EP1620885B1 - Organische polymere, elektronische vorrichtungen und verfahren - Google Patents

Organische polymere, elektronische vorrichtungen und verfahren Download PDF

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EP1620885B1
EP1620885B1 EP04760816A EP04760816A EP1620885B1 EP 1620885 B1 EP1620885 B1 EP 1620885B1 EP 04760816 A EP04760816 A EP 04760816A EP 04760816 A EP04760816 A EP 04760816A EP 1620885 B1 EP1620885 B1 EP 1620885B1
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polymer
organic
independently
polymers
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EP1620885A1 (de
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Feng 3M Center BAI
Todd D. 3M Center JONES
Kevin M. 3M Center LEWANDOWSKI
Tzu-Chen 3M Center LEE
Dawn V. 3M Center MUYRES
Tommie W. 3M Center KELLEY
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3M Innovative Properties Co
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
    • H10K10/478—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a layer of composite material comprising interpenetrating or embedded materials, e.g. TiO2 particles in a polymer matrix
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
    • H01L21/02345—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
    • H01L21/02348—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light treatment by exposure to UV light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/312—Organic layers, e.g. photoresist
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
    • H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
    • H10K10/474—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
    • Y10T428/31692—Next to addition polymer from unsaturated monomers

Definitions

  • Organic polymeric materials such as organic dielectrics
  • organic dielectrics are used in a wide variety of electronic devices, including optoelectronic devices. Examples include transistors, diodes, capacitors (e.g., embedded capacitors), resistors, which can be used in various arrays to form amplifiers, receivers, transmitters, inverters, and oscillators, for example.
  • Organic semiconductors such as tetracene, pentacene, and sexithiophene, are currently of great interest for a variety of electronic applications as well.
  • organic polymer dielectrics have produced devices with low mobilities.
  • an advantage of using organic polymer dielectrics is that they are solution processible and photopatternable. Thin layers of organic polymers have been shown to improve mobilities in devices prepared on inorganic oxides, such as Al 2 O 3 or SiO 2 , which have dielectric constants that are higher than most organic polymers.
  • a number of organic polymers have been considered as dielectric materials. These include polyimides, parylene C, crosslinked benzocyclobutene, and cyanoethylpullulan. See, for example, C.D. Sheraw et al., "Spin-on polymer gate dielectric for high performance organic thin film transistors", Materials Research Society Symposium Proceedings v 558, Materials Research Society, Warrendale, PA, USA, pages 403-408 (2000 ); U.S. Patent No. 6,265,243 (Katz ); and U.S. Patent No. 5,347,144 (Garnier ). Mobilities measured in devices prepared using these polymers, however, are typically no higher than 0.7 cm 2 /V ⁇ s.
  • a high dielectric constant is desirable to permit the use of relatively thick films, which have a relatively lower probability of pinhole defects than thin films. Also, a high dielectric constant is desirable to lower the operating voltages of devices while maintaining the same charge polarization.
  • Journal of applied Physics 92, 5259 relates to high-mobility polymer gate dielectric pentacene thin film transistors using crosslinked poly-4-phenol and poly-4-vinyl phenol-co-2-hydroxyethyl acrylate as polymer gate dielectric materials.
  • organic polymers are desired for a variety of electronic devices (e.g., transistors, capacitors, etc.). Particularly, organic polymers are desired that combine relatively high observed device mobilities with relatively high dielectric constants and that are preferably capable of being solution-deposited, e.g., by spin-coating or similar techniques.
  • the present invention is directed to polymers suitable for use in electronic devices. More particularly, the present invention provides cyano-functional (preferably, cyano-functional styrenic) polymers, preferably with relatively high dielectric constants. These polymers can be prepared by standard chemical techniques (e.g., free radical polymerization from the corresponding monomers or chemical modifications of existing polymers), and used as a dielectric layer in electronic devices, in some cases without the addition of a surface-modifying film.
  • Suitable polymers for use in devices preferably include a cyano-functional portion and a portion that provides a relatively high dielectric constant to the overall polymer, which portions may be the same or different.
  • the polymers can be homopolymers or copolymers. Copolymers are those polymers prepared from two or more different monomers and include terpolymers, tetrapolymers, and the like. The monomers can join to form random, block, segmented copolymers, as well as any of a variety of other structural arrangements.
  • the present invention provides an electronic device that includes an organic polymer dielectric layer.
  • the two repeat units could be the same, thereby forming a homopolymer.
  • the organic polymer is crosslinked
  • capacitors e.g., embedded capacitors
  • thin film transistors or transistor arrays e.g., thin film transistors or transistor arrays
  • electroluminescent lamps e.g., electroluminescent lamps.
  • the devices preferably include an organic polymer dielectric layer with styrenic units (preferably, cyano-functional styrenic units) at its surface.
  • a wide variety of electronic devices can be made by forming a layer (i.e., a film) of an organic polymer described herein, optionally annealing the organic polymer, and optionally crosslinking the organic polymer.
  • a particularly preferred method of making an electronic device includes: forming a layer of an organic polymer having a dielectric constant of at least about 3.5, wherein the organic polymer includes cyano-functional groups and styrenic units (which may include the cyano-functional groups); annealing the organic polymer to cause the styrenic units to migrate to the surface of the layer; and optionally crosslinking the organic polymer to form an organic polymer dielectric layer.
  • the present invention also provides an electronic device prepared by this method.
  • a "polymer” includes two or more repeat units (e.g., homopolymers and copolymers), and a “copolymer” includes two or more different repeat units, and encompasses terpolymers, tetrapolymers, etc.
  • the copolymers can be random, block, alternating, etc.
  • organic group means a hydrocarbon group (with optional elements other than carbon and hydrogen, such as oxygen, nitrogen, sulfur, silicon, and halogens) that is classified as an aliphatic group, cyclic group, or combination of aliphatic and cyclic groups (e.g., alkaryl and aralkyl groups).
  • the organic groups are those that do not interfere with the film-forming properties of the organic dielectric layer and/or the formation or function of a semiconductor layer adjacent to the organic dielectric layer.
  • aliphatic group means a saturated or unsaturated linear or branched hydrocarbon group. This term is used to encompass alkyl, alkenyl, and alkynyl groups, for example.
  • alkyl group means a saturated linear or branched hydrocarbon group including, for example, methyl, ethyl, isopropyl, t-butyl, hexyl, heptyl, dodecyl, octadecyl, amyl, 2-ethylhexyl, and the like.
