EP1369200B1 - Vorrichtung zum polieren von optischen platten - Google Patents
Vorrichtung zum polieren von optischen platten Download PDFInfo
- Publication number
- EP1369200B1 EP1369200B1 EP02701709A EP02701709A EP1369200B1 EP 1369200 B1 EP1369200 B1 EP 1369200B1 EP 02701709 A EP02701709 A EP 02701709A EP 02701709 A EP02701709 A EP 02701709A EP 1369200 B1 EP1369200 B1 EP 1369200B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- polishing
- optical disk
- disk
- sheet
- elastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 171
- 230000003287 optical effect Effects 0.000 title claims abstract description 59
- 230000037431 insertion Effects 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 238000010008 shearing Methods 0.000 abstract 1
- 230000008030 elimination Effects 0.000 description 7
- 238000003379 elimination reaction Methods 0.000 description 7
- 229920003051 synthetic elastomer Polymers 0.000 description 6
- 239000005061 synthetic rubber Substances 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000009991 scouring Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/20—Mountings for the wheels
Definitions
- the present invention relates to a polishing apparatus for restoring optical disks, such as CD, DVD, VD and LD.
- US 5,938,510 which is regarded to represent the closest state of the art according to the preamble of claim 1, discloses a disc cleaner/scourer/polisher device comprising two holders, one holder holding a scouring member for scratch removal and one holder holding a scouring member for polishing, both scouring the annular portion of the planar side of the supported disc.
- Each holder has a respective pressing/lifting mechanism for moving the respective holder relative to the planar side of the supported disc for effecting/breaking the contact of the respective scouring member with an annular portion of the planar side of the supported disc, independent of at least one other of the holders.
- US 5,860,851 discloses a polishing apparatus comprising an elastic member interposed between a polishing table and a polishing cloth, with that polishing cloth being moveable independent of the elastic member.
- US 4,825,497 discloses a disk cleaner comprising a driving mechanism which is operated when a lid is positioned in a closed condition relative to a main casing.
- the driving mechanism is operatively connected to another mechanism for rotating and revolving a cleaner body to clean the disk.
- optical disks have been selling in large quantities. When a flaw or flaws are made on its surface, it is sometimes impossible to read data from the disk. It is therefore desirable to repair the disk and restore it to a readable state. In view of resource saving, it is not desirable to dispose of such reusable optical disks in large quantities.
- Fig. 5 shows an example of a conventional disk polishing apparatus.
- the apparatus is composed of a disk rotator A2 for rotating an object 31 and a polishing mechanism B2 for polishing the surface of the object 31.
- a polishing pad C2 is attached to a rotating substrate 33 fixed to a rotation shaft 32 via such an attachment means as "Velcro" (registered trademark).
- a polishing sheet 36 is attached to the bottom of a spongy elastic body 35.
- Fig. 6a shows the case of polishing the surface of an optical disk with the above-constructed polishing apparatus.
- the elastic body 35 of the polishing pad C2 is too soft, deformation occurs in the polishing face.
- roundness E is formed on the outer edge of the optical disk 31.
- the elastic body 35 of the polishing pad C2 When, on the other hand, the elastic body 35 of the polishing pad C2 is not pliable, the pressure contact between the polishing face and the surface of the optical disk is tightened in part. It is therefore difficult to eliminate abrasive filings (e.g. polycarbonate powder), which clog the surface of the polishing sheet. Thus, the polishing power decreases and the accumulated filings cause small shallow cuts (i.e. scratches) on the surface of the optical disk.
- abrasive filings e.g. polycarbonate powder
- the problems to be solved by the present invention are as follows: (1) to obtain an appropriate pressure required for polishing; (2) to correct the accuracy of parallelism between the rotation planes of an optical disk and a polishing sheet; (3) to remove roundness formed on the outer edge of an optical disk and unevenness in polishing; and (4) to prevent clogging of the surface of a polishing sheet by the active elimination of abrasive filings and an occurrence of scratches on the surface of an optical disk due to the clogging.
