EP2358727A1 - Reinigung von siliciumverbindungen - Google Patents
Reinigung von siliciumverbindungenInfo
- Publication number
- EP2358727A1 EP2358727A1 EP09737391A EP09737391A EP2358727A1 EP 2358727 A1 EP2358727 A1 EP 2358727A1 EP 09737391 A EP09737391 A EP 09737391A EP 09737391 A EP09737391 A EP 09737391A EP 2358727 A1 EP2358727 A1 EP 2358727A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- foreign metal
- content
- metal
- atoms
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 150000003377 silicon compounds Chemical class 0.000 title claims abstract description 23
- 238000004140 cleaning Methods 0.000 title description 2
- 229910052751 metal Inorganic materials 0.000 claims abstract description 109
- 239000002184 metal Substances 0.000 claims abstract description 109
- 150000001875 compounds Chemical class 0.000 claims abstract description 50
- 239000011148 porous material Substances 0.000 claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 40
- 150000001282 organosilanes Chemical class 0.000 claims abstract description 39
- 150000004756 silanes Chemical class 0.000 claims abstract description 35
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000011347 resin Substances 0.000 claims abstract description 6
- 229920005989 resin Polymers 0.000 claims abstract description 6
- 239000010457 zeolite Substances 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims description 69
- 239000003463 adsorbent Substances 0.000 claims description 61
- -1 - aminoalkyl Chemical group 0.000 claims description 46
- 125000004432 carbon atom Chemical group C* 0.000 claims description 41
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 26
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 23
- 229910000077 silane Inorganic materials 0.000 claims description 22
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 19
- 230000008569 process Effects 0.000 claims description 17
- 229910052742 iron Inorganic materials 0.000 claims description 13
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 12
- 229910052796 boron Inorganic materials 0.000 claims description 12
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 12
- 239000005052 trichlorosilane Substances 0.000 claims description 12
- 125000004122 cyclic group Chemical group 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 239000000460 chlorine Substances 0.000 claims description 8
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 7
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 7
- 229920000570 polyether Polymers 0.000 claims description 7
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 239000011575 calcium Substances 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 125000001188 haloalkyl group Chemical group 0.000 claims description 6
- 239000011591 potassium Substances 0.000 claims description 6
- 229910052700 potassium Inorganic materials 0.000 claims description 6
- 229910052708 sodium Inorganic materials 0.000 claims description 6
- 239000011734 sodium Substances 0.000 claims description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 5
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 229910001507 metal halide Inorganic materials 0.000 claims description 5
- 125000005375 organosiloxane group Chemical group 0.000 claims description 5
- 125000000304 alkynyl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000005160 aryl oxy alkyl group Chemical group 0.000 claims description 4
- 125000004966 cyanoalkyl group Chemical group 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 4
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- 229910052987 metal hydride Inorganic materials 0.000 claims description 4
- 150000004681 metal hydrides Chemical class 0.000 claims description 4
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 4
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 3
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims description 3
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 3
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 3
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 229910021536 Zeolite Inorganic materials 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 238000011109 contamination Methods 0.000 claims description 2
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 claims description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000005055 methyl trichlorosilane Substances 0.000 claims description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 6
- 125000002877 alkyl aryl group Chemical group 0.000 claims 2
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 238000001179 sorption measurement Methods 0.000 abstract description 8
- 150000004760 silicates Chemical class 0.000 abstract description 5
- 239000002131 composite material Substances 0.000 abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- 238000001914 filtration Methods 0.000 description 15
- 150000002739 metals Chemical class 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 8
- 239000012528 membrane Substances 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 8
- 238000009835 boiling Methods 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 235000011089 carbon dioxide Nutrition 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000006384 oligomerization reaction Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000013022 venting Methods 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 239000005909 Kieselgur Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- 150000005840 aryl radicals Chemical class 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000005054 phenyltrichlorosilane Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 2
- 239000005050 vinyl trichlorosilane Substances 0.000 description 2
- BPPVUXSMLBXYGG-UHFFFAOYSA-N 4-[3-(4,5-dihydro-1,2-oxazol-3-yl)-2-methyl-4-methylsulfonylbenzoyl]-2-methyl-1h-pyrazol-3-one Chemical compound CC1=C(C(=O)C=2C(N(C)NC=2)=O)C=CC(S(C)(=O)=O)=C1C1=NOCC1 BPPVUXSMLBXYGG-UHFFFAOYSA-N 0.000 description 1
- 229920003043 Cellulose fiber Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241001091551 Clio Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004813 Perfluoroalkoxy alkane Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910003691 SiBr Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- LUXIMSHPDKSEDK-UHFFFAOYSA-N bis(disilanyl)silane Chemical compound [SiH3][SiH2][SiH2][SiH2][SiH3] LUXIMSHPDKSEDK-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical class OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229920011301 perfluoro alkoxyl alkane Polymers 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 1
- PZKOFHKJGUNVTM-UHFFFAOYSA-N trichloro-[dichloro(trichlorosilyl)silyl]silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)[Si](Cl)(Cl)Cl PZKOFHKJGUNVTM-UHFFFAOYSA-N 0.000 description 1
- MSQITEWLCPTJBF-UHFFFAOYSA-N trichloro-[dichloro-[dichloro(trichlorosilyl)silyl]silyl]silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)[Si](Cl)(Cl)[Si](Cl)(Cl)Cl MSQITEWLCPTJBF-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
Definitions
- the invention relates to a process for the treatment of a composition containing silicon compounds, in particular organosilanes and / or inorganic silanes and at least one foreign metal and / or a foreign metal-containing compound, wherein the composition is brought into contact with at least one adsorbent and / or a first filter and subsequently obtaining the composition in which the content of the foreign metal and / or the foreign metal-containing compound is reduced.