  • alkenyl group' means an unsaturated linear or branched hydrocarbon group with one or more carbon-carbon double bonds, such as a vinyl group.
  • alkynyl group means an unsaturated linear or branched hydrocarbon group with one or more carbon-carbon triple bonds.
  • cyclic group means a closed ring hydrocarbon group that is classified as an alicyclic group, aromatic group, or heterocyclic group.
  • alicyclic group means a cyclic hydrocarbon group having properties resembling those of aliphatic groups.
  • aromatic group or “aryl group” means a mono- or polynuclear aromatic hydrocarbon group, including within its scope alkaryl and aralkyl groups.
  • heterocyclic group means a closed ring hydrocarbon in which one or more of the atoms in the ring is an element other than carbon (e.g., nitrogen, oxygen, sulfur, etc.).
  • substitution is anticipated on the organic groups of the polymers of the present invention.
  • group and “moiety” are used to differentiate between chemical species that allow for substitution or that may be substituted and those that do not allow or may not be so substituted.
  • group when the term “group” is used to describe a chemical substituent, the described chemical material includes the unsubstituted group and that group with O, N, Si, or S atoms, for example, in the chain (as in an alkoxy group) as well as carbonyl groups or other conventional substitution.
  • moiety is used to describe a chemical compound or substituent, only an unsubstituted chemical material is intended to be included.
  • alkyl group is intended to include not only pure open chain saturated hydrocarbon alkyl substituents, such as methyl, ethyl, propyl, t-butyl, and the like, but also alkyl substituents bearing further substituents known in the art, such as hydroxy, alkoxy, alkylsulfonyl, halogen atoms, cyano, nitro, amino, carboxyl, etc.
  • alkyl group includes ether groups, haloalkyls, nitroalkyls, carboxyalkyls, hydroxyalkyls, sulfoalkyls, etc.
  • the phrase “alkyl moiety” is limited to the inclusion of only pure open chain saturated hydrocarbon alkyl substituents, such as methyl, ethyl, propyl, t-butyl, and the like.
  • layer refers to any layer that can be formed on a substrate from precursor compounds using a solution coating process or vapor deposition process, for example.
  • layer is meant to include layers specific to the semiconductor industry, such as “barrier layer,” “dielectric layer,” “insulating layer,” and “conductive layer.” (The term “layer” is synonymous with the term “film” frequently used in the semiconductor industry.)
  • layer is also meant to include layers found in technology outside of semiconductor technology, such as coatings on glass.
  • Dielectric layer refers to a layer (or film) having a relatively high dielectric constant containing cyano-functional polymers, preferably styrenic polymers.
  • the present invention is directed to polymers suitable for use in electronic devices, including optoelectronic devices. More particularly, the present invention provides cyano-functional polymers with relatively high dielectric constants (preferably, at least about 3.5, more preferably at least about 4.0, and even more preferably at least about 4.5).
  • the polymers include cyano-functional groups and styrenic units.
  • the styrenic units may include the cyano-functional groups and/or the cyano-functional groups may be part of other inter-polymerized units.
  • the polymers described herein can be prepared by standard chemical techniques (e.g., free radical polymerization from the corresponding monomers or chemical modifications of existing polymers), and used as a dielectric layer in electronic devices (e.g., field-effect thin film transistors, capacitors, embedded capacitors or electroluminescent lamps) or as a dielectric layer in devices used as components of an integrated circuit (e.g., inverters or oscillators).
  • electronic devices e.g., field-effect thin film transistors, capacitors, embedded capacitors or electroluminescent lamps
  • devices used as components of an integrated circuit e.g., inverters or oscillators.
  • Various combinations (e.g., mixtures) of the cyano-functional polymers described herein (with or without other organic polymers) can be used in devices of the present invention.
  • Electronic devices include components such as transistors, arrays of transistors, diodes, capacitors, embedded capacitors, and resistors that are used to form circuits. Electronic devices also include arrays of circuits that perform an electronic function. Examples of these arrays, or integrated circuits, are amplifiers, receivers, transmitters, inverters, and oscillators.
  • RFIDs radio frequency identification devices
  • Devices of the present invention may also include camera flash capacitors, energy storage capacitors, etc.
  • the present invention is not limited by the type of device.
  • Particularly preferred types of devices include thin film transistors, capacitors, embedded capacitors and electroluminescent lamps.
  • the polymer layer of the present invention would typically be interposed between a conductive gate electrode layer and a semiconductor layer, or alternatively between a conductive gate electrode layer and a second conductive source/drain layer.
  • the polymeric layer of the present invention would typically be interposed between two conductive layers.
  • An embedded capacitor is a capacitor that is embedded or integrated as a component of a circuit, preferably a flexible circuit.
  • the polymeric layer of the present invention would be sandwiched between two flexible, conductive substrates, such as copper foil.
  • An electroluminescent lamp (EL) is an electronic device that produces light when current is passed through it.
  • the polymeric layer of the present invention would be interposed between a light emitting layer and one or both of the electrodes.
  • Transistors such as pentacene-based transistors, fabricated using the materials of the present invention, preferably possess a charge carrier mobility of greater than about 0.5 cm 2 /V ⁇ s, more preferably greater than about 1.5 cm 2 /V ⁇ s, and even more preferably greater than about 3.0 cm 2 /V ⁇ s. These transistors preferably have relevant device parameters within acceptable ranges (e.g., threshold voltage between +15 Volts (v) and -15 V, on/off ratio of at least 10 3 , and subthreshold slope less than about 2.5V/decade).
  • acceptable ranges e.g., threshold voltage between +15 Volts (v) and -15 V, on/off ratio of at least 10 3 , and subthreshold slope less than about 2.5V/decade.
  • materials of the present invention are also generally useful with other types of organic semiconductors including oligothiophenes, acenes, perylenes, fullerenes, phthalocyanines, etc.
  • the materials of the present invention are also generally useful with inorganic semiconductor such as, for example, amorphous Si, CdS, CdSe, and other semiconductors well known in the art.
  • organic polymeric dielectrics can also be useful in fabricating organic thin film transistors using polymeric semiconductors such as, but not limited to, those discussed in Applicants' Assignee's copending applications, U.S. Patent Application Nos. 09/966,954 and 09/966,961 filed on September 27, 2001 and U.S. Patent Application No. 10/256,489 filed on September 27, 2002 .
  • relatively high dielectric constant polymers of the present invention possess one or more of the following characteristics: coatable out of solution, crosslinkable, photopatternable, high thermal stability (e.g., are stable up to a temperature of about 250°C), low processing temperatures (e.g., less than about 150°C, preferably less than about 100°C), and are compatible with flexible substrates.
