HK1118304A1 - Dispersion containing hollow sio2, coating composition, and substrate with antireflection coating film - Google Patents

Dispersion containing hollow sio2, coating composition, and substrate with antireflection coating film

Info

Publication number
HK1118304A1
HK1118304A1 HK08109359.8A HK08109359A HK1118304A1 HK 1118304 A1 HK1118304 A1 HK 1118304A1 HK 08109359 A HK08109359 A HK 08109359A HK 1118304 A1 HK1118304 A1 HK 1118304A1
Authority
HK
Hong Kong
Prior art keywords
substrate
dispersion containing
containing hollow
coating film
coating composition
Prior art date
Application number
HK08109359.8A
Other languages
English (en)
Inventor
Yohei Kawai
Takashige Yoneda
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of HK1118304A1 publication Critical patent/HK1118304A1/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/054—Forming anti-misting or drip-proofing coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/06—Coating with compositions not containing macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/42—Gloss-reducing agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/67—Particle size smaller than 100 nm
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/68—Particle size between 100-1000 nm
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/478—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/259—Silicic material
HK08109359.8A 2005-06-02 2008-08-21 Dispersion containing hollow sio2, coating composition, and substrate with antireflection coating film HK1118304A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005162487A JP4883383B2 (ja) 2005-06-02 2005-06-02 中空状ＳｉＯ２を含有する分散液、塗料組成物及び反射防止塗膜付き基材
PCT/JP2006/305597 WO2006129411A1 (ja) 2005-06-02 2006-03-20 中空状ＳｉＯ2を含有する分散液、塗料組成物及び反射防止塗膜付き基材

Publications (1)

Publication Number Publication Date
HK1118304A1 true HK1118304A1 (en) 2009-02-06

Family

ID=37481344

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08109359.8A HK1118304A1 (en) 2005-06-02 2008-08-21 Dispersion containing hollow sio2, coating composition, and substrate with antireflection coating film

Country Status (7)

