JPS56136635A - Production of ultra-fine powder and particle utilizing arc plasma sputtering and its device - Google Patents

Production of ultra-fine powder and particle utilizing arc plasma sputtering and its device

Info

Publication number
JPS56136635A
JPS56136635A JP4014380A JP4014380A JPS56136635A JP S56136635 A JPS56136635 A JP S56136635A JP 4014380 A JP4014380 A JP 4014380A JP 4014380 A JP4014380 A JP 4014380A JP S56136635 A JPS56136635 A JP S56136635A
Authority
JP
Japan
Prior art keywords
ultra
fine particles
vapor
chamber
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4014380A
Other languages
Japanese (ja)
Other versions
JPS6320571B2 (en
Inventor
Ryoji Ueda
Nobuhiko Wada
Hiroo Ooya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Research Development Corp of Japan
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan, Shingijutsu Kaihatsu Jigyodan filed Critical Research Development Corp of Japan
Priority to JP4014380A priority Critical patent/JPS56136635A/en
Publication of JPS56136635A publication Critical patent/JPS56136635A/en
Publication of JPS6320571B2 publication Critical patent/JPS6320571B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
  • Glanulating (AREA)

Abstract

PURPOSE: To produce ultra-fine particles of ≤1,000Å by heating and evaporating metal oxide and carbide, semiconductor material by plasma arc discharging in an inert gas atmosphere thereby making ultra-fine particles.
CONSTITUTION: Metal oxide or carbide or semiconductor material M is placed on the tray in a vapor generating chamber 1, and the inside of the chamber is evacuated to a vacuum through an exhaust pipe 16, thence the valve 9" of a gas supply pipe 9' in the lower part is opened to introduce an inert gas such as helium into the chamber. Thence, when an upper annular electrode body 6 and a middle annular electrode 5 are connected by way of a high-voltage power source 12, plasma arc discharge takes place, and the vapor of the intended material generates from the material M. The high-temp. helium plasma containing this is ejected through an ejection port J into a cohering cylinder 2. In the cohering cylinder 2, the vapor is cooled and forms fine particles which deposit on the surface of a cooling and capturing device 15.
COPYRIGHT: (C)1981,JPO&Japio
JP4014380A 1980-03-29 1980-03-29 Production of ultra-fine powder and particle utilizing arc plasma sputtering and its device Granted JPS56136635A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4014380A JPS56136635A (en) 1980-03-29 1980-03-29 Production of ultra-fine powder and particle utilizing arc plasma sputtering and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4014380A JPS56136635A (en) 1980-03-29 1980-03-29 Production of ultra-fine powder and particle utilizing arc plasma sputtering and its device

Publications (2)

Publication Number Publication Date
JPS56136635A true JPS56136635A (en) 1981-10-26
JPS6320571B2 JPS6320571B2 (en) 1988-04-28

Family

ID=12572547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4014380A Granted JPS56136635A (en) 1980-03-29 1980-03-29 Production of ultra-fine powder and particle utilizing arc plasma sputtering and its device

Country Status (1)

Country Link
JP (1) JPS56136635A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261601A (en) * 1985-09-09 1987-03-18 Shigeki Yatani Method for forming particles by sputtering
JPS634006A (en) * 1986-06-24 1988-01-09 Nok Corp Production of magnetic fluid
JPH0328363A (en) * 1989-06-23 1991-02-06 Sanyo Electric Co Ltd Method and device for forming thin film
CN1090548C (en) * 1999-12-23 2002-09-11 武汉大学 Synthesizing method of metal-in-carbon and metal-in-carbon carbide nanometer micropowder
CN103962567A (en) * 2014-05-31 2014-08-06 金堆城钼业股份有限公司 Method and equipment for preparing spherical molybdenum powder
CN104117685A (en) * 2014-07-30 2014-10-29 金堆城钼业股份有限公司 Method for preparing sodium molybdate doped molybdenum powder
CN110935885A (en) * 2019-11-11 2020-03-31 山西中磁尚善科技有限公司 Flaky metal grinding process

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261601A (en) * 1985-09-09 1987-03-18 Shigeki Yatani Method for forming particles by sputtering
JPS634006A (en) * 1986-06-24 1988-01-09 Nok Corp Production of magnetic fluid
JPH0328363A (en) * 1989-06-23 1991-02-06 Sanyo Electric Co Ltd Method and device for forming thin film
CN1090548C (en) * 1999-12-23 2002-09-11 武汉大学 Synthesizing method of metal-in-carbon and metal-in-carbon carbide nanometer micropowder
CN103962567A (en) * 2014-05-31 2014-08-06 金堆城钼业股份有限公司 Method and equipment for preparing spherical molybdenum powder
CN103962567B (en) * 2014-05-31 2015-10-21 金堆城钼业股份有限公司 A kind of preparation method of spherical molybdenum powder and equipment
CN104117685A (en) * 2014-07-30 2014-10-29 金堆城钼业股份有限公司 Method for preparing sodium molybdate doped molybdenum powder
CN110935885A (en) * 2019-11-11 2020-03-31 山西中磁尚善科技有限公司 Flaky metal grinding process

Also Published As

Publication number Publication date
JPS6320571B2 (en) 1988-04-28

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