- the invention relates to the use of organic resins, activated carbon, silicates and / or zeolites and / or at least one filter with small pore sizes for reducing said compounds.
- organic silanes such as alkoxysilanes, alkylalkoxysilanes, alkenylalkoxysilanes, alkynylalkoxysilanes, arylalkoxysilanes or even organofunctional silanes and silicic acid esters in nanotechnology or in the field of microelectronics
- organic silanes such as alkoxysilanes, alkylalkoxysilanes, alkenylalkoxysilanes, alkynylalkoxysilanes, arylalkoxysilanes or even organofunctional silanes and silicic acid esters in nanotechnology or in the field of microelectronics.
- silicon compounds organic or inorganic
- microelectronics for example in the deposition of insulating, dielectric or epitaxial layers in the semiconductor industry
- traces of foreign metal contaminants generate considerable problems in these sensitive applications. If foreign metals are contained in the silicon compounds, this leads to undesirable doping effects and reduces the lifetime of electrical components due to migration processes.
- EP 0 684 245 A2 discloses reducing the content of hydrocarbons in halosilanes by adsorbing them to an adsorbent
- EP 0 957 105 A2 discloses the reduction of residual halogen contents and the color number improvement in alkoxysilane or alkoxysilane-based compositions by treatment thereof activated carbon.
- the present invention has for its object to provide a method for reducing the foreign metal content as well as the content of a foreign metal-containing compound in silicon compounds in a simple and economical manner.
- a further object of the present invention was to provide ultrahigh-purity silicon compounds, in particular organosilanes and / or inorganic silanes, with the lowest levels of foreign metals and foreign metal-containing compounds.
- the invention therefore provides a process for the treatment of a composition containing silicon compounds, in particular at least one organosilane and / or at least one inorganic silane or a mixture of one of the silanes or both silanes, and at least one foreign metal and / or a foreign metal-containing compound, the composition being is substantially anhydrous in particular for inorganic silanes, is brought in a first step with at least one adsorbent and / or at least one filter in contact, and optionally in a further step with at least one filter in contact, preferably filtered, and recovering the A composition in which the content of the foreign metal and / or the foreign metal-containing compound is reduced.
- the steps of contacting with an adsorbent and optionally separating the adsorbent for example by means of a first filtration, Sed imentation, centrifugation, or, by the adsorbent is flowed through by the composition, combined with an additional filtration step.
- the method for the treatment of the composition may according to a variant embodiment provide that an adsorbent also acts as a filter.
- the adsorbent be densely packed in a cartridge or the like, which is flowed through by the composition.
- the mean pore size which in this case results interparti cally from the packing of the adsorbent, may be less than 100 ⁇ m, preferably less than 50 ⁇ m to 5 ⁇ m.
- the method for the treatment of the composition can also be effected by the composition is filtered, in particular, the filter has a pore size of less than 100 .mu.m, preferably less than 50 .mu.m to 5 .mu.m, more preferably, the filter has a mean pore size between 5 to 30 microns , particularly preferably from 5 to 10 .mu.m, optionally in a further step, the thus treated composition is filtered at least once, wherein the at least one filter has a pore size of less than 5 microns, in particular a pore size equal to 1 micron, more preferably a pore size less than or equal to 0.1 ⁇ m, and less than or equal to 0.05 ⁇ m, and recovering the composition in which the content of the foreign metal and / or the foreign metal-containing compound is decreased.
- the pore size can also result from the interparticle packing of an adsorbent.
- the adsorbent is optionally separated; for example, the composition may pass through an adsorbent, stirred with an adsorbent, shaken and / or allowed to stand, or otherwise contacted with the adsorbent in other ways known to those skilled in the art, such as by first filtration a filter, in particular, the filter has a pore size less than 100 microns, preferably less than 50 microns to greater than 5 microns, more preferably, the filter has a mean pore size between 5 to 30 .mu.m, more preferably from 5 to 10 .mu.m, alternatively or additionally the composition may be centrifuged or sedimented; and
- the thus treated composition is filtered, wherein the at least one filter has a pore size of less than 5 microns, in particular a pore size equal to 1 micron, more preferably a pore size less than or equal to 0.1 microns 0.05 ⁇ m, and
- One or more filtration steps can be carried out at atmospheric pressure, overpressure or under vacuum at a suitable temperature.
- the foreign metal content and / or the content of the foreign metal-containing compound, - is usually a residual content of foreign metal or foreign metal-containing compound which can be poorly distilled or not further separated - especially independently from each other to a content in the range of below 100 ⁇ g / kg, in particular below 50 ⁇ g / kg to 0 ⁇ g / kg, preferably below 30 ⁇ g / kg to 0 ⁇ g / kg, preferably below 15 ⁇ g / kg to 0 ⁇ g / kg , more preferably below 10 ⁇ g / kg to 0 ⁇ g / kg, most preferably below 1 ⁇ g / kg to 0 ⁇ g / kg.
- organosilanes in particular organosilanes of general formula I are considered.
