ES2110094T3 - Material de deposicion en forma de vapor y metodo para la produccion del mismo. - Google Patents

Material de deposicion en forma de vapor y metodo para la produccion del mismo.

Info

Publication number
ES2110094T3
ES2110094T3 ES93911971T ES93911971T ES2110094T3 ES 2110094 T3 ES2110094 T3 ES 2110094T3 ES 93911971 T ES93911971 T ES 93911971T ES 93911971 T ES93911971 T ES 93911971T ES 2110094 T3 ES2110094 T3 ES 2110094T3
Authority
ES
Spain
Prior art keywords
cobalt
weight
deposition material
percent
degrees
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93911971T
Other languages
English (en)
Inventor
Yukihiro Oishi
Susumu Yamamoto
Teruyuki Murai
Nozomu Kawabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14650392A external-priority patent/JPH05311405A/ja
Priority claimed from JP14650492A external-priority patent/JPH06240442A/ja
Priority claimed from JP14650292A external-priority patent/JPH05311301A/ja
Priority claimed from JP28667792A external-priority patent/JP3228356B2/ja
Priority claimed from JP4328526A external-priority patent/JP3018798B2/ja
Priority claimed from JP05100277A external-priority patent/JP3103458B2/ja
Priority claimed from JP10772893A external-priority patent/JP2903940B2/ja
Priority claimed from JP11374993A external-priority patent/JPH06306583A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of ES2110094T3 publication Critical patent/ES2110094T3/es
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

SE PREVE UN MATERIAL DE DEPOSICION DE VAPOR PARA LA PRODUCCION DE CINTAS VTR, DE PELICULAS FINAS DE GRABACION MAGNETICA VERTICAL, ETC. EL MATERIAL DE DEPOSICION DE VAPOR ES UN HILO HECHO DE COBALTO CON IMPUREZAS, UNA ALEACION DE COBALTO-NIQUEL QUE CONTIENE HASTA 30 PORCIENTO EN PESO DE IMPUREZAS DE COBALTO, Y OTRAS IMPUREZAS INEVITABLES, O UNA ALEACION DE COBALTO-CROMO QUE CONTIENE HASTA 30 POR CIENTO EN PESO DE CROMO Y OTRAS IMPUREZAS INEVITABLES. ESTE HILO TIENE UN DIAMETRO DE 1.0 A 10 MM, UNA FUERZA DE TENSION DE 400 MA A 1,5000 MPA Y UN ALARGAMIENTO Y CONTRACCION DE AL MENOS 5%. EL MATERIAL DE DEPOSICION DE VAPOR TIENE UNA ESTRUCTURA CRISTALINA PREDETERMINADA, Y UNA PROPORCION DE LA RED CUBICO CENTRADA EN LA CARA ES 0.1 A 1. PARA OBTENER TALES PROPIEDADES, LA MATERIA SE CALIENTA A TU (GRADOS) C Y ENTONCES SE SOMETE A UNA PLASTIFICACION A UNA TEMPERATURA ENTRE TD (GRADOS) C Y TU (GRADOS) C + 200 (GRADOS) C DE MANERA QUE LA REDUCCION DE AREA POR PASO ES SUPERIOR A 10% DONDE TU ES LA TEMPERATURA DE TRANSFORMACION DURANTE EL CALENTAMIENTO PARA UN CAMBIO DE HEXAGONO EMPAQUETADO CERRADO A UN CUBO CENTRADO DE CARA MIENTRAS TD ES LA TEMPERATURA DE TRANSFORMACION DURANTE E ENFRIAMIENTO PARA UN CAMBIO DE CUBO CENTRADO EN LA CARA A HEXAGONO EMPAQUETADO CERRADO. CUANDO EL MATERIAL DEL HILO ESTA HECHO DE METAL DE COBALTO O ALEACION DE COBALTO-NIQUEL, CONTIENE PREFERIBLEMENTE DE 0.01 A 0.1 PORCIENTO EN PESO DE CUALQUIERA DE LOS ELEMENTOS ELEGIDOS DEL GRUPO QUE CONSISTE EN MN, CR, MG, ZR Y CA. CUANDO E MATERIAL DE HILO ESTA HECHO DE ALEACION DE COBALTO-CROMO, CONTIENE PREFERIBLEMENTE DE 0.01 A 0.1 PORCIENTO EN PESO CUALQUIERA DE LOS ELEMENTOS ELEGIDOS DEL GRUPO QUE CONSISTE EN MN, MG, ZR Y CA.
ES93911971T 1992-05-11 1993-05-06 Material de deposicion en forma de vapor y metodo para la produccion del mismo. Expired - Lifetime ES2110094T3 (es)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP14650392A JPH05311405A (ja) 1992-05-11 1992-05-11 蒸着用材料の製造方法
JP14650292A JPH05311301A (ja) 1992-05-11 1992-05-11 蒸着用材料
JP14650492A JPH06240442A (ja) 1992-05-11 1992-05-11 蒸着用材料の製造方法
JP28667792A JP3228356B2 (ja) 1992-09-30 1992-09-30 蒸着用材料
JP4328526A JP3018798B2 (ja) 1992-11-13 1992-11-13 蒸着材料の製造方法
JP05100277A JP3103458B2 (ja) 1993-04-02 1993-04-02 蒸着用材料
JP10772893A JP2903940B2 (ja) 1993-04-09 1993-04-09 蒸着用材料及びその製造方法
JP11374993A JPH06306583A (ja) 1993-04-16 1993-04-16 蒸着用材料及びその製造方法

Publications (1)

Publication Number Publication Date
ES2110094T3 true ES2110094T3 (es) 1998-02-01

Family

ID=27572944

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93911971T Expired - Lifetime ES2110094T3 (es) 1992-05-11 1993-05-06 Material de deposicion en forma de vapor y metodo para la produccion del mismo.