  • Crosslinkable and/or photopattemable polymers are particularly desirable. This is because they provide flexibility in manufacturing methods, would easily integrate with solution processed device layers, and could allow for high-speed roll-to-roll processing.
  • Polymers are photopattemable if they include one or more crosslinking (i.e., crosslinkable) groups that can be induced to form a crosslinked network upon exposure to radiation (most commonly, UV radiation). The exposed (crosslinked portion of the polymer) becomes insoluble in certain solvents and the unexposed portion of the polymer can be washed away using a developing solvent. This is an example of a negative-acting photopatternable polymer. It is also possible to photopattern a polymer that is initially insoluble in certain solvents and that becomes soluble in UV-exposed areas upon exposure. This is an example of a positive-acting photopatternable polymer.
  • Photopatterning can be carried out by a variety of techniques well known to those of skill in the art. Typically, photopatterning is carried out with ultraviolet light and a photomask. Photopatterning is further described in International Application No. WO 97/15173, published April 24, 1997 . It may also be desirable to coat the photopatternable polymer evenly over the entire surface of the device using no mask and no pattern. The polymer layer can then be crosslinked as described above, with or without forming a pattern.
  • the polymers of the present invention are preferably deposited using solution coating techniques. Examples of such techniques include knife coating, spin coating, drop coating, dip coating, ink jetting, rotogravure coating, spray coating, and roll coating.
  • Solvents suitable for use with the polymers of the present invention for solution coating include any solvent or solvent mixture that will dissolve the polymers to form a low viscosity solution suitable for coating by any of the above methods. Examples of useful solvents include hydrocarbons, chlorinated solvents, and ketonic solvents. More particularly useful are solvents such as cyclohexanone, cyclopentanone, dichloroethane, dimethylformamide, toluene, and chloroform.
  • the polymers of the present invention can be transfer printed.
  • the polymeric dielectric layer of the invention has a thickness of less than about 5000 Angstroms (A), more preferably less than about 3000 ⁇ , and most preferably less than about 2000 ⁇ .
  • the polymeric dielectric layer of the invention preferably has a thickness of at least about 500 ⁇ , more preferably at least about 1000 ⁇ .
  • the thickness can be determined through known methods, e.g., ellipsometry and profilometry.
  • thicknesses can include those described above for TFTs, but may further include thicknesses of 10 microns, 20 microns (i.e., micrometers or ⁇ m), or even greater.
  • Polymers of the present invention include cyano-functional groups and styrenic units, which may include the cyano-functional groups.
  • the two repeat units could be the same (e.g., if R 1 and R 3 are hydrogen and R 2 is the same as the phenyl-(R 5 ) n group), thereby forming a homopolymer.
  • the polymers of the present invention can include other monomers, e.g., styrene, that can be copolymerized (e.g., ionically, free-radically) with one or more monomers that form the repeat units above.
  • the polymers are crosslinked.
  • Crosslinked polymers typically tolerate higher breakdown field strengths than their uncrosslinked analogs. Also, there is typically a difference in dielectric constants of crosslinked and uncrosslinked polymers.
  • the polymers are substantially nonfluorinated.
  • substantially nonfluorinated means that less than 5% (more preferably less than 1% and even more preferably 0%) of the carbons in the polymeric layer have fluorine substituents.
  • certain polymers can have a small amount of fluorine (e.g., in R 5 ) .
  • At least one R 1 includes at least one crosslinkable group.
  • crosslinkable groups include, for example, (meth)acrylates (i.e., acrylates and methacrylates), amines, hydroxyls, thiols, oxiranes, aziridines, chlorosilanes (e.g., trialkoxysilanes), vinyls, and alkoxysilanes (e.g., trialkoxysilanes).
  • the crosslinkable groups are acrylates. Combinations of various crosslinkable groups can be within any one polymer.
  • the crosslinkable groups are typically incorporated into an organic group, which can be up to about 20 carbon atoms in size.
  • the crosslinkable groups can contain heteroatoms such as O, N, S, P, and Si.
  • R 1 and R 2 include aryl groups that can include up to 18 carbon atoms in size.
  • the aryl groups for R 1 and R 2 are (C5-C8)aryl groups, examples of which include, but are not limited to, phenyl, naphthyl, phenanthryl, anthracenyl, or alkyl-substituted derivatives thereof.
  • Preferred aryl groups for R 1 and R 2 include phenyl. These groups may be substituted with one to three R 5 groups.
  • R 5 can be a (C1-C20)alkyl group, more preferably a (C1-C12)alkyl group, even more preferably a (C1-C8)alkyl group, and even more preferably a (C1-C4)alkyl group, examples of which include, but are not limited to, methyl, ethyl, propyl, butyl.
  • R 5 can be a halogen, and preferably, Cl, Br, or I.
  • R 5 can be R 4 wherein R 4 is a (C2-C12)organic group having at least one CN group and having a molecular weight of about 30 to about 200 per CN group.
  • each R 4 is a (C2-C20)organic group, more preferably a (C2-C12) organic group, including at least one CN group and having a molecular weight of about 30 to about 200 per CN group.
  • R 4 includes one or more aromatic groups.
  • the molecular weight is about 30 to about 150 per CN group.
  • CN-containing groups for R 4 include, but are not limited to, N-methyl-(2-cyanoethyl)carbamido, N-bis(2-cyanoethyl)carbamido, p-(2-cyanoethyl)phenyl, p-(2,2-dicyanopropyl)phenyl, p-(1,2-dicyanopropionitrilo)phenyl, N-methyl-N-(2-cyanoethyl)benzylamino, bis-N-(2-cyanoethyl)benzylamino, cyanomethyl, 2,2'-dicyanopropyl, 1,2,2'-tricyanoethyl, and N,N'-bis(2-cyanoethyl)aminoethyl.
  • R 2 is independently H, a (C5-C8)aryl group, or R 4 and R 4 is a (C2-C20)organic group, more preferably a (C2-C12) organic group, having at least one CN group and having a molecular weight of about 30 to about 200 per CN group.
  • Preferred polymers include styrenic interpolymerized units.
  • such styrenic units can migrate to the surface of a film of the polymer, thereby forming a phase-separated polymer.
  • the polymer can then be crosslinked, if desired.
  • phase-separated polymers can be used without an overlying surface-modifying layer (discussed below).