- the composition to be treated is at least one organosilane, which corresponds to the general formula I,
- R 1 is hydrogen, a linear, branched and / or cyclic and optionally substituted alkyl group having 1 to 18 C atoms and / or a linear, branched and / or cyclic alkoxy, alkoxyalkyl, aryloxyalkyl, arylalkyl, - aminoalkyl, haloalkyl, polyether, polyetheralkyl, alkenyl, alkynyl, epoxyalkyl, ureidoalkyl, Mercaptoalkyl, cyanoalkyl, isocyanatoalkyl, methacryloxyalkyl, and / or acryloxyalkyl group having 1 to 18 carbon atoms and / or an aryl group having 6 to 12 carbon atoms, wherein R 2 is hydrogen, a linear, branched and / or cyclic and optionally substituted alkyl group having 1 to 18 C atoms and / or a linear, branched and / or cyclic alk
- Organosilanes according to the invention are, in particular, tetraalkoxysilanes, alkyltrialkoxysilanes and / or dialkyldialkoxysilanes, trialkylalkoxysilanes, such as tetraethoxysilane, tetramethoxysilane, methyltriethoxysilane, methyltrimethoxysilane, dimethyldiethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane and / or trimethylethoxysilane.
- the aminoalkyl group is preferably selected from the aminopropyl functional groups of the formulas - (CH 2 ) S-NH 2 , - (CH 2 ) S -NHR ', - (CH 2 ) 3 -NH (CH 2 ) 2 -NH 2 or
- R ' is a linear, branched or cyclic alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 12 carbon atoms
- the polyether group or polyetheralkyl group preferably corresponds to one of the formulas R '- (O-CH 2 -CH 2 -) n O- (CH 2 ) 3 -, R' - (O-) CH 2 -CH 2 -CH 2 -) n O- (CH 2 ) 3 -, R '- (O-CH 2 - CH 2 -CH 2 -CH 2) n O- (CH 2) 3-, R '- (O-CH 2 -CH 2 -) n O- J R' - (O-CH 2 -CH 2 -CH 2 -) n O -, FT- (O-CH 2 --CH 2 -CH 2 -CH 2 -CH 2
- R 1 corresponds to an F 3 C (CF 2 ) r (CH 2 ) s group, where r is an integer from 0 to 9, s is 0 or 2, preferably r is 5 and s is 2 Particularly preferred groups are the CF 3 (CF 2 ) 5 (CH 2 ) 2 or CF 3 (CF 2 ) 7 (CH 2 ) 2 or CF 3 (C 6 H 4 ) or C 6 F 5 groups ,
- R 2 and / or R 3 correspond to hydrogen or a linear or branched alkyl group having 1 to 8 C atoms, in particular a methyl, ethyl, n-propyl, iso-propyl or n-octyl Group or an aryl group having 6 C-atoms and R 4 is a methyl, ethyl-n-propyl or iso-propyl group, wherein total tetraalkoxy-, trialkoxy- and / or dialkoxy-substituted silanes are preferred.
- compositions are essentially anhydrous.
- Anhydrous is considered to be a composition according to the invention if the content of water according to Karl Fischer is ⁇ 10 ppm, in particular ⁇ 5 ppm.
- the composition to be treated comprises organosilanes corresponding to oligomeric or polymeric organosiloxanes obtained from the at least partial hydrolysis and condensation of one or more organosilanes of general formula I,
- R 1 is hydrogen, a linear, branched and / or cyclic, optionally substituted alkyl group having 1 to 18 C And / or a linear, branched and / or cyclic alkoxy, alkoxyalkyl, aryloxyalkyl, arylalkyl, - aminoalkyl, haloalkyl, polyether, polyetheralkyl, alkenyl, alkynyl, epoxyalkyl, ureidoalkyl, mercaptoalkyl , Cyanoalkyl, isocyanatoalkyl, methacryloxyalkyl, and / or acryloxyalkyl group having 1 to 18 C atoms and / or an aryl group having 6 to 12 C atoms, where R 2 is hydrogen, a linear, branched and / or cyclic, optionally substituted alkyl group having 1 to 18 C And / or a linear, branched and / or cyclic alkoxy, alkoxy
- the aminoalkyl group is selected from the aminopropyl functional groups of the formulas - (CH 2 ) 3 - NH 2 , - (CH 2 ) S -NHR ', - (CH 2 ) 3 -NH (CH 2 ) 2 -NH 2 or (CH 2 ) 3 -NH (CH 2 ) 2 -NH (CH 2 ) 2 -NH 2 , wherein R 'is a linear, branched or cyclic alkyl group having 1 to 18 carbon atoms or is an aryl group having 6 to 12 C atoms, the polyether or polyether alkyl group preferably corresponds to one of the formulas R '- (O-CH 2 -CH 2 -) n O- (CH 2 ) 3 -, R '- (O-CH 2 -CH 2 -CH 2 -) n O- (CH 2 ) 3 -, R '- (O-CH 2 -CH 2 -CH 2 -) n O- (
- R 1 corresponds to an F 3 C (CF 2 V (CH 2 ) S - group, where r is an integer from 0 to 9, s is 0 or 2, preferably r is 5 and s is 2, Particularly preferred groups are the CF 3 (CF 2 ) 5 (CH 2 ) 2 or CF 3 (CF 2 ) 7 (CH 2 ) 2 or CF 3 (C 6 H 4 ) or C 6 F 5 groups ,
- oligomeric or polymeric organosiloxanes in particular comprise chain-like, cyclic, crosslinked and / or spatially crosslinked structural elements, the chain-like and cyclic structural elements corresponding in idealized form to the general formulas II and III
- the oligomerization degree of addition in the range of 2 to 30, but the degree of oligomerization or polymerization can also be higher.
