JPS5651228B2 - - Google Patents

Info

Publication number
JPS5651228B2
JPS5651228B2 JP16127778A JP16127778A JPS5651228B2 JP S5651228 B2 JPS5651228 B2 JP S5651228B2 JP 16127778 A JP16127778 A JP 16127778A JP 16127778 A JP16127778 A JP 16127778A JP S5651228 B2 JPS5651228 B2 JP S5651228B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16127778A
Other languages
Japanese (ja)
Other versions
JPS54110988A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU782568105A external-priority patent/SU796248A1/en
Priority claimed from SU782593106A external-priority patent/SU1125291A2/en
Application filed filed Critical
Publication of JPS54110988A publication Critical patent/JPS54110988A/en
Publication of JPS5651228B2 publication Critical patent/JPS5651228B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
JP16127778A 1978-01-31 1978-12-28 Coating vacuum evaporation apparatus Granted JPS54110988A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU782568105A SU796248A1 (en) 1978-01-31 1978-01-31 Device for coating
SU782593106A SU1125291A2 (en) 1978-03-30 1978-03-30 Apparatus for application of coatings

Publications (2)

Publication Number Publication Date
JPS54110988A JPS54110988A (en) 1979-08-30
JPS5651228B2 true JPS5651228B2 (en) 1981-12-03

Family

ID=26665654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16127778A Granted JPS54110988A (en) 1978-01-31 1978-12-28 Coating vacuum evaporation apparatus

Country Status (5)

Country Link
JP (1) JPS54110988A (en)
DE (1) DE2902142C2 (en)
FR (1) FR2416273A1 (en)
IT (1) IT1101076B (en)
SE (1) SE431473B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1040631A1 (en) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Vacuum arc apparatus
GB2106545B (en) * 1981-02-23 1985-06-26 Rimma Ivanovna Stupak Consumable cathode for electric-arc evaporator of metal
CH657242A5 (en) * 1982-03-22 1986-08-15 Axenov Ivan I ARC PLASMA SOURCE AND ARC SYSTEM WITH SUCH AN ARC PLASMA SOURCE FOR PLASMA TREATMENT OF THE SURFACE OF WORKPIECES.
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
DE3331707A1 (en) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln METHOD AND DEVICE FOR REACTIVELY SPRAYING CONNECTIONS FROM METALS AND SEMICONDUCTORS
FR2557822B1 (en) * 1984-01-11 1987-10-16 Instr I CUTTING TOOL AND METHOD FOR MANUFACTURING SAID TOOL
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
DE3615361C2 (en) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Device for the surface treatment of workpieces
DE19600993A1 (en) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Appts. for high rate anodic evapn. for substrate coating
DE10044419C1 (en) * 2000-09-08 2002-05-02 Infineon Technologies Ag Shading ring for plasma coating systems and its use

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481780A (en) * 1977-12-13 1979-06-29 Futaba Denshi Kogyo Kk Ion plating device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3749662A (en) * 1972-04-17 1973-07-31 Materials Research Corp Heated substrate support station for sputtering systems
US4038171A (en) * 1976-03-31 1977-07-26 Battelle Memorial Institute Supported plasma sputtering apparatus for high deposition rate over large area

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481780A (en) * 1977-12-13 1979-06-29 Futaba Denshi Kogyo Kk Ion plating device

Also Published As

Publication number Publication date
FR2416273B1 (en) 1981-11-06
IT1101076B (en) 1985-09-28
FR2416273A1 (en) 1979-08-31
SE431473B (en) 1984-02-06
DE2902142A1 (en) 1979-08-16
SE7813467L (en) 1979-08-01
JPS54110988A (en) 1979-08-30
IT7831436A0 (en) 1978-12-29
DE2902142C2 (en) 1983-03-17

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