- the polishing mechanism B has an elastic mechanism D for elastically holding a polishing pad C and the elastic mechanism D is constructed to have elasticity in the direction perpendicular to the rotation plane of the optical disk and rigidity in the direction parallel to the rotation plane of the optical disk.
- an apparatus for polishing an optical disk composed of a disk rotator A for rotating an optical disk and a polishing mechanism B for polishing the surface of the optical disk wherein the ratio of the disk angular speed omega a of the disk rotator A to the polishing sheet angular speed omega b of the polishing mechanism B satisfies the range of 0.2 ⁇ ⁇ a/ ⁇ b ⁇ 1.5.
- a wet polishing apparatus is used in the present embodiment.
- the wet polishing apparatus when the surface 2a of a polishing sheet of a polishing pad C is pressed into contact with the surface 1a of an optical disk for the purpose of polishing, such liquid as water is supplied to the interface between the surfaces 1a and 2a. Thereby, frictional heat is eased and the elimination of filings is attained in the course of polishing.
- Figs. 1 and 2 show an apparatus for polishing an optical disk according to the present embodiment.
- the apparatus is composed of a disk rotator A for rotating an optical disk 1 and a polishing mechanism B for polishing the surface of the optical disk.
- the polishing mechanism B has an elastic mechanism D for elastically holding a polishing pad C.
- the optical disk 1 is mounted on a rotating substrate 4 coupled with a rotation shaft 3.
- the elastic mechanism D is constructed so that a second rigid body 7 is connected to a first rigid body 6 in a floating state, as shown in Figs. 2 and 3.
- the polishing pad C is attached to the second rigid body 7.
- plural shafts 7a project upward from its circumferential vicinity.
- the first rigid body 6 is coupled with a rotation shaft 5.
- plural shaft holes 6a are provided in its circumferential vicinity.
- the shaft 7a is fitted into the shaft hole 6a through a coil spring 8 between rigid bodies 6 and 7.
- the shaft 7a is capable of sliding and is fixed by a fixing member 9.
- the elastic mechanism D is therefore constructed to have elasticity in the direction perpendicular to the rotation plane of the optical disk 1 and rigidity in the direction parallel to the rotation plane of the optical disk 1.
- a magnetic body 10 is provided on the bottom of the second rigid body 7. The magnetic body 10 is magnetically joined with a metal substrate 11 of the polishing pad C as described later.
- a polishing sheet 2 is attached via an elastic sheet 12 to the metal substrate 11 joined with the magnetic body 10.
- the polishing pad C can be attached to the second rigid body 7 by a Hook-and-Loop fastener, such as "Velcro” (registered trademark), in addition to the magnetic attachment/detachment means.
- a Hook-and-Loop fastener such as "Velcro” (registered trademark)
- the integrated elastic mechanism D and polishing pad C may be attached to and detached from the rotation shaft 5.
- Figs. 4a and 4b show another type of the elastic mechanism D.
- a magnetic body 20 is attached via a ring 29 to a ribbed elastic body 28 fixed to a rotation shaft 25 of a polishing mechanism B1.
- Fig. 4b which is a plan view of the elastic mechanism shown in Fig. 4a
- the ribbed elastic body 28 is formed so that an inner part 28a is connected to an outer part 28b by ribs 28d while creating a space 28c.
- the elastic mechanism D1 is thus constructed. Therefore, the elastic mechanism D 1 is also constructed to have elasticity in the direction perpendicular to the rotation plane of the optical disk and rigidity in the direction parallel to the rotation plane of the optical disk.
