FR2416273A1 - Dispositif d'application de revetements sous vide - Google Patents

Dispositif d'application de revetements sous vide

Info

Publication number
FR2416273A1
FR2416273A1 FR7902330A FR7902330A FR2416273A1 FR 2416273 A1 FR2416273 A1 FR 2416273A1 FR 7902330 A FR7902330 A FR 7902330A FR 7902330 A FR7902330 A FR 7902330A FR 2416273 A1 FR2416273 A1 FR 2416273A1
Authority
FR
France
Prior art keywords
tools
cup
coating
esp
high speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7902330A
Other languages
English (en)
Other versions
FR2416273B1 (fr
Inventor
A I Grigorov
A M Dorodnov
A F Isakov
M D Kiselev
J A Perekatov
A F Rogozin
B L Taubkin
A T Kalinin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST T AVTOMOBILNO
Original Assignee
INST T AVTOMOBILNO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU782568105A external-priority patent/SU796248A1/ru
Priority claimed from SU782593106A external-priority patent/SU1125291A2/ru
Application filed by INST T AVTOMOBILNO filed Critical INST T AVTOMOBILNO
Publication of FR2416273A1 publication Critical patent/FR2416273A1/fr
Application granted granted Critical
Publication of FR2416273B1 publication Critical patent/FR2416273B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne la protection de surfaces au moyen de revêtements. Le dispositif faisant l'objet de l'invention est du type comprenant, disposés coaxialement dans une chambre à vide 1 : une source d'ions accélérés de la matière de revêtement et un porte-supports 21 à potentiel négatif, ainsi qu'un moyen 24 d'amenée d'un gaz de réaction disposé lui aussi dans la chambre à vide, et est caractérisé en ce que ledit porte-supports est réalisé sous forme d'un corps creux ayant un côté ouvert orienté vers la source d'ions accélérés, et porte sur sa surface intérieure les supports ou pièces 23 destinés à recevoir les revêtements et qui sont électriquement reliés audit porte-supports. L'invention peut être utilisée notamment pour l'application sous vide de revêtements de composition compliquée résistant à l'usure sur des pièces produites en très grande série et qui doivent, au cours de leur exploitation, présenter une haute résistance à l'usure.
FR7902330A 1978-01-31 1979-01-30 Dispositif d'application de revetements sous vide Granted FR2416273A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU782568105A SU796248A1 (ru) 1978-01-31 1978-01-31 Устройство дл нанесени покрытий
SU782593106A SU1125291A2 (ru) 1978-03-30 1978-03-30 Устройство дл нанесени покрытий

Publications (2)

Publication Number Publication Date
FR2416273A1 true FR2416273A1 (fr) 1979-08-31
FR2416273B1 FR2416273B1 (fr) 1981-11-06

Family

ID=26665654

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7902330A Granted FR2416273A1 (fr) 1978-01-31 1979-01-30 Dispositif d'application de revetements sous vide

Country Status (5)

Country Link
JP (1) JPS54110988A (fr)
DE (1) DE2902142C2 (fr)
FR (1) FR2416273A1 (fr)
IT (1) IT1101076B (fr)
SE (1) SE431473B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2512270A1 (fr) * 1981-02-23 1983-03-04 Sablev Leonid Cathode consommable pour evaporateur de metaux a arc electrique
FR2545840A1 (fr) * 1983-05-09 1984-11-16 Vac Tec Syst Appareil perfectionne pour la stabilisation d'un arc servant a la vaporisation d'une matiere solide
FR2557822A1 (fr) * 1984-01-11 1985-07-12 Instr I Outil de coupe et procede de fabrication dudit outil
FR2568896A1 (fr) * 1984-08-13 1986-02-14 Vac Tec Syst Appareil et procede ameliores pour l'evaporation a l'arc electrique de cibles de grande surface
RU213628U1 (ru) * 2022-03-22 2022-09-20 Федеральное государственное бюджетное образовательное учреждение высшего образования "Комсомольский-на-Амуре государственный университет" (ФГБОУ ВО "КнАГУ") Электропроводный держатель для неэлектропроводного изделия со сквозной цилиндрической полостью

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
CH657242A5 (de) * 1982-03-22 1986-08-15 Axenov Ivan I Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken.
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
DE19600993A1 (de) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
DE10044419C1 (de) * 2000-09-08 2002-05-02 Infineon Technologies Ag Abschattungsring für Plasmabeschichtungsanlagen und dessen Verwendung

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1123563A (en) * 1964-08-20 1968-08-14 Cons Vacuum Corp Improvements in or relating to sputtering apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
JPS581186B2 (ja) * 1977-12-13 1983-01-10 双葉電子工業株式会社 イオンプレ−テイング装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1123563A (en) * 1964-08-20 1968-08-14 Cons Vacuum Corp Improvements in or relating to sputtering apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2512270A1 (fr) * 1981-02-23 1983-03-04 Sablev Leonid Cathode consommable pour evaporateur de metaux a arc electrique
FR2545840A1 (fr) * 1983-05-09 1984-11-16 Vac Tec Syst Appareil perfectionne pour la stabilisation d'un arc servant a la vaporisation d'une matiere solide
NL8400053A (nl) * 1983-05-09 1984-12-03 Vac Tec Syst Werkwijze voor verdampingsboogstabilisatie en inrichting voor het toepassen van deze werkwijze.
FR2557822A1 (fr) * 1984-01-11 1985-07-12 Instr I Outil de coupe et procede de fabrication dudit outil
FR2568896A1 (fr) * 1984-08-13 1986-02-14 Vac Tec Syst Appareil et procede ameliores pour l'evaporation a l'arc electrique de cibles de grande surface
RU213627U1 (ru) * 2022-03-04 2022-09-20 Федеральное государственное бюджетное образовательное учреждение высшего образования "Комсомольский-на-Амуре государственный университет" (ФГБОУ ВО "КнАГУ") Держатель изделий, имеющих сквозную полость
RU213628U1 (ru) * 2022-03-22 2022-09-20 Федеральное государственное бюджетное образовательное учреждение высшего образования "Комсомольский-на-Амуре государственный университет" (ФГБОУ ВО "КнАГУ") Электропроводный держатель для неэлектропроводного изделия со сквозной цилиндрической полостью

Also Published As

Publication number Publication date
DE2902142A1 (de) 1979-08-16
JPS5651228B2 (fr) 1981-12-03
JPS54110988A (en) 1979-08-30
FR2416273B1 (fr) 1981-11-06
SE7813467L (sv) 1979-08-01
IT7831436A0 (it) 1978-12-29
DE2902142C2 (de) 1983-03-17
IT1101076B (it) 1985-09-28
SE431473B (sv) 1984-02-06

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