- the degree of oligomerization or polymerization of the organosilanes corresponds to the number of Si units per molecule.
- each oligomeric or polymeric organosilane will be understood in consideration of the fact that each oxygen atom of a monomeric silane unit of the general formula (I) can function as a bridging agent between two silicon atoms.
- the number of available oxygen atoms of each silane of the general formula (I) also determines the functionality of each individual siloxane unit in the organosilane; the monomeric organosilanes of the general formula (I) can thus be mono-, di-, tri- or tetrafunctional.
- the structural units present for the construction of oligomeric and / or polymeric organosilanes with chain-like, cyclic, crosslinked and / or spatially crosslinked structural elements accordingly comprise the monofunctional (R) 3-Si-O- with the designation M, the difunctional -O-Si (R) 2-O- with the notation D, the trifunctional (-O-) sSiR to which the symbol T has been assigned and the tetrafunctional Si (-O-) 4 with the symbol Q.
- the designation of the units is carried out according to their functionality with the symbols M, D, T and Q.
- Inorganic silanes are, in particular, halosilanes, hydrohalosilanes, halosilanes which are substituted by at least one organic radical and / or hydrohalosilanes which are substituted by at least one organic radical, and also mixtures of these silanes.
- pure hydrogen silanes may also be included.
- each halogen independently of other halogen atoms can be selected from the group fluorine, chlorine, bromine or iodine, so that, for example, mixed halosilanes such as SiBrCI 2 F or SiBr 2 CIF can be included.
- the inorganic silanes preferably include the chlorine-substituted, predominantly monomeric silanes, such as tetrachlorosilane, trichlorosilane, dichlorosilane, monochlorosilane, methyltrichlorosilane, trichloromethylsilane, trimethylchlorosilane, dimethyldichlorosilane, phenylmethyldichlorosilane, phenyltrichlorosilane, vinyltrichlorosilane, dihydrogendichlorosilane.
- monomeric silanes such as tetrachlorosilane, trichlorosilane, dichlorosilane, monochlorosilane, methyltrichlorosilane, trichloromethylsilane, trimethylchlorosilane, dimethyldichlorosilane, phenylmethyldichlorosilane, phenyltrichlorosilane
- the monomeric silanes such as tetramethylsilane, trimethylsilane, dimethylsilane, methylsilane, monosilane or organohydrosilanes or disilane, trisilane, tetrasilane and / or pentasilane and higher homologous silanes can be reduced according to the inventive method in their foreign metal content.
- monomeric silanes such as tetramethylsilane, trimethylsilane, dimethylsilane, methylsilane, monosilane or organohydrosilanes or disilane, trisilane, tetrasilane and / or pentasilane and higher homologous silanes
- monomeric silanes such as tetramethylsilane, trimethylsilane, dimethylsilane, methylsilane, monosilane or organohydrosilanes or disilane, trisilane, tetrasilane and / or pentasilane
- Pentachlorhydrogendisilan or Tetrachlordihydrogendisilan, and mixtures thereof with monomeric, linear, branched and / or cyclic oligomeric and / or polymeric inorganic silanes are reduced accordingly in their foreign metal content.
- the cyclic oligomeric compounds include compounds of the type Si n X 2n, with n> 3, such as Si 5 CliO, and to the polymeric inorganic compounds, for example, halopolysilanes, ie polysilicon halides Si n X 2n + 2 with n> 5 and / or polysilicon hydrogen halides Si n H a X [(2n + 2) -a] with n> 2 and 0 ⁇ a ⁇ (2n + 2), where X is in each case a halogen, such as F, Cl, Br, J, in particular Cl.
- a halogen such as F, Cl, Br, J, in particular Cl.
- the invention likewise relates to a process for the treatment of a composition comprising inorganic silanes and at least one foreign metal and / or a foreign metal-containing compound, according to the process described above, wherein at least one inorganic silane corresponds to the general formula IV,
- each X in the silane is independently a halogen selected from the group consisting of fluorine, chlorine, bromine or iodine
- each Group R 5 in silane independently of one another correspond to a linear, branched and / or cyclic alkyl group having 1 to 16 C atoms, or an aryl group.
- an aryl group also alkyl-substituted aryls, with linear, branched or cyclic alkyl groups having 1 to 8 carbon atoms, understood.
- foreign metals and / or foreign metal-containing compounds are considered those in which the metal does not correspond to silicon.
- the adsorption and / or filtration of the at least one foreign metal and / or the at least one foreign metal-containing compound by means of adsorbent and / or filter is carried out in particular selectively from the silicon compounds, such as at least one organosilane and / or an inorganic silane containing composition, while the adsorption and / or filtration both in solution and in the gas phase.
- foreign metals or foreign metal-containing compounds are compounds containing metal halides or compounds containing semimetals, for example boron, boron trichloride and boric acid esters, such as B (OMe) 3 or B (OEt) 3 .
- Phosphorus phosphorus trichloride or phosphorus pentachloride, phosphoric acid esters such as triethyl phosphate, arsenic and antimony and corresponding compounds.
- the foreign metals and / or foreign metal-containing compounds to be reduced may be metal halides, metal hydrogen halides, metal alkoxides, metal esters and / or metal hydrides and mixtures of these compounds.
- the organo-organic radicals, such as alkyl or aryl groups, functionalized metal halides, metal hydrogen halides or metal hydrides can also be removed from organosilanes with very good results.
- entrained particulate metals in continuously running processes can contaminate the composition.
