the focus of the image on the substrate changes and the image remains telecentric. FIG. 31 is a diagram showing a schematic configuration in which focus control is performed using a movable roof top in the configurations of FIGS. 28 and 29. Two folding mirrors 832 are placed in the telecentric beam from the individually controllable element 102 in front of the field lens 814 along with a rooftop (eg, a prism or set of mirrors) 834. By moving the rooftop 834 away or closer to the folding mirror 832 along the direction 833, the image is shifted along the optical axis and thus relative to the substrate. Since the focal change in the axial direction corresponds to the square of the ratio of the F value, there is a large magnification along the optical axis. Therefore, the defocus of 25 μm of the F / 2.5 beam on the substrate is f / 37 at the field lens 814. The focal shift applied to the .5 beam is 5.625 mm ((37.5 / 2.5) ² ). That is, the rooftop 834 must be moved by half of that.

  FIG. 32 relates to an embodiment of the invention and relates to a lithography according to an embodiment of the invention having individually controllable elements substantially stationary in the XY plane and optical elements movable relative thereto. It is a schematic sectional side view of an apparatus. FIG. 32 shows a configuration similar to FIG. 23, but can be suitably modified to fit any of the embodiments of FIGS. 19-22 and / or 24-31.

  Referring to FIG. 32, the lithographic apparatus 100 includes a substrate table 106 that holds a substrate, and a positioning device 116 that moves the substrate table 106 with a maximum of 6 degrees of freedom.

  The lithographic apparatus 100 further comprises a plurality of individually controllable elements 102 arranged on the frame 160. In this embodiment, each individually controllable element 102 is a radiant light emitting diode, for example a laser diode, for example a violet laser diode. The individually controllable element 102 is disposed on the frame 838 and extends along the Y direction. Although one frame 838 is shown, the lithographic apparatus may have a plurality of frames 838, for example similar to the array 200 shown in FIG. Further, lenses 812 and 816 are arranged on the frame 838. Frame 838, and thus individually controllable element 102, and lenses 812, 816 are substantially stationary in the XY plane. Frame 838, individually controllable element 102, and lenses 812, 816 may be moved in the Z direction by actuator 836.

  In this embodiment, a frame 840 is provided and is rotatable. A field lens 814 and an imaging lens 818 are disposed on the frame 840, and the coupling of the field lens 814 and the imaging lens 818 forms a movable imaging lens 242. In use, the plate rotates about its own axis (eg, in the direction indicated by the arrow with respect to the array 200 in FIG. 5). Frame 840 is rotated about axis 206 using motor 216. Further, the frame 840 may be moved in the Z direction by the motor 216 so that the movable imaging lens 242 is displaced with respect to the substrate table 106.

  In this embodiment, an aperture structure 248 having an aperture on the inside may be disposed above the lens 812 and between the lens 812 and the associated individually controllable element 102. Aperture structure 248 can limit the diffractive effects of lens 812, associated individually addressable element 102, and / or adjacent lens 812 / individually addressable element 102.

  In certain embodiments, the lithographic apparatus 100 comprises one or more movable plates 890 (eg, rotatable plates, eg, rotatable discs) that comprise optical elements (eg, lenses). In the embodiment of FIG. 32, a plate 890 with a field lens 814 and a plate 890 with an imaging lens 818 are shown. In one embodiment, the lithographic apparatus is completely devoid of reflective optical elements that rotate in use. In certain embodiments, the lithographic apparatus receives radiation from any or all individually controllable elements 102 and is entirely devoid of reflective optical elements that rotate in use. In some embodiments, one or more (e.g., all) plates 890 are substantially flat, e.g., optical elements (or optical elements) that protrude above or below one or more surfaces of the plates. Part). To achieve this, for example, the plate 890 is made sufficiently thick (ie, at least thicker than the height of the optical element and positioned so that the optical element does not protrude), or a flat cover that covers the plate 890 A plate (not shown) may be provided. Substantially flattening one or more surfaces of the plate can help, for example, reduce noise during use of the device.

  FIG. 33 is a schematic cross-sectional side view of a portion of a lithographic apparatus having individually controllable elements substantially stationary in the XY plane. The lithographic apparatus 900 includes a substrate support portion 902 that holds a substrate, and a positioning device 904 that moves the substrate support portion 902 with a maximum of 6 degrees of freedom. The substrate may be a resist-coated substrate (eg, a silicon wafer or glass plate).

The lithographic apparatus 900 further comprises a plurality of individually controllable radiation sources 906 configured to emit a plurality of beams. As illustrated in FIG. 33, these radiation sources 906 are self-radiating contrast devices. In some embodiments, the self-radiating contrast device 906 is a radiant light emitting diode (eg, a light emitting diode (LED), an organic LED (OLED), a polymer LED (PLED)), or a laser diode (eg, a solid state laser diode). ). In one embodiment, each individually controllable element 906 is a blue-violet laser diode (eg, Sanyo model number DL-3146-151). Such diodes are supplied by companies such as Sanyo, Nichia, OSRAM, and Nitride. In some embodiments, the diode emits radiation having a wavelength of about 365 nm or about 405 nm. In some embodiments, the diode can provide an output power selected from the range of 0.5 mW to 200 mW. In one embodiment, the size of the laser diode (bare die) is selected from the range of 100 μm to 800 μm. In some embodiments, the laser diode has a light emitting region selected from the range of 1 μm ² to 5 μm ² . In some embodiments, the laser diode has a divergence angle selected from the range of 7 degrees to 44 degrees. In some embodiments, the diodes are configured to provide a total brightness of about 6.4 × 10 ⁸ W / (m ² · sr) or greater (eg, light emitting area, divergence angle, output power, etc.). ).

  The individually controllable device 906 is disposed on the frame 908 and may extend along the Y direction and / or along the X direction. Although one frame 908 is illustrated, the lithographic apparatus may have a plurality of frames 908. The frame 908 is further provided with a lens 920. Frame 908, and thus individually controllable self-radiating contrast device 906 and lens 920, are substantially stationary in the XY plane. Frame 908, individually controllable contrast device 906, and lens 920 may be moved in the Z direction by actuator 910.

  The self-radiating contrast device 906 may be configured to emit a beam, and the projection systems 920, 924, 930 may be configured to project the beam onto a target portion of the substrate. Self-radiating contrast device 906 and the projection system form an optical column. The lithographic apparatus 900 may comprise an actuator (eg, a motor 918) configured to move the optical column or a portion thereof relative to the substrate. A field lens 924 and an imaging lens 930 are disposed on the frame 912, and the frame 912 may be rotatable using its actuator. The combination of the field lens 924 and the imaging lens 930 forms a movable optical system 914. In use, the frame 912 rotates about its own axis 916, for example, in the direction indicated by the arrow in FIG. Frame 912 is rotated about axis 916 using an actuator (eg, motor 918). Further, the frame 912 may be moved in the Z direction by the motor 910, and thereby the movable optical system 914 may be displaced with respect to the substrate support portion 902. In FIG. 33, two optical columns are each shown on the opposite side of the lithographic apparatus. In practice, the lithographic apparatus may comprise more than two optical columns, which may be distributed eg in the periphery of the lithographic apparatus. Each of the optical columns comprises one or more self-radiating contrast devices 906 and a stationary part 920 of the projection system. The rotatable portion of the optical column includes lenses 924, 930, which can be used in connection with a plurality of optical columns, for example when the frame 912 rotates.

  An aperture structure 922 having an aperture on the inside may be disposed above the lens 920 and between the lens 920 and the self-radiating contrast device 906. Aperture structure 922 can limit the diffractive effects of lens 920, associated individually controllable self-radiating contrast device 906, and / or adjacent lens 920 / individually controllable self-radiating contrast device 906.

  The illustrated apparatus may be used by rotating the frame 912 and simultaneously moving the substrate on the substrate support 902 below the optical column. The self-radiating contrast device 906 can emit a beam through the lenses 920, 924, 930 when they are substantially aligned with each other. By moving the lenses 924, 930, the image of the beam on the substrate scans a portion of the substrate. At the same time, by moving the substrate on the substrate support 902 below the optical column, the portion of the substrate exposed to the image of the self-radiating contrast device 906 is also moved. Imaging a desired pattern on a resist layer on a substrate by controlling the rotation of the optical column or part thereof and controlling the on / off of the self-radiating contrast device 906 at high speed by a controller that controls the substrate speed. Can do.

  FIG. 34 is a schematic top view of the lithographic apparatus of FIG. 33 having a self-radiating contrast device 906. Similar to the lithographic apparatus 900 shown in FIG. 33, the lithographic apparatus 900 includes a substrate support portion 902 that holds the substrate 928, a positioning device 904 that moves the substrate support portion 902 with a maximum of 6 degrees of freedom, and an optical column for the substrate 928. A position / level sensor 932 for determining position and for determining whether the substrate 928 is horizontal with respect to the projection of the self-radiating contrast device 906. As shown, the substrate 928 has a rectangular shape, but circular substrates may be processed.

  A self-radiating contrast device 906 is disposed on the frame 926. The self-emitting contrast device 906 may be a emitting light emitting diode, such as a laser diode, such as a blue-violet laser diode. As shown in FIG. 34, contrast devices 906 may be arranged in an array extending in the XY plane, and one or more contrast devices 906 may be associated with each of the optical columns. The contrast device 906 is divided into four lithography wheels as shown in FIG. Each of the lithography wheels includes a number of optical columns mounted on a stationary frame 908 and a rotatable frame 912. Within one lithography wheel, the optical column may share a portion of the optical column mounted on a rotatable frame 912 such as lenses 924, 930. That is, the lenses 924, 930 may be used later by a separate optical column of the lithography wheel as the frame rotates.