Country Link
US (1) US20080124539A1 (ja)
EP (1) EP1887059B1 (ja)
JP (1) JP4883383B2 (ja)
CN (1) CN101184815B (ja)
HK (1) HK1118304A1 (ja)
TW (1) TW200704590A (ja)
WO (1) WO2006129411A1 (ja)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4872739B2 (ja) * 2006-03-23 2012-02-08 住友化学株式会社 積層体の製造方法
EP2128091B1 (en) * 2007-03-16 2013-07-03 Asahi Glass Company, Limited Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon
EP2128090B1 (en) * 2007-03-16 2012-05-16 Asahi Glass Company, Limited Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon
JP2008233290A (ja) * 2007-03-19 2008-10-02 Mitsubishi Plastics Ind Ltd 反射フィルム及び反射板
WO2009001905A1 (ja) * 2007-06-26 2008-12-31 Denki Kagaku Kogyo Kabushiki Kaisha 球状有機ポリマー－シリコン化合物複合粒子、中空粒子およびそれらの製造方法
JP5423945B2 (ja) * 2007-08-22 2014-02-19 Ｊｓｒ株式会社 シリカ系中空粒子分散体の製造方法
JP5284632B2 (ja) * 2007-12-12 2013-09-11 日揮触媒化成株式会社 導電性繊維状中空シリカ微粒子分散質およびその製造方法
WO2009106456A1 (en) * 2008-02-29 2009-09-03 Dsm Ip Assets B.V. Articles comprising coating
US8936833B2 (en) 2008-02-29 2015-01-20 The University Of Houston System Anti-reflection coatings and methods of preparing and using same
US8795773B2 (en) 2008-03-13 2014-08-05 Guardian Industries Corp. Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition
US20090233105A1 (en) * 2008-03-13 2009-09-17 Remington Jr Michael P Composite coatings comprising hollow and/or shell like metal oxide particles deposited via combustion deposition
CN101579672A (zh) * 2008-05-16 2009-11-18 3M创新有限公司 用于提高亲水性/透射率的二氧化硅涂层
EP2298694A4 (en) * 2008-06-03 2011-06-01 Asahi Glass Co Ltd PROCESS FOR PRODUCTION OF CORE / ENVELOPE PARTICLES, CORE / ENVELOPE PARTICLES, METHOD FOR PRODUCTION OF HOLLOW PARTICLES, COMPOSITION OF PAINTS AND ARTICLE
US20100035039A1 (en) * 2008-08-07 2010-02-11 3M Innovative Properties Company Acicular silica coating for enhanced hydrophilicity/transmittivity
US8153249B2 (en) * 2008-08-26 2012-04-10 Snu R&Db Foundation Article treated with silica particles and method for treating a surface of the article
CN101722691B (zh) * 2008-10-23 2014-04-16 大日本印刷株式会社 硬涂膜及硬涂层用固化性树脂组合物
JP5387330B2 (ja) * 2008-10-31 2014-01-15 日立化成株式会社 中空状無機粒子の前駆体、中空状無機粒子及びこの製造方法、並びに中空状無機粒子を用いた光学部材及び光学部材体
JP5387331B2 (ja) * 2008-10-31 2014-01-15 日立化成株式会社 中空状無機粒子の前駆体、中空状無機粒子及びこの製造方法、並びに中空状無機粒子を用いた光学部材及び光学部材体
CN102196996B (zh) * 2008-10-31 2013-08-07 旭硝子株式会社 中空粒子、其制造方法、涂料组合物及物品
DE102008056792B4 (de) * 2008-11-11 2018-06-28 Schott Ag Verfahren zum Aufbringen einer porösen selbstreinigenden Entspiegelungsschicht sowie Glas mit dieser Entspiegelungsschicht und Verwendung einer selbstreinigenden porösen Entspiegelungsschicht
KR20100069799A (ko) * 2008-12-17 2010-06-25 삼성코닝정밀소재 주식회사 모아레 무늬 저감 및 공기 오염물질 제거가 가능한 디스플레이 장치용 필터
JP5339627B2 (ja) * 2009-02-17 2013-11-13 国立大学法人 名古屋工業大学 低密度シリカ殻からなるナノ中空粒子及びその製造方法
CN101941001B (zh) 2009-07-03 2014-04-02 3M创新有限公司 亲水涂层、制品、涂料组合物和方法
SG179016A1 (en) * 2009-09-07 2012-04-27 Asahi Glass Co Ltd Article having low-reflection film on surface of base material
KR101781661B1 (ko) * 2009-10-24 2017-09-25 쓰리엠 이노베이티브 프로퍼티즈 컴파니 구배 나노공극형 물품을 위한 방법
