EP3786715A1 - Photoleitende trommel, bilderzeugungsgerät und verfahren zur regenerierung einer photoleitfähigen trommel - Google Patents

Photoleitende trommel, bilderzeugungsgerät und verfahren zur regenerierung einer photoleitfähigen trommel Download PDF

Info

Publication number
EP3786715A1
EP3786715A1 EP20192894.2A EP20192894A EP3786715A1 EP 3786715 A1 EP3786715 A1 EP 3786715A1 EP 20192894 A EP20192894 A EP 20192894A EP 3786715 A1 EP3786715 A1 EP 3786715A1
Authority
EP
European Patent Office
Prior art keywords
photoconductive drum
polishing
protective layer
abrasive grains
agglomerative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20192894.2A
Other languages
English (en)
French (fr)
Inventor
Jun Zhang
Ryohta SOTONO
Hiroyuki Chiba
Hiroya TANIKAWA
Kiyotaka Sawada
Wataru Kikuta
Tatsuya Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Publication of EP3786715A1 publication Critical patent/EP3786715A1/de
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/75Details relating to xerographic drum, band or plate, e.g. replacing, testing
    • G03G15/751Details relating to xerographic drum, band or plate, e.g. replacing, testing relating to drum
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147Cover layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers
    • G03G5/142Inert intermediate layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147Cover layers
    • G03G5/14704Cover layers comprising inorganic material