  The array may be an elongated line. In certain embodiments, the array may be a one-dimensional array of one or more individually addressable contrast devices 906. In certain embodiments, the array may be a two-dimensional array of one or more individually addressable contrast devices 906.

  A rotatable frame 912 may be provided, which may rotate in the direction illustrated by the arrows. The rotatable frame may be provided with lenses 924 and 930 (see FIG. 33) for providing an image of each movable individual contrast device 906.

  The apparatus may be provided with an actuator configured to rotate the rotatable frame 912 and rotate the rotating portion of the optical column including the lenses 924, 930 with it.

  During the generation of the pattern, the substrate 928 is preferably moved in the scanning direction with a constant scanning speed vscan. The substrate 928 is divided into a number of elongated portions 936 in a direction substantially perpendicular to the scanning direction. Each elongate portion 936 is associated with its own optical column, and each optical column comprises a number of self-radiating contrast devices 906 and a stationary portion 920 of the projection system. The rotatable portion of the optical column includes lenses 924, 930 and may be used with respect to other elongated portions 936 that are covered by the rotatable frame 912. Each elongated portion 936 is divided into a number of target portions 938 that are adjacent in the scanning direction and partially overlap. During the scanning movement of the substrate, one elongated portion of the target portion is subsequently exposed with the beam of the associated optical column contrast device 906. These target portions 938 overlap with adjacent target portions 938 of adjacent elongated portions 936 and overlap with adjacent target portions 938 of the same elongated portion 936. This overlap is required to obtain a reliable pattern over the entire substrate surface.

  In some embodiments, one optical column may be provided across all elongate portions 936 in a direction substantially perpendicular to the scan direction, thereby producing a pattern on the substrate in a single scan.

  When projecting a pattern onto a substrate, it is desirable that the patterned beam projected onto the substrate be accurately aligned and focused on the surface of the substrate where the pattern is to be generated.

  In this application, the terms “align” and “alignment” refer to the patterns generated on the target portion 938 of the optical column connected to each other, and the overall pattern is due to inaccuracies in the positioning of the optical column relative to the substrate. It means that the optical column is arranged or controlled so as not to include any error.

An alignment control system 956 is provided to control the alignment of the optical column with respect to the substrate. As one possible embodiment is shown in Figure 35. The alignment control system 956 adjusts the position of one or more beams of the optical column based on the measured position and a position measurement device 944 for determining the position of the optical column relative to a reference for each optical column. And an alignment adjustment device 954.

  The alignment control system 956 is configured to mutually determine the position of the optical column before the actual lithographic process is started. The positions of the optical columns are determined with respect to the reference object 940. The reference object 940 may be a substrate 928 having some reference marks, but is preferably a separate object mounted on the substrate support 902. The reference object 940 has several marks. The reference object 940 is made with high accuracy and extends across the entire width of the substrate.

  Those marks on the reference object 940 are arranged so that one mark is provided for each overlapping portion of the target portions 938 of two adjacent optical columns of two or more optical columns. As a result, this mark can be used to measure the position of each of two adjacent optical columns. In this case, the position measuring device 944 of each optical column may include an image sensor 952 (see the embodiment of FIG. 35). The image sensor 952 can be used to determine the position of the mark in the X and Y directions (ie, these are the directions in the main plane of the substrate 928). Based on this information, the relative positions of the target portions 938 can be determined when necessary, and as a result, a correction operation can be performed.

  The alignment adjustment device 954 is configured to perform such a correction operation. The correction operation may be, for example, adjustment of patterns to be projected in the target portion 938.

  For example, the intensity and / or drive time of the contrast device 906 may be adapted based on the relative position of two adjacent optical columns. In this way, the patterns to be projected on two adjacent target portions are adjusted.

  It may also be possible to skip some lines in one or both of the target portions 938 to avoid double projection of the pattern on the substrate 928 when the overlap between the two target portions is too great.

  In another possible approach, scaling of the data pattern in the X or Y direction may be performed to compensate for the position offset.

  In the alignment adjustment device 954 of this embodiment, the alignment adjustment is not performed by any direct mechanical adjustment but in the lithography process itself (for example, adjustment of the position of the target portions 938). Alternatively or in conjunction therewith, the correction operation described above may include mechanical adjustments within the lithographic apparatus (e.g. changing the relative positions of the optical columns). The alignment adjuster 954 may be a separate processing unit or processor, but in one embodiment, the main processing unit or main processor responsible for driving the contrast device 906 to generate a pattern on the substrate 928. It is a part.

  In an alternative embodiment, a movable part of the lithographic apparatus, for example a movable lens 920 (see FIG. 33), may be used to correct the alignment of the optical columns. In this case, the movable lens element 920 may be driven by an actuator 942 (see FIG. 33) to correct the relative position of the target portions 938 based on the measured position of the target portion 938. In this embodiment, the alignment adjustment device includes a movable lens element 920 and an actuator 942, and the actuator 942, or generally the lithographic apparatus, includes a processing device or processor for controlling the alignment adjustment movement of the movable lens element 920. In addition. The movable lens element 920 may be used for other adjustments of the optical column.

  Next, possible embodiments of the position measuring device will be described in detail.

  FIG. 35 shows an embodiment for an alignment controller or controller that includes a position measurement device 944 for determining the position of each optical column beam relative to a reference object 940 and an alignment adjustment device 954. The position measuring device 944 is integrated in the optical column.

  A reference object 940 is disposed below the corresponding optical column to determine the position of the beam of the corresponding optical column. The beam is projected onto the reference object 940 by the contrast device 906. The projection beam passes through a lens 920, a beam splitter or beam splitter 946, a quarter wave plate 948, and lenses 924, 930 on the rotatable frame 8. The beam is reflected by the reference object 940. The reflected beam includes an image of a mark provided on the reference object 940. The reflected beam again passes through lenses 924 and 930 and quarter wave plate 948. Due to the phase shift caused by quarter wave plate 948, the reflected beam is now reflected by beam splitter 946. The reflected beam goes to the image sensor 952 (for example, a CCD camera) via the lens 950.

  Such a position measuring device 944 is disposed in each optical column. As described above, the reference object 940 includes at least one mark in each overlapping region of the two target portions. By analyzing an image containing the same mark on the image sensor 952 of two adjacent optical columns, the relative positions of the optical columns can be determined.

  Analysis of the image projected on the image sensor 952 may be performed by a processing device or processor that is part of the image sensor 952, or by a separate processing device. The processing apparatus may be part of a central processing unit or central processor of the lithographic apparatus. In some embodiments, this analysis may be performed in alignment adjustment device 954.

  By repeating such alignment control for all optical columns, the relative positions of all target portions of the optical column can be determined. At the same time, the position of the lithography wheel can be determined mutually. Based on this information, the alignment adjuster 954 can adjust the patterns to be projected at all target portions, thereby projecting a pattern for the entire substrate 928 onto the substrate 928. Can do. In this way, errors due to misalignment in the overlapping region of two adjacent target portions are avoided.

  The alignment position measurement of the optical column is typically performed before the actual lithographic process is started. Such a calibration process may be performed during lithographic apparatus setup and during periodic calibration of the lithographic apparatus, but may also be performed before every lithographic projection process.

  Referring to FIG. 34, when the lithographic process is started, the substrate 928 is moved toward the lithography wheel at a certain scanning speed vscan. The sensor 932 can measure the position of the substrate relative to the optical column before the substrate reaches the lithography wheel. If desired, the position of the substrate (eg in the Y direction) can be changed to properly position the substrate on the lithography wheel. Further, the alignment adjustment device 954 may adjust the entire pattern. However, by providing the alignment control system 956, errors in the pattern itself due to misalignment between the optical columns are highly avoided.

