FR2354632A1 - Systeme d'exposition a un faisceau d'electrons - Google Patents
Systeme d'exposition a un faisceau d'electronsInfo
- Publication number
- FR2354632A1 FR2354632A1 FR7717867A FR7717867A FR2354632A1 FR 2354632 A1 FR2354632 A1 FR 2354632A1 FR 7717867 A FR7717867 A FR 7717867A FR 7717867 A FR7717867 A FR 7717867A FR 2354632 A1 FR2354632 A1 FR 2354632A1
- Authority
- FR
- France
- Prior art keywords
- electron beam
- workpiece
- exposure system
- beam exposure
- openings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
L'invention concerne un système d'exposition à un faisceau d'électrons comprenant un moyen générateur d'un faisceau d'électrons un système optique électronique pour converger et projeter le faisceau sur une pièce, un moyen d'entraînement pour décaler continuellement pièce dans une certaine direction Y et un moyen déflecteur pour dévier le faisceau d'électrons dans une étendue de bande étroite sur la pièce plus ou moins perpendiculairement à la direction Y. Selon l'invention un moyen forme le faisceau d'électrons 3 à section transversale à plusieurs côtés produit par le moyen générateur 2 et il comporte deux plaques à ouvertures 7 et 8 ayant des ouvertures a plusieurs côtes respectivement et un moyen déflecteur 9 entre les deux plaques. L'invention permet notamment de reproduire divers motifs sur des pièces.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6910376A JPS52151568A (en) | 1976-06-11 | 1976-06-11 | Electron beam exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2354632A1 true FR2354632A1 (fr) | 1978-01-06 |
FR2354632B1 FR2354632B1 (fr) | 1981-07-31 |
Family
ID=13392941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7717867A Granted FR2354632A1 (fr) | 1976-06-11 | 1977-06-10 | Systeme d'exposition a un faisceau d'electrons |
Country Status (5)
Country | Link |
---|---|
US (2) | US4117340A (fr) |
JP (1) | JPS52151568A (fr) |
DE (1) | DE2725959C3 (fr) |
FR (1) | FR2354632A1 (fr) |
GB (1) | GB1546533A (fr) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1605087A (en) * | 1977-05-31 | 1981-12-16 | Rikagaku Kenkyusho | Method for shaping a beam of electrically charged particles |
JPS5412675A (en) * | 1977-06-30 | 1979-01-30 | Jeol Ltd | Electon beam exposure method |
US4167676A (en) * | 1978-02-21 | 1979-09-11 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
US4246640A (en) * | 1979-02-26 | 1981-01-20 | The Perkin-Elmer Corporation | Automatic recorder abscissa scaling |
JPS55146931A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Depicting method by electronic beam |
US4376249A (en) * | 1980-11-06 | 1983-03-08 | International Business Machines Corporation | Variable axis electron beam projection system |
US4494004A (en) * | 1980-11-28 | 1985-01-15 | International Business Machines Corporation | Electron beam system |
DE3169257D1 (en) * | 1980-11-28 | 1985-04-18 | Ibm | Electron beam system and method |
WO1982002623A1 (fr) * | 1981-01-23 | 1982-08-05 | Veeco Instr Inc | Systeme d'exposition a faisceau de particules chargees en parallele |
DE3138896A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen |
US4469950A (en) * | 1982-03-04 | 1984-09-04 | Varian Associates, Inc. | Charged particle beam exposure system utilizing variable line scan |
JPS5958586A (ja) * | 1982-09-28 | 1984-04-04 | Toshiba Mach Co Ltd | マスクの検査方法および装置 |
JPH0732110B2 (ja) * | 1984-05-18 | 1995-04-10 | 株式会社日立製作所 | 電子線露光装置 |
JP2619565B2 (ja) * | 1990-11-05 | 1997-06-11 | 株式会社日立製作所 | 電子ビーム描画装置 |
US5194741A (en) * | 1991-03-20 | 1993-03-16 | Fujitsu Limited | Method for writing a pattern on an object by a focused electron beam with an improved efficiency |
DE19638109A1 (de) * | 1995-09-25 | 1997-03-27 | Jeol Ltd | Elektronenstrahl-Lithographie-System |
US6110318A (en) * | 1997-11-26 | 2000-08-29 | Science Research Laboratory | System for selective electron beam irradiation |
JPWO2006104139A1 (ja) * | 2005-03-29 | 2008-09-11 | 株式会社アドバンテスト | マルチコラム型電子ビーム露光装置 |
JP5243912B2 (ja) * | 2008-01-24 | 2013-07-24 | 日本電子株式会社 | 荷電粒子ビーム装置におけるビーム位置較正方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3638231A (en) * | 1968-05-27 | 1972-01-25 | Tno | Device for recording with electron rays |
FR2329069A1 (fr) * | 1975-10-23 | 1977-05-20 | Rikagaku Kenkyusho | Procede de projection d'un faisceau de particules chargees |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1100835B (de) * | 1952-03-01 | 1961-03-02 | Zeiss Carl Fa | Einrichtung zum Fraesen von Profilen, zum Schneiden von Schablonen oder zum Bohren von Duesenkanaelen mittels eines Ladungstraegerstrahles |
FR919297A (fr) * | 1959-09-04 | 1947-04-01 | ||
DE1765852C3 (de) * | 1968-07-26 | 1979-03-01 | Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln | Vorrichtung zur Bearbeitung von Werkstoffen mit magnetisch fokussierten Ladungsträgerstrahlen |
US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
US3922546A (en) * | 1972-04-14 | 1975-11-25 | Radiant Energy Systems | Electron beam pattern generator |
US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
US4017403A (en) * | 1974-07-31 | 1977-04-12 | United Kingdom Atomic Energy Authority | Ion beam separators |
JPS5148313A (ja) * | 1974-10-23 | 1976-04-26 | Hitachi Ltd | Fudogatajikihetsudoroodeingukiko |
JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
US4393312A (en) * | 1976-02-05 | 1983-07-12 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
-
1976
- 1976-06-11 JP JP6910376A patent/JPS52151568A/ja active Granted
-
1977
- 1977-05-18 GB GB20952/77A patent/GB1546533A/en not_active Expired
- 1977-05-31 US US05/801,812 patent/US4117340A/en not_active Expired - Lifetime
- 1977-06-08 DE DE2725959A patent/DE2725959C3/de not_active Expired
- 1977-06-10 FR FR7717867A patent/FR2354632A1/fr active Granted
-
1982
- 1982-07-06 US US06/395,853 patent/USRE31630E/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3638231A (en) * | 1968-05-27 | 1972-01-25 | Tno | Device for recording with electron rays |
FR2329069A1 (fr) * | 1975-10-23 | 1977-05-20 | Rikagaku Kenkyusho | Procede de projection d'un faisceau de particules chargees |
Non-Patent Citations (1)
Title |
---|
NV8093/75 * |
Also Published As
Publication number | Publication date |
---|---|
GB1546533A (en) | 1979-05-23 |
JPS5337711B2 (fr) | 1978-10-11 |
JPS52151568A (en) | 1977-12-16 |
US4117340A (en) | 1978-09-26 |
DE2725959B2 (de) | 1981-06-04 |
USRE31630E (en) | 1984-07-17 |
FR2354632B1 (fr) | 1981-07-31 |
DE2725959C3 (de) | 1982-02-18 |
DE2725959A1 (de) | 1977-12-15 |
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