FR2329069A1 - Procede de projection d'un faisceau de particules chargees - Google Patents

Procede de projection d'un faisceau de particules chargees

Info

Publication number
FR2329069A1
FR2329069A1 FR7630468A FR7630468A FR2329069A1 FR 2329069 A1 FR2329069 A1 FR 2329069A1 FR 7630468 A FR7630468 A FR 7630468A FR 7630468 A FR7630468 A FR 7630468A FR 2329069 A1 FR2329069 A1 FR 2329069A1
Authority
FR
France
Prior art keywords
projecting
charged particles
charged
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7630468A
Other languages
English (en)
Other versions
FR2329069B1 (fr
Inventor
Eiichi Goto
Takashi Soma
Masanori Idesawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Publication of FR2329069A1 publication Critical patent/FR2329069A1/fr
Application granted granted Critical
Publication of FR2329069B1 publication Critical patent/FR2329069B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
FR7630468A 1975-10-23 1976-10-11 Procede de projection d'un faisceau de particules chargees Granted FR2329069A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50127833A JPS5251871A (en) 1975-10-23 1975-10-23 Projecting method for charge particle beams

Publications (2)

Publication Number Publication Date
FR2329069A1 true FR2329069A1 (fr) 1977-05-20
FR2329069B1 FR2329069B1 (fr) 1980-05-23

Family

ID=14969779

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7630468A Granted FR2329069A1 (fr) 1975-10-23 1976-10-11 Procede de projection d'un faisceau de particules chargees

Country Status (5)

Country Link
US (1) US4112305A (fr)
JP (1) JPS5251871A (fr)
DE (1) DE2647855A1 (fr)
FR (1) FR2329069A1 (fr)
GB (1) GB1567187A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2354632A1 (fr) * 1976-06-11 1978-01-06 Rikagaku Kenkyusho Systeme d'exposition a un faisceau d'electrons
FR2393418A1 (fr) * 1977-05-31 1978-12-29 Rikagaku Kenkyusho Procede et appareil pour projeter un faisceau de particules electrisees sur une cible
FR2400256A1 (fr) * 1977-08-10 1979-03-09 Ibm Systeme a faisceau d'electrons pouvant projeter des caracteres
FR2482780A1 (fr) * 1980-05-19 1981-11-20 Hughes Aircraft Co Dispositif a profiler un faisceau electronique

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316577A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
CA1166766A (fr) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Methode et dispositif pour obtenir un faisceau electronique de grosseur variable
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
JPS5410678A (en) * 1977-06-24 1979-01-26 Zeiss Jena Veb Carl Nonnthermal electron beam processor
JPS5435680A (en) * 1977-08-25 1979-03-15 Cho Lsi Gijutsu Kenkyu Kumiai Device for exposing electron beam
JPS5461879A (en) * 1977-10-27 1979-05-18 Fujitsu Ltd Electron beam exposure apparatus
JPS54108580A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device
JPS5515212A (en) * 1978-07-20 1980-02-02 Nippon Telegr & Teleph Corp <Ntt> Electronic beam exposure apparatus
JPS5591125A (en) * 1978-12-28 1980-07-10 Agency Of Ind Science & Technol Pattern formation method and apparatus using charged particle beam
US4263514A (en) * 1979-09-13 1981-04-21 Hughes Aircraft Company Electron beam system
US4282437A (en) * 1979-12-17 1981-08-04 Bell Telephone Laboratories, Incorporated Charged particle beam lithography
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
US4469950A (en) * 1982-03-04 1984-09-04 Varian Associates, Inc. Charged particle beam exposure system utilizing variable line scan
JPS6251218A (ja) * 1985-08-30 1987-03-05 Hitachi Ltd 電子線描画装置
US5828730A (en) * 1995-01-19 1998-10-27 Sten-Tel, Inc. Method and apparatus for recording and managing communications for transcription

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3020441A (en) * 1957-10-09 1962-02-06 Gen Dynamics Corp Character beam-shaped tube
US2988660A (en) * 1958-07-02 1961-06-13 Gen Dynamics Corp Electro optical system in a cathode ray tube
NL6807439A (fr) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3922546A (en) * 1972-04-14 1975-11-25 Radiant Energy Systems Electron beam pattern generator
US3936693A (en) * 1972-10-02 1976-02-03 General Electric Company Two-aperture immersion lens
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2354632A1 (fr) * 1976-06-11 1978-01-06 Rikagaku Kenkyusho Systeme d'exposition a un faisceau d'electrons
FR2393418A1 (fr) * 1977-05-31 1978-12-29 Rikagaku Kenkyusho Procede et appareil pour projeter un faisceau de particules electrisees sur une cible
FR2400256A1 (fr) * 1977-08-10 1979-03-09 Ibm Systeme a faisceau d'electrons pouvant projeter des caracteres
FR2482780A1 (fr) * 1980-05-19 1981-11-20 Hughes Aircraft Co Dispositif a profiler un faisceau electronique

Also Published As

Publication number Publication date
DE2647855C2 (fr) 1987-01-29
DE2647855A1 (de) 1977-05-05
JPS5251871A (en) 1977-04-26
JPS5320391B2 (fr) 1978-06-26
US4112305A (en) 1978-09-05
GB1567187A (en) 1980-05-14
FR2329069B1 (fr) 1980-05-23

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