Embodiments are also given by the numbered sections below.
1. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator configured to expose an exposure area of the substrate with a plurality of beams modulated according to a desired pattern;
A projection system configured to project a modulated beam onto a substrate, comprising a lens array for receiving the plurality of beams, the lens array being moved relative to the modulator during exposure of the exposure region And a configured projection system.
2. The lithographic apparatus of embodiment 1, wherein each lens comprises at least two lenses arranged along at least one beam path of the plurality of beams from the modulator to the substrate.
3. The lithographic apparatus according to embodiment 2, wherein the first lens of the at least two lenses comprises a field lens and the second lens of the at least two lenses comprises an imaging lens.
4). The lithographic apparatus according to embodiment 3, wherein the focal plane of the field lens coincides with the rear focal plane of the imaging lens.
5. The lithographic apparatus according to embodiment 3 or 4, wherein the imaging lens comprises a double-sided aspheric lens.
6). The lithographic apparatus according to any one of embodiments 3 to 5, wherein the focal length of the field lens is such that the field size of the imaging lens is smaller than a half angle of 2 degrees to 3 degrees.
7). The lithography of any of embodiments 3-6, wherein the focal length of the imaging lens is such that the imaging lens does not exceed the diameter of the field lens when the substrate has an NA of 0.2. apparatus.
8). The lithographic apparatus according to embodiment 7, wherein the focal length of the imaging lens is equal to the diameter of the field lens.
9. The lithographic apparatus according to any of embodiments 3 to 8, wherein a plurality of beams are imaged by a combination of a single field lens and the imaging lens.
10. The lithographic apparatus according to any of embodiments 3-9, further comprising a focus control device disposed along at least one beam path of the plurality of beams from the modulator to the field lens.
11. The lithographic apparatus according to embodiment 10, wherein the focus control device comprises a folding mirror and a movable rooftop.
12 The lithographic apparatus according to embodiment 3, further comprising a lens that collimates a beam from the first lens to the second lens in the path.
13. The lithographic apparatus according to embodiment 12, wherein a lens that collimates a beam in the path is substantially stationary relative to the modulator.
14 14. The lithographic apparatus according to embodiment 3, 12 or 13, further comprising a lens for focusing at least one of the plurality of beams directed toward the first lens between the modulator and the first lens in the path.
15. The lithographic apparatus according to embodiment 14, wherein the lens for focusing the beam in the path is substantially stationary relative to the modulator.
16. The lithographic apparatus according to any of embodiment 3 or 12-15, wherein the optical axis of the field lens coincides with the optical axis of the imaging lens.
17. The lithographic apparatus of embodiment 2, wherein a first lens of the at least two lenses comprises at least two sub-lenses, and at least one of the plurality of beams is focused midway between the two sub-lenses.
18. The lithographic apparatus according to embodiment 17, wherein each of the at least two sub-lenses has a substantially equal focal length.
19. The lithographic apparatus according to embodiment 2, 17 or 18, wherein the first lens is arranged to output a collimated beam towards a second lens of the at least two lenses.
20. The lithographic apparatus according to any one of embodiments 2 or 17-19, configured to move the first lens of the at least two lenses at a different speed than the second lens of the at least two lenses.
21. The lithographic apparatus according to embodiment 20, wherein the speed of the second lens is twice that of the first lens.
22. The lithographic apparatus according to embodiment 1, wherein each lens comprises a 4f telecentric in / telecentric out imaging system.
23. The lithographic apparatus according to embodiment 22, wherein the 4f telecentric in / telecentric out imaging system comprises at least six lenses.
24. The lithographic apparatus according to embodiment 1, further comprising a derotator between the modulator and the lens array.
25. 25. The lithographic apparatus according to embodiment 24, wherein the derotator comprises a Pechan prism.
26. 26. The lithographic apparatus according to embodiment 24 or 25, wherein the derotator is configured to move at half the speed of the lens array.
27. 27. The lithographic apparatus according to any of embodiments 24 to 26, further comprising a parabolic mirror for reducing a beam size between the modulator and the derotator.
28. 28. The lithographic apparatus according to any of embodiments 24-27, further comprising a parabolic mirror for increasing the size of the beam between the derotator and the lens array.
29. 29. The lithographic apparatus according to any of embodiments 1-28, wherein the lens array is rotated relative to the modulator.
30. 30. The lithographic apparatus according to any of embodiments 1-29, wherein the modulator comprises a plurality of individually controllable radiation sources for emitting electromagnetic radiation.
31. 30. The lithographic apparatus according to any of embodiments 1-29, wherein the modulator comprises a micromirror array.
32. 30. The lithographic apparatus according to any of embodiments 1-29, wherein the modulator comprises a radiation source or an acousto-optic modulator.
33. The device manufacturing method
Providing a plurality of beams modulated according to a desired pattern;
Projecting the plurality of beams onto a substrate using a lens array that receives the plurality of beams;
Moving the lens array relative to the beam during the projection.
34. 34. The method of embodiment 33, wherein each lens comprises at least two lenses arranged along a beam path of the at least one beam from a source of at least one beam of the plurality of beams to a substrate.
35. 35. The method of embodiment 34, wherein the first lens of the at least two lenses comprises a field lens and the second lens of the at least two lenses comprises an imaging lens.
36. 36. The method of embodiment 35, wherein the focal plane of the field lens coincides with the back focal plane of the imaging lens.
37. 37. The method of embodiment 35 or 36, wherein the imaging lens comprises a double-sided aspheric lens.
38. 38. The method of any of embodiments 35 to 37, wherein the focal length of the field lens is such that the field size of the imaging lens is smaller than a half angle of 2 degrees to 3 degrees.
39. The method of any of embodiments 35-38, wherein the focal length of the imaging lens is such that the imaging lens does not exceed the diameter of the field lens when the substrate has a NA of 0.2. .
40. 40. The method of embodiment 39, wherein the focal length of the imaging lens is equal to the diameter of the field lens.
41. 41. The method as in any of the embodiments 35-40, wherein a plurality of beams are imaged by combining a single field lens and the imaging lens.
42. 42. The method as in any of the embodiments 35-41, further comprising using a focus control device between a source of at least one of the plurality of beams and the field lens.
43. 43. The method of embodiment 42, wherein the focus control device comprises a folding mirror and a movable rooftop.
44. 36. The method of embodiment 35, further comprising collimating the at least one beam using a lens between the first lens and the second lens.
45. 45. The method of embodiment 44, wherein the lens that collimates the at least one beam is substantially stationary with respect to the at least one beam.
46. Embodiment 35, further comprising focusing at least one of the plurality of beams toward the first lens using a lens in the path between the source of the at least one beam and the first lens. 44 or 45.
47. 47. The method of embodiment 46, wherein the lens that focuses the at least one beam is substantially stationary with respect to the at least one beam.
48. 48. The method of any of the embodiments 35 or 44 to 47, wherein the optical axis of the field lens coincides with the optical axis of the corresponding imaging lens.
49. 35. The method of embodiment 34, wherein a first lens of the at least two lenses comprises at least two sub-lenses, and at least one of the plurality of beams is focused midway between the two sub-lenses.
50. 50. The method of embodiment 49, wherein each of the at least two sub-lenses has a substantially equal focal length.
51. 51. The method of embodiment 34, 49, or 50, wherein the first lens is arranged to output a collimated beam toward a second lens of the at least two lenses.
52. 52. The method of any of embodiments 34 or 49 through 51, comprising moving the first lens of the at least two lenses at a different speed than the second lens of the at least two lenses.
53. 53. The method of embodiment 52, wherein the speed of the second lens is twice that of the first lens.
54. 34. The method of embodiment 33, wherein each lens comprises a 4f telecentric in / telecentric out imaging system.
55. 55. The method of embodiment 54, wherein the 4f telecentric in / telecentric out imaging system comprises at least six lenses.
56. 34. The method of embodiment 33, further comprising derotating the beam using a derotator between the source of the beam and the lens array.
57. 57. The method of embodiment 56, wherein the derotator comprises a Pechan prism.
58. 58. The method of embodiment 56 or 57 comprising moving the derotator at half the speed of the lens array.
59. 59. The method as in any of the embodiments 56-58, further comprising using a parabolic mirror between the source of the beam and the derotator to reduce the size of the beam.
60. 60. The method as in any of the embodiments 56-59, further comprising using a parabolic mirror between the derotator and the lens array to increase the size of the beam.
61. 61. The method as in any of the embodiments 33-60, comprising rotating the lens array relative to the beam.
62. 62. The method as in any of the embodiments 33-61, wherein each of a plurality of individually controllable radiation sources emits each of the plurality of beams.
63. 62. The method as in any of the embodiments 33-61, wherein a micromirror array emits the plurality of beams.
64. 62. The method as in any of the embodiments 33-61, wherein a radiation source or acousto-optic modulator generates the plurality of beams.
65. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources for emitting electromagnetic radiation and configured to expose an exposure area of the substrate with a plurality of beams modulated according to a desired pattern;
A projection system configured to project a modulated beam onto a substrate, comprising a lens array for receiving the plurality of beams, the lens array for the individually controllable radiation source during exposure of the exposure area A projection system configured to be moved.
66. The device manufacturing method
Providing a plurality of beams modulated according to a desired pattern using a plurality of individually controllable radiation sources;
Projecting the plurality of beams onto a substrate using a lens array that receives the plurality of beams;
Moving the lens array relative to the individually controllable radiation source during the projection.
67. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator configured to expose an exposure area of the substrate with a plurality of beams modulated according to a desired pattern;
A projection system configured to project a modulated beam onto a substrate, comprising a plurality of lens arrays for receiving the plurality of beams, each lens array being spaced apart along a beam path of the plurality of beams. A projection system provided.
68. 68. The lithographic apparatus according to embodiment 67, wherein the projection system is configured to move the lens array relative to the modulator during exposure of the exposure area.
69. 69. The lithographic apparatus according to embodiment 67 or 68, wherein in each array the lenses are arranged in a single body.
70. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources for emitting electromagnetic radiation, configured to expose an exposure area of the substrate with a plurality of beams modulated according to a desired pattern, all of the plurality of radiation sources at any one point in time; A modulator configured to move the plurality of radiation sources relative to the exposure area during exposure of the exposure area such that the exposure area can be exposed with fewer radiation sources;
A projection system configured to project the modulated beam onto the substrate.
71. The lithographic apparatus
A plurality of individually controllable radiation sources configured to provide a plurality of beams modulated according to a desired pattern, where at least one of the plurality of radiation sources emits and does not emit radiation A plurality of individually controllable radiation sources that are movable, and
A substrate holder configured to hold the substrate;
A projection system configured to project the modulated beam onto the substrate.
72. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources for emitting electromagnetic radiation, the plurality of radiation sources configured to expose an exposure area of a substrate with a plurality of beams modulated according to a desired pattern At least one radiation source with respect to the exposure area such that radiation from the at least one radiation source is adjacent or overlaps with radiation from at least one other radiation source of the plurality of radiation sources simultaneously. A modulator configured to move
A projection system configured to project the modulated beam onto the substrate.
73. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure region of a substrate, wherein at least one of the plurality of radiation sources is the exposure region A plurality of individually controllable radiation sources movable between places where radiation can be emitted and places where radiation cannot be emitted into the exposure area;
A projection system configured to project the modulated beam onto the substrate.
74. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, wherein the plurality of radiation sources during exposure of the exposure area And the modulator has an output to the exposure area of the plurality of beams, the output having a smaller area than an output area of the plurality of radiation sources. Having a modulator;
A projection system configured to project the modulated beam onto the substrate.
75. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation source arrays configured to supply a plurality of beams modulated according to a desired pattern to a corresponding exposure area of the substrate, each array corresponding to its corresponding exposure area Or moving the plurality of beams from each array relative to their corresponding exposure areas or moving both the array and the plurality of beams relative to their corresponding exposure areas when in use. A modulator in which an exposure area corresponding to an array of the plurality of arrays is adjacent to or overlaps with an exposure area corresponding to another array of the plurality of arrays;
A projection system configured to project the modulated beam onto the substrate.
76. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area Configured to move or move the plurality of beams relative to the exposure area or move each of the plurality of radiation sources and the plurality of beams relative to the exposure area, in use, Each radiation source is actuated by a gradient portion of the corresponding power / forward current curve; and
A projection system configured to project the modulated beam onto the substrate.
77. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area Each of the plurality of radiation sources and each of the plurality of beams are moved with respect to the exposure area, and each of the plurality of beams can be individually controlled. The radiation source comprises a blue-violet laser diode, a modulator,
A projection system configured to project the modulated beam onto the substrate.
78. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator configured to move relative to each other, wherein the plurality of radiation sources are arranged in at least two concentric circular arrays;
A projection system configured to project the modulated beam onto the substrate.
79. 79. The lithographic apparatus according to embodiment 78, wherein at least one of the circular arrays is offset relative to at least one other of the circular arrays.
80. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A plurality of radiation sources arranged around a center of the structure, the structure having an opening through the structure inside the plurality of radiation sources And
A projection system configured to project the modulated beam onto the substrate.
81. 81. The lithographic apparatus according to embodiment 80, further comprising a support that holds and supports a structure at or outside the radiation source.
82. 82. The lithographic apparatus according to embodiment 81, wherein the support comprises a bearing that allows movement of the structure.
83. 83. The lithographic apparatus according to embodiment 81 or 82, wherein the support comprises a motor that moves the structure.
84. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator configured to move relative to the plurality of radiation sources arranged around the center of the structure;
A support configured to support the structure at or outside of the radiation source, and to rotate or allow rotation of the structure;
A projection system configured to project the modulated beam onto the substrate.
85. 85. The lithographic apparatus according to embodiment 84, wherein the support comprises a bearing that allows rotation of the structure.
86. 86. The lithographic apparatus according to embodiment 84 or 85, wherein the support comprises a motor that rotates the structure.
87. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator disposed on a structure that is movable by being disposed on a movable plate; and