- the polishing pads were prepared by using the elastic sheets that differed in material and thickness. Next, these polishing pads were attached to the polishing mechanism B of the polishing apparatus according to the present embodiment. The surface of the polishing sheet of each polishing pad was pressed into contact with the surface of the optical disk with a pressure required for polishing. Samples 1-6 were thus obtained. Reference is made to Table 1, which shows the deformation amount ⁇ x of the surface of the polishing sheet in this case. Table 1 also shows the comprehensive as well as the individual rating regarding clogging of the surface of the polishing sheet and roundness formed on the outer edge of the optical disk. In the present experiment, the rotation speed of the disk rotator A is 500 rpm and that of the polishing mechanism B is 1200 rpm. The disk rotator A and the polishing mechanism B rotate in the same direction.
- the deformation amount (depression amount) ⁇ x when the deformation amount (depression amount) ⁇ x is small, the surface of the polishing sheet is likely to be clogged; when it is large, roundness is likely to be formed on the outer edge of the optical disk; and it is preferable to set the deformation amount (depression amount) ⁇ x within the range of 0.005 mm to 0.3 mm, more preferably within the range of 0.01 mm to 0.1 mm.
- the disk angular speed ⁇ a of the disk rotator A and the polishing sheet angular speed ⁇ b of the polishing mechanism B were regulated to set the angular speed ratio at the values shown in Table 2.
- Samples 1-7 were thus obtained. As for these samples, an amount of polishing was measured. In the meantime, the elimination of filings, an occurrence of clogging, etc. were rated. These measurement and ratings are comprehensively shown in the column of "Rating of Amount of Polishing" of Table 2.
- TABLE 2 Sample No. Disk Angular Speed / Polishing Sheet Angular Speed ( ⁇ a/ ⁇ b) Rating of Amount of Polishing 1 0.1 ⁇ 2 0.2 ⁇ 3 0.4 ⁇ 4 0.6 ⁇ 5 1.0 ⁇ 6 1.5 ⁇ 7 2.0 ⁇
- the polishing sheet always effects polishing in the direction La parallel to a trace of polishing Ka, as shown in Fig. 7a.
- the same abrasive grains of the polishing sheet always polish a peak part Y of the traces of polishing Ka
- the other ones always polish a valley part T thereof. Therefore, the polishing efficiency is low and the amount of polishing decreases. Further, the polishing sheet is likely to be clogged because it is difficult to eliminate the filings. Thereby, endurance of the polishing sheet decreases.
- the polishing sheet effects polishing in the direction Lc nearly perpendicular to a trace of polishing Kc, as shown in Fig. 7c. Therefore, differently from the case of the sample No. 1, the same part of the abrasive grains does not polish the peak part Y. That is, the peak part Y and valley part T are polished alternatively. In this case, the filings produced by polishing the peak part T are actively eliminated through the valley part T and thereby an occurrence of clogging is prevented.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Optical Head (AREA)
Claims (6)
- Vorrichtung zum Polieren einer optischen Scheibe, umfassend eine Scheibenrotationsvorrichtung (A) zum Drehen einer optischen Scheibe (1) und einen einzelnen Poliermechanismus (B) zum Polieren der Oberfläche der optischen Scheibe, wobei:der Poliermechanismus (B) aufweist: einen elastischen Mechanismus (D) zum elastischen Halten eines Polierpads (C);ein Polierblatt des Polierpads (C);wobei der elastische Mechanismus (D) so konstruiert ist, dass er Elastizität in der Richtung senkrecht zu der Rotationsebene der optischen Scheibe (1) und Steifigkeit in der Richtung parallel zu der Rotationsebene der optischen Scheibe (1) aufweist, dadurch gekennzeichnet, dassder elastische Mechanismus (D) elastische Glieder (8) in der Nähe seines Umfangs aufweist und dass das Polierblatt des Polierpads (C) eine derartige Elastizität aufweist, dass der Verformungsbetrag Δx 0,005 mm bis 0,3 mm beträgt, wenn das Polierblatt mit der Oberfläche der optischen Scheibe (1) mit einem zum Polieren erforderlichen Druck in Kontakt kommt.