  • Such migration of the styrenic units to the surface of a polymer film can occur during an annealing process. Annealing conditions are selected to allow for this migration to occur without deterioriating or damaging the polymer or other materials subjected to the annealing conditions.
  • annealing occurs at a temperature of at least 120°C and for a time of at least 10 minutes.
  • annealing occurs at a temperature of no greater than 160°C and for a time of no greater than 60 minutes.
  • polymers with relatively high dielectric constants can be prepared by standard chemical techniques such as free radical polymerization from the corresponding monomers or chemical modifications of existing polymers. These approaches provide substantially different materials for obtaining these desirable properties.
  • styrene maleic anhydride (SMA) copolymers can be modified as shown in Scheme 1 by adding a methacrylate functional group for crosslinking purposes and by attaching CN-functional groups to increase the dielectric constant (polymer series 1 and 2) compared to unsubstituted poly(styrene) (preferably having a number average molecular weight of about 1000 to about 500,000).
  • SMA styrene maleic anhydride
  • Another approach is based on a polymer with a high dielectric constant, which is unsuitable as a substrate for growing good organic semiconductor films.
  • ester- and amide-containing materials form poor substrates for pentacene growth due to factors such as surface energy, roughness and/or exposed functional or chemical groups including, for example, polyimide, polymethyl methacrylate (PMMA), and polyvinyl acetate.
  • PMMA polymethyl methacrylate
  • incorporation of a polystyrene block or graft into this polymer which can migrate to the free surface under annealing prior to organic semiconductor deposition, enables improved device performance without reducing dielectric constant.
  • These can be prepared by sequential polymerization using living polymerization methods, for example, or through copolymerization with functional macromers to form graft copolymers.
  • a third approach is to prepare polymers that are inherently more suitable for growing organic semiconductor films.
  • ester and amide groups for example, and preparing monomers containing cyano groups for increasing dielectric constant, and aromatic groups for improved semiconductor film growth and frequency independence, a suitable polymer can be directly produced. Subsequently, other groups can be incorporated through copolymerization to provide additional functionality, such as crosslinkability.
  • An example of a particularly useful polymer is a copolymer of bis(2-cyanoethyl)acrylamide with a polystyrene (PS) macromer (Polymer 3).
  • PS polystyrene
  • This polymer is made by copolymerizing an acrylated polystyrene macromer made by the anionic addition of styrene to n-butyllithium to make a polystyrene with a low polydispersity.
  • the living polymer is then quenched with ethylene oxide and reacted with 2-isocyanatoethyl methacrylate to form an acrylated polystyrene macromer according to the procedure described in U.S. Patent No.
  • acrylated polystyrene macromer is then copolymerized with bis(2-cyanoethyl)acrylamide (prepared according to the procedure of Schuller et al., J. Org. Chem., 23, 1047 (1958 )).
  • Examples of other materials that include cyano-functional styrenes, without ester linkages or free hydroxyl groups are polymers (e.g., copolymers or homopolymers) derived from the polymerization of 4-vinylbenzylcyanide (Polymer 4), 4-(2,2'-dicyanopropyl)styrene (Polymer 5), 4-(1,1',2-tricyanoethyl)styrene (Polymer 6), and/or 4-(bis-cyanoethyl)aminomethyl)styrene (Polymer 7).
  • Polymers e.g., copolymers or homopolymers
  • Polymer 4 4-vinylbenzylcyanide
  • Polymer 5 4-(2,2'-dicyanopropyl)styrene
  • Polymer 6 4-(1,1',2-tricyanoethyl)styrene
  • Polymer 7 4-(bis-cyanoethyl)aminomethyl
  • Such materials include a copolymer made from copolymerization of 4-vinylbenzylcyanide and 4-vinylbenzylacrylate in a 1:1 ratio (Copolymer 8), or other copolymers of such monomers with or without other monomers.
  • Suitable polymers for use in electronic devices preferably include a styrenic portion (preferably, a cyano-functional styrenic portion) and a portion that provides a relatively high dielectric constant to the overall polymer, which portions may be the same or different.
  • the polymers can be homopolymers or copolymers.
  • Copolymers are those polymers prepared from two or more different monomers and include terpolymers, tetrapolymers, and the like. The monomers can join to form random, block, segmented copolymers, as well as any of a variety of other structural arrangements.
  • Preferred polymers are block copolymers with styrenic blocks (preferably, a cyano-functional styrenic block) and blocks having a relatively high dielectric constant.
  • Copolymers that include a styrenic portion are particularly desirable as these polymers can migrate to the surface of a film of the polymer, thereby forming a phase-separated polymer.
  • a styrenic portion i.e., styrenic interpolymerized units, and preferably cyano-functional styrenic units
  • Such phase-separated polymers can be used without an overlying surface-modifying layer (discussed below).
  • Such migration of the styrenic units to the surface of a polymer film can occur during an annealing process.
  • the polymers of the present invention can be crosslinked using radiation (e.g., ultraviolet (UV), e-beam, gamma) or thermal energy, for example.
  • Chemical crosslinking agents can also be used if desired. Examples include, but are not limited to, 1,6-hexanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, ethylene di(meth)acrylate, glyceryl di(meth)acrylate, glyceryl tri(meth)acrylate, diallyl phthalate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, neopentyl glycol triacrylate and 1,3,5-tri(2-methacryloxyethyl-s-triazine.
  • Crosslinking can also occur by the addition of small amounts of diepoxides.
  • a polymer with a pendant epoxide functionality could be chemically crosslinked by the
  • Reactive diluents useful in this approach include those mentioned above as crosslinking agents and can also include, but are not limited to, any low viscosity monomer capable of dissolving the polymer and capable of polymerizing with the polymer during the crosslinking reaction.
  • reactive diluents include ethylenically unsaturated monomers such as acrylic acid and acrylate esters such as methyl methacrylate, ethyl arcylate, 2-ethylhexyl acrylate, and cyclohexyl acrylate.
  • the polymers of the present invention can be mixed with a photoinitiator to enhance crosslinking.
  • a photoinitiator to enhance crosslinking.
  • Useful photoinitiators that initiate free radical polymerization are described, for example, in Chapter II of "Photochemistry” by Calvert and Pitts, John Wiley & Sons (1966 ).
  • photoinitiators examples include acryloin and derivatives, thereof, such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and (alpha)-methylbenzoin; diketones such as benzil and diacetyl, etc.; organic sulfides such as diphenyl monosulfide, diphenyl disulfide, decyl phenyl sulfide, and tetramethylthiuram monosulfide; S-acyl thiocarbamates such as S-benzoyl-N,N-dimethyldithiocarbamate; and phenones such as acetophenone, benzophenone and derivatives.