CN102241899B (zh) 2010-05-11 2014-05-14 3M创新有限公司 涂料组合物，改性基体表面的方法和制品
JP5742519B2 (ja) * 2010-07-06 2015-07-01 三菱化学株式会社 セラミックス多孔質体
KR101256552B1 (ko) * 2010-07-08 2013-04-19 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
JP2012063687A (ja) * 2010-09-17 2012-03-29 Toppan Printing Co Ltd 反射防止フィルム、反射防止性偏光板、及び透過型液晶ディスプレイ
CN102675932A (zh) * 2011-03-07 2012-09-19 深圳市优纳科技有限公司 复合介孔隔热保温涂料
KR20140015443A (ko) * 2011-03-09 2014-02-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 입자 크기가 큰 건식 실리카를 포함하는 반사 방지 필름
CN103476726B (zh) * 2011-04-01 2016-06-01 旭硝子株式会社 附有低反射膜的玻璃板
CN102749666B (zh) * 2011-04-20 2015-04-01 国家纳米科学中心 一种减反射涂层的制备方法
JP2012240864A (ja) * 2011-05-17 2012-12-10 Konica Minolta Holdings Inc 中空粒子、赤外線反射フィルム及び赤外線反射体
CN102838889B (zh) * 2011-06-21 2015-06-24 国家纳米科学中心 一种可见光全波段多层减反射涂层的制备方法
US20130148205A1 (en) * 2011-12-12 2013-06-13 Canon Kabushiki Kaisha Method of producing antireflection film
WO2013143615A1 (en) * 2012-03-30 2013-10-03 Applied Materials, Inc. Transparent body for use in a touch panel and its manufacturing method and apparatus
CN104671672B (zh) * 2013-11-26 2017-06-06 比亚迪股份有限公司 一种减反射镀膜液及其制备方法、光伏玻璃及其制备方法、太阳能电池组件
JP6459489B2 (ja) * 2014-03-11 2019-01-30 三菱マテリアル株式会社 シリカ多孔質膜形成用液組成物及びその液組成物から形成されたシリカ多孔質膜
CN103951282B (zh) * 2014-04-03 2017-02-01 中国科学院宁波材料技术与工程研究所 一种基于杂化溶胶的折射率渐变薄膜及其制备方法
CN105273622B (zh) * 2014-05-30 2018-12-04 三菱综合材料株式会社 低折射率膜形成用组合物及其制法、低折射率膜的形成法
JP7019020B2 (ja) * 2018-02-28 2022-02-14 富士フイルム株式会社 水性コート材、膜及びその製造方法、積層体及びその製造方法、並びに、水性コート材キット
CN114213948A (zh) * 2021-12-20 2022-03-22 江南大学 一种含有中空SiO2@TiO2微球的光固化水性聚氨酯隔热涂料的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4046921B2 (ja) * 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
DE10049803A1 (de) * 2000-10-09 2002-04-18 Bayer Ag Kompositpartikel
JP4911814B2 (ja) * 2000-11-22 2012-04-04 日揮触媒化成株式会社 球状多孔質粒子およびその製造方法
AUPR725701A0 (en) * 2001-08-24 2001-09-20 Commonwealth Scientific And Industrial Research Organisation Functionalised nanoparticle concentrates
JP2003202406A (ja) * 2001-10-25 2003-07-18 Matsushita Electric Works Ltd 反射防止フィルム及びディスプレイ装置
JP4107050B2 (ja) * 2001-10-25 2008-06-25 松下電工株式会社 コーティング材組成物及びそれにより形成された被膜を有する物品
KR20070011650A (ko) * 2001-10-25 2007-01-24 마츠시다 덴코 가부시키가이샤 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품
JP4278020B2 (ja) * 2001-10-30 2009-06-10 日揮触媒化成株式会社 研磨用粒子および研磨材の製造方法
JP2003200033A (ja) * 2002-01-09 2003-07-15 Hitachi Chem Co Ltd 中空微粒子集合体の製造方法及びそれにより得られた中空微粒子集合体
JP2003298087A (ja) * 2002-03-29 2003-10-17 Matsushita Electric Works Ltd 太陽電池システム
WO2004027517A2 (en) * 2002-09-19 2004-04-01 Optimax Technology Corporation Antiglare and antireflection coatings of surface active nanoparticles
JP4048912B2 (ja) * 2002-10-22 2008-02-20 松下電工株式会社 表面防汚性複合樹脂フィルム、表面防汚性物品、化粧板
JP4309744B2 (ja) * 2002-11-07 2009-08-05 パナソニック電工株式会社 フッ素系複合樹脂フィルム及び太陽電池
KR101163539B1 (ko) * 2003-11-06 2012-07-06 니끼 쇼꾸바이 카세이 가부시키가이샤 체인 무기 산화물 미립자 그룹, 미립자 그룹 분산의제조방법 및 미립자 그룹의 이용
TWI388876B (zh) * 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置