Country Status (5)

Country Link
US (2) US5441010A (es)
EP (1) EP0603407B1 (es)
DE (1) DE69315309T2 (es)
ES (1) ES2110094T3 (es)
WO (1) WO1993023586A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2373744A (en) * 2001-01-06 2002-10-02 Valmet General Ltd Coating a flexible web with a metal
WO2003004139A1 (fr) * 2001-07-05 2003-01-16 Asahi Glass Company, Limited Dispositif et procede d'affinage de materiaux solides
US7247396B2 (en) 2003-01-30 2007-07-24 Seagate Technology Llc Highly oriented perpendicular magnetic recording media
US7211340B2 (en) * 2003-01-30 2007-05-01 Seagate Technology Llc Thin film structures providing strong basal plane growth orientation and magnetic recording media comprising same
WO2018020296A1 (en) * 2016-07-27 2018-02-01 Arcelormittal Apparatus and method for vacuum deposition
CN113084454B (zh) * 2021-03-24 2023-07-21 宁波江丰电子材料股份有限公司 一种用于半导体蒸发镀膜用蒸发料及其制备方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3091022A (en) * 1959-03-25 1963-05-28 Union Carbide Corp Cold-formable predominantly cobalt alloys
DE1558632C3 (de) * 1966-07-14 1980-08-07 Sps Technologies, Inc., Jenkintown, Pa. (V.St.A.) Anwendung der Verformungshärtung auf besonders nickelreiche Kobalt-Nickel-Chrom-Molybdän-Legierungen
US3563731A (en) * 1969-07-28 1971-02-16 Coast Metals Inc Cobalt-base alloys containing chromium,carbon,tungsten and nickel
JPS5023367A (es) * 1973-07-05 1975-03-13
BE842233A (fr) * 1976-05-26 1976-09-16 Electrode enrobee pour le rechargement manuel dur et resistant a la corrosion et a l'abrasion.
JPS5360313A (en) * 1976-11-10 1978-05-30 Noriya Ishida Cobalt chrome alloy wires for dental use
JPS58157542A (ja) * 1982-03-12 1983-09-19 Hitachi Metals Ltd 高Ｃｏ合金材料の加工方法
JPS5945327A (ja) * 1982-09-09 1984-03-14 Teijin Ltd 金属薄膜磁気記録媒体用ポリエチレンテレフタレ−トフイルム
JPS5964734A (ja) * 1982-09-30 1984-04-12 Nippon Gakki Seizo Kk Ｃｏ−Ｎｉ系磁性合金
JPS59169602A (ja) * 1983-03-17 1984-09-25 Seiko Electronic Components Ltd 高弾性帯材の製造方法
JPS6046355A (ja) * 1983-08-22 1985-03-13 Nippon Mining Co Ltd Ｃｏ−Νｉ系合金棒，線又は条の製造方法
JPS6050625A (ja) * 1983-08-27 1985-03-20 Olympus Optical Co Ltd 磁気記録媒体の製造方法
JPS6132219A (ja) * 1984-07-25 1986-02-14 Matsushita Electric Ind Co Ltd 垂直磁気記録媒体の製造方法
JPS6194238A (ja) * 1984-10-16 1986-05-13 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法
JPS61160836A (ja) * 1984-12-29 1986-07-21 Toshiba Corp 磁気記録媒体の製造方法
JPH0687298B2 (ja) * 1985-04-24 1994-11-02 東レ株式会社 高密度記録媒体用ベ−スフイルム
JPS62295219A (ja) * 1986-06-13 1987-12-22 Sony Corp 垂直磁気記録媒体の製造方法
JPS6314864A (ja) * 1986-07-08 1988-01-22 Ulvac Corp Ｃｏ基合金スパツタタ−ゲツトおよびその製造法
JP2593877B2 (ja) * 1987-07-27 1997-03-26 住友電気工業株式会社 炭化物析出硬化型Ｃｏ基合金溶接線及びその製造方法
JPS6475144A (en) * 1987-09-16 1989-03-20 Mitsubishi Metal Corp Manufacture of evaporation body for vacuum deposition
JPH02137126A (ja) * 1988-11-17 1990-05-25 Matsushita Electric Ind Co Ltd 磁気記録媒体の製造方法
JPH02147195A (ja) * 1988-11-28 1990-06-06 Daido Steel Co Ltd コバルト・クロム基合金溶接材料の製造方法
JPH0371912A (ja) * 1989-08-08 1991-03-27 Sumitomo Electric Ind Ltd ステライトの伸線方法
JPH03236435A (ja) * 1990-06-25 1991-10-22 Mitsui Eng & Shipbuild Co Ltd 硫黄、酸素及び窒素の各含有量が極めて低いコバルト基合金

Also Published As

Publication number Publication date
EP0603407B1 (en) 1997-11-19
DE69315309D1 (de) 1998-01-02
WO1993023586A1 (en) 1993-11-25
US6126760A (en) 2000-10-03
DE69315309T2 (de) 1998-06-25
EP0603407A4 (en) 1995-02-08
US5441010A (en) 1995-08-15
EP0603407A1 (en) 1994-06-29

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