A projection system configured to project the modulated beam onto the substrate.
88. 90. The lithographic apparatus according to embodiment 87, wherein the movable structure is rotatable.
89. 90. The lithographic apparatus according to embodiment 87 or 88, wherein the movable plate is rotatable.
90. 90. The lithographic apparatus according to embodiment 89, wherein the rotational center of the movable plate does not coincide with the rotational center of the movable structure.
91. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator, wherein the plurality of radiation sources are disposed in or on a movable structure;
A fluid conduit configured within the movable structure to supply temperature control fluid at least adjacent to the plurality of radiation sources;
A projection system configured to project the modulated beam onto the substrate.
92. 92. The lithographic apparatus according to embodiment 91, further comprising a sensor disposed in or on the movable structure.
93. 94. The lithographic apparatus according to embodiment 91 or 92, further comprising a sensor disposed at a location adjacent to at least one radiation source of the plurality of radiation sources and not within or on the movable structure.
94. 94. The lithographic apparatus according to embodiment 92 or 93, wherein the sensor comprises a temperature sensor.
95. 95. The lithographic apparatus according to any of embodiments 92-94, wherein the sensor comprises a sensor configured to measure expansion and / or contraction of the structure.
96. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator, wherein the plurality of radiation sources are disposed in or on a movable structure;
Fins disposed in or on the structure to provide temperature control of the movable structure;
A projection system configured to project the modulated beam onto the substrate.
97. 97. The lithographic apparatus according to embodiment 96, further comprising stationary fins that cooperate with the fins in or on the movable structure.
98. At least two fins are provided in or on the movable structure, and the stationary fin is disposed between at least one of the fins in or on the movable structure and at least one other. The lithographic apparatus according to embodiment 97.
99. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator, wherein the plurality of radiation sources are disposed in or on a movable structure;
A fluid supply device configured to supply fluid to an outer surface of the structure to control the temperature of the structure;
A projection system configured to project the modulated beam onto the substrate.
100. 100. The lithographic apparatus according to embodiment 99, wherein the fluid supply device is configured to supply a gas.
101. 100. The lithographic apparatus according to embodiment 99, wherein the fluid supply device is configured to supply a liquid.
102. 102. The lithographic apparatus according to embodiment 101, further comprising a fluid confinement structure configured to maintain the liquid in contact with the structure.
103. 103. The lithographic apparatus according to embodiment 102, wherein the fluid confinement structure is configured to maintain a seal between the structure and the fluid confinement structure.
104. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources, configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, and configured to move each of the plurality of radiation sources relative to the exposure area The modulator being
A structurally separated lens attached to or near each radiation source of the plurality of radiation sources and movable with the corresponding radiation source.
105. 107. The lithographic apparatus according to embodiment 104, further comprising an actuator configured to displace the lens relative to a corresponding radiation source.
106. 106. The lithographic apparatus according to embodiment 104 or 105, further comprising an actuator configured to displace the lens and the corresponding radiation source relative to the structure supporting the lens and the corresponding radiation source.
107. 107. The lithographic apparatus according to embodiment 105 or 106, wherein the actuator is configured to move the lens with a maximum of three degrees of freedom.
108. 108. The lithographic apparatus according to any of embodiments 104-107, further comprising an aperture structure downstream from at least one of the plurality of radiation sources.
109. 108. The lithographic apparatus according to any of embodiments 104-107, wherein the lens is attached to a structure that supports the lens and its corresponding radiation source with a material having high thermal conductivity.
110. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources, configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, and configured to move each of the plurality of radiation sources relative to the exposure area The modulator being
A spatial coherence disruption device configured to scramble radiation from at least one of the plurality of radiation sources;
A projection system configured to project the modulated beam onto the substrate.
111. 110. The lithographic apparatus according to embodiment 110, wherein the spatial coherence disruption device comprises a stationary plate and the at least one radiation source is movable relative to the plate.
112. 110. The lithographic apparatus according to embodiment 110, wherein the spatial coherence disruption device comprises at least one selected from a phase modulator, a rotating plate, or a vibrating plate.
113. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources, configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, and configured to move each of the plurality of radiation sources relative to the exposure area The modulator being
A sensor configured to measure focus with respect to at least one radiation source of the plurality of radiation sources, wherein at least a portion of the sensor is within or on the at least one radiation source;
A projection system configured to project the modulated beam onto the substrate.
114. 114. The lithographic apparatus according to embodiment 113, wherein the sensor is configured to measure focus individually for each radiation source.
115. 114. The lithographic apparatus according to embodiment 113 or 114, wherein the sensor is a knife edge focus detector.
116. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources, configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, and configured to move each of the plurality of radiation sources relative to the exposure area The modulator being
A transmitter configured to wirelessly transmit signals and / or power to the plurality of radiation sources to control and / or power each of the plurality of radiation sources;
A projection system configured to project the modulated beam onto the substrate.
117. 115. The lithographic apparatus according to embodiment 116, wherein the signal comprises a plurality of signals and further comprises a demultiplexer for sending each of the plurality of signals to a corresponding radiation source.
118. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator configured to move relative to the plurality of radiation sources disposed within or on a movable structure;
A wire connecting a controller to the movable structure and delivering a plurality of signals and / or power to the plurality of radiation sources to respectively control and / or power the plurality of radiation sources;
A projection system configured to project the modulated beam onto the substrate.
119. 119. The lithographic apparatus according to embodiment 118, wherein the signal comprises a plurality of signals and further comprises a demultiplexer for sending each of the plurality of signals to a corresponding radiation source.
120. 120. The lithographic apparatus of embodiment 118 or 119, wherein the wiring comprises optical wiring.
121. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources, configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, and configured to move each of the plurality of radiation sources relative to the exposure area The modulator being
A sensor for measuring a property of radiation transmitted to or to be transmitted to the substrate by at least one of the plurality of radiation sources;
A projection system configured to project the modulated beam onto the substrate.
122. 122. The lithographic apparatus according to embodiment 121, wherein at least a portion of the sensor is disposed within or on the surface of the substrate holder.
123. 123. The lithographic apparatus according to embodiment 122, wherein the at least part of the sensor is disposed on the inside or surface of the substrate holder at a position outside a region where the substrate is supported by the substrate holder.
124. 122. The lithographic apparatus according to any of embodiments 121-123, wherein at least a portion of the sensor is disposed on a side of the substrate that substantially extends in a scanning direction of the substrate in use.
125. 125. The lithographic apparatus according to any of embodiments 121 to 124, wherein at least a portion of the sensor is mounted in or on a surface of a frame that supports the movable structure.
126. 132. The lithographic apparatus according to any of embodiments 121-125, wherein the sensor is configured to measure radiation from the at least one radiation source outside the exposure area.
127. 130. The lithographic apparatus according to any of embodiments 121-126, wherein at least a portion of the sensor is movable.
128. 130. The lithographic apparatus according to any of embodiments 121-127, further comprising a controller configured to calibrate the at least one radiation source based on the sensor results.
129. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator configured to move relative to the plurality of radiation sources disposed within or on a movable structure;
A sensor for measuring the position of the movable structure;
A projection system configured to project the modulated beam onto the substrate.
130. 130. The lithographic apparatus according to embodiment 129, wherein at least a portion of the sensor is mounted in or on a surface of a frame that supports the movable structure.
131. The lithographic apparatus
A substrate holder configured to hold the substrate;
A modulator comprising a plurality of individually controllable radiation sources configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, each of the plurality of radiation sources being applied to the exposure area A modulator configured to move relative to each other, each of the plurality of radiation sources having or providing an identification means;
A sensor configured to detect the identification means;
A projection system configured to project the modulated beam onto the substrate.
132. 132. The lithographic apparatus according to embodiment 131, wherein at least some of the sensors are mounted in or on a frame that supports the plurality of radiation sources.
133. 132. The lithographic apparatus according to embodiment 131 or 132, wherein the identification means comprises the frequency of radiation from a corresponding radiation source.
134. 130. The lithographic apparatus according to any of embodiments 131 to 133, wherein the identification means comprises at least one selected from a barcode, individual identification by radio waves, or a mark.
135. The lithographic apparatus
A substrate holder configured to hold the substrate;
A plurality of individually controllable radiation sources, configured to supply a plurality of beams modulated according to a desired pattern to an exposure area of a substrate, and configured to move each of the plurality of radiation sources relative to the exposure area The modulator being
A sensor configured to detect radiation redirected by the substrate from at least one of the plurality of radiation sources;
A projection system configured to project the modulated beam onto the substrate.
136. 136. The lithographic apparatus according to embodiment 135, wherein the sensor is configured to determine a position of a spot of radiation incident on the substrate from the at least one radiation source from the redirected radiation.
137. 136. The lithographic apparatus according to any of embodiments 70-136, wherein the modulator is configured to rotate at least one radiation source about an axis substantially parallel to a propagation direction of the plurality of beams.
138. 136. The lithographic apparatus according to any of embodiments 70-137, wherein the modulator is configured to translate at least one radiation source in a direction that intersects a propagation direction of the plurality of beams.
139. 141. The lithographic apparatus according to any of embodiments 70-138, wherein the modulator comprises a beam deflector configured to move the plurality of beams.
140. 140. The lithographic apparatus according to embodiment 139, wherein the beam deflector is selected from the group consisting of a mirror, a prism, or an acousto-optic modulator.
141. 140. The lithographic apparatus according to embodiment 139, wherein the beam deflector comprises a polygon.
142. 140. The lithographic apparatus according to embodiment 139, wherein the beam deflector is configured to vibrate.
143. 140. The lithographic apparatus according to embodiment 139, wherein the beam deflector is configured to rotate.
144. 142. The lithographic apparatus according to any one of embodiments 70 to 143, wherein the substrate holder is configured to move the substrate in a certain direction, and the plurality of beams are supplied along the direction.
145. 142. The lithographic apparatus according to embodiment 144, wherein the movement of the substrate is a rotation.
146. 142. The lithographic apparatus according to any of embodiments 70-145, wherein the plurality of radiation sources are movable together.
147. 150. The lithographic apparatus according to any of embodiments 70-146, wherein the plurality of radiation sources are arranged in a circle.
148. 150. The lithographic apparatus according to any of embodiments 70-147, wherein the plurality of radiation sources are disposed on the plate with a gap therebetween.
149. 150. The lithographic apparatus according to any of embodiments 70-148, wherein the projection system comprises a lens array.
150. 150. The lithographic apparatus according to any of embodiments 70-149, wherein the projection system consists essentially of a lens array.
151. The lens of the lens array has a high numerical aperture, and the lithographic apparatus is configured to defocus the radiation associated with the lens from the substrate to substantially reduce the numerical aperture of the lens 149 or 150 lithographic apparatus.
152. 150. The lithographic apparatus according to any of embodiments 70-151, wherein each of the radiation sources comprises a laser diode.
153. 151. The lithographic apparatus according to embodiment 152, wherein each laser diode is configured to emit radiation having a wavelength of about 405 nm.
154. 150. The lithographic apparatus according to any of embodiments 70-153, further comprising a temperature controller configured to maintain the plurality of radiation sources at a substantially constant temperature during exposure.
155. 150. The lithographic apparatus according to embodiment 154, wherein the controller is configured to heat the plurality of radiation sources to the substantially constant temperature or a temperature in the vicinity thereof prior to exposure.
156. 150. The lithographic apparatus according to any of embodiments 70-155, comprising at least three separate arrays arranged along a direction, each array comprising a plurality of radiation sources.
157. 150. The lithographic apparatus according to any of embodiments 70-156, wherein the plurality of radiation sources comprises at least about 1200 radiation sources.
158. 158. The lithographic apparatus according to any of embodiments 70-157, further comprising an alignment sensor for determining alignment of at least one of the plurality of radiation sources with the substrate.
159. 150. The lithographic apparatus according to any of embodiments 70-158, further comprising a level sensor for determining a position of the substrate relative to a focus of at least one of the plurality of beams.
160. 160. The lithographic apparatus according to embodiment 158 or 159, further comprising a controller configured to change the pattern based on a result of the alignment sensor and / or a result of the level sensor.
161. 150. The lithographic apparatus according to any of embodiments 70-160, further comprising a controller configured to change the pattern based on a measurement of a temperature of or associated with at least one of the plurality of radiation sources. .
162. 160. The lithographic apparatus according to any of embodiments 70-161, further comprising a sensor for measuring a property of radiation transmitted to or to be transmitted to the substrate by at least one of the plurality of radiation sources.
163. The lithographic apparatus
A plurality of individually controllable radiation sources configured to provide a plurality of beams modulated according to a desired pattern;
A lens array comprising a plurality of lenslets;
A substrate holder configured to hold the substrate,
In use, there is no optical system between the plurality of radiation sources and the substrate except for the lens array.
164. Programmable patterning devices
A substrate comprising an array of emissive light emitting diodes spaced in at least one direction;
A lens array on the radiation downstream side of the radiation light emitting diode.
165. The lens array includes a microlens array having a plurality of microlenses, the number of the microlenses corresponds to the number of the radiant light emitting diodes, and the array of microspots selectively transmits radiation by the corresponding radiant light emitting diodes. 164. The programmable patterning device of embodiment 164, positioned to focus on.
166. 166. The programmable patterning device of embodiment 164 or 165, wherein the emissive light emitting diodes are spaced in at least two orthogonal directions.
167. 170. The programmable patterning device of any of embodiments 164 to 166, wherein the emitting light emitting diode is embedded in a material having low thermal conductivity.
168. The device manufacturing method