Definitions

  • aspects of the present disclosure relate to a photoconductive drum, an image forming apparatus, and a method of regenerating photoconductive drum.
  • an electrostatic latent image is formed on a photoconductive drum by an optical writing device and developed as a toner image by a developing device, and the toner image is transferred to a transfer belt. Residual toner on a surface of the photoconductive drum is removed by a cleaning device. When the formation of the toner image and the removal of the toner as described above are repeated, the surface of the photoconductive drum may be damaged.
  • the characteristics of the photoconductive drum after polishing may be further improved since simply polishing the photoconductive drum to reduce its surface roughness may not obtain the same characteristics as an unused photoconductive drum.
  • a purpose of the present invention is to provide a photoconductive drum capable of obtaining good characteristics even after polishing, an image forming apparatus including the photoconductive drum, and a method of regenerating the photoconductive drum.
  • a photoconductive drum that includes a sleeve member having a hollow cylindrical shape, a photosensitive layer, and a protective layer.
  • the photosensitive layer and the protective layer are sequentially laminated on an outer peripheral surface of the sleeve member.
  • a surface of the protective layer has an arithmetic mean roughness of less than 0.03 ⁇ m at a cutoff value of 0.25 mm and an arithmetic mean waviness of 0.05 ⁇ m or more at the cutoff value of 2.5 mm.
  • a method of regenerating the photoconductive drum by applying a polishing process to the photoconductive drum after use includes polishing, in the polishing process, the surface of the protective layer with polishing means including agglomerative abrasive grains as polishing abrasive grains.
  • the photoconductive drum has an arithmetic average roughness less than 0.03 ⁇ m, thus allowing the influence of scratches to be reduced by polishing even if the surface of the photoconductive drum is scratched by using the photoconductive drum. Therefore, the photoconductive drum can restrain a cleaning failure caused by scratches of the surface of the photoconductive drum when a cleaning blade cleans the surface of the photoconductive drum and can also restrain a streak-like stain caused by the scratches when an image is formed. Moreover, setting the arithmetic average waviness to be 0.05 ⁇ m or more can ensure a sufficient cleaning performance, and restrain uneven contact of the cleaning blade and the photoconductive drum. Thus, even after polishing, sufficient surface characteristics of the photoconductive drum can be obtained by reducing the surface roughness at relatively micro level and retaining the surface waviness at relatively macro level.
  • the photoconductive drum 1 of the present embodiment includes a hollow cylindrical sleeve member 2, a photosensitive layer 3 laminated on an outer peripheral surface of the sleeve member 2, and a protective layer 4 laminated on an outer peripheral surface of the photosensitive layer 3. Namely, the photosensitive layer 3 and the protective layer 4 are sequentially laminated on the outer peripheral surface of the sleeve member 2.
  • the photoconductive drum 1 is used in an image forming apparatus such as a copying machine, a facsimile, a laser printer, a multifunctional machine having two or more of the foregoing capabilities, and the like.
  • An electrostatic latent image is formed on the surface by an optical writing device and developed by a developing device as a toner image, and the toner image is transferred to a transfer belt.
  • the photosensitive layer 3 includes, for example, an undercoating layer, a charge generating layer, and a charge transport layer.
  • the protective layer 4 is formed by, for example, dispersing a filler such as a resin or the like in a binder resin such as polycarbonate which constitutes the charge transport layer.
  • the configurations and materials of the photosensitive layer 3 and the protective layer 4 may be suitably selected.
  • FIG. 2 schematically illustrates a surface shape of the protective layer 4 in the unused (new) photoconductive drum 1.
  • FIG. 3 schematically illustrates the surface shape of the protective layer 4 in the photoconductive drum 1 after a predetermined number of uses.
  • the photoconductive drum 1 As enlarged illustrated in FIGS. 2 and 3 (see the inside of each dashed line circle), as the photoconductive drum 1 is used, rough surface degradation is caused by abrasion and filming. Furthermore, as the photoconductive drum 1 is used uneven contact of the cleaning blade and the photoconductive drum 1 or a developing material causes scratches 41 to 43. Also, the protective layer 4 has a waviness shape both before and after the use of the photoconductive drum 1.
  • the photoconductive drum 1, which has degraded through use, is polished as described below to regenerate the photoconductive drum 1.
  • FIG. 4 illustrates a polishing apparatus 100 (polishing means) that polishes the photoconductive drum 1.
  • the polishing apparatus 100 has a cylindrical elastic member 101 and a polishing film 102 attached to the upper surface of the elastic member 101.
  • the polishing apparatus 100 is configured to be rotated by a power source with the height direction of the cylindrical elastic member 101 as the axial direction of the polishing apparatus 100.
  • the elastic member 101 is made of, for example, urethane foam, foamed EVA sponge, suede, nonwoven fabric, or the like.
  • the polishing film 102 has agglomerative abrasive grains as abrasive grains, and functions as a polishing means.
  • the agglomerative abrasive grains are agglomerates consisting of a large number of fine primary particles. A large number of primary particles are loosely coupled to each other, partially and with void areas formed, to form a granular porous body.