  • acryloin and derivatives thereof, such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, be
  • additives can be used with the polymers of the present invention. These include, for example, fillers, diluents (e.g., monoacrylates), rheological thickeners, colorants, surfactants, antioxidants, and the like.
  • the CN-containing polymers of this invention are preferably blended with fillers to form dispersions that become polymer composites when cured.
  • These polymer composites can have a high dielectric constant if the base polymer has a high dielectric constant and if the filler is composed of a material with a high dielectric constant.
  • Dielectrics incorporating superfine ceramic particles have been used to make organic thin film transistors (OTFTs) and are discussed in Applicants' Assignee's Copending Application U.S. Serial No. 09/619,302, filed July 19, 2000 .
  • ferroelectric ceramic fillers such as barium titanate, strontium titanate lead zirconate or many other fillers that have a high dielectric constant such as those disclosed in U.S. Patent No. 6,159,611 (Lee ). It may also be useful to coat the fillers with a coupling agent (e.g., silane coupling agents) in order to make them compatible with the polymer system.
  • a coupling agent e.g., silane coupling agents
  • suitable fillers include metal oxides (e.g., SiO 2 , Al 2 O 3 , and TiO 2 ), nitrides (e.g., Si 3 N 4 ), etc., as well as those disclosed in U.S. Patent Nos. 5,126,915 (Pepin et al.
  • Preferred such filled composites can have a dielectric constant of at least 25, more preferably at least 30, and even more preferably of at least 40.
  • the present invention provides a thin film transistor (TFT) 10 that includes a substrate 12, a gate electrode 14 disposed on the substrate, a dielectric material 16 of the present invention disposed on the gate electrode, an optional surface-modifying film 18 disposed on the gate dielectric, an semiconductor layer 20 adjacent to the surface-modifying film, and a source electrode 22 and a drain electrode 24 contiguous to the semiconductor layer.
  • TFT thin film transistor
  • Figure 1 shows one possible thin film transistor configuration. Any other known thin film transistor configuration is possible with the materials of this invention.
  • the source and drain electrodes may be adjacent to the dielectric material with the semiconductor layer over the source and drain electrodes, or the semiconductor layer may be interposed between the source and drain electrodes and the dielectric.
  • the present invention provide an embedded capacitor 213 that includes two flexible conductive substrates 214 and 216 with a dielectric material 218 of the present invention interposed between the two flexible substrates.
  • the capacitor 213 is embedded in a material such as a fiberglass/epoxy composite 212.
  • An active electronic device 220 is situated above the embedded capacitor 213 and has electrical connections 222a and 222b to conductive substrates 214 and 216 respectively.
  • Embedded capacitors are used for low impedance power distribution in high speed electronic devices.
  • U.S. Patent No. 6,274,224 O'Bryan et al ).
  • the present invention provides an electroluminescent lamp 310 that includes a transparent conductive film (such as indium-tin-oxide) 314 formed on an upper surface of an insulating transparent film (such as polyethylene terephthalate) 312.
  • a light emitting layer 315 is pattern printed on the transparent conductive film 314 by screen printing, for example.
  • the composition of light-emitting layer 315 is made by dissolving high dielectric resin, such as cyanoethyl pullulan or vinylidene fluoride group rubber in an organic solvent, such as dimethyl formamide or N-methyl pyrrolidinone, and then diffusing an illuminant, such as zinc sulfide, therein.
  • a dielectric material of the present invention 316 is formed on the light emitting layer 315.
  • a back-surface electrode 322 is formed on dielectric layer 316 by using a carbon resin group paste or a silver resin group paste.
  • An insulating coat layer 326 is formed on the back-surface electrode layer 322 by using, for instance, an insulating paste.
  • Electrodes 314a and 322a are formed on conductive layers 314 and 322 respectively as shown. A further description of these devices may be found in, for instance, U.S. Patent No. 5,844,362 (Tanabe et al ).
  • a surface-modifying film i.e., surface treatment
  • devices such as organic thin film transistors, made with the polymer dielectrics of the present invention.
  • surface treatments can optimally increase the transistor mobility by a factor of 3 or more, making these devices comparable to those made with a standard metal oxide dielectric layer. This increased mobility also allows the electronic devices of the present invention to be used in more complex circuits.
  • Such surface treatments can take the form of a polymeric surface-modifying film disposed on at least a portion of the dielectric layer.
  • a typical device might further include an organic semiconductor layer, wherein the polymeric surface-modifying film is interposed between the dielectric layer and the organic semiconductor layer.
  • styrene-containing surface-modifying polymers are used, such as homopolymers of styrene, ⁇ -methylstyrene, 4- tert -butylstyrene, 2-methylstyrene, 3-methylstyrene, or 4-methylstyrene; a copolymer of styrene and (trimethoxysilyl)propyl methacrylate; polystyrene with silyl-containing end groups; or copolymers of at least two different monomers selected from styrene, silyl-containing comonomers, ⁇ -methylstyrene, 4- tert -butylstyrene, 2-methylstyrene, 3-methylstyrene, and 4-methylstyrene.
  • the polymeric surface-modifying film of the invention preferably has a thickness of less than about 400 Angstroms (A), more preferably less than about 200 ⁇ , and most preferably less than about 100 ⁇ .
  • the polymeric surface-modifying film of the invention preferably has a thickness of at least about 5 ⁇ , more preferably at least about 10 ⁇ . The thickness can be determined through known methods, e.g., ellipsometry.
  • a substrate can be used to support a device, e.g., during manufacturing, testing, storage, use, or any combination thereof.
  • the dielectric layer may provide sufficient support for the intended use of the resultant device such that another substrate is not required.
  • one substrate may be selected for testing or screening various embodiments while another substrate is selected for commercial embodiments.
  • a support may be detachably adhered or mechanically affixed to a substrate, such as when the support is desired for a temporary purpose.
  • a flexible polymeric substrate may be adhered to a rigid glass support, which support could be removed.
  • the substrate does not provide any necessary electrical function for the device. This type of substrate is termed a "non-participating substrate.”
  • the substrate may include inorganic glasses, ceramic foils, polymeric materials, filled polymeric materials, coated or uncoated metallic foils, acrylics, epoxies, polyamides, polycarbonates, polyimides, polyketones, poly(oxy-1,4-phenyleneoxy-1,4-phenylenecarbonyl-1,4-phenylene) (sometimes referred to as poly(ether ether ketone) or PEEK), polynorbornenes, polyphenyleneoxides, polyethylene naphthalenedicarboxylate) (PEN), poly(ethylene terephthalate) (PET), pbly(phenylene sulfide) (PPS), and fiber-reinforced plastics (FRP).