Providing a plurality of beams modulated according to a desired pattern to an exposure area of the substrate using a plurality of individually controllable radiation sources;
Moving at least one of the plurality of radiation sources while delivering the plurality of beams such that only a few of the plurality of radiation sources can expose the exposure area at any one time And
Projecting the plurality of beams onto a substrate.
169. The device manufacturing method
Providing a plurality of beams modulated according to a desired pattern using a plurality of individually controllable radiation sources;
Moving at least one of the plurality of radiation sources between a location that emits radiation and a location that does not emit radiation;
Projecting the plurality of beams onto a substrate.
170. A device manufacturing method includes providing a beam modulated according to a desired pattern using a plurality of individually controllable radiation sources, and supplying the modulated beam from the plurality of individually controllable radiation sources to a substrate. And projecting using only.
171. The device manufacturing method
Providing a plurality of electromagnetic radiation beams modulated according to a desired pattern using a plurality of individually controllable radiation sources;
Radiating from at least one of the plurality of radiation sources to radiation from at least one other of the plurality of radiation sources during exposure of the exposure region to at least one of the plurality of radiation sources relative to the exposure region. Moving them adjacent or overlapping at the same time;
Projecting the plurality of beams onto a substrate.
172. 171. The method as in any of the embodiments 168-171, wherein the moving comprises rotating at least one radiation source about an axis substantially parallel to a propagation direction of the plurality of beams.
173. 173. The method as in any one of embodiments 168 to 172, wherein the moving comprises translating at least one radiation source in a direction that intersects a propagation direction of the plurality of beams.
174. 174. The method as in any of the embodiments 168-173, wherein the moving comprises moving the plurality of beams using a beam deflector.
175. 171. The method of embodiment 174, wherein the beam deflector is selected from the group consisting of a mirror, a prism, or an acousto-optic modulator.
176. 174. The method of embodiment 174, wherein the beam deflector comprises a polygon.
177. 171. The method of embodiment 174, wherein the beam deflector is configured to vibrate.
178. 174. The method of embodiment 174, wherein the beam deflector is configured to rotate.
179. 171. The method as in any of the embodiments 168-178, comprising moving the substrate in a direction, wherein the plurality of beams are provided along the direction.
180. 170. The method of embodiment 179, wherein the movement of the substrate is a rotation.
181. 181. The method as in any of the embodiments 168-180, comprising moving the plurality of radiation sources together.
182. 184. The method as in any of the embodiments 168-181, wherein the plurality of radiation sources are arranged in a circle.
183. 185. The method as in any of the embodiments 168 to 182, wherein the plurality of radiation sources are disposed on the plate with a gap therebetween.
184. 184. The method as in any of the embodiments 168-183, wherein the projecting includes forming an image of each of the beams on a substrate using a lens array.
185. 185. The method as in any of the embodiments 168-184, wherein the projecting comprises forming an image of each of the beams on a substrate using substantially only a lens array.
186. 186. The method as in any of the embodiments 168-185, wherein each of the radiation sources comprises a laser diode.
187. 185. The method of embodiment 186, wherein each laser diode is configured to emit radiation having a wavelength of about 405 nm.
188. 188. A flat panel display manufactured according to the method of any of embodiments 168 to 187.
189. 188. An integrated circuit device manufactured according to the method of any of embodiments 168 to 187.
190. The radiation system
A plurality of movable radiation arrays each comprising a plurality of individually controllable radiation sources configured to provide a plurality of beams modulated according to a desired pattern;
A motor configured to move each of the radiating arrays.
191. 190. The radiation system of embodiment 190, wherein the motor is configured to rotate each of the radiation arrays about an axis substantially parallel to the direction of propagation of the plurality of beams.
192. 200. The radiation system of embodiment 190 or 191, wherein the motor is configured to translate each of the radiation arrays in a direction that intersects the propagation direction of the plurality of beams.
193. 195. The radiation system of any of embodiments 190 to 192, further comprising a beam deflector configured to move the plurality of beams.
194. 194. The radiation system of embodiment 193, wherein the beam deflector is selected from the group consisting of a mirror, a prism, or an acousto-optic modulator.
195. 194. The radiation system of embodiment 193, wherein the beam deflector comprises a polygon.
196. 194. The radiation system of embodiment 193, wherein the beam deflector is configured to vibrate.
197. 194. The radiation system of embodiment 193, wherein the beam deflector is configured to rotate.
198. 200. The radiation system of any of embodiments 190 to 197, wherein the plurality of radiation sources of each of the radiation arrays are movable together.
199. 200. The radiation system of any of embodiments 190 to 198, wherein the plurality of radiation sources of each of the radiation arrays are arranged in a circle.
200. 200. The radiation system of any of embodiments 190 to 199, wherein the plurality of radiation sources of each of the radiation arrays are disposed on a plate with a gap therebetween.
201. 200. The radiation system of any of embodiments 190-200, further comprising a lens array associated with each of the radiation arrays.
202. 202. The radiation system of embodiment 201, wherein each of the plurality of radiation sources of each radiation array is associated with a lens of a lens array associated with the radiation array.
203. The radiation system of any of embodiments 190 to 202, wherein each of the plurality of sources of each radiation array comprises a laser diode.
204. 200. The radiation system of embodiment 203, wherein each laser diode is configured to emit radiation having a wavelength of about 405 nm.
205. A lithographic apparatus for exposing a substrate with radiation comprises a programmable patterning device having from 100 to 25000 self-emitting individually addressable elements.
206. 220. The lithographic apparatus according to embodiment 205, comprising at least 400 self-emitting individual addressable elements.
207. 220. The lithographic apparatus according to embodiment 205, comprising at least 1000 self-emitting individual addressable elements.
208. The lithographic apparatus according to any of embodiments 205-207, comprising fewer than self-radiating individually addressable elements less than 10,000.
220. The lithographic apparatus according to any of embodiments 205-207, comprising fewer than 209.5000 self-emitting individual addressable elements.
210. 220. The lithographic apparatus according to any of embodiments 205-209, wherein the self-emitting individual addressable element is a laser diode.
211. 200. The lithographic apparatus according to any of embodiments 205-209, wherein the self-emitting individual addressable element is configured to have a spot size on the substrate selected from a range of 0.1 microns to 3 microns.
212. 200. The lithographic apparatus according to any of embodiments 205-209, wherein the self-emitting individual addressable element is configured to have a spot size on a substrate of about 1 micron.
213. A lithographic apparatus for exposing a substrate with radiation comprises a programmable patterning device having from 100 to 25000 self-emitting individual addressable elements normalized to an exposure field length of 10 cm.
214. 214. The lithographic apparatus of embodiment 213, comprising at least 400 self-emitting individual addressable elements.
215. 214. The lithographic apparatus of embodiment 213, comprising at least 1000 self-emitting individual addressable elements.
220. The lithographic apparatus according to any of embodiments 213 to 215, comprising fewer than 216.10000 self-emitting individual addressable elements.
219. The lithographic apparatus according to any of embodiments 213 to 215, comprising fewer than 2175,000 self-emitting individual addressable elements.
218. 220. The lithographic apparatus according to any of embodiments 213 to 217, wherein the self-emitting individual addressable element is a laser diode.
219. 222. The lithographic apparatus according to any of embodiments 213 to 217, wherein the self-emitting individual addressable element is configured to have a spot size on the substrate selected from a range of 0.1 microns to 3 microns.
220. 222. The lithographic apparatus according to any of embodiments 213 to 217, wherein the self-emitting individual addressable element is configured to have a spot size on a substrate of about 1 micron.
221. The programmable patterning device comprises a rotatable disk having from 100 to 25000 self-emitting individual addressable elements.
222. 223. The programmable patterning device of embodiment 221, wherein the disk comprises at least 400 self-radiating individually addressable elements.
223. 224. The programmable patterning device of embodiment 221, wherein the disk comprises at least 1000 self-radiating individually addressable elements.
224. 224. The programmable patterning device of any of embodiments 221-223, wherein the disk comprises fewer than 10,000 self-radiating individually addressable elements.
225. 224. The programmable patterning device of any of embodiments 221-223, wherein the disk comprises fewer than 5000 self-emitting individual addressable elements.
226. 225. The programmable patterning device of any of embodiments 221-225, wherein the self-emitting individual addressable element is a laser diode.
227. One or more uses of the present invention in the manufacture of flat panel displays.
228. One or more uses of the present invention in integrated circuit packaging.
229. The lithographic method comprises exposing a substrate with radiation using a programmable patterning device having self-emitting elements, wherein the power consumption of the programmable patterning device for operating the self-emitting elements during the exposure is 10 kW Is less than.
230. 227. The method of embodiment 229, wherein the power consumption is less than 5 kW.
231. 230. The method of embodiment 229 or 230, wherein the power consumption is at least 100 mW.
232. Embodiment 229. The method of any of embodiments 229 to 231 wherein the self-emitting element is a laser diode.
233. The method of embodiment 232, wherein said laser diode is a blue-violet laser diode.
234. The lithographic method comprises exposing the substrate with radiation using a programmable patterning device having self-emitting elements, wherein the light output per emitting element in use is at least 1 mW.
235. 234. The method of embodiment 234, wherein the light output is at least 10 mW.
236. 234. The method of embodiment 234, wherein the light output is at least 50 mW.
237. 234. The method of any of embodiments 234 to 236, wherein the light output is less than 200 mW.
238. 234. The method of any of embodiments 234 to 237, wherein the self-emitting element is a laser diode.
239. 238. The method of embodiment 238, wherein the laser diode is a blue-violet laser diode.
240. 234. The method of embodiment 234, wherein the light output is greater than 5 mW and less than or equal to 20 mW.
241. 234. The method of embodiment 234, wherein the light output is greater than 5 mW and less than or equal to 30 mW.
242. 234. The method of embodiment 234, wherein the light output is greater than 5 mW and less than or equal to 40 mW.
243. [00117] 234. The method as in any of the embodiments 234-242, wherein the self-emitting element operates in a single mode.
244. The lithographic apparatus
A programmable patterning device having a self-radiating element;
A rotatable frame having an optical element for receiving radiation from the self-emitting element, wherein the optical element is a refractive optical element.
245. The lithographic apparatus
A programmable patterning device having a self-radiating element;
A rotatable frame having an optical element for receiving radiation from the self-emitting element, the rotatable frame having no reflective optical element for receiving radiation from any or all of the self-emitting elements .
246. The lithographic apparatus
A programmable patterning device;
A rotatable frame, and the rotatable frame includes a plate with an optical element, and a surface of the plate with the optical element is flat.
247. One or more uses of the present invention in the manufacture of flat panel displays.
248. One or more uses of the present invention in integrated circuit packaging.
249. A flat panel display manufactured according to any of the above methods.
250. An integrated circuit device manufactured according to any of the above methods.
251. The lithographic apparatus
Two or more optical columns configured to project a beam onto a target portion of a substrate, each of the two or more optical columns providing one or more of said beams Two or more optical columns comprising a plurality of radiation sources and a projection system for projecting the beam onto the target portion;
A scanning movement actuator configured to move the substrate at a scanning speed in a scanning direction relative to the two or more optical columns;
Two or more position measuring devices configured to determine the position of the corresponding two or more optical columns relative to a reference object.
252. The reference object comprises at least one mark, the at least one mark being arranged in an overlapping portion of a target portion of two adjacent optical columns of the two or more optical columns, 254. The lithographic apparatus of embodiment 251, wherein one mark is used for position measurement relative to each other of the two adjacent optical columns.
253. The reference object includes a plurality of marks, and each of the two or more position measuring devices includes an image sensor configured to receive a reflected image of one of the plurality of marks. 254. The lithographic apparatus of embodiment 251, wherein a position of an optical column can be determined based on the reflected image projected onto the image sensor.
254. The one mark is arranged in the overlapping part of the target part of two adjacent optical columns of the two or more optical columns, so that the reflected image is obtained by both position measuring devices. 254. The lithographic apparatus of embodiment 253, received.
255. The lithography of embodiment 253 or 254, wherein each of the two or more position measurement devices comprises a beam splitter and a quarter wave plate configured to direct the reflected image to the image sensor. apparatus.
256. 260. The lithographic apparatus according to any of embodiments 251-255, wherein the position measurement device is integrated into a corresponding optical column.
257. 260. The lithographic apparatus according to any of embodiments 251-256, comprising an alignment adjustment device for adjusting the position of one or more beams of the two or more optical columns based on measured positions.
258. 258. The lithographic apparatus according to embodiment 257, wherein the alignment adjustment device is configured to adjust the patterns to be projected into each target portion to align the two or more optical columns. .
259. The alignment adjustment device is configured to adjust the patterns by controlling the intensity and / or drive time of the one or more radiation sources of the corresponding two or more optical columns; 260. The lithographic apparatus of embodiment 257 or 258.
260. Each of the optical columns comprises at least one movable lens element, and an actuator is connected to said lens element to adjust the position of the pattern generated in the corresponding target portion, according to embodiments 251 to 259. Any lithographic apparatus.
261. 260. The lithographic apparatus according to any of embodiments 251-260, wherein the lithographic apparatus comprises more than two optical columns, each optical column comprising a position measuring device.
262. 260. The lithographic apparatus according to any of embodiments 251-261, wherein the position of the two or more optical columns is measured in two directions in the plane of the surface of the substrate onto which a pattern is to be projected.
263. 260. The lithographic apparatus according to any of embodiments 251-262, wherein the reference object is a substrate.
H.264. 260. The lithographic apparatus according to any one of embodiments 251-262, wherein the reference object is a reference plate mounted on a substrate support.
265. 260. The lithographic apparatus according to any of embodiments 251-264, wherein the radiation source is a self-radiating contrast device.
266. 260. The lithographic apparatus according to any one of embodiments 251-265, comprising an actuator for moving at least a portion of one of the two or more optical columns relative to the substrate.
267. Embodiment 251 is a method for aligning an optical column of a lithographic apparatus according to any one of embodiments 251-266, the method comprising
Measuring the position of the target portion of a number of optical columns relative to a reference object;
Comparing the positions of target portions of adjacent optical columns with each other;
Adjusting the patterns projected onto the target portion to align the optical column.
268. The reference object comprises at least one mark, the at least one mark being arranged in an overlapping portion of a target portion of two adjacent optical columns of the two or more optical columns, 268. The method of embodiment 267, wherein the measured position of the at least one mark in two adjacent optical columns is used to mutually determine the position of the two adjacent optical columns.