  • granules (secondary particles) having a particle size of about 1 ⁇ m to about 300 ⁇ m are obtained by granulating with a spray dryer. Thereafter, the granules are heat treated to form a porous structure.
  • the agglomerative abrasive grains after heat treatment preferably have a compressive breaking strength of 20 megapascals (MPa) or less. If the compressive breaking strength is too high, scratches are likely to occur during polishing.
  • the primary particles of the agglomerative abrasive grains preferably have an average particle diameter of 4 ⁇ m or less.
  • the primary particles are preferably inorganic oxide such as aluminum oxide, zirconium oxide, silicon dioxide, cerium oxide, silicon dioxide, iron oxide, or the like.
  • the abrasive grains obtained as described above are mixed with liquid urethane resin, and methyl ethyl ketone is added as a solvent to adjust a viscosity of the solution.
  • the solution is mixed and stirred for about 10 minutes using a stirrer to prepare a mixture. Stirring is carried out at room temperature, and the number of revolutions can be set to 100 round per minutes (rpm) as a degree that does not destroy abrasive grains.
  • the mixture is coated with a wire bar coater on a substrate (e.g., polyethylene terephthalate (PET) film having a thickness of about 75 ⁇ m), and then dried for an hour in a constant temperature chamber kept at 60°C, and the polishing film 102 can be obtained.
  • PET polyethylene terephthalate
  • a polishing process is carried out by rotating the photoconductive drum 1 by a power source and rotating the polishing apparatus 100 by the power source and reciprocating the polishing apparatus 100 in the vertical direction in the FIG. 4B .
  • the polishing film 102 rotates with the elastic member 101 in the state of biting into the surface of the photoconductive drum 1 by a certain amount.
  • the polishing apparatus 100 as described above performs the polishing process on the photoconductive drum 1 whose surface of the protective layer 4 has degraded after a certain number of uses, thus, allowing a regenerated photoconductive drum 1 to be obtained.
  • the regenerated photoconductive drum 1 has an arithmetic mean roughness Ra defined in JIS B 0601-2001 being less than 0.03 ⁇ m at a cutoff value of 0.25 mm, an arithmetic mean waviness Wa defined in JIS B 0601-2001 being 0.05 ⁇ m or more at the cutoff value of 2.5 mm, and a maximum height roughness Rz defined in JIS B 0601-2001 being 0.5 ⁇ m or less at the cutoff value of 0.25 mm, on the surface of the protective layer 4. Furthermore, the average thickness of the protective layer 4 is 0.2 ⁇ m or more in the regenerated photoconductive drum 1.
  • the following effects can be obtained.
  • the arithmetic average roughness Ra on the surface of the protective layer 4 is less than 0.03 ⁇ m, even if the scratches 41 to 43 are formed on the photoconductive drum 1, the influence of the scratches 41 to 43 can be reduced by polishing. Therefore, when the cleaning blade cleans the surface of the photoconductive drum 1, a cleaning failure caused by scratches of the surface of the photoconductive drum 1 can be restrained. Further, when an image is formed, a streak-like stain caused by the scratches can be restrained.
  • setting the arithmetic average waviness Wa of 0.05 ⁇ m or more on the surface of the protective layer 4 can ensure a sufficient cleaning performance of the cleaning blade and restrain uneven contact of the cleaning blade and the photoconductive drum 1.
  • sufficient surface characteristics of the photoconductive drum 1 can be obtained even if after polishing, by reducing the surface roughness at relatively micro level and retaining the surface waviness at relatively macro level.
  • setting the average thickness of the protective layer 4 to 0.2 ⁇ m or more can restrain a change in the electrostatic properties of the photosensitive layer 3 and extend the use life of the regenerated photoconductive drum 1.
  • the arithmetic mean roughness Ra on the surface of the protective layer 4 after polishing can be less than 0.03 ⁇ m, while the arithmetic average waviness Wa is 0.05 ⁇ m or more.
  • a polishing process with loose abrasive grains e.g., a soft polishing pad such as a nonwoven cloth or sponge
  • a surface S0 before polishing is indicated by a solid line
  • a surface S1 after polishing is indicated by a broken line
  • the scratches 41 to 43 also progress with the progress of polishing, and deeper ones of the scratches 41 to 43 may not be removed.
  • the scratches 41 to 43 can be easily removed.
  • the waviness cannot be maintained, and the arithmetic mean waviness Wa is reduced.
  • polishing with the polishing film 102 having agglomerative abrasive grains as in the present embodiment can maintain the waviness while removing the scratches 41 to 43.
  • agglomerative abrasive grains with an average particle diameter of the primary particles of 4 ⁇ m or less can prevent scratches by polishing on the surface of the protective layer 4 which is a processed surface.
  • the average particle diameter of the primary particles is too large, the polishing processing efficiency may be enhanced.
  • scratches are likely to occur on the processed surface, and the quality may deteriorate.
  • the agglomerative abrasive grains having the compressive breaking strength of 20 MPa or less wear can be gradually progressed during polishing, new cutting edges can easily be generated, the quality can be improved while the surface of the protective layer 4 is polished, and such a condition can be easily maintained for a long time.
  • the compressive breaking strength of the agglomerative abrasive grains is too high, new polishing scratches may occur on the surface of the protective layer 4 during polishing, which may lead to deterioration of the quality of the surface.