  • inorganic glasses ceramic foils, polymeric materials, filled polymeric materials, coated or uncoated metallic foils, acrylics, epoxies, polyamides, polycarbonates, polyimides, polyketones, poly(oxy-1,4-phenyleneoxy-1,4-phenylene
  • a flexible substrate is used in some embodiments of the present invention. This allows for roll processing, which may be continuous, providing economy of scale and economy of manufacturing over some flat and/or rigid substrates.
  • the flexible substrate chosen preferably is capable of wrapping around the circumference of a cylinder of less than about 50 centimeters (cm) diameter without distorting or breaking.
  • the substrate chosen more preferably is capable of wrapping around the circumference of a cylinder of less than about 25 cm diameter without distorting or breaking the substrate.
  • the force used to wrap the flexible substrate of the invention around a particular cylinder typically is low, such as by unassisted hand, i.e., without the aid of levers, machines, hydraulics, and the like.
  • the preferred flexible substrate may be rolled upon itself.
  • Useful materials for a semiconductor layer include organic semiconductors that include acenes, such as anthracene, tetracene, pentacene, and substituted pentacenes.
  • acenes such as anthracene, tetracene, pentacene, and substituted pentacenes.
  • Substituted pentacene compounds that are useful as organic semiconductors in the present invention include at least one substituent selected from the group consisting of electron-donating substituents (for example, alkyl, alkoxy, or thioalkoxy), halogen substituents, and combinations thereof.
  • Useful substituted pentacenes include, but are not limited to, 2,9-dialkylpentacenes, 2,9-difluoropentacenes, and 2,10-dialkylpentacenes, wherein the alkyl group has from 1 to 12 carbons; 2,10-dialkoxypentacenes; and 1,4,8,11-tetraalkoxypentacenes.
  • Such substituted pentacenes are taught in Applicants' Assignee's copending applications U.S. Serial No. 09/966,954 , and U.S. Serial No. 09/966,961, both filed on September 26,2001 .
  • Examples of other useful semiconductors include perylenes, fullerenes, phthalocyanines, oligothiophenes, and substituted derivatives thereof.
  • Particular organic semiconductor compounds include sexithiophene, ⁇ , ⁇ -dihexylsexithiophene, quinquethiophene, quaterthiophene, ⁇ , ⁇ -dihexylquaterthiophene, ⁇ , ⁇ -dihexylquinquethiophene, poly(3-hexylthiophene), bis(dithienothiophene), poly(3-alkylthiophene), anthradithiophene, dihexylanthradithiophene, polyacetylene, poly(thienylenevinylene), poly(phenylene vinylene)" C 60 , copper(II) hexadecafluorophthalocyanine, and N,N'-bis(pentadecafluoroheptyl
  • the organic semiconductor layer can be provided by any useful means, such as for example, vapor deposition, solution deposition, spin coating, and printing techniques.
  • the organic semiconductor layer can be patterned by deposition through an aperture mask.
  • Useful aperture masks for this purpose are described in Applicants' Assignee's copending applications U.S. Serial No. 10/076,003 and U.S. Serial No. 10,076,174, both filed on February 14, 2002 .
  • inorganic semiconductors in the devices of this invention.
  • examples of such semiconductors include amorphous silicon and inorganic nanoparticle-based semiconductors such as cadmium sulfide or cadmium selenide.
  • the gate electrode can be any useful conductive material.
  • the gate electrode may include doped silicon, or a metal, such as aluminum, chromium, copper, gold, silver, nickel, palladium, platinum, tantalum, or titanium.
  • Conductive polymers also can be used, for example polyaniline or poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate) (PEDOT:PSS).
  • PEDOT:PSS poly(3,4-ethylenedioxythiophene)/poly(styrene sulfonate)
  • alloys, combinations, and multilayers of these materials may be useful.
  • the source electrode and drain electrode are separated from the gate electrode by the dielectric material of the present invention (e.g., a gate dielectric), while the organic semiconductor layer can be over or under the source electrode and drain electrode.
  • the source and drain electrodes can be any useful conductive material.
  • Useful materials include those described above for the gate electrode.
  • useful materials include aluminum, barium, calcium, chromium, copper, gold, silver, nickel, palladium, platinum, titanium, polyaniline, PEDOT:PSS, other conducting polymers, alloys thereof, combinations thereof, and multilayers thereof.
  • the thin film electrodes can be provided by any useful means such as physical vapor deposition (e.g., thermal evaporation, sputtering), plating, or ink jet printing.
  • the patterning of these electrodes can be accomplished by known methods such as shadow masking, etching, additive photolithography, subtractive photolithography, printing, microcontact printing, transfer printing, and pattern coating.
  • the glass transition temperature (Tg) was determined using a modulated DSC (Model Q1000, TA Instruments, New Castle, DE). A linear heating rate of 5°C per minute (min) was applied with a perturbation amplitude of ⁇ 0.796°C every 60 seconds. The sample was subjected to a heat-quench-heat profile ranging from 15°C to 265°C.
  • Infrared spectroscopy was performed on a NEXUS 670 Fourier Transform Infrared Spectrometer (available from Thermo-Nicolet, Madison, WI). The spectra were measured on films of polymer cast onto sodium chloride plates in the transmission mode.
  • the polymer was recovered by precipitation in excess methanol, followed by vacuum filtration and drying under vacuum overnight at room temperature.
  • the resulting polymer had a weight average molecular weight (Mw) of 140,000 g/mol and a polydispersity of 5.5 based on GPC in tetrahydrofuran against polystyrene standards.
  • a solution was then prepared containing 4-vinylbenzylcyanide (1.0 g), cyclopentanone (18.0 g), and VAZO 67 (0.04 g). The solution was sparged with nitrogen gas for 10 minutes, then heated overnight on a shaker bath at 65°C. The polymer, poly(4-vinylbenzylcyanide), was recovered by precipitation into excess methanol, followed by vacuum filtration, and dried in a vacuum oven overnight at room temperature. It had a weight average molecular weight of 23,500 g/mol and a polydispersity of 2.75 based on GPC in THF against polystyrene standards.
