FR2400256A1 - Systeme a faisceau d'electrons pouvant projeter des caracteres - Google Patents
Systeme a faisceau d'electrons pouvant projeter des caracteresInfo
- Publication number
- FR2400256A1 FR2400256A1 FR7820120A FR7820120A FR2400256A1 FR 2400256 A1 FR2400256 A1 FR 2400256A1 FR 7820120 A FR7820120 A FR 7820120A FR 7820120 A FR7820120 A FR 7820120A FR 2400256 A1 FR2400256 A1 FR 2400256A1
- Authority
- FR
- France
- Prior art keywords
- electron beam
- character
- system capable
- beam system
- projecting characters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 239000003990 capacitor Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 230000003252 repetitive effect Effects 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Abstract
Système à faisceau d'électrons pouvant projeter des caractères. Le système comprend des moyens de mise en forme du faisceau constitués par l'ouverture carrée 14. Le condensateur 15 focalise l'image de l'ouverture 14 dans le plan 16 d'un élément à caractères 17 comportant un certain nombre d'ouverture de dessins de caractères. Le moyen de déflexion 19 comprenant des plaques 20, 20', 21 et 21' permet de diriger le faisceau d'électrons sur le caractère 16 à projeter de l'élement 17. Ainsi un caractère choisi peut être projeté pour impressionner une couche photorésistante. Peut être utilisé pour la fabrication des circuits intégrés, de nature répétitive.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US82335277A | 1977-08-10 | 1977-08-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2400256A1 true FR2400256A1 (fr) | 1979-03-09 |
FR2400256B1 FR2400256B1 (fr) | 1982-02-05 |
Family
ID=25238513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7820120A Granted FR2400256A1 (fr) | 1977-08-10 | 1978-06-29 | Systeme a faisceau d'electrons pouvant projeter des caracteres |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5429981A (fr) |
BR (1) | BR7804994A (fr) |
CH (1) | CH631574A5 (fr) |
DE (1) | DE2834391C2 (fr) |
FR (1) | FR2400256A1 (fr) |
GB (1) | GB1598219A (fr) |
IT (1) | IT1112285B (fr) |
NL (1) | NL7808162A (fr) |
SE (1) | SE425838B (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2488043A1 (fr) * | 1980-07-30 | 1982-02-05 | Le N Proizv | Dispositif a optique electronique pour l'etude d'echantillons |
FR2507816A1 (fr) * | 1981-06-15 | 1982-12-17 | Nippon Telegraph & Telephone | Systeme deflecteur de focalisation pour faisceau de particules chargees |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5435173U (fr) * | 1977-08-12 | 1979-03-07 | ||
JPS5463681A (en) * | 1977-10-29 | 1979-05-22 | Nippon Aviotronics Kk | Electron beam exposure device |
JPS61183926A (ja) * | 1985-02-08 | 1986-08-16 | Toshiba Corp | 荷電ビ−ム照射装置 |
JPS62206828A (ja) * | 1986-03-06 | 1987-09-11 | Nec Corp | 荷電粒子線描画装置 |
JPH02246318A (ja) * | 1989-03-20 | 1990-10-02 | Fujitsu Ltd | 荷電粒子ビーム露光装置 |
JP2746098B2 (ja) * | 1994-01-19 | 1998-04-28 | 日本電気株式会社 | 電子ビーム描画用アパーチャおよび電子ビーム描画方法 |
JP3206448B2 (ja) | 1996-08-30 | 2001-09-10 | 日本電気株式会社 | 電子ビーム描画装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2460716B1 (de) * | 1974-12-19 | 1976-05-06 | Siemens Ag | Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats |
FR2329069A1 (fr) * | 1975-10-23 | 1977-05-20 | Rikagaku Kenkyusho | Procede de projection d'un faisceau de particules chargees |
FR2337420A1 (fr) * | 1975-12-31 | 1977-07-29 | Fujitsu Ltd | Appareil lithographique a faisceau electronique |
FR2351497A1 (fr) * | 1976-05-14 | 1977-12-09 | Thomson Csf | Dispositif permettant le trace programme de figures de formes differentes |
FR2393418A1 (fr) * | 1977-05-31 | 1978-12-29 | Rikagaku Kenkyusho | Procede et appareil pour projeter un faisceau de particules electrisees sur une cible |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
US3956635A (en) * | 1975-06-13 | 1976-05-11 | International Business Machines Corporation | Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns |
GB1557924A (en) * | 1976-02-05 | 1979-12-19 | Western Electric Co | Irradiation apparatus and methods |
JPS5357764A (en) * | 1976-11-04 | 1978-05-25 | Fujitsu Ltd | Electron beam exposure apparatus |
CA1166766A (fr) * | 1977-02-23 | 1984-05-01 | Hans C. Pfeiffer | Methode et dispositif pour obtenir un faisceau electronique de grosseur variable |
-
1978
- 1978-05-10 GB GB18816/78A patent/GB1598219A/en not_active Expired
- 1978-06-29 FR FR7820120A patent/FR2400256A1/fr active Granted
- 1978-07-07 CH CH740878A patent/CH631574A5/de not_active IP Right Cessation
- 1978-07-12 JP JP8411578A patent/JPS5429981A/ja active Granted
- 1978-07-26 IT IT26097/78A patent/IT1112285B/it active
- 1978-08-02 SE SE7808326A patent/SE425838B/sv not_active IP Right Cessation
- 1978-08-03 NL NL787808162A patent/NL7808162A/xx not_active Application Discontinuation
- 1978-08-03 BR BR7804994A patent/BR7804994A/pt unknown
- 1978-08-05 DE DE2834391A patent/DE2834391C2/de not_active Expired
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2460716B1 (de) * | 1974-12-19 | 1976-05-06 | Siemens Ag | Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats |
FR2329069A1 (fr) * | 1975-10-23 | 1977-05-20 | Rikagaku Kenkyusho | Procede de projection d'un faisceau de particules chargees |
FR2337420A1 (fr) * | 1975-12-31 | 1977-07-29 | Fujitsu Ltd | Appareil lithographique a faisceau electronique |
FR2351497A1 (fr) * | 1976-05-14 | 1977-12-09 | Thomson Csf | Dispositif permettant le trace programme de figures de formes differentes |
FR2393418A1 (fr) * | 1977-05-31 | 1978-12-29 | Rikagaku Kenkyusho | Procede et appareil pour projeter un faisceau de particules electrisees sur une cible |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2488043A1 (fr) * | 1980-07-30 | 1982-02-05 | Le N Proizv | Dispositif a optique electronique pour l'etude d'echantillons |
FR2507816A1 (fr) * | 1981-06-15 | 1982-12-17 | Nippon Telegraph & Telephone | Systeme deflecteur de focalisation pour faisceau de particules chargees |
Also Published As
Publication number | Publication date |
---|---|
DE2834391A1 (de) | 1979-02-22 |
JPS5438035B2 (fr) | 1979-11-19 |
IT1112285B (it) | 1986-01-13 |
DE2834391C2 (de) | 1986-04-17 |
BR7804994A (pt) | 1979-04-17 |
FR2400256B1 (fr) | 1982-02-05 |
CH631574A5 (en) | 1982-08-13 |
SE425838B (sv) | 1982-11-15 |
NL7808162A (nl) | 1979-02-13 |
SE7808326L (sv) | 1979-02-11 |
IT7826097A0 (it) | 1978-07-26 |
SE7808326A (sv) | 1979-02-11 |
GB1598219A (en) | 1981-09-16 |
JPS5429981A (en) | 1979-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |