JPS54110988A - Coating vacuum evaporation apparatus - Google Patents

Coating vacuum evaporation apparatus

Info

Publication number
JPS54110988A
JPS54110988A JP16127778A JP16127778A JPS54110988A JP S54110988 A JPS54110988 A JP S54110988A JP 16127778 A JP16127778 A JP 16127778A JP 16127778 A JP16127778 A JP 16127778A JP S54110988 A JPS54110988 A JP S54110988A
Authority
JP
Japan
Prior art keywords
vacuum evaporation
evaporation apparatus
coating vacuum
coating
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16127778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5651228B2 (fr
Inventor
Ioshifuouitsuchi Arukusandoru
Mihairouitsuchi Dorodo Andorei
Fuyoodorouitsuchi Arekusandoru
Danirouitsuchi Kiseref Mihairu
Arekuseeeuitsuchi Pereka Yurii
Furoi Arekusandoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NII CHIEFUNOROGII AFUTOMOBIRIN
Original Assignee
NII CHIEFUNOROGII AFUTOMOBIRIN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU782568105A external-priority patent/SU796248A1/ru
Priority claimed from SU782593106A external-priority patent/SU1125291A2/ru
Application filed by NII CHIEFUNOROGII AFUTOMOBIRIN filed Critical NII CHIEFUNOROGII AFUTOMOBIRIN
Publication of JPS54110988A publication Critical patent/JPS54110988A/ja
Publication of JPS5651228B2 publication Critical patent/JPS5651228B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP16127778A 1978-01-31 1978-12-28 Coating vacuum evaporation apparatus Granted JPS54110988A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU782568105A SU796248A1 (ru) 1978-01-31 1978-01-31 Устройство дл нанесени покрытий
SU782593106A SU1125291A2 (ru) 1978-03-30 1978-03-30 Устройство дл нанесени покрытий

Publications (2)

Publication Number Publication Date
JPS54110988A true JPS54110988A (en) 1979-08-30
JPS5651228B2 JPS5651228B2 (fr) 1981-12-03

Family

ID=26665654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16127778A Granted JPS54110988A (en) 1978-01-31 1978-12-28 Coating vacuum evaporation apparatus

Country Status (5)

Country Link
JP (1) JPS54110988A (fr)
DE (1) DE2902142C2 (fr)
FR (1) FR2416273A1 (fr)
IT (1) IT1101076B (fr)
SE (1) SE431473B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
JPS6011103B2 (ja) * 1981-02-23 1985-03-23 レオニド パフロヴイツチ サブレフ 電弧金属蒸発装置用の消耗性陰極
CH657242A5 (de) * 1982-03-22 1986-08-15 Axenov Ivan I Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken.
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
FR2557822B1 (fr) * 1984-01-11 1987-10-16 Instr I Outil de coupe et procede de fabrication dudit outil
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
DE19600993A1 (de) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
DE10044419C1 (de) * 2000-09-08 2002-05-02 Infineon Technologies Ag Abschattungsring für Plasmabeschichtungsanlagen und dessen Verwendung

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481780A (en) * 1977-12-13 1979-06-29 Futaba Denshi Kogyo Kk Ion plating device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481780A (en) * 1977-12-13 1979-06-29 Futaba Denshi Kogyo Kk Ion plating device

Also Published As

Publication number Publication date
DE2902142A1 (de) 1979-08-16
FR2416273A1 (fr) 1979-08-31
JPS5651228B2 (fr) 1981-12-03
FR2416273B1 (fr) 1981-11-06
IT1101076B (it) 1985-09-28
SE7813467L (sv) 1979-08-01
SE431473B (sv) 1984-02-06
DE2902142C2 (de) 1983-03-17
IT7831436A0 (it) 1978-12-29

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