- the contents of boron, aluminum, potassium, lithium, copper, sodium, magnesium, calcium, iron, chromium, titanium, zinc, vanadium, manganese, cobalt and / or nickel can be reduced, in particular based on these metals Compounds separated.
- Particularly preferred is the content of aluminum, boron and iron; or boron, iron, calcium, copper, potassium and sodium.
- the inventive method is particularly suitable for the separation or reduction of foreign metal-containing compounds whose boiling point in the range of the boiling point of a silicon compound, in particular an organosilane and / or an inorganic silane, or would go with this as an azeotrope. Some of these foreign metal-containing compounds can be removed only with difficulty or not at all by distillation.
- a boiling point which is in the range of the boiling point of an organosilane and / or inorganic silane
- a boiling point is considered, in the range of ⁇ 20 0 C of the boiling point of one of the silicon compounds or an organosilane and / or inorganic silane silane at atmospheric pressure (about 1 013.25 hPa or 1013.25 mbar).
- the foreign metal and / or the foreign metal-containing compound can be reduced by 40.0 to 99.8 wt .-%.
- the foreign metal content is reduced by 50 to 90% by weight, preferably by 65.0 to less than or equal to 100% by weight, preferably by 85 to 95% by weight, particularly preferably by 95 to 99.8% by weight , This means that, starting from the original content, the foreign metal and / or the foreign metal-containing compound can be almost completely removed from the composition.
- the process allows a reduction of the residual content by 85-95 % By weight, more preferably 90 to 99.8% by weight and, depending on the combination of adsorbent and double filtration, of 90 to 99.95% by weight.
- the aluminum content of a composition of inorganic silanes can be reduced by 40 to 99% by weight, preferably by 85 to 99% by weight, and the boron content by 95 to 99.8% by weight.
- the foreign metal content and / or the content of the foreign metal-containing compound in a composition may preferably be reduced in each case to a content in the range of below 100 ⁇ g / kg with respect to the metallic compound, in particular independently of one another.
- This composition is considered to be of the highest purity within the meaning of the invention.
- the content can be reduced to below 30 ⁇ g / kg, preferably below 15 ⁇ g / kg, more preferably below 10 ⁇ g / kg and most preferably below 1 ⁇ g / kg.
- Both inorganic and organic adsorbents may be used to carry out the process.
- a mixture of hydrophilic and hydrophobic adsorbents or else an adsorption medium which has both functions is used.
- Selected may be the adsorbents from the group of activated carbons or silicates, in particular of diatomaceous earth or silica, are also suitable zeolites, organic resins or silicates, such as fumed silica and precipitated silica (silica gel).
- Preferred adsorption agents are activated carbon, in particular Norit activated carbon SA + (Norit Deutschland GmbH, kieselguhr Seitz Super (PaII Corporation), kieselguhr (0.2 to 0.5 mm diameter, Süd-Chemie).
- filter media or filters which, for example, can be used as plate filters or filter plates, as
- Filter cartridge as a filter cartridge, as a depth filter, as a filter bag, as a transmission filter, as
- Filter cartridges designed as a membrane filter, as a bed or as a filter chute are. Preference is given to cartridges.
- the filters may be based on fabrics, fiber-oriented nonwovens, spunbonded nonwovens, random fiber webs or felt, to name only a few examples.
- wound filter cartridges of the aforementioned materials can be used advantageously.
- a wide variety of materials can be used for advantageously usable filter media, for example cellulose, cellulose fibers, plastics such as nylon, polyester, polyethylene, polypropylene, polyphenylene sulfide, polytetrafluoroethylene, PFA, PVDF, synthetic fibers produced therefrom, ceramic fibers / sintered bodies, Glass fibers, but also metals, stainless steels, z. B. 316 L, in particular in the form of wire, fibers or wool. It is clear to the person skilled in the art that all of the aforementioned filters of very different pore sizes can be designed accordingly.
- compositions comprising silicon compounds such as organosilanes and / or inorganic silanes
- inventive treatment of compositions comprising silicon compounds is performed by first heating the adsorbent to dry thoroughly and to remove any adsorbed volatile contaminants and to maximize adsorbent loading enable.
- the dried adsorbent is brought under protective gas atmosphere with the composition in contact, optionally stirred.
- the treatment is carried out at room temperature and atmospheric pressure for several hours.
- the composition is brought into contact with the adsorbent between 1 minute and 10 hours, in particular 2 minutes to 5 hours.
- the recovery or separation of the purified composition is usually carried out by filtration, centrifugation or sedimentation.
- a preferred embodiment is to use adsorbents (adsorbents) applied together on carriers, together extruded or sintered adsorbent shaped bodies, since the separation of the adsorbent material is then greatly simplified.
- the supported adsorbents can be used in moldings familiar to the person skilled in the art, for example as pellets, briquettes, rings or other forms.
- a tubular reactor with adsorbent, preferably with supported Designed adsorbent and can be traversed by the composition. This embodiment allows for continuous contact with the adsorbent without, in any event, requiring downstream additional filtration.
- the supported adsorbent can also fulfill the function of a filter at the same time. Overall, however, it is preferable still downstream of a fine particle filter.
- the adsorbent When using powdered adsorbers or Adsorbergranulaten the adsorbent is preferably separated again, in particular by filtration.
- the filter used is preferably adapted to the particle size of the adsorbent to separate the absorbent.
- coarse filter plates are used, which are still permeable at the condition caused by the adsorber large load and can be replaced frequently.
- band-pass filters can also be used which can be removed from the process continuously or semicontinuously via the adsorbent.