  Although this document describes the use of a lithographic apparatus as an example in the manufacture of certain devices or structures (eg, integrated circuits or flat panel displays), the lithographic apparatus and lithographic methods described herein may be used for other applications. It should be understood that it can be applied. Other applications include integrated circuits, integrated optical systems, guidance and detection patterns for magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), OLED displays, thin film magnetic heads, micro electromechanical devices (MEMS), micro optics Electromechanical system (MOEMS), DNA chip, packaging (for example, flip chip, rewiring, etc.), or flexible display or electronic device (conformer that can be wound and bent like paper and has no deformation It can be used for the manufacture of, but not limited to, bull, uneven, thin and / or lightweight displays or electronic devices (eg flexible plastic displays). Also, for example in the case of flat panel displays, the apparatus and method according to the present invention can be used to help produce various layers such as thin film transistor layers and / or color filter layers. For those other applications, those skilled in the art will consider that the terms "wafer" or "die" herein are considered synonymous with the more general terms "substrate" or "target portion", respectively. Will be able to understand. The substrates mentioned in this document are processed before or after exposure, for example by a track (typically a device that applies a resist layer to the substrate and develops the resist after exposure), a metrology tool, and / or an inspection tool. May be. Where applicable, the disclosure herein may be applied to these or other substrate processing apparatus. The substrate may also be processed multiple times, for example to produce a multi-layer IC, in which case the term substrate herein may also mean a substrate comprising a number of processing layers that have already been processed.