  • stains and scratches on the surface of the protective layer 4 can be easily removed.
  • the maximum height roughness Rz at the surface of the protective layer 4 is 0.5 ⁇ m or less at the cutoff value of 0.25 mm.
  • the maximum height roughness Rz may be larger than 0.5 ⁇ m if the arithmetic average roughness Ra can be less than 0.03 ⁇ m at the cutoff value of 0.25 mm.
  • the average thickness of the protective layer 4 is 0.2 ⁇ m or more. However, for example, if it is desired to improve the initial image quality, the average thickness of the protective layer 4 may be less than 0.2 ⁇ m.
  • the average particle diameter of the primary particles is 4 ⁇ m or less
  • the compressive breaking strength is 20 MPa or less
  • the primary particles are made of inorganic oxide.
  • the polishing means need only have agglomerative abrasive grains that can maintain the waviness shape while removing scratches on the surface of the protective layer 4, and the average particle diameter of the primary particles, the compressive breaking strength, and the material of the primary particles may be selected as appropriate.
  • both the arithmetic mean roughness Ra and the maximum height roughness Rz were increased. Also, the arithmetic average roughness Ra was reduced by polishing in both the unused photoconductive drum 1 and the photoconductive drum 1 after use. The maximum height of the unused photoconductive drum 1 was slightly increased after polishing. The maximum height roughness Rz was decreased by polishing the photoconductive drum 1 after use, but became a larger value than the maximum height roughness Rz of the unused photoconductive drum 1 before polishing.
  • Example 1 Agglomerative Abrasive Grains 0.1 2.2
  • Example 2 Agglomerative Abrasive Grains 2 5.1
  • Example 3 Agglomerative Abrasive Grains 3 7.1
  • Example 4 Agglomerative Abrasive Grains 3 19.3
  • Example 5 Agglomerative Abrasive Grains 3 22.3
  • Example 6 Agglomerative Abrasive Grains 4 8.2 Comparative Example 1 Ultraprecision Lapping Film n/a n/a Comparative Example 2 Ultraprecision Lapping Film n/a n/a Comparative Example 3 Alumina Slurry Polishing Pad n/a n/a
  • the ultraprecision lapping film of Comparative Example 1 is a LAPIKA #1200 film manufactured by KOVAX Corporation.
  • the ultraprecision lapping film of Comparative Example 2 is a LAPIKA #10000 film manufactured by KOVAX Corporation and is finer in particle size than Comparative Example 1.
  • the polishing pad of Comparative Example 3 is a suede type SURFIN 018-3 manufactured by FUJIMI Inc., and the alumina slurry is obtained by mixing the abrasive grains of an average particle diameter of 0.5 ⁇ m, which are manufactured by FUJIMI Inc., with water so that the abrasive grains have a weight ratio of 5 wt%. In Comparative Example 3, the alumina slurry was supplied at a feed speed of 20 cc/min on the polishing pad during polishing.
  • Table 3 illustrates the results of polishing using the polishing means of Examples 1 to 5 and Comparative Examples 1 to 3.
  • Table 3 Scratch Occurrence After Polishing Scratch Removability Example 1
  • Example 2 Not Occur Example 3
  • Example 4 Good
  • Example 5 Almost Not Occur Example 6
  • Occur Comparative Example 1 Occur n/a Comparative Example 2 n/a Bad Comparative Example 3 n/a Bad
  • both the restraint of the occurrence of new scratches caused by polishing the removal of the scratches caused by using the photoconductive drum 1 were simultaneously achieved in any of Examples 1 to 6, while were not simultaneously achieved in any of Comparative Examples 1 to 3.
  • the arithmetic average roughness Ra becomes less than 0.03 ⁇ m at the cutoff value of 0.25 mm
  • the arithmetic mean waviness Wa is 0.05 ⁇ m or more at the cutoff value of 2.5 mm.
  • Table 4 illustrates the maximum height roughness Rz when an unused photoconductive drum 1 is polished by using the polishing means of Examples 1 to 6.
  • Table 4 Maximum Height Roughness Rz ( ⁇ m) Example 1 0.25 to 0.35 Example 2 0.33 to 0.48 Example 3 0.25 to 0.35 Example 4 0.33 to 0.48 Example 5 0.6 to 0.11 Example 6 0.8 to 1.5
  • the average polishing speed (polishing efficiency) was evaluated by using a polishing means in which the compression breaking strength was substantially constant (8 MPa) and the average particle diameter of primary particles was different. Results of the tests are illustrated in FIG. 7 .
  • Polishing was performed using the polishing means of Example 3 for the photoconductive drum 1 after use, and the arithmetic mean waviness Wa before and after polishing (before and after regenerating) was measured. Results of the measurements are illustrated in FIG. 8 . In all samples, the arithmetic mean waviness Wa was decreased by polishing, but was 0.05 ⁇ m or more even after polishing.
  • the used photoconductive drum 1 was polished by using the polishing means of Example 3, so that the average thickness of the protective layer 4 was 0.2 ⁇ m.
  • the photoconductive drum 1 after polishing was installed in the image forming apparatus and a life test was performed, and good results were obtained.
  • the used photoconductive drum 1 was polished using the polishing means of Example 3, and the electrostatic capacity of the surface of the photoconductive drum 1 was measured before and after polishing. Results of the tests are illustrated in FIG. 9 . Although the electrostatic capacitance was reduced by polishing, there was no change that affected the quality.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Cleaning In Electrography (AREA)
EP20192894.2A 2019-09-02 2020-08-26 Photoleitende trommel, bilderzeugungsgerät und verfahren zur regenerierung einer photoleitfähigen trommel Pending EP3786715A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019159469A JP7375385B2 (ja) 2019-09-02 2019-09-02 感光体ドラム、画像形成装置および感光体ドラム再生方法