- a further very fine particle filter in particular having a pore size smaller than 5 microns, downstream, optionally retracting small to smallest Adsorberteilchen with adherent foreign metal and / or foreign metal-containing compounds as well as particulate metals or metal-containing particles withholds.
- a stationary adsorbent for example in a cartridge used or an adsorbent, which is separated by means of a coarse filtration of the composition, followed by subsequent filtration with at least one filter having a pore size less than 5 microns.
- the process can be carried out batchwise, semicontinuously or continuously as required.
- the invention also provides the use of an organic resin, an activated carbon, a silicate and / or a zeolite for reducing the content of a foreign metal and / or at least one foreign metal-containing compound from compositions containing silicon compounds, in particular organosilanes and / or inorganic silanes, in particular according to above definition, particularly preferably in combination with one or more filters, wherein at least one filter has a pore size of less than 5 ⁇ m, in particular with a pore size of less than 1 ⁇ m, particularly preferably with a pore size of less than or equal to 0.1 ⁇ m or less than or equal to 0, 05 ⁇ m.
- supported, sintered or extruded organic resin, activated carbon, silicates and / or zeolites are used.
- an adsorbent may be stationary in the nature of a first filter through which the composition to be purified flows.
- the invention also provides the use of a filter having a pore size of less than 5 microns, in particular with a pore size less than 1 micron, more preferably with a pore size less than or equal to 0.1 microns less than 0.05 microns, to reduce the content of one Foreign metal and / or at least one foreign metal-containing compound or an adsorbent or particulate impurities from compositions containing silicon compounds, in particular organosilanes and / or inorganic silanes, as defined above.
- Another object of the invention is also a composition
- a composition comprising at least one silicon compound as defined above, in particular containing at least one organosilane of formula I and / or derived therefrom by partial hydrolysis and / or condensation oligomeric or polymeric organosiloxane and / or an inorganic silane, in particular of the formula IV, wherein the content of aluminum ⁇ 5 ⁇ g / kg, in particular ⁇ 1 ⁇ g / kg, the content of boron is less than 5 ⁇ g / kg, in particular less than or equal to 2.5 ⁇ g / kg, the content of iron is less than 5 ⁇ g / kg.
- the composition of the invention is substantially anhydrous, especially when inorganic silanes are included in the composition.
- the composition of the invention based on silicon compounds, such as organosilanes and / or inorganic silanes, has a reduced foreign metal content and / or foreign metal-containing compound content of from 40 to 99.8% by weight.
- the content can be reduced to below 100 ⁇ g / kg, in particular below 30 ⁇ g / kg, preferably below 15 ⁇ g / kg, more preferably below 10 ⁇ g / kg, very particularly preferably below 1 ⁇ g / kg ,
- substitution patterns mentioned above are particularly preferred.
- the organosilanes or inorganic silanes With regard to the composition and the structure of the oligomeric and / or polymeric organosilanes, the organosilanes or inorganic silanes, reference is made to the above statements.
- Determination of boron content The sample preparation and measurement of the samples was carried out in a manner familiar to the analytical expert, by hydrolyzing the sample with demineralized water and the hydrolyzate was fluorinated using hydrofluoric acid (suprapur). The residue was taken up in demineralised water and the element content determined by means of ICP-MS (ELAN 6000 Perkin Elmer).
- the adsorbent was carefully pre-dried prior to use to prevent hydrolysis of the silanes to be purified. The drying took place at 110 ° C. for 3 hours. The adsorbents were stored in a desiccator over desiccant until used in a desiccator.
- the silane to be purified was placed in a flask with stirrer and nitrogen inlet under a nitrogen atmosphere and added a defined amount of the corresponding adsorbent. This mixture was then added for two hours
- Pressure filter Seitz Supradur 100 depth filter, average pore size 5 - 1 0 microns
- the resulting filtrate was then a particulate filter (Pall mini-Kleen Change ® filter material: 320 cm 2 PTFE, pore size: 0.05 .mu.m, filter area) filtered.
- Pall mini-Kleen Change ® filter material 320 cm 2 PTFE, pore size: 0.05 .mu.m, filter area
- Example 1.3 The following example was carried out according to the general procedure in Example 1.2 with the amounts given here.
- Tetraethoxysilane was conveyed continuously over a sintered activated carbon element (Schumasorb AC 20 Pa, area: 0.11 m 2 , 0 pore width: 25 ⁇ m).
- a sample of the silane passed through the adsorber plug was filtered through a membrane filter (Anatop TM 25 Plus, Disposable Syringe Filter PLUS Integral Prefilter, 0.1 ⁇ m pore size).
- Amberlite XAD 4 were submitted consisting of a glass four-necked flask having a condenser (water, dry ice), dropping funnel, stirrer, thermometer and nitrogen pad in a 500 ml stirring apparatus and under vacuum ( ⁇ 1 mbar) and about 170 0 C, Dried for 5 hours, slowly aerated with dry nitrogen and cooled. This was followed by the addition of 250 ml of trichlorosilane through a dropping funnel. The adsorption process was carried out at room temperature and under normal pressure for 5 h. The trichlorosilane was withdrawn from the adsorbent through a glass frit (Por.
- Wessalith F 20 20.17 g of Wessalith F 20 were mixed in a 500 ml stirred apparatus consisting of a glass four-necked flask with condenser (water, dry ice), dropping funnel, stirrer,
- a sample of the adsorbent-treated trichlorosilane was filtered through a membrane filter (Arbortech L # 942, PTFE membrane, 0.2 ⁇ m pore size).
