PL2111559T3 - Powlekająca kompozycja antyrefleksyjna i powłoka antyrefleksyjna wytwarzana z jej zastosowaniem - Google Patents

Powlekająca kompozycja antyrefleksyjna i powłoka antyrefleksyjna wytwarzana z jej zastosowaniem

Info

Publication number
PL2111559T3
PL2111559T3 PL07851814T PL07851814T PL2111559T3 PL 2111559 T3 PL2111559 T3 PL 2111559T3 PL 07851814 T PL07851814 T PL 07851814T PL 07851814 T PL07851814 T PL 07851814T PL 2111559 T3 PL2111559 T3 PL 2111559T3
Authority
PL
Poland
Prior art keywords
antireflection
same
coating composition
film prepared
antireflection film
Prior art date
Application number
PL07851814T
Other languages
English (en)
Inventor
Hyun-Woo Shin
Bu-Gon Shin
Yeong-Rae Chang
Young-Jun Hong
Young-Eun Lee
Tae-Su Kim
Original Assignee
Lg Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Chemical Ltd filed Critical Lg Chemical Ltd
Publication of PL2111559T3 publication Critical patent/PL2111559T3/pl

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Polarising Elements (AREA)
PL07851814T 2006-12-29 2007-12-28 Powlekająca kompozycja antyrefleksyjna i powłoka antyrefleksyjna wytwarzana z jej zastosowaniem PL2111559T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20060137601 2006-12-29
PCT/KR2007/006917 WO2008082168A1 (en) 2006-12-29 2007-12-28 Coating composition for antireflection and antireflection film prepared by using the same
EP07851814A EP2111559B1 (en) 2006-12-29 2007-12-28 Coating composition for antireflection and antireflection film prepared by using the same

Publications (1)

Publication Number Publication Date
PL2111559T3 true PL2111559T3 (pl) 2012-11-30

Family

ID=39588772

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07851814T PL2111559T3 (pl) 2006-12-29 2007-12-28 Powlekająca kompozycja antyrefleksyjna i powłoka antyrefleksyjna wytwarzana z jej zastosowaniem

Country Status (8)

Country Link
US (1) US8213086B2 (pl)
EP (1) EP2111559B1 (pl)
JP (1) JP5101631B2 (pl)
KR (1) KR100940433B1 (pl)
CN (1) CN101573639B (pl)
PL (1) PL2111559T3 (pl)
TW (1) TWI373499B (pl)
WO (1) WO2008082168A1 (pl)

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US20100265580A1 (en) * 2007-11-13 2010-10-21 Hansik Yun Coating composition for antireflection, antireflection film and method for preparing the same
KR101451795B1 (ko) * 2007-12-14 2014-10-24 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
JP5590851B2 (ja) 2008-12-10 2014-09-17 キヤノン株式会社 回折光学素子、積層型回折光学素子及びその製造方法
WO2010093030A1 (ja) * 2009-02-10 2010-08-19 住友化学株式会社 偏光板、ならびにそれを用いた液晶パネルおよび液晶表示装置
JP2012014051A (ja) * 2010-07-02 2012-01-19 Fuji Seisakusho:Kk 光透過性部材
TWI435922B (zh) 2010-07-08 2014-05-01 Lg Chemical Ltd 抗反射膜及其製造方法
HUE026881T2 (en) * 2010-07-14 2016-08-29 Lg Chemical Ltd Anti-reflection and anti-glare coating composition, anti-reflection and anti-glare film, and a method for producing them
KR101698627B1 (ko) 2011-12-21 2017-01-20 주식회사 엘지화학 점착제 조성물
EP2891693B1 (en) 2013-06-19 2021-09-29 LG Chem, Ltd. Pressure-sensitive adhesive composition
WO2014204253A1 (ko) 2013-06-19 2014-12-24 주식회사 엘지화학 점착제 조성물
CN107001548B (zh) * 2014-12-02 2020-04-10 三菱化学株式会社 固化性组合物及膜
CN104676458B (zh) * 2015-02-09 2016-11-23 扬州明晟新能源科技有限公司 一种led增透防眩玻璃灯罩及其生产方法
US11009662B2 (en) * 2017-09-05 2021-05-18 Facebook Technologies, Llc Manufacturing a graded index profile for waveguide display applications
WO2020036564A2 (en) * 2018-06-28 2020-02-20 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi Hydrophilic anti-reflective coating which can be tempered and has high corrosion resistance
WO2023101220A1 (ko) 2021-12-02 2023-06-08 주식회사 엘지화학 경화성 조성물, 보호 필름, 광학 소자 및 액정 디스플레이 장치
CN114345662B (zh) * 2021-12-16 2023-02-17 中建材玻璃新材料研究院集团有限公司 一种增透膜及其制备方法、增透膜制备装置

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JP2008163205A (ja) * 2006-12-28 2008-07-17 Catalysts & Chem Ind Co Ltd 透明被膜形成用塗料および透明被膜付基材

Also Published As

Publication number Publication date
CN101573639A (zh) 2009-11-04
US8213086B2 (en) 2012-07-03
TWI373499B (en) 2012-10-01
KR20080063107A (ko) 2008-07-03
EP2111559B1 (en) 2012-06-20
EP2111559A4 (en) 2011-06-22
EP2111559A1 (en) 2009-10-28
WO2008082168A1 (en) 2008-07-10
CN101573639B (zh) 2011-04-06
TW200902651A (en) 2009-01-16
JP2010515100A (ja) 2010-05-06
KR100940433B1 (ko) 2010-02-10
US20090296219A1 (en) 2009-12-03
JP5101631B2 (ja) 2012-12-19
WO2008082168A9 (en) 2009-07-30

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