SE7813467L - Anordning for paforande av beleggningar i vakuum - Google Patents
Anordning for paforande av beleggningar i vakuumInfo
- Publication number
- SE7813467L SE7813467L SE7813467A SE7813467A SE7813467L SE 7813467 L SE7813467 L SE 7813467L SE 7813467 A SE7813467 A SE 7813467A SE 7813467 A SE7813467 A SE 7813467A SE 7813467 L SE7813467 L SE 7813467L
- Authority
- SE
- Sweden
- Prior art keywords
- vacuum coatings
- preparing vacuum
- preparing
- coatings
- vacuum
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU782568105A SU796248A1 (ru) | 1978-01-31 | 1978-01-31 | Устройство дл нанесени покрытий |
SU782593106A SU1125291A2 (ru) | 1978-03-30 | 1978-03-30 | Устройство дл нанесени покрытий |
Publications (2)
Publication Number | Publication Date |
---|---|
SE7813467L true SE7813467L (sv) | 1979-08-01 |
SE431473B SE431473B (sv) | 1984-02-06 |
Family
ID=26665654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7813467A SE431473B (sv) | 1978-01-31 | 1978-12-29 | Anordning for paforande av beleggningar i vakuum |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS54110988A (sv) |
DE (1) | DE2902142C2 (sv) |
FR (1) | FR2416273A1 (sv) |
IT (1) | IT1101076B (sv) |
SE (1) | SE431473B (sv) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1040631A1 (ru) * | 1980-06-25 | 1983-09-07 | Предприятие П/Я В-8851 | Вакуумно-дуговое устройство |
GB2106545B (en) * | 1981-02-23 | 1985-06-26 | Rimma Ivanovna Stupak | Consumable cathode for electric-arc evaporator of metal |
CH657242A5 (de) * | 1982-03-22 | 1986-08-15 | Axenov Ivan I | Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken. |
GB2140040B (en) * | 1983-05-09 | 1986-09-17 | Vac Tec Syst | Evaporation arc stabilization |
DE3331707A1 (de) * | 1983-09-02 | 1985-03-21 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern |
FR2557822B1 (fr) * | 1984-01-11 | 1987-10-16 | Instr I | Outil de coupe et procede de fabrication dudit outil |
US4724058A (en) * | 1984-08-13 | 1988-02-09 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
DE3615361C2 (de) * | 1986-05-06 | 1994-09-01 | Santos Pereira Ribeiro Car Dos | Vorrichtung zur Oberflächenbehandlung von Werkstücken |
DE19600993A1 (de) * | 1995-01-13 | 1996-08-08 | Technics Plasma Gmbh | Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung |
DE10044419C1 (de) * | 2000-09-08 | 2002-05-02 | Infineon Technologies Ag | Abschattungsring für Plasmabeschichtungsanlagen und dessen Verwendung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3305473A (en) * | 1964-08-20 | 1967-02-21 | Cons Vacuum Corp | Triode sputtering apparatus for depositing uniform coatings |
US3329601A (en) * | 1964-09-15 | 1967-07-04 | Donald M Mattox | Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial |
US3369990A (en) * | 1964-12-31 | 1968-02-20 | Ibm | Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency |
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
US3749662A (en) * | 1972-04-17 | 1973-07-31 | Materials Research Corp | Heated substrate support station for sputtering systems |
US4038171A (en) * | 1976-03-31 | 1977-07-26 | Battelle Memorial Institute | Supported plasma sputtering apparatus for high deposition rate over large area |
JPS581186B2 (ja) * | 1977-12-13 | 1983-01-10 | 双葉電子工業株式会社 | イオンプレ−テイング装置 |
-
1978
- 1978-12-28 JP JP16127778A patent/JPS54110988A/ja active Granted
- 1978-12-29 IT IT31436/78A patent/IT1101076B/it active
- 1978-12-29 SE SE7813467A patent/SE431473B/sv not_active IP Right Cessation
-
1979
- 1979-01-19 DE DE2902142A patent/DE2902142C2/de not_active Expired
- 1979-01-30 FR FR7902330A patent/FR2416273A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5651228B2 (sv) | 1981-12-03 |
IT1101076B (it) | 1985-09-28 |
SE431473B (sv) | 1984-02-06 |
DE2902142A1 (de) | 1979-08-16 |
JPS54110988A (en) | 1979-08-30 |
FR2416273B1 (sv) | 1981-11-06 |
FR2416273A1 (fr) | 1979-08-31 |
IT7831436A0 (it) | 1978-12-29 |
DE2902142C2 (de) | 1983-03-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |
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