- the foreign metal contents before and after the individual treatment steps were determined by means of ICP-MS, cf. Table 5.
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- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102008054537A DE102008054537A1 (de) | 2008-12-11 | 2008-12-11 | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
PCT/EP2009/063316 WO2010066487A1 (de) | 2008-12-11 | 2009-10-13 | Reinigung von siliciumverbindungen |
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EP2358727A1 true EP2358727A1 (de) | 2011-08-24 |
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EP09737391A Withdrawn EP2358727A1 (de) | 2008-12-11 | 2009-10-13 | Reinigung von siliciumverbindungen |
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US (1) | US8476468B2 (zh) |
EP (1) | EP2358727A1 (zh) |
JP (1) | JP5656862B2 (zh) |
KR (1) | KR20110093882A (zh) |
CN (1) | CN102245618A (zh) |
DE (1) | DE102008054537A1 (zh) |
TW (1) | TWI454477B (zh) |
WO (1) | WO2010066487A1 (zh) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009027257A1 (de) | 2009-06-26 | 2010-12-30 | Wacker Chemie Ag | Verfahren zur Herstellung von Organoalkoxyhydrogensilanen |
DE102009027730A1 (de) | 2009-07-15 | 2011-01-27 | Evonik Degussa Gmbh | Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen |
DE102009056731A1 (de) * | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
DE102010002342A1 (de) | 2010-02-25 | 2011-08-25 | Evonik Degussa GmbH, 45128 | Verwendung der spezifischen Widerstandsmessung zur indirekten Bestimmung der Reinheit von Silanen und Germanen und ein entsprechendes Verfahren |
DE102011003453A1 (de) | 2011-02-01 | 2012-08-02 | Wacker Chemie Ag | Verfahren zur destillativen Reinigung von Chlorsilanen |
DE102011077455B4 (de) | 2011-06-14 | 2014-02-06 | Wacker Chemie Ag | Verfahren zur Bestimmung von Verunreinigungen in Silicium und Reaktor zur Abscheidung von polykristallinem Silicium |
CN103120937B (zh) * | 2011-11-18 | 2016-01-13 | 中国石油化工股份有限公司 | 用于对苯二甲酸精制的Pd/C催化剂的制备方法 |
DE102012200992A1 (de) | 2012-01-24 | 2013-07-25 | Wacker Chemie Ag | Dotierstoffarmes polykristallines Siliciumstück |
EP2814997A1 (en) | 2012-02-16 | 2014-12-24 | Dow Corning Corporation | Deposition system and method of forming a metalloid-containing material therewith |
CN104592291B (zh) * | 2013-10-30 | 2017-12-29 | 中国科学院上海高等研究院 | 有机硅化合物中金属杂质的去除方法 |
DE102014203810A1 (de) * | 2014-03-03 | 2015-09-03 | Evonik Degussa Gmbh | Verfahren zur Herstellung reiner Octachlortrisilane und Decachlortetrasilane |
DE102014013250B4 (de) | 2014-09-08 | 2021-11-25 | Christian Bauch | Verfahren zur Aufreinigung halogenierter Oligosilane |
DE102014220539A1 (de) | 2014-10-09 | 2016-04-14 | Wacker Chemie Ag | Reinigung von Chlorsilanen mittels Destillation und Adsorption |
EP3056262B1 (de) * | 2015-02-12 | 2018-05-02 | Evonik Degussa GmbH | Verfahren zur Gewinnung hochreiner Chlorsilanmischungen |
CN108250230B (zh) * | 2018-02-07 | 2020-09-15 | 浙江博瑞电子科技有限公司 | 一种二异丙胺硅烷的精制方法 |
CN112189026B (zh) * | 2018-06-19 | 2022-09-13 | 日产化学株式会社 | 除去盐类了的聚硅氧烷的制造方法 |
CN108929343A (zh) * | 2018-06-27 | 2018-12-04 | 合盛硅业(泸州)有限公司 | 一种提纯八甲基环四硅氧烷的方法 |
KR102618387B1 (ko) * | 2018-12-07 | 2023-12-27 | 와커 헤미 아게 | 할로실란 함유 조성물내 보론 화합물의 함량을 감소시키는 방법 |
US11975976B2 (en) * | 2019-08-22 | 2024-05-07 | Dow Silicones Corporation | Process for purifying silicon compounds |
WO2022096098A1 (de) * | 2020-11-05 | 2022-05-12 | Wacker Chemie Ag | Verfahren zur entfernung einer verunreinigung aus einem chlorsilangemisch |
CN112759608B (zh) * | 2020-12-31 | 2023-05-02 | 有研国晶辉新材料有限公司 | 一种八甲基环四硅氧烷中金属杂质的去除设备及工艺 |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2877097A (en) * | 1958-05-06 | 1959-03-10 | Guenter A Wolff | Method of purification of silicon compounds |
IT1088820B (it) * | 1977-12-05 | 1985-06-10 | Smiel Spa | Processo di purificazione di clorosilani impiegabili nella preparazione di silicio per elettronica |
CA1207127A (en) * | 1982-09-29 | 1986-07-08 | Dow Corning Corporation | Purification of chlorosilanes |
JPH0688772B2 (ja) * | 1985-02-27 | 1994-11-09 | 昭和電工株式会社 | ジクロロシランの精製法 |
JP2570409B2 (ja) * | 1988-12-06 | 1997-01-08 | 三菱マテリアル株式会社 | クロロポリシランの精製方法 |
JPH0747594B2 (ja) * | 1990-07-20 | 1995-05-24 | 大陽酸素株式会社 | 高純度アルコキシシランの製造方法 |
US5445742A (en) | 1994-05-23 | 1995-08-29 | Dow Corning Corporation | Process for purifying halosilanes |
EP0702017B1 (de) | 1994-09-14 | 2001-11-14 | Degussa AG | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen |
