Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
  • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
  • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Definitions

• the invention relates to a method for coating one or more sides of substrates with catalytically active material, comprising a material deposition under vacuum in a vacuum chamber, wherein the following steps are performed
• PVD plasma coating
• This method and the corresponding device can be used, for example, for coating electrodes which are used in the chlor-alkali electrolysis.
• Electrodes that are used in the chlor-alkali electrolysis must be coated with a catalytically active layer. These coatings are realized by means of known spraying, dipping or mechanical application methods.
• EP 0546 714 B1 discloses such a coating method in which the catalyst is applied as a moist mass with a spray gun and then heated in an inert gas atmosphere.
• WO 96/24705 A1 proposes cleaning and etching with acid and subsequent drying as pretreatment steps. This wet-chemical step before the vacuum coating is complicated in larger components and the required drying complicates the process.
• Crucial, however, is that the quality of the surface or its l Coating varies greatly with large substrate elements and there is still no sufficient reproducibility.
• a cathode which is coated by means of sputtering in vacuum with catalyst. Before coating, the surface is enlarged and roughened by sandblasting.
• a disadvantage of the sandblasting is that with flat supports the degree and the uniform distribution of the surface roughness is difficult to reproduce and is difficult to adjust over the entire substrate. The achievable profiling of the surface is limited, since at some point created elevations are removed by a longer impact again.
• the problem in the prior art is to provide a simple and well reproducible method with which substrates and especially electrodes can be coated.
• This object is achieved by the method according to the invention for one or more-sided coating of substrates with catalytically active material, which comprises a material deposition under vacuum in a vacuum chamber.
• e) coating by means of a coating method taken from the group of plasma coating methods, physical vapor deposition, sputtering methods or the like, wherein one or more metals or their oxides are applied to the surface of the substrate,
• the deposition method selected in step d) have the great advantage that the surface is not covered and thus the existing, desired roughness is not equalized again, but island-like, punctual elevations are created, which represent a real surface enlargement and where the following rather flat layer adheres excellently.
• the substances to be deposited on the substrate are freely selectable and are determined by the intended use of the substrate.
• the substrate is also coated with further substances or substance mixtures, these materials ideally being or containing rare earths.
• This deposition process under vacuum has the further advantage that substances to be deposited can be applied even in very low concentrations, which can not be distributed homogeneously and in reproducible, the same quality on surfaces by the classical wet-thermal process.
• a variant of the method consists in introducing an oxidizing gas into the vacuum chamber directly after the coating step (e) in order to produce a defined metal oxide layer.
• the substrate in the coating step (e), is coated with one or more non-oxide metals and / or alkali and / or alkaline earth metals and an oxidizing throughout the or part of the coating period Gas is passed into the vacuum chamber.
• the oxidizing gas which may be, for example, oxygen or an oxygen-containing gas, pulsed introduced into the vacuum chamber. It has surprisingly been found that such a particularly high quality and stable coating is achieved and very effective intermetallic oxide layers and / or segregations are avoided.
• the method can be improved so that the coating step (e) or the removal step (T) below, a thermal treatment of the coated substrates at a temperature of 350 0 C to 650 0 C. is made.
• This thermal treatment in which intercrystalline processes which are not described in more detail here, improves the adhesion time of the coating in the long term.
• the coating process can be supplemented to the effect that under atmospheric conditions and before the first step (a) one or more process steps for surface enlargement, profiling and / or cleaning of the surface are made.
• mechanical methods such as, for example, a sandblasting method and / or a chemical method, such as an etching method, are used.
• a first cleaning and / or drying of the substrate surface takes place.
• a particular variant of the method consists in the division of the process by stages, so as to take into account the different duration of the individual process steps.
• the coated substrates are collected in a sampling chamber and removed from time to time, the three chambers are separated by valves or locks from each other.
• This variant can be improved to the effect that the pressure in the three stages and / or chambers can be set independently of each other. Furthermore, it is advantageous if the prechamber and the removal chamber can be physically separated from the vacuum chamber. Thus, a decoupling of the method steps before and after the coating step is made possible.
• the evacuation of large volumes up to a pressure of about 10 '5 bar and deep is very time consuming. This evacuation time is further increased when dirt and / or moisture is present in the chamber resulting, for example, from a previous wet cleaning step such as an etching and / or washing process.
• the evacuation of one or more pre-chambers and / or the removal chamber spatially and / or temporally independent of the actual surface treatment of the substrate or substrates.
• This transitional volume which is present in the region of the sealing elements and valves or locks, is very small in comparison to the chamber volumes and thus requires only a short time to produce a vacuum identical to the chambers or the identical pressure.
• the method can be improved if the above-mentioned thermal process step takes place in a vacuum, takes place before the process step (xvii) in the still unopened removal chamber.
• steps (i) to (iii) and steps (xvi) to (xix) are temporally and spatially varied and / or performed separately depending on the local logistical possibilities.
• An advantage is thus in the optimal, continuous vacuum treatment of the substrates with respect to the process steps substrate cleaning by introducing a gaseous reducing agent in the vacuum chamber, enlargement of the substrate surface by deposition of a vaporous component on the substrate surface and coating by means of a coating process, taken from the group Plasma coating process, physical vapor deposition, sputtering or the like. Time-consuming evacuation steps are decoupled from the actual substrate treatment under vacuum.
• the invention thus also includes a device with which the above-mentioned method can be carried out in one of its variants.
• This device comprises as central elements one or more prechambers, one or more treatment chambers, one or more removal chambers and locks are provided between the respective chambers.
• the pre-chamber has the shape of a container.
• the antechamber has the form of a cassette.
• the prechamber contains devices that allow it to be evacuated independently and is structurally suitable for at least a pressure of 10 "7 bar, the vacuum of the treatment stage Ideally, the prechamber and the removal chamber are identically constructed.
• An improvement of the device is that the locks or the trapped by the locks volume can be connected to a vacuum line, about which this trapped by the locks volume can be evacuated separately.
• the pre-and the removal chamber can be formed as mentioned above as cassettes.
• these cassettes or containers are also suitable for storage and transport purposes under vacuum.
• An improvement consists in that the cassettes, but primarily the removal cassette comprises a heating element, whereby the thermal aftertreatment of the substrates can still be done under vacuum, without opening the cassette for this purpose before.
• an electric radiant heater is provided inside the cassettes.
• From the invention is also included to use the aforementioned method and / or the device in one of the aforementioned embodiments for the production of electrodes, in particular cathodes for the chlor-alkali electrolysis and / or production of hydrogen.
• a 15O x 300 mm large nickel cathode as described in WO 98/15675 A1, introduced as a substrate in a vacuum chamber.
• the Substart was charged with an argon / hydrogen mixture and pre-cleaned.
• the chamber was evacuated (10 5 bar).
• the oxide layer is reduced by hydrogen was introduced at 250 - 350 0 C.
• a surface enlargement was made.
• a source of substance target was elemental nickel, which corresponded to the material of the substrate.
• the round Ni targets had a surface area of 30 cm 2 . This nickel was -bar vacuum and a temperature of 250 with a plasma method at 10 '5-350 0 C deposited on the substrate until a 50-fold increase in surface area was achieved.
• the thus pretreated substrate was coated by PVD method.
• ruthenium was deposited over 2 minutes from a target and then the Ru coating was oxidized by means of introduced into the vacuum chamber oxygen under the influence of temperature to ruthenium dioxide.
• the method is characterized by a very good controllability.
• Layer thicknesses of the intermediate layer and the catalyst and, if necessary, mixing ratios of catalysts and further the amount of pulsed oxygen during the coating allows a hitherto technically unattainable control accuracy of the crucial parameters.

