IT1101076B - DEVICE FOR VACUUM COATING - Google Patents

DEVICE FOR VACUUM COATING

Info

Publication number
IT1101076B
IT1101076B IT31436/78A IT3143678A IT1101076B IT 1101076 B IT1101076 B IT 1101076B IT 31436/78 A IT31436/78 A IT 31436/78A IT 3143678 A IT3143678 A IT 3143678A IT 1101076 B IT1101076 B IT 1101076B
Authority
IT
Italy
Prior art keywords
vacuum coating
vacuum
coating
Prior art date
Application number
IT31436/78A
Other languages
Italian (it)
Other versions
IT7831436A0 (en
Inventor
Alesandr Iosifovich Grigorov
Andrei Mikhailovich Dorodnov
Alexandr Fedorovich Isakov
Mikhail Danilovich Kiselev
Jury Alexeevich Pereratov
Alexandr Froimovich Rogozin
Boris Lvovich Taubkin
Alexandr Timofeevich Kalinin
Original Assignee
Nii Tekh Avtomobil Promy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU782568105A external-priority patent/SU796248A1/en
Priority claimed from SU782593106A external-priority patent/SU1125291A2/en
Application filed by Nii Tekh Avtomobil Promy filed Critical Nii Tekh Avtomobil Promy
Publication of IT7831436A0 publication Critical patent/IT7831436A0/en
Application granted granted Critical
Publication of IT1101076B publication Critical patent/IT1101076B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT31436/78A 1978-01-31 1978-12-29 DEVICE FOR VACUUM COATING IT1101076B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU782568105A SU796248A1 (en) 1978-01-31 1978-01-31 Device for coating
SU782593106A SU1125291A2 (en) 1978-03-30 1978-03-30 Apparatus for application of coatings

Publications (2)

Publication Number Publication Date
IT7831436A0 IT7831436A0 (en) 1978-12-29
IT1101076B true IT1101076B (en) 1985-09-28

Family

ID=26665654

Family Applications (1)

Application Number Title Priority Date Filing Date
IT31436/78A IT1101076B (en) 1978-01-31 1978-12-29 DEVICE FOR VACUUM COATING

Country Status (5)

Country Link
JP (1) JPS54110988A (en)
DE (1) DE2902142C2 (en)
FR (1) FR2416273A1 (en)
IT (1) IT1101076B (en)
SE (1) SE431473B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1040631A1 (en) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Vacuum arc apparatus
JPS6011103B2 (en) * 1981-02-23 1985-03-23 レオニド パフロヴイツチ サブレフ Consumable cathode for electric arc metal evaporation equipment
CH657242A5 (en) * 1982-03-22 1986-08-15 Axenov Ivan I ARC PLASMA SOURCE AND ARC SYSTEM WITH SUCH AN ARC PLASMA SOURCE FOR PLASMA TREATMENT OF THE SURFACE OF WORKPIECES.
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
DE3331707A1 (en) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln METHOD AND DEVICE FOR REACTIVELY SPRAYING CONNECTIONS FROM METALS AND SEMICONDUCTORS
FR2557822B1 (en) * 1984-01-11 1987-10-16 Instr I CUTTING TOOL AND METHOD FOR MANUFACTURING SAID TOOL
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
DE3615361C2 (en) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Device for the surface treatment of workpieces
DE19600993A1 (en) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Appts. for high rate anodic evapn. for substrate coating
DE10044419C1 (en) * 2000-09-08 2002-05-02 Infineon Technologies Ag Shading ring for plasma coating systems and its use

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area
JPS581186B2 (en) * 1977-12-13 1983-01-10 双葉電子工業株式会社 Ion plating device

Also Published As

Publication number Publication date
DE2902142A1 (en) 1979-08-16
DE2902142C2 (en) 1983-03-17
SE7813467L (en) 1979-08-01
JPS5651228B2 (en) 1981-12-03
SE431473B (en) 1984-02-06
FR2416273B1 (en) 1981-11-06
JPS54110988A (en) 1979-08-30
IT7831436A0 (en) 1978-12-29
FR2416273A1 (en) 1979-08-31

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19931229