  • the monomer, 4-(2,2'-dicyanopropyl)styrene was prepared by a reaction series, as described below:
  • the monomer 4-(1,1',2-tricyanoethyl)styrene was prepared by a reaction series, as described below:
  • a solution was prepared containing 2.06 g 4-vinylbenzyl cyanide, 0.51 g 4-vinylbenzyl chloride, 10.04 g methylethylketone, and 0.0143 g VAZO 67.
  • the solution was sparged with nitrogen gas for 20 min, then heated overnight at 65°C on a shaker bath.
  • the polymer was recovered by precipitation into excess methanol, followed by vacuum filtration and drying in a vacuum oven overnight at room temperature.
  • a sample (0.40 g) of this polymer was dissolved in 4.66 g dimethylformamide. To this solution was added 0.09 g acrylic acid, 0.01 g hydroquinone, and 0.20 g triethylamine. This solution was stirred overnight at room temperature. During this time, a precipitate formed. After filtration, the polymer was recovered by precipitation into water, followed by drying overnight in a vacuum oven at room temperature.
  • the dielectric constants of the polymeric dielectrics of the invention were determined by constructing a test device (capacitor) 410 as shown in Figure 4 .
  • Spin-coating solutions were prepared at a loading of 5-15% by weight of polymer, in either cyclopentanone or dimethylformamide, as indicated in Table 1.
  • the solutions were spun for 20 seconds (sec) at 500 revolutions per minute (rpm), followed by 1000 rpm for 40 sec.
  • the coated polymer was annealed at 140°C for 35 minutes in an oven.
  • One thousand angstroms (1000 A) of Au 422 was thermally deposited at a pressure below 5 x 10 -6 torr and at a rate of 2.5 ⁇ /sec. through a metal stencil mask (apertures were rectangular in shape and dimensions varied from 8-18 millimeters (mm)) on top of each polymeric dielectric sample.
  • Capacitance was measured for each sample at a frequency of 100 kilohertz (kHz), except where otherwise indicated. Measurements were made on three separate occasions and were averaged to give the final values presented in Table 1, below.
  • Dielectric films prepared in a fashion similar to that described above were used as the basis to fabricate and test organic transistor devices as described in U.S. Patent No. 6,433,359 (Kelley ).
  • the device 510 fabricated as described is shown in Figure 5 .
  • a photopatternable solution of Polymer 1 was made by dissolving 3.00 g of Polymer 1 (12.80 parts), 0.3 g pentaerythritol triacrylate (1.30 parts, Aldrich) and 0.17 g IRGACURE 819 photoinitator (0.70 part, Ciba, Basel, Switzerland) in 20 g cyclopentanone (85.20 parts). The solution was kept in the dark and was filtered through a 0.45 micrometer ( ⁇ m or micron) filter before use.
  • the shadow mask was removed and the substrate was subjected to a post-exposure bake (5 seconds at about 150°C on a hot plate) to enhance the sensitivity of the system.
  • the unexposed photopolymer was removed by developing the wafer for less than 20 seconds in tetrahydrofuran.
  • the remaining photopatterned polymer was post-baked at 165°C for about 2 minutes. The result was a silicon wafer with rectangular bars of photopatterned dielectric crosslinked polymer matching the void spaces in the shadow mask.
  • a photopattemable solution of Polymer 1 prepared according to the procedure described in Example 2 was spin-coated onto 35 ⁇ m thick copper foil (surface was treated with oxygen plasma) at 500 rpm for 40 seconds. After the sample was soft-baked at 80°C for 4 minutes, it was exposed to UV light with an energy of 550 mJ/cm 2 in the C-band of the ultraviolet spectrum followed by post-baking at 110°C for 2 minutes.
  • the response of capacitance and dissipation loss of the sample at high frequency ranges were recorded on an Agilent 4396B Network/Spectrum/Impedence Analyzer (available from Agilent, Palo Alto, CA) in impedance mode coupled with a 43961A RF Impedance Test Adapter (Agilent).
  • Example 11 Construction of Patterned Transistors with Photopatternable Dielectric Layers.
  • An array of patterned transistors 610 ( Figure 4 ) was made on a glass substrate as follows. A patterned gate layer 614 of 15 ⁇ titanium and 600 ⁇ gold was deposited onto a clean glass slide 612 through a silicon (Si) shadow mask. Then a solution of Polymer 1 prepared as described in Example 9 above was spin-coated onto the glass substrate and the photopolymer layer was exposed to UV radiation through an appropriate silicon shadow mask to form a patterned dielectric layer 616. After removing the uncrosslinked dielectric polymer layer and post-baking as described in Example 9, the transistors 610 were finished with 600 ⁇ patterned vapor-deposited pentacene 620 followed by 600 ⁇ of gold source 622 and drain 624 electrodes as shown. All layers were well aligned and the devices were tested as described above.
  • An array of transistors with vapor-deposited alumina was prepared in the same manner as above with the exception that the alumina was deposited by electron beam evaporation through a silicon shadow mask and was surface treated with poly( ⁇ -methylstyrene) as described in Applicants' Assignee's Copending Application U.S. Serial No. 10/012,654, filed on November 5, 2001 . Following surface treatment, pentacene was vapor deposited through a silicon shadow mask to a final thickness of 600 ⁇ and transistors were finished by thermally evaporating 600 ⁇ of gold through a silicon shadow mask.
  • test structures were prepared 710 ( Figure 5 ) with a layer of poly( ⁇ -methylstyrene) 718 situated between the dielectric layer 716 and the pentacene semiconductor layer 720.
  • the devices were fabricated as follows:
  • the polymer dielectric layer 716 was crosslinked by blanket exposure to UV light under a nitrogen atmosphere as previously described.
  • an Al 2 O 3 -coated silicon wafer was obtained from Silicon Valley Microelectronics.
  • a solution was prepared by mixing the following components: 2.00 g of Polymer 1 or 2, 20.0 g cyclopentanone, and 0.20 g pentaerythritol triacrylate (Aldrich). This mixture was filtered through a 0.45 ⁇ m filtration cartridge. To 2.0 g of this filtered solution was added 1.0 g dispersion of barium titanate dispered in methyl ethyl ketone/methylisobutyl ketone (2:3 v/v, 60 weight percent (wt-%) of solid content). The final mixture has 37% volume loading of BaTiO 3 with respect to polymer. This mixture was ultrasonically stirred before use.