- Vorrichtung nach Anspruch 1 zum Polieren einer optischen Scheibe (1), wobei das Verhältnis der Scheiben-Winkelgeschwindigkeit ωa der Scheibenrotationsvorrichtung (A) zu der Polierblatt-Winkelgeschwindigkeit ωb des Poliermechanismus (B) den Bereich von 0,2<ωa/ωb<1,5 erfüllt.
- Vorrichtung zum Polieren einer optischen Scheibe (1) nach Anspruch 1 oder 2, wobei der elastische Mechanismus (D) umfasst:a) ein erstes Plattenglied (7);b) ein zweites Plattenglied (6), welches gegenüber einem an dem ersten Plattenglied (7) bereitgestellten Stabglied (7d) gleitet; undc) ein elastisches Glied (8) mit dem Stabglied (7a) durch Einfügen zwischen dem ersten Plattenglied (7) und dem zweiten Plattenglied (6) gefügt.
- Vorrichtung zum Polieren einer optischen Scheibe (1) nach Anspruch 1 oder 2, wobei der elastische Mechanismus (D) ein mit Rippen versehener elastischer Körper ist.
- Vorrichtung zum Polieren einer optischen Scheibe (1) nach einem der Ansprüche 1 bis 4, wobei das Polierpad (C) mittels eines magnetischen Befestigungs-/Trennmittels oder eines Haken-und-Schlaufen-Befestigungsmittels mit dem elastischen Mechanismus (D) verbunden und von demselben getrennt wird.
- Vorrichtung zum Polieren einer optischen Scheibe (1) nach einem der Ansprüche 1 bis 5, wobei die integrierten Komponenten elastischer Mechanismus (D) und Polierpad (C) mit einer Rotationswelle (5) verbunden und von derselben getrennt werden.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001111994 | 2001-03-05 | ||
JP2001111994 | 2001-03-05 | ||
PCT/JP2002/001981 WO2002070199A1 (fr) | 2001-03-05 | 2002-03-04 | Dispositif de polissage de disque optique |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1369200A1 EP1369200A1 (de) | 2003-12-10 |
EP1369200A4 EP1369200A4 (de) | 2005-11-23 |
EP1369200B1 true EP1369200B1 (de) | 2007-08-01 |
Family
ID=18963484
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02701709A Expired - Fee Related EP1369200B1 (de) | 2001-03-05 | 2002-03-04 | Vorrichtung zum polieren von optischen platten |
Country Status (6)
Country | Link |
---|---|
US (1) | US6869344B2 (de) |
EP (1) | EP1369200B1 (de) |
JP (1) | JPWO2002070199A1 (de) |
DE (1) | DE60221502T2 (de) |
ES (1) | ES2287242T3 (de) |
WO (1) | WO2002070199A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109531338A (zh) * | 2018-12-29 | 2019-03-29 | 重庆荣成玻璃制品有限公司 | 玻璃吹压生产装置 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7104871B1 (en) * | 1997-06-20 | 2006-09-12 | Kennedy Michael S | Method and apparatus for reconditioning compact discs |
DE102004001546A1 (de) * | 2004-01-10 | 2005-08-04 | August Rüggeberg Gmbh & Co. Kg | Werkzeug |
FR2900356B1 (fr) * | 2006-04-27 | 2008-07-18 | Essilor Int | Outil de surfacage d'une surface optique |
EP1985876B1 (de) * | 2007-04-23 | 2011-06-08 | HTC Sweden AB | Schleifhalter eines Bearbeitungsgeräts |
KR100893067B1 (ko) * | 2008-02-22 | 2009-04-17 | 이중호 | 플랙시블 래핑기 |