Publications (1)

Publication Number Publication Date
EP3786715A1 true EP3786715A1 (de) 2021-03-03

Family

ID=72243032

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20192894.2A Pending EP3786715A1 (de) 2019-09-02 2020-08-26 Photoleitende trommel, bilderzeugungsgerät und verfahren zur regenerierung einer photoleitfähigen trommel

Country Status (3)

Country Link
EP (1) EP3786715A1 (de)
JP (1) JP7375385B2 (de)
CN (1) CN112445089A (de)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345167A (ja) * 1991-05-23 1992-12-01 Matsushita Electric Ind Co Ltd 電子写真感光体
EP1134619A2 (de) * 2000-03-16 2001-09-19 Canon Kabushiki Kaisha Lichtempfindliches Element, Bildherstellungsapparat und Bildherstellungsverfahren
EP1243973A1 (de) * 2001-03-22 2002-09-25 Ricoh Company Gerät zur Regenerierung von Photorezeptoren, Bilderzeugungsgerät mit einem regenerierten Photorezeptor und Verfahren zur Regenerierung von Photorezeptoren
JP2006301092A (ja) * 2005-04-18 2006-11-02 Canon Inc 画像形成装置
US20100330475A1 (en) * 2009-06-25 2010-12-30 Nozomu Tamoto Image forming apparatus, process cartridge, and image bearing member
JP2011007969A (ja) * 2009-06-25 2011-01-13 Ricoh Co Ltd 電子写真感光体、及びこれを用いた画像形成方法、画像形成装置、プロセスカートリッジ
JP2012078642A (ja) * 2010-10-04 2012-04-19 Ricoh Co Ltd 画像形成装置、画像形成装置用プロセスカートリッジ

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02101488A (ja) * 1988-10-11 1990-04-13 Fuji Xerox Co Ltd 電子写真感光体のクリーニング方法
JPH0962016A (ja) * 1995-08-28 1997-03-07 Konica Corp 電子写真感光体、感光体表面研磨方法及び画像形成方法
JP4093459B2 (ja) * 2001-09-19 2008-06-04 株式会社リコー 電子写真画像形成装置用部材表面の突起等の検出方法、検出装置および前記画像形成装置用部材の生産システム
JP2004009227A (ja) * 2002-06-07 2004-01-15 Furukawa Electric Co Ltd:The アルミニウム管の製造方法及び電子写真感光ドラム
JP2007057840A (ja) 2005-08-24 2007-03-08 Fuji Xerox Co Ltd 電子写真感光体、プロセスカートリッジおよび画像形成装置
JP4979253B2 (ja) 2006-03-29 2012-07-18 株式会社リコー 画像形成装置及びプロセスカートリッジ
JP2008233165A (ja) * 2007-03-16 2008-10-02 Fuji Xerox Co Ltd 電子写真感光体、電子写真プロセスカートリッジ、および画像形成装置
JP2012203023A (ja) * 2011-03-23 2012-10-22 Ricoh Co Ltd 電子写真感光体、画像形成装置及びプロセスカートリッジ
JP2014153488A (ja) * 2013-02-07 2014-08-25 Fuji Xerox Co Ltd 画像形成装置
JP6354863B2 (ja) * 2015-01-30 2018-07-11 京セラドキュメントソリューションズ株式会社 電子写真感光体及びそれを備えた画像形成装置
JP2018049060A (ja) * 2016-09-20 2018-03-29 富士ゼロックス株式会社 電子写真感光体、プロセスカートリッジ、及び画像形成装置
JP2018054707A (ja) * 2016-09-26 2018-04-05 富士ゼロックス株式会社 画像形成装置及びプロセスカートリッジ