  As used herein, the terms “radiation” and “beam” refer to ultraviolet (UV) radiation (eg, having a wavelength of about 365 nm, 248 nm, 193 nm, 157 nm, or 126 nm) and extreme ultraviolet (EUV) radiation (eg, 5 nm to All types of electromagnetic radiation, including particle beams such as ion beams or electron beams.

  The flat panel display substrate may be rectangular in shape. A lithographic apparatus designed to expose such a substrate is designed to have an exposure area that covers the entire width of a rectangular substrate or a portion thereof (eg, half the full width). The substrate is scanned at the bottom of this exposure area, and the patterning device is scanned synchronously with the patterned beam, or the patterning device provides a changing pattern. In this way, all or part of the pattern is transferred to the substrate. If the exposure area covers the entire width of the substrate, the exposure is completed with a single scan. If the exposure area covers, for example, half the width of the substrate, the substrate is moved laterally after the first exposure, and further scanning is usually performed to expose the remainder of the substrate.

  As used herein, the term “patterning device” should be construed broadly to indicate any device that can be used to modulate the cross section of the radiation beam, such as generating a pattern on (a portion of) a substrate. The pattern imparted to the radiation beam may not exactly match the pattern desired for the target portion of the substrate if the pattern includes, for example, phase shift features or so-called assist features. Further, the pattern finally formed on the substrate may not coincide with the pattern formed on the individually controllable element array at any point of time. Such a situation is that the final pattern formed on each part of the substrate is formed by superposition of exposures for a predetermined time or a predetermined number of times, and the pattern on the individually controllable element array and / or This can happen when the relative position of the substrate changes. Typically, the pattern generated on the target portion of the substrate corresponds to a particular functional layer of a device such as an integrated circuit or flat panel display generated on the target portion (eg, a color filter layer of a flat panel display, or a flat panel Display thin film transistor layer). Examples of patterning devices include reticles, programmable mirror arrays, laser diode arrays, light emitting diode arrays, grating light valves, and LCD arrays. The pattern in the patterning device can be programmed using electronic means (eg, a computer). For example, the patterning device may comprise a plurality of programmable elements each capable of modulating the intensity of a portion of the radiation beam (eg, all devices other than the reticle referred to in the previous sentence are applicable). For example, the patterning device includes an electronically programmable patterning device having a plurality of programmable elements that impart a pattern to the radiation beam by modulating the phase of a portion of the radiation beam relative to an adjacent portion of the radiation beam. Including. Hereinafter, these are collectively referred to as a “contrast device”. In certain embodiments, the patterning device has at least 10 programmable elements, eg, at least 100, at least 1,000, at least 10,000, at least 100,000, at least 1,000,000. Or at least 10,000,000 programmable elements. Some embodiments of these devices are detailed below.

  A programmable mirror array. The programmable mirror array may comprise a matrix-addressable surface having a viscoelastic control layer and a reflective surface. The basic principle of this device is, for example, that the addressed area of the reflective surface reflects incident radiation as diffracted radiation, while the unaddressed area reflects incident radiation as non-diffracted radiation. is there. By using an appropriate spatial filter, non-diffracted radiation can be removed from the reflected beam so that only diffracted radiation reaches the substrate. In this way, a pattern is imparted to the beam according to the addressing pattern of the matrix-addressable surface. As an alternative, diffracted radiation may be removed by a filter so that non-diffracted radiation reaches the substrate. An array of diffractive optical MEMS devices can be used as well. A diffractive optical MEMS device may comprise a plurality of reflective ribbon-like sites, one deforming relative to the other to form a grating that reflects incident radiation as diffracted radiation. In other embodiments of the programmable mirror array, an array of matrix-like micromirrors is used. Each micromirror can be individually tilted about its axis by being appropriately applied with an electric field locally or by using piezoelectric driving means. The degree of tilt defines the state of each mirror. Each mirror can be controlled by an appropriate control signal from the controller when the element is not defective. Each non-defective element is controllable to assume any one of a series of states to adjust the intensity of the corresponding pixel in the projected radiation pattern. Again, the mirrors are addressable in a matrix, and the addressed mirrors reflect the incoming radiation beam in a different direction than the non-addressed mirrors. In this way, a pattern can be applied to the reflected beam according to the addressing pattern of the matrix-addressable mirror. The required matrix addressing can be performed using any suitable electronic means. More information on mirror arrays referred to in this document can be found, for example, from US Pat. No. 5,296,891, US Pat. No. 5,523,193, WO 98/38597, WO 98/33096. Are available and are incorporated herein in their entirety.

  -Programmable LCD array. An example of such a configuration is given in US Pat. No. 5,229,872, which is incorporated herein in its entirety.

  The lithographic apparatus may comprise one or more patterning devices, for example one or more contrast devices. For example, the lithographic apparatus may have a plurality of individually controllable element arrays, each array being controlled independently of each other. In this configuration, some or all of the individually controllable element arrays have at least one illumination system (or part of the illumination system), a support structure for the array, and / or a projection system. (Or part of the projection system) may be shared.

  When utilizing feature pre-bias processing, optical proximity correction features, phase change techniques, and / or multiple exposure techniques, for example, the pattern “displayed” on the individually controllable element array may be on a layer of the substrate or on the substrate. It should be understood that the pattern that is ultimately transferred to the layers can be substantially different. Similarly, the pattern ultimately generated on the substrate may not correspond to the pattern formed on the individually controllable element array at any point in time. Such a situation is that the final pattern formed on each part of the substrate is formed by superposition of exposures for a predetermined time or a predetermined number of times, and the pattern on the individually controllable element array and / or This can happen when the relative position of the substrate changes.

  The projection system and / or illumination system may be a variety of optical components such as refractive optical components, reflective optical components, magnetic optical components, electromagnetic optical components, electrostatic optical components, or other types of optical components, or these Combinations may be included to control the direction and shape of the radiation beam or other controls.

  The lithographic apparatus may comprise two (eg dual stage) or more substrate tables (and / or two or more patterning device tables). In such a multi-stage apparatus, the added tables are used in parallel, or the preparation process is performed on one or more other tables while one or more tables are used for exposure. It may be executed.