Also Published As

Publication number Publication date
JP4883383B2 (ja) 2012-02-22
CN101184815A (zh) 2008-05-21
TW200704590A (en) 2007-02-01
CN101184815B (zh) 2010-12-08
WO2006129411A1 (ja) 2006-12-07
EP1887059A1 (en) 2008-02-13
US20080124539A1 (en) 2008-05-29
EP1887059B1 (en) 2014-01-08
EP1887059A4 (en) 2008-12-17
JP2006335881A (ja) 2006-12-14

Similar Documents

Publication Publication Date Title
HK1118304A1 (en) Dispersion containing hollow sio2, coating composition, and substrate with antireflection coating film
EP1972598A4 (en) SILICA HOLLOW MICROPARTICLE, COMPOSITION FOR FORMING A TRANSPARENT COATING CONTAINING THE MICROPARTICLE AND SUBSTRATE HAVING A TRANSPARENT COATING
TWI346253B (en) Antireflection film composition, patterning process and substrate using the same
AU2006227151B2 (en) Coating composition with solar properties
EP1886972A4 (en) PROCESS FOR PREPARING A DISPERSION OF HOLLOWED FINE SIO2 PARTICLES, COATING COMPOSITION AND SUBSTRATE WITH ANTI-REFLECTION COATING FILM
EP1727671A4 (en) COATINGS CONTAINING NANOTUBES, METHODS FOR APPLYING SAID COATINGS AND TRANSPARENT ELEMENTS INCORPORATING THE SAME COATINGS
EP1845392A4 (en) SUBSTRATE HAVING ANTIREFLECTION COATING
IL191821A0 (en) Transparent substrate provided with an antireflective coating
EP2188048A4 (en) PHOTOCATALYTIC ANTI-REFLECTION COMPOSITION AND THE COMPOSITE GLASS COMPOSITE COATED TO THE COMPOSITION
EP2209860A4 (en) ANTI-REFLECTIVE COATING COMPOSITION AND ANTI-REFLECTIONS MANUFACTURED THEREWITH
EP2038355A4 (en) ANTIREFLEX COATING COMPOSITION WITH STAIN RESISTANCE, ANTIREFLEX COATING FILM THEREFOR AND METHOD OF MANUFACTURING THEREOF
PL2111559T3 (pl) Powlekająca kompozycja antyrefleksyjna i powłoka antyrefleksyjna wytwarzana z jej zastosowaniem
EP2147957A4 (en) HYDROPHILIC COATING COMPOSITION AND HYDROPHILIC ELEMENT THEREWITH
EP1845132B8 (en) Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
EP2053615A4 (en) CONDUCTIVE PASTE, CONDUCTIVE COATING FILM AND CONDUCTIVE FILM USING THE SAME
PL1926690T3 (pl) Wyrób powleczony o barwie niebieskiej z powłoką niskoemisyjną
EP2071366A4 (en) COATING COMPOSITION FOR FORMING ANTIREFLECTION FILM, AND ARTICLE ON WHICH IS FORMED ANTIREFLECTION FILM
EP1939232A4 (en) HIGHLY CROSSLINKABLE LOW VISCOSITY POLYISOCYANATE COMPOSITION AND COATING COMPOSITION CONTAINING THE SAME
SI1591502T1 (sl) Sestavek prevleke utrdljiv z UV
EP2183329A4 (en) COATING COMPOSITION AND PRODUCT THEREOF
EP2209855A4 (en) ANTI-REFLECTIVE COATING COMPOSITION, ANTI-REFLECTION FILM, AND METHOD OF MANUFACTURING THEREOF
WO2006015205A8 (en) Absorbent article with color surfaces
TWI368627B (en) Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
EP1930358A4 (en) POLYISOCYANATE COMPOSITION AND COATING COMPOSITION CONTAINING THE SAME
IL205406A0 (en) Alpha - (n - sulfonamido) acetamide compound, composition comprising the same and uses thereof

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20150320