ES2030006T3 - Dispositivo para el tratamiento de plasma de substratos en una descarga de plasma excitada mediante alta frecuencia. - Google Patents

Dispositivo para el tratamiento de plasma de substratos en una descarga de plasma excitada mediante alta frecuencia.

Info

Publication number
ES2030006T3
ES2030006T3 ES198787102866T ES87102866T ES2030006T3 ES 2030006 T3 ES2030006 T3 ES 2030006T3 ES 198787102866 T ES198787102866 T ES 198787102866T ES 87102866 T ES87102866 T ES 87102866T ES 2030006 T3 ES2030006 T3 ES 2030006T3
Authority
ES
Spain
Prior art keywords
electrode
plasma
hollow anode
substrates
hollow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198787102866T
Other languages
English (en)
Inventor
Jorg Dr. Dipl.-Phys. Kieser
Michael Dr. Dipl.-Phys. Sellschopp
Michael Dr. Dipl.-Phys. Geisler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6295415&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2030006(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Leybold AG filed Critical Leybold AG
Application granted granted Critical
Publication of ES2030006T3 publication Critical patent/ES2030006T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape

Abstract

DISPOSITIVOS PARA LA MANIPULACION DE PLASMA DE SUSTRATOS (7) EN UNA DESCARGA DE PLASMA ACTIVADA POR ALTA FRECUENCIA ENTRE DOS ELECTRODOS (3,8) ABASTECIDOS POR UNA FUENTE DE ALTA FRECUENCIA (6). EL PRIMER ELECTRODO ESTA CONSTRUIDO COMO UN ANODO HUECO (3), Y EL SEGUNDO ELECTRODO (8), PORTADOR DEL SUSTRATO (7), ESTA SITUADO EN LA CAMARA HUECA (10) DEL ANODO HUECO O POR DELANTE. ADEMAS EL ANODO HUECO (3) MUESTRA UN BORDE (9) ABIERTO EN DIRECCION AL SEGUNDO ELECTRODO (8) QUE FORMA UNA HENDIDURA S1 DE UN MAXIMO DE 10 MM. DE ANCHURA FRENTE AL SEGUNDO ELECTRODO. PARA COLOCAR EL ANODO HUECO SIN CRITICA CON RESPECTO A LA ANCHURA DE LA HENDIDURA, SE HAN COLOCADO SALIDIZOS (12) EN LA CAMARA HUECA (10) DEL ANODO (3), QUE AUMENTAN LA SUPERFICIE (11) INTERIOR. ESTOS SALIDIZOS (12) ESTAN CONSTRUIDOS ESENCIALMENTE COMO ESTRUCTURA DE NERVADURA QUE PUEDE TOMAR LA FORMA DE ALVEOLO.
ES198787102866T 1986-03-04 1987-02-27 Dispositivo para el tratamiento de plasma de substratos en una descarga de plasma excitada mediante alta frecuencia. Expired - Lifetime ES2030006T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863606959 DE3606959A1 (de) 1986-03-04 1986-03-04 Vorrichtung zur plasmabehandlung von substraten in einer durch hochfrequenz angeregten plasmaentladung

Publications (1)

Publication Number Publication Date
ES2030006T3 true ES2030006T3 (es) 1992-10-16

Family

ID=6295415

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198787102866T Expired - Lifetime ES2030006T3 (es) 1986-03-04 1987-02-27 Dispositivo para el tratamiento de plasma de substratos en una descarga de plasma excitada mediante alta frecuencia.

Country Status (6)

Country Link
US (1) US4767641A (es)
EP (1) EP0235770B1 (es)
JP (1) JPS62282434A (es)
AT (1) ATE73961T1 (es)
DE (2) DE3606959A1 (es)
ES (1) ES2030006T3 (es)

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Also Published As

Publication number Publication date
EP0235770A3 (en) 1989-09-06
ATE73961T1 (de) 1992-04-15
DE3777425D1 (de) 1992-04-23
JPS62282434A (ja) 1987-12-08
DE3606959A1 (de) 1987-09-10
EP0235770A2 (de) 1987-09-09
US4767641A (en) 1988-08-30
EP0235770B1 (de) 1992-03-18

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