IT1101076B - DEVICE FOR VACUUM COATING - Google Patents
DEVICE FOR VACUUM COATINGInfo
- Publication number
- IT1101076B IT1101076B IT31436/78A IT3143678A IT1101076B IT 1101076 B IT1101076 B IT 1101076B IT 31436/78 A IT31436/78 A IT 31436/78A IT 3143678 A IT3143678 A IT 3143678A IT 1101076 B IT1101076 B IT 1101076B
- Authority
- IT
- Italy
- Prior art keywords
- vacuum coating
- vacuum
- coating
- Prior art date
Links
- 238000001771 vacuum deposition Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU782568105A SU796248A1 (en) | 1978-01-31 | 1978-01-31 | Device for coating |
SU782593106A SU1125291A2 (en) | 1978-03-30 | 1978-03-30 | Apparatus for application of coatings |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7831436A0 IT7831436A0 (en) | 1978-12-29 |
IT1101076B true IT1101076B (en) | 1985-09-28 |
Family
ID=26665654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT31436/78A IT1101076B (en) | 1978-01-31 | 1978-12-29 | DEVICE FOR VACUUM COATING |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS54110988A (en) |
DE (1) | DE2902142C2 (en) |
FR (1) | FR2416273A1 (en) |
IT (1) | IT1101076B (en) |
SE (1) | SE431473B (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1040631A1 (en) * | 1980-06-25 | 1983-09-07 | Предприятие П/Я В-8851 | Vacuum arc apparatus |
JPS6011103B2 (en) * | 1981-02-23 | 1985-03-23 | レオニド パフロヴイツチ サブレフ | Consumable cathode for electric arc metal evaporation equipment |
CH657242A5 (en) * | 1982-03-22 | 1986-08-15 | Axenov Ivan I | ARC PLASMA SOURCE AND ARC SYSTEM WITH SUCH AN ARC PLASMA SOURCE FOR PLASMA TREATMENT OF THE SURFACE OF WORKPIECES. |
GB2140040B (en) * | 1983-05-09 | 1986-09-17 | Vac Tec Syst | Evaporation arc stabilization |
DE3331707A1 (en) * | 1983-09-02 | 1985-03-21 | Leybold-Heraeus GmbH, 5000 Köln | METHOD AND DEVICE FOR REACTIVELY SPRAYING CONNECTIONS FROM METALS AND SEMICONDUCTORS |
FR2557822B1 (en) * | 1984-01-11 | 1987-10-16 | Instr I | CUTTING TOOL AND METHOD FOR MANUFACTURING SAID TOOL |
US4724058A (en) * | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
DE3615361C2 (en) * | 1986-05-06 | 1994-09-01 | Santos Pereira Ribeiro Car Dos | Device for the surface treatment of workpieces |
DE19600993A1 (en) * | 1995-01-13 | 1996-08-08 | Technics Plasma Gmbh | Appts. for high rate anodic evapn. for substrate coating |
DE10044419C1 (en) * | 2000-09-08 | 2002-05-02 | Infineon Technologies Ag | Shading ring for plasma coating systems and its use |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3305473A (en) * | 1964-08-20 | 1967-02-21 | Cons Vacuum Corp | Triode sputtering apparatus for depositing uniform coatings |
US3329601A (en) * | 1964-09-15 | 1967-07-04 | Donald M Mattox | Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial |
US3369990A (en) * | 1964-12-31 | 1968-02-20 | Ibm | Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency |
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
US3749662A (en) * | 1972-04-17 | 1973-07-31 | Materials Research Corp | Heated substrate support station for sputtering systems |
US4038171A (en) * | 1976-03-31 | 1977-07-26 | Battelle Memorial Institute | Supported plasma sputtering apparatus for high deposition rate over large area |
JPS581186B2 (en) * | 1977-12-13 | 1983-01-10 | 双葉電子工業株式会社 | Ion plating device |
-
1978
- 1978-12-28 JP JP16127778A patent/JPS54110988A/en active Granted
- 1978-12-29 IT IT31436/78A patent/IT1101076B/en active
- 1978-12-29 SE SE7813467A patent/SE431473B/en not_active IP Right Cessation
-
1979
- 1979-01-19 DE DE2902142A patent/DE2902142C2/en not_active Expired
- 1979-01-30 FR FR7902330A patent/FR2416273A1/en active Granted
Also Published As
Publication number | Publication date |
---|---|
DE2902142A1 (en) | 1979-08-16 |
DE2902142C2 (en) | 1983-03-17 |
SE7813467L (en) | 1979-08-01 |
JPS5651228B2 (en) | 1981-12-03 |
SE431473B (en) | 1984-02-06 |
FR2416273B1 (en) | 1981-11-06 |
JPS54110988A (en) | 1979-08-30 |
IT7831436A0 (en) | 1978-12-29 |
FR2416273A1 (en) | 1979-08-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19931229 |