JPS5469384A - Electric furnace unit - Google Patents

Electric furnace unit

Info

Publication number
JPS5469384A
JPS5469384A JP13689677A JP13689677A JPS5469384A JP S5469384 A JPS5469384 A JP S5469384A JP 13689677 A JP13689677 A JP 13689677A JP 13689677 A JP13689677 A JP 13689677A JP S5469384 A JPS5469384 A JP S5469384A
Authority
JP
Japan
Prior art keywords
jig
wafer
wafers
gas
electric furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13689677A
Other languages
Japanese (ja)
Inventor
Takeshi Kimura
Masaharu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13689677A priority Critical patent/JPS5469384A/en
Publication of JPS5469384A publication Critical patent/JPS5469384A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the damage of wafers and make taking-in and out of wafers high-speed to enhance production efficiency by taking semiconductor wafers into or out from the electric furnace and holding them in the furnace by using an air bearing. CONSTITUTION:Jig 2 which takes in and out and holds wafers in a non-contact state by the air bearing system is inserted into quartz tube 1 constituting an electric furnace. In this constitution, gas such as N2 is fed from gas supply exit 21 provided in jig 2, and wafer 4 is put on one edge of jig 2. Therefore, wafter 4 floats and advances in the furnace due to gas jetted right-upward from gas jetting exit groups 2111 and 2121 provided in jig 2. Next, when the wafer reaches left-upward opened gas jetting exit group 2112, the right and the left forces are balanced, and wafer 4 becomes stationary at a prescribed position. After that, though a prescribed processing such as vapour-phase growing is performed in this state, a good production can be continued without generating pollution, warp, damage, etc., in wafer 4.
JP13689677A 1977-11-14 1977-11-14 Electric furnace unit Pending JPS5469384A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13689677A JPS5469384A (en) 1977-11-14 1977-11-14 Electric furnace unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13689677A JPS5469384A (en) 1977-11-14 1977-11-14 Electric furnace unit

Publications (1)

Publication Number Publication Date
JPS5469384A true JPS5469384A (en) 1979-06-04

Family

ID=15186082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13689677A Pending JPS5469384A (en) 1977-11-14 1977-11-14 Electric furnace unit

Country Status (1)

Country Link
JP (1) JPS5469384A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5885523A (en) * 1981-11-17 1983-05-21 Nec Home Electronics Ltd Semiconductor manufacturing apparatus
JPS59152618A (en) * 1983-02-21 1984-08-31 Hitachi Ltd Thermal treatment and equipment for the same
JPS59215718A (en) * 1983-05-23 1984-12-05 Kokusai Electric Co Ltd Infrared heat treatment apparatus for semiconductor wafer
JPS60110114A (en) * 1983-11-21 1985-06-15 Kokusai Electric Co Ltd Apparatus for heat treating semiconductor substrate with infrared rays

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5885523A (en) * 1981-11-17 1983-05-21 Nec Home Electronics Ltd Semiconductor manufacturing apparatus
JPH0151051B2 (en) * 1981-11-17 1989-11-01 Nippon Denki Hoomu Erekutoronikusu Kk
JPS59152618A (en) * 1983-02-21 1984-08-31 Hitachi Ltd Thermal treatment and equipment for the same
JPS59215718A (en) * 1983-05-23 1984-12-05 Kokusai Electric Co Ltd Infrared heat treatment apparatus for semiconductor wafer
JPS60110114A (en) * 1983-11-21 1985-06-15 Kokusai Electric Co Ltd Apparatus for heat treating semiconductor substrate with infrared rays

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