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Claims (14)

  1. Elektronische Vorrichtung, umfassend eine dielektrische organische Polymerschicht, umfassend ein organisches Polymer mit Wiederholungseinheiten der folgenden Formeln:
    Figure imgb0014
     wobei weniger als 5 % der Kohlenstoffatome in der polymeren Schicht Fluorsubstituenten aufweisen und wobei:
    jedes R1 unabhängig H, Cl, Br, I, eine Arylgruppe oder eine organische Gruppe, die eine vernetzbare Gruppe enthält, ist;
    jedes R2 unabhängig H, eine Arylgruppe oder R4 ist;
    jedes R3 unabhängig H oder Methyl ist;
    jedes R5 unabhängig eine Alkylgruppe, ein Halogen oder R4 ist; und
    n = 0-3;
    wobei die Wiederholungseinheiten gegebenenfalls die gleichen sind;
    dadurch gekennzeichnet, dass jedes R4 unabhängig eine organische Gruppe, umfassend mindestens eine CN-Gruppe ist und ein Molekulargewicht von etwa 30 bis etwa 200 pro CN-Gruppe aufweist und dass mindestens eine Wiederholungseinheit in dem Polymer R4 enthält.
  2. Vorrichtung nach Anspruch 1, wobei jedes R1 unabhängig H, eine (C5-C8)-Arylgruppe, Cl, Br, I oder eine organische Gruppe ist, die (Meth)acrylat-, Amin-, Hydroxyl-, Thiol-, Oxiran-, Aziridin-, Chlorsilan-, Vinyl- oder Alkoxysilan-gruppen enthält.
  3. Vorrichtung nach Anspruch 1, wobei jedes R2 unabhängig H, eine (C5-C8)-Arylgruppe oder R4 ist und jedes R4 eine organische (C2-C20)-Gruppe, umfassend mindestens eine CN-Gruppe ist und ein Molekulargewicht von etwa 30 bis etwa 200 pro CN-Gruppe aufweist.
  4. Vorrichtung nach Anspruch 1, wobei mindestens ein R1 eine vernetzbare Gruppe enthält.
  5. Elektronische Vorrichtung nach Anspruch 1, wobei die dielektrische organische Polymerschicht lichtbemusterbar ist.
  6. Vorrichtung nach Anspruch 1 oder 5, wobei R4 N-Methyl-(2-cyanethyl)carbamid, N-Bis(2-cyanethyl)carbamid, p-(2-Cyanethyl)phenyl, p-(2,2-Dicyanpropyl)phenyl, p-(1,2-Dicyanpropio-nitril)phenyl, N-Methyl-N-(2-cyanethyl)benzylamin, Bis-N-(2-cyanethyl)benzylamin, Cyanmethyl, 2,2'-Dicyanpropyl, 1,2,2'-Tricyanethyl oder N,N'-Bis(2-cyanethyl)aminoethyl ist.
  7. Vorrichtung nach Anspruch 1, wobei das Polymer Wiederholungseinheiten der folgenden Formeln umfasst:
    Figure imgb0015
     wobei: R CH3 oder CH2CH2CN ist;
    jedes R5 unabhängig eine Alkylgruppe, ein Halogen oder eine organische Gruppe, umfassend mindestens eine CN-Gruppe ist und ein Molekulargewicht von etwa 30 bis etwa 200 pro CN-Gruppe aufweist; und
    n = 0-3.
  8. Vorrichtung nach Anspruch 1, wobei das Polymer ein Copolymer von Bis(2-cyanethyl)acrylamid mit einem Polystyrolmakromer ist.
  9. Vorrichtung nach Anspruch 1, wobei das Polymer Wiederholungseinheiten der folgenden Formel umfasst:
    Figure imgb0016
     oder
    Figure imgb0017
  10. Vorrichtung nach Anspruch 9, wobei das Polymer ein Homopolymer ist.
  11. Vorrichtung nach Anspruch 1, wobei das Polymer ein Copolymer umfassend Wiederholungseinheiten der folgenden Formel ist:
    Figure imgb0018
  12. Verfahren zur Herstellung einer elektronischen Vorrichtung, wobei das Verfahren die Ausbildung einer dielektrischen organischen Polymerschicht, umfassend ein organisches Polymer mit Wiederholungseinheiten der folgenden Formeln umfasst:
    Figure imgb0019
     wobei weniger als 5 % der Kohlenstoffatome der polymeren Schicht Fluorsubstituenten aufweisen und
    wobei:
    jedes R1 unabhängig H, Cl, Br, I, eine Arylgruppe oder eine organische Gruppe, die eine vernetzbare Gruppe enthält, ist;
    jedes R2 unabhängig H, eine Arylgruppe oder R4 ist;
    jedes R3 unabhängig H oder Methyl ist;
    jedes R5 unabhängig eine Alkylgruppe, ein Halogen oder R4 ist; und
    n = 0-3;
    wobei die Wiederholungseinheiten gegebenenfalls die gleichen sind;
    dadurch gekennzeichnet, dass jedes R4 unabhängig eine organische Gruppe, umfassend mindestens eine CN-Gruppe ist und ein Molekulargewicht von etwa 30 bis etwa 200 pro CN-Gruppe aufweist und dass mindestens eine Wiederholungseinheit in dem Polymer R4 enthält.
  13. Verfahren nach Anspruch 12,
    wobei
    jedes R1 unabhängig eine organische Gruppe, die eine vernetzbare Gruppe enthält, ist;'
    und das Verfahren ferner das Vernetzen des organischen Polymers umfasst.
  14. Verfahren nach Anspruch 12, wobei die dielektrische organische Polymerschicht eine Dielektrizitätskonstante von mindestens etwa 3,5 aufweist und wobei das organische Polymer funktionelle Cyangruppen und Styroleinheiten umfasst;
    wobei das Verfahren ferner umfasst
    Tempern des organischen Polymers, was ein Wandern der Styroleinheiten zur Oberfläche der Schicht verursacht; und
    gegebenenfalls Vernetzen des organischen Polymers zur Ausbildung der dielektrischen organischen Polymerschicht.
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EP1620885A1 (de) 2006-02-01
US7473652B2 (en) 2009-01-06
CN1813343A (zh) 2006-08-02
ATE439681T1 (de) 2009-08-15
DE602004022534D1 (de) 2009-09-24
JP4668916B2 (ja) 2011-04-13
JP2007538381A (ja) 2007-12-27
US20060237717A1 (en) 2006-10-26
CN1784772A (zh) 2006-06-07
WO2004102652A1 (en) 2004-11-25
TW200505950A (en) 2005-02-16
US20040222412A1 (en) 2004-11-11
US7098525B2 (en) 2006-08-29
KR20060009320A (ko) 2006-01-31

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