  The lithographic apparatus may be such that at least a part of the substrate is covered with an “immersion liquid” so as to fill a gap between the projection system and the substrate. This liquid is a liquid such as water having a relatively high refractive index. An immersion liquid may be applied to other spaces in the lithographic apparatus, for example, between the patterning device and the projection system. Immersion techniques are used to increase the numerical aperture of projection systems. The term “immersion” herein does not mean that a structure, such as a substrate, is completely immersed in the liquid, but the liquid is placed between the projection system and the substrate during exposure. It just means that.

  The apparatus also includes a fluid treatment that allows interaction between the fluid and the irradiated portion of the substrate (eg, to attach chemicals to the substrate or to selectively modify the surface structure of the substrate). A cell may be provided.

  In certain embodiments, the substrate optionally has a substantially circular shape with notches and / or flats at the periphery, and in certain embodiments, the substrate is a polygonal shape, such as a rectangle. Have Embodiments in which the shape of the substrate is substantially circular have a substrate diameter of at least 25 mm, such as at least 50 mm, at least 75 mm, at least 100 mm, at least 125 mm, at least 150 mm, at least 175 mm, at least 200 mm, at least 250 mm, or at least 300 mm. Embodiments are included. In one embodiment, the diameter of the substrate is at most 500 mm, at most 400 mm, at most 350 mm, at most 300 mm, at most 250 mm, at most 200 mm, at most 150 mm, at most 100 mm Or 75 mm at the longest. Embodiments in which the substrate is a polygon, such as a rectangle, have a length of at least one side of the substrate, such as at least two sides, or at least three sides, of at least 5 cm, such as at least 25 cm, at least 50 cm, at least 100 cm, at least Embodiments that are 150 cm, at least 200 cm, or at least 250 cm are included. In some embodiments, the length of at least one side of the substrate is at most 1000 cm, such as at most 750 cm, at most 500 cm, at most 350 cm, at most 250 cm, at most 150 cm, or long. Even 75cm. In some embodiments, the substrate is a rectangular substrate having a length of about 250-350 cm and a width of about 250-300 cm. The thickness of the substrate can vary and may depend in part on, for example, the substrate material and / or substrate dimensions. In certain embodiments, the thickness is at least 50 μm, such as at least 100 μm, at least 200 μm, at least 300 μm, at least 400 μm, at least 500 μm, or at least 600 μm. In one embodiment, the thickness of the substrate is at most 5000 μm, for example, at most 3500 μm, at most 2500 μm, at most 1750 μm, at most 1250 μm, at most 1000 μm, at most 800 μm, thick The thickness is 600 μm, the thickness is 500 μm, the thickness is 400 μm, or the thickness is 300 μm. The substrate referred to herein may be processed before or after exposure, for example in a track (typically an apparatus that applies a resist layer to the substrate and develops the exposed resist). The properties of the substrate may be measured before or after exposure, for example in metrology tools and / or inspection tools.

  In some embodiments, a resist layer is provided on the substrate. In one embodiment, the substrate is a wafer, for example a semiconductor wafer. In some embodiments, the wafer material is selected from the group consisting of Si, SiGe, SiGeC, SiC, Ge, GaAs, InP, InAs. In some embodiments, the wafer is a III-V compound semiconductor wafer. In some embodiments, the wafer is a silicon wafer. In some embodiments, the substrate is a ceramic substrate. In some embodiments, the substrate is a glass substrate. Glass substrates can be useful, for example, in the manufacture of flat panel displays and liquid crystal display panels. In some embodiments, the substrate is a plastic substrate. In some embodiments, the substrate is transparent (when viewed with the naked human eye). In some embodiments, the substrate is colored. In some embodiments, the substrate is colorless.

  In some embodiments, the patterning device 104 is described and / or illustrated as being above the substrate 114, but alternatively or additionally, the patterning device 104 is disposed below the substrate 114. Also good. In some embodiments, the patterning device 104 and the substrate 114 may be arranged side by side, for example, the patterning device 104 and the substrate 114 extend vertically, and the pattern is projected horizontally. In some embodiments, the patterning device 104 is provided such that at least two opposing sides of the substrate 114 are exposed. For example, at least two patterning devices 104 may be present on at least each of the corresponding opposing sides of the substrate 114 to expose these sides. In certain embodiments, a single patterning device 104 that projects one side of the substrate 114 and suitable optics that project a pattern from the single patterning device 104 onto another side of the substrate 114 (eg, A beam guiding mirror).

While specific embodiments of the invention have been described above, the invention may be practiced otherwise than as described. For example, the present invention provides a computer program that includes one or more sequences of machine-readable instructions that describe the method described above, or a data recording medium (eg, a semiconductor memory, a magnetic disk, or (Optical disc) may be used.
An embodiment according to the present invention comprises (two or more optical columns configured to project a beam onto a target portion of a substrate, each of the two or more optical columns being Two or more optical columns comprising one or more radiation sources for providing the beam and a projection system for projecting the beam onto the target portion, and the two or more A scanning movement actuator configured to move the substrate at a scanning speed in the scanning direction with respect to a larger number of optical columns and a corresponding two or more optical column positions determined relative to a reference object A method for aligning an optical column of a lithographic apparatus, wherein the lithographic apparatus comprises two or more position measuring devices configured to ,
Measuring the position of the target portion of a number of optical columns relative to a reference object;
Comparing the positions of target portions of adjacent optical columns with each other;
Adjusting the patterns projected onto the target portion to align the optical column.
According to a further embodiment of the invention, the reference object comprises at least one mark, the at least one mark being a target portion of two adjacent optical columns of the two or more optical columns. The measured position of the at least one mark in the two adjacent optical columns is used to mutually determine the position of the two adjacent optical columns.

  Further, although the invention has been disclosed in the context of certain embodiments and examples, the invention extends beyond the specific embodiments disclosed above to alternative embodiments and / or uses of the invention. It will be apparent to those skilled in the art that the invention can be extended to obvious modifications and equivalents thereof. In addition, although several variations of the invention have been illustrated and described, other modifications within the scope of the invention will be apparent to those skilled in the art based on the present disclosure. For example, various combinations or sub-combinations of the specific features and aspects of each embodiment are possible and within the scope of the invention. Accordingly, various features and aspects of the disclosed embodiments can be combined or interchanged with one another to form various forms of the disclosed invention. For example, in some embodiments, the movable individually controllable element embodiment of FIG. 5 may be combined with a non-movable array of individually controllable elements, for example, to provide or have a backup system. .

  Thus, while various embodiments of the invention have been described above, it should be understood that they are exemplary only and not limiting. It will be apparent to those skilled in the relevant art that various changes in form and detail may be made without departing from the spirit and scope of the invention. Accordingly, the scope and spirit of the invention are not limited to any of the exemplary embodiments described above, but are defined only by the claims and their equivalents.

Claims (15)

Two or more optical columns configured to project a beam onto a target portion of a substrate, each of the two or more optical columns comprising:
One or more radiation sources for providing said beam;
A projection system for projecting the beam onto the target portion, the projection system comprising a plurality of lenses;
A rotatable portion, the rotatable portion configured to support the plurality of lenses arranged in a circle around a rotation axis of the rotatable portion;
Two or more optical columns comprising a rotary actuator configured to rotate the rotatable portion about the axis of rotation ;
A scanning movement actuator configured to move the substrate at a scanning speed in a scanning direction relative to the two or more optical columns;
A lithographic apparatus, comprising: two or more position measuring devices configured to determine the position of two or more corresponding optical columns with respect to a reference object.   The reference object comprises at least one mark, the at least one mark being arranged in an overlapping portion of a target portion of two adjacent optical columns of the two or more optical columns, The lithographic apparatus according to claim 1, wherein at least one mark is used for position measurement relative to each other of the two adjacent optical columns.   The reference object includes a plurality of marks, and each of the two or more position measuring devices includes an image sensor configured to receive a reflected image of one of the plurality of marks. A lithographic apparatus according to claim 1, further comprising: a position of an optical column that can be determined based on the reflected image projected on the image sensor.   The one mark is arranged in the overlapping part of the target part of two adjacent optical columns of the two or more optical columns, so that the reflected image is obtained by both position measuring devices. A lithographic apparatus according to claim 3, wherein the lithographic apparatus is received.   5. Each of the two or more position measurement devices comprises a beam splitter and a quarter wave plate configured to direct the reflected image to the image sensor. Lithographic apparatus.   The lithographic apparatus according to claim 1, wherein the position measuring device is integrated in a corresponding optical column.   A lithographic apparatus according to any one of the preceding claims, comprising an alignment adjustment device for adjusting the position of one or more beams of the two or more optical columns based on measured positions. .   8. The alignment device of claim 7, wherein the alignment device is configured to adjust the patterns to be projected into each target portion to align the two or more optical columns. Lithographic apparatus.   The alignment adjustment device is configured to adjust the patterns by controlling the intensity and / or drive time of the one or more radiation sources of the corresponding two or more optical columns; A lithographic apparatus according to claim 7 or 8. Each optical column comprises at least one movable lens element,
10. A lithographic apparatus according to any one of the preceding claims, wherein an actuator is connected to the lens element to adjust the position of the pattern generated at the corresponding target portion.   A lithographic apparatus according to any one of the preceding claims, wherein the lithographic apparatus comprises more than two optical columns, each optical column comprising a position measuring device.   12. A lithographic apparatus according to any one of the preceding claims, wherein the position of the two or more optical columns is measured in two directions in the plane of the surface of the substrate on which a pattern is to be projected.   The lithographic apparatus according to claim 1, wherein the reference object is a substrate.   The lithographic apparatus according to claim 1, wherein the reference object is a reference plate mounted on a substrate support.   A lithographic apparatus according to any one of the preceding claims, wherein the radiation source is a self-radiating contrast device.

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