FR2935628B1 (fr) * | 2008-09-10 | 2011-10-14 | Essilor Int | Outil de surfacage a qualite optique |
US20100087124A1 (en) * | 2008-10-07 | 2010-04-08 | Farzad Saghian | Cd repair apparatus |
KR101034506B1 (ko) * | 2008-11-28 | 2011-05-17 | 세메스 주식회사 | 연마 유닛, 이를 갖는 기판 연마 장치 및 이를 이용한 기판연마 방법 |
JP5388212B2 (ja) * | 2009-03-06 | 2014-01-15 | エルジー・ケム・リミテッド | フロートガラス研磨システム用下部ユニット |
JP5408790B2 (ja) * | 2009-03-06 | 2014-02-05 | エルジー・ケム・リミテッド | フロートガラス研磨システム |
JP5408789B2 (ja) * | 2009-03-06 | 2014-02-05 | エルジー・ケム・リミテッド | フロートガラス研磨システム |
JP5408788B2 (ja) * | 2009-03-06 | 2014-02-05 | エルジー・ケム・リミテッド | フロートガラス研磨システム |
US20100330890A1 (en) * | 2009-06-30 | 2010-12-30 | Zine-Eddine Boutaghou | Polishing pad with array of fluidized gimballed abrasive members |
KR101342952B1 (ko) * | 2009-10-08 | 2013-12-18 | 주식회사 엘지화학 | 유리판 연마 시스템 및 방법 |
CN101884981B (zh) * | 2010-06-10 | 2012-12-26 | 北京中电科电子装备有限公司 | 晶片清洁装置 |
US20130181465A1 (en) * | 2012-01-17 | 2013-07-18 | Elm Inc. | Optical disc restoration method and system |
DE202012002267U1 (de) * | 2012-03-07 | 2012-04-18 | Jakob Löwer Inh. von Schumann GmbH & Co. KG | Tellerschleifer einer Vorrichtung zum Entgraten und/oder Verrunden von metallenen Werkstücken im Durchlaufverfahren |
US9754622B2 (en) | 2014-03-07 | 2017-09-05 | Venmill Industries Incorporated | Methods for optimizing friction between a pad and a disc in an optical disc restoration device |
US9620166B2 (en) | 2012-05-18 | 2017-04-11 | Venmill Industries | Methods for restoring optical discs |
DE102012213749A1 (de) * | 2012-08-03 | 2014-02-06 | Robert Bosch Gmbh | Schleiftellerfederplatte |
US9387569B2 (en) * | 2013-04-27 | 2016-07-12 | John Blick | Leather head finishing system having plurality of apertures and angled shoe rails |
US10449651B2 (en) * | 2017-05-16 | 2019-10-22 | Diamond Productions Ltd. | Quick attachment abrasive assembly for power concrete treating machines |
CN107262412A (zh) * | 2017-07-26 | 2017-10-20 | 谢剑和 | 一种刹车离合片生产用除尘装置 |
CN108406506A (zh) * | 2018-02-12 | 2018-08-17 | 广西农垦糖业集团星星制糖有限公司 | 一种截止阀拍修复机 |
CN109605198B (zh) * | 2018-11-30 | 2020-07-03 | 天津大学 | 一种用于机器人抛光的柔性抛光装置 |
EP3800008A1 (de) | 2019-10-02 | 2021-04-07 | Optikron GmbH | Vorrichtung und verfahren zum schleifen und/oder polieren planer flächen von werkstücken |
CN112222989A (zh) * | 2020-09-28 | 2021-01-15 | 万华化学集团电子材料有限公司 | 基于单晶硅片的可调式磨削装置及用于单晶硅片的磨削加工方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4825497A (en) * | 1986-03-24 | 1989-05-02 | Kyushu Hitachi Maxell, Ltd. | Disc cleaner |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4956944A (en) * | 1987-03-19 | 1990-09-18 | Canon Kabushiki Kaisha | Polishing apparatus |
JP3024417B2 (ja) * | 1992-02-12 | 2000-03-21 | 住友金属工業株式会社 | 研磨装置 |
US5334254A (en) * | 1992-10-21 | 1994-08-02 | Paul J. Gelardi | Non-abrasive disc cleaner |
US5643053A (en) * | 1993-12-27 | 1997-07-01 | Applied Materials, Inc. | Chemical mechanical polishing apparatus with improved polishing