Applications Claiming Priority (2)

Publications (1)

Family

ID=39124108

Family Applications (1)

Country Status (10)

Families Citing this family (10)

Family Cites Families (17)

• 2006
  • 2006-12-04 DE DE102006057386A patent/DE102006057386A1/de not_active Ceased
• 2007
  • 2007-11-15 WO PCT/EP2007/009862 patent/WO2008067899A1/de active Application Filing
  • 2007-11-15 JP JP2009539629A patent/JP2010511787A/ja active Pending
  • 2007-11-15 BR BRPI0719712-8A2A patent/BRPI0719712A2/pt not_active IP Right Cessation
  • 2007-11-15 KR KR1020097011448A patent/KR20090084920A/ko not_active Application Discontinuation
  • 2007-11-15 RU RU2009125585/02A patent/RU2468120C2/ru not_active IP Right Cessation
  • 2007-11-15 CA CA002671173A patent/CA2671173A1/en not_active Abandoned
  • 2007-11-15 US US12/312,999 patent/US20100092692A1/en not_active Abandoned
  • 2007-11-15 CN CNA2007800448590A patent/CN101553593A/zh active Pending
  • 2007-11-15 EP EP07846592A patent/EP2097553A1/de not_active Withdrawn

Non-Patent Citations (1)

Also Published As

Similar Documents

Legal Events