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345167A (ja) * 1991-05-23 1992-12-01 Matsushita Electric Ind Co Ltd 電子写真感光体
EP1134619A2 (de) * 2000-03-16 2001-09-19 Canon Kabushiki Kaisha Lichtempfindliches Element, Bildherstellungsapparat und Bildherstellungsverfahren
EP1243973A1 (de) * 2001-03-22 2002-09-25 Ricoh Company Gerät zur Regenerierung von Photorezeptoren, Bilderzeugungsgerät mit einem regenerierten Photorezeptor und Verfahren zur Regenerierung von Photorezeptoren
JP2002351098A (ja) 2001-03-22 2002-12-04 Ricoh Co Ltd 感光体リサイクル装置、感光体リサイクル方法、感光体、並びに画像形成装置
JP3854171B2 (ja) 2001-03-22 2006-12-06 株式会社リコー 感光体リサイクル装置、感光体リサイクル方法
JP2006301092A (ja) * 2005-04-18 2006-11-02 Canon Inc 画像形成装置
US20100330475A1 (en) * 2009-06-25 2010-12-30 Nozomu Tamoto Image forming apparatus, process cartridge, and image bearing member
JP2011007969A (ja) * 2009-06-25 2011-01-13 Ricoh Co Ltd 電子写真感光体、及びこれを用いた画像形成方法、画像形成装置、プロセスカートリッジ
JP2012078642A (ja) * 2010-10-04 2012-04-19 Ricoh Co Ltd 画像形成装置、画像形成装置用プロセスカートリッジ

Also Published As

Publication number Publication date
JP7375385B2 (ja) 2023-11-08
JP2021039194A (ja) 2021-03-11
CN112445089A (zh) 2021-03-05

Similar Documents

Publication Publication Date Title
US6190236B1 (en) Method and system for vacuum removal of chemical mechanical polishing by-products
CN105388725B (zh) 充电构件、处理盒和电子照相设备
WO2000059680A1 (fr) Corps de polissage, dispositif de polissage, procede de polissage et procede de fabrication d'un dispositif a semi-conducteur
KR102614442B1 (ko) 합성 지석
TW201829121A (zh) 研磨墊
JP2005271151A (ja) 研磨装置及び研磨方法
JP2009072832A (ja) 研磨シートおよびその製造方法
CN110828334A (zh) 基板用清洗件、基板清洗装置、基板处理装置、基板处理方法以及基板用清洗件的制造方法
EP3786715A1 (de) Photoleitende trommel, bilderzeugungsgerät und verfahren zur regenerierung einer photoleitfähigen trommel
CN1239962C (zh) 感光体再生方法及其装置,感光体,图像形成装置
TW474852B (en) Method and apparatus for polishing workpieces
JP6345988B2 (ja) 基板処理装置
JP5267164B2 (ja) 電子写真感光体の表面研磨方法
JP2000237962A (ja) 鏡面加工用研磨具
JP7438243B2 (ja) 基板をパッケージングするための平坦化方法
JP4198612B2 (ja) 円筒部材の作製方法、その円筒部材、電子写真用各種部品、センタレス研削加工装置、及び電子写真画像形成装置
JP2009276440A (ja) 電子写真感光体の研磨方法
JP2002346927A (ja) Cmpコンディショナ
JP6772008B2 (ja) 電子写真用部材、その製造方法、プロセスカートリッジ及び電子写真画像形成装置
JP7222677B2 (ja) 帯電部材、プロセスカートリッジ及び電子写真画像形成装置
JPH071397B2 (ja) 電子写真感光体用基体の表面加工方法
JPH06118662A (ja) 電子写真感光体の表面粗面化法
JPH0635216A (ja) 電子写真感光体用アルミニウム管状基板の製造方法
JP5902000B2 (ja) 研磨装置
CN111805433A (zh) 研磨装置以及研磨方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20200826

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20230131