IT7826097A0 - Apparecchiatura a fascio di elettroni particolarmente atta all'impiego nella fabbricazione di tracciati lsi. - Google Patents

Apparecchiatura a fascio di elettroni particolarmente atta all'impiego nella fabbricazione di tracciati lsi.

Info

Publication number
IT7826097A0
IT7826097A0 IT7826097A IT2609778A IT7826097A0 IT 7826097 A0 IT7826097 A0 IT 7826097A0 IT 7826097 A IT7826097 A IT 7826097A IT 2609778 A IT2609778 A IT 2609778A IT 7826097 A0 IT7826097 A0 IT 7826097A0
Authority
IT
Italy
Prior art keywords
lsi
traces
manufacture
electron beam
particularly suitable
Prior art date
Application number
IT7826097A
Other languages
English (en)
Other versions
IT1112285B (it
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT7826097A0 publication Critical patent/IT7826097A0/it
Application granted granted Critical
Publication of IT1112285B publication Critical patent/IT1112285B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
IT26097/78A 1977-08-10 1978-07-26 Apparecchiatura a fascio di elettroni particolarmente atta all'impiego nella fabbricazione di tracciati lsi IT1112285B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82335277A 1977-08-10 1977-08-10

Publications (2)

Publication Number Publication Date
IT7826097A0 true IT7826097A0 (it) 1978-07-26
IT1112285B IT1112285B (it) 1986-01-13

Family

ID=25238513

Family Applications (1)

Application Number Title Priority Date Filing Date
IT26097/78A IT1112285B (it) 1977-08-10 1978-07-26 Apparecchiatura a fascio di elettroni particolarmente atta all'impiego nella fabbricazione di tracciati lsi

Country Status (9)

Country Link
JP (1) JPS5429981A (it)
BR (1) BR7804994A (it)
CH (1) CH631574A5 (it)
DE (1) DE2834391C2 (it)
FR (1) FR2400256A1 (it)
GB (1) GB1598219A (it)
IT (1) IT1112285B (it)
NL (1) NL7808162A (it)
SE (1) SE425838B (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435173U (it) * 1977-08-12 1979-03-07
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
FR2488043A1 (fr) * 1980-07-30 1982-02-05 Le N Proizv Dispositif a optique electronique pour l'etude d'echantillons
JPS57206173A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Focusing deflecting device for charged corpuscule beam
JPS61183926A (ja) * 1985-02-08 1986-08-16 Toshiba Corp 荷電ビ−ム照射装置
JPS62206828A (ja) * 1986-03-06 1987-09-11 Nec Corp 荷電粒子線描画装置
JPH02246318A (ja) * 1989-03-20 1990-10-02 Fujitsu Ltd 荷電粒子ビーム露光装置
JP2746098B2 (ja) * 1994-01-19 1998-04-28 日本電気株式会社 電子ビーム描画用アパーチャおよび電子ビーム描画方法
JP3206448B2 (ja) 1996-08-30 2001-09-10 日本電気株式会社 電子ビーム描画装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
DE2460716C2 (de) * 1974-12-19 1976-12-30 Siemens Ag Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
JPS5357764A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
GB1605087A (en) * 1977-05-31 1981-12-16 Rikagaku Kenkyusho Method for shaping a beam of electrically charged particles

Also Published As

Publication number Publication date
DE2834391A1 (de) 1979-02-22
JPS5438035B2 (it) 1979-11-19
IT1112285B (it) 1986-01-13
DE2834391C2 (de) 1986-04-17
BR7804994A (pt) 1979-04-17
FR2400256B1 (it) 1982-02-05
CH631574A5 (en) 1982-08-13
SE425838B (sv) 1982-11-15
NL7808162A (nl) 1979-02-13
SE7808326L (sv) 1979-02-11
SE7808326A (sv) 1979-02-11
FR2400256A1 (fr) 1979-03-09
GB1598219A (en) 1981-09-16
JPS5429981A (en) 1979-03-06

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