IT1101076B - Dispositio per il rivestimento sotto vuoto - Google Patents

Dispositio per il rivestimento sotto vuoto

Info

Publication number
IT1101076B
IT1101076B IT31436/78A IT3143678A IT1101076B IT 1101076 B IT1101076 B IT 1101076B IT 31436/78 A IT31436/78 A IT 31436/78A IT 3143678 A IT3143678 A IT 3143678A IT 1101076 B IT1101076 B IT 1101076B
Authority
IT
Italy
Prior art keywords
vacuum coating
vacuum
coating
Prior art date
Application number
IT31436/78A
Other languages
English (en)
Italian (it)
Other versions
IT7831436A0 (it
Inventor
Alesandr Iosifovich Grigorov
Andrei Mikhailovich Dorodnov
Alexandr Fedorovich Isakov
Mikhail Danilovich Kiselev
Jury Alexeevich Pereratov
Alexandr Froimovich Rogozin
Boris Lvovich Taubkin
Alexandr Timofeevich Kalinin
Original Assignee
Nii Tekh Avtomobil Promy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU782568105A external-priority patent/SU796248A1/ru
Priority claimed from SU782593106A external-priority patent/SU1125291A2/ru
Application filed by Nii Tekh Avtomobil Promy filed Critical Nii Tekh Avtomobil Promy
Publication of IT7831436A0 publication Critical patent/IT7831436A0/it
Application granted granted Critical
Publication of IT1101076B publication Critical patent/IT1101076B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT31436/78A 1978-01-31 1978-12-29 Dispositio per il rivestimento sotto vuoto IT1101076B (it)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU782568105A SU796248A1 (ru) 1978-01-31 1978-01-31 Устройство дл нанесени покрытий
SU782593106A SU1125291A2 (ru) 1978-03-30 1978-03-30 Устройство дл нанесени покрытий

Publications (2)

Publication Number Publication Date
IT7831436A0 IT7831436A0 (it) 1978-12-29
IT1101076B true IT1101076B (it) 1985-09-28

Family

ID=26665654

Family Applications (1)

Application Number Title Priority Date Filing Date
IT31436/78A IT1101076B (it) 1978-01-31 1978-12-29 Dispositio per il rivestimento sotto vuoto

Country Status (5)

Country Link
JP (1) JPS54110988A (fr)
DE (1) DE2902142C2 (fr)
FR (1) FR2416273A1 (fr)
IT (1) IT1101076B (fr)
SE (1) SE431473B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
JPS6011103B2 (ja) * 1981-02-23 1985-03-23 レオニド パフロヴイツチ サブレフ 電弧金属蒸発装置用の消耗性陰極
CH657242A5 (de) * 1982-03-22 1986-08-15 Axenov Ivan I Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken.
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
FR2557822B1 (fr) * 1984-01-11 1987-10-16 Instr I Outil de coupe et procede de fabrication dudit outil
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
DE19600993A1 (de) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
DE10044419C1 (de) * 2000-09-08 2002-05-02 Infineon Technologies Ag Abschattungsring für Plasmabeschichtungsanlagen und dessen Verwendung

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area
JPS581186B2 (ja) * 1977-12-13 1983-01-10 双葉電子工業株式会社 イオンプレ−テイング装置

Also Published As

Publication number Publication date
JPS54110988A (en) 1979-08-30
JPS5651228B2 (fr) 1981-12-03
SE431473B (sv) 1984-02-06
SE7813467L (sv) 1979-08-01
FR2416273B1 (fr) 1981-11-06
FR2416273A1 (fr) 1979-08-31
DE2902142A1 (de) 1979-08-16
DE2902142C2 (de) 1983-03-17
IT7831436A0 (it) 1978-12-29

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19931229