DE19516386A1 (de) | 1995-05-04 | 1996-11-07 | Huels Chemische Werke Ag | Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen |
JP3823400B2 (ja) * | 1996-05-23 | 2006-09-20 | 東亞合成株式会社 | 高純度アルコキシシランの製造方法 |
DE19649023A1 (de) | 1996-11-27 | 1998-05-28 | Huels Chemische Werke Ag | Verfahren zur Entfernung von Restmengen an acidem Chlor in Carbonoyloxysilanen |
DE19746862A1 (de) | 1997-10-23 | 1999-04-29 | Huels Chemische Werke Ag | Vorrichtung und Verfahren für Probenahme und IR-spektroskopische Analyse von hochreinen, hygroskopischen Flüssigkeiten |
DE19821156B4 (de) | 1998-05-12 | 2006-04-06 | Degussa Ag | Verfahren zur Minderung von Resthalogengehalten und Farbzahlverbesserung in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen und die Verwendung von Aktivkohle dazu |
ATE284406T1 (de) | 1998-11-06 | 2004-12-15 | Degussa | Verfahren zur herstellung von chloridarmen oder chloridfreien alkoxysilanen |
DE19963433A1 (de) | 1999-12-28 | 2001-07-12 | Degussa | Verfahren zur Abscheidung von Chlorsilanen aus Gasströmen |
JP2002173495A (ja) * | 2000-03-28 | 2002-06-21 | Mitsui Chemicals Inc | 高純度有機シラン類及びその精製法 |
DE10057482A1 (de) * | 2000-11-20 | 2002-05-23 | Solarworld Ag | Verfahren zur Reinigung von Trichlorsilan |
FR2843392B1 (fr) * | 2002-08-09 | 2004-09-10 | Rhodia Chimie Sa | Procede de preparation d'halogenoalkyldialkylchlorosilane |
DE10330022A1 (de) | 2003-07-03 | 2005-01-20 | Degussa Ag | Verfahren zur Herstellung von Iow-k dielektrischen Filmen |
US20050054211A1 (en) * | 2003-09-04 | 2005-03-10 | Mindi Xu | Purification of silicon-containing materials |
DE102004008442A1 (de) | 2004-02-19 | 2005-09-15 | Degussa Ag | Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips |
WO2005092790A2 (en) * | 2004-03-19 | 2005-10-06 | Entegris, Inc. | Method and apparatus for purifying inorganic halides and oxyhalides using zeolites |
DE102004037675A1 (de) | 2004-08-04 | 2006-03-16 | Degussa Ag | Verfahren und Vorrichtung zur Reinigung von Wasserstoffverbindungen enthaltendem Siliciumtetrachlorid oder Germaniumtetrachlorid |
DE102004045245B4 (de) | 2004-09-17 | 2007-11-15 | Degussa Gmbh | Vorrichtung und Verfahren zur Herstellung von Silanen |
DE102005041137A1 (de) | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
DE102006003464A1 (de) | 2006-01-25 | 2007-07-26 | Degussa Gmbh | Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung |
DE102007014107A1 (de) | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
DE102007048937A1 (de) * | 2007-10-12 | 2009-04-16 | Evonik Degussa Gmbh | Entfernung von polaren organischen Verbindungen und Fremdmetallen aus Organosilanen |
DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
DE102007050573A1 (de) | 2007-10-23 | 2009-04-30 | Evonik Degussa Gmbh | Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien |
DE102007059170A1 (de) | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
DE102008004396A1 (de) | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Anlage und Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen |
DE102008004397A1 (de) | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
JP5206185B2 (ja) * | 2008-07-14 | 2013-06-12 | 東亞合成株式会社 | 高純度クロロポリシランの製造方法 |
-
2008
- 2008-12-11 DE DE102008054537A patent/DE102008054537A1/de not_active Withdrawn
-
2009
- 2009-10-13 JP JP2011539975A patent/JP5656862B2/ja not_active Expired - Fee Related
- 2009-10-13 US US13/121,702 patent/US8476468B2/en not_active Expired - Fee Related
- 2009-10-13 KR KR1020117013252A patent/KR20110093882A/ko active IP Right Grant
- 2009-10-13 CN CN2009801494218A patent/CN102245618A/zh active Pending
- 2009-10-13 WO PCT/EP2009/063316 patent/WO2010066487A1/de active Application Filing
- 2009-10-13 EP EP09737391A patent/EP2358727A1/de not_active Withdrawn
- 2009-12-09 TW TW098142062A patent/TWI454477B/zh not_active IP Right Cessation
Non-Patent Citations (1)
Title |
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See references of WO2010066487A1 * |
Also Published As
Publication number | Publication date |
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WO2010066487A1 (de) | 2010-06-17 |
TWI454477B (zh) | 2014-10-01 |
JP5656862B2 (ja) | 2015-01-21 |
JP2012511529A (ja) | 2012-05-24 |
US8476468B2 (en) | 2013-07-02 |
TW201035107A (en) | 2010-10-01 |
CN102245618A (zh) | 2011-11-16 |
KR20110093882A (ko) | 2011-08-18 |
DE102008054537A1 (de) | 2010-06-17 |
US20110184205A1 (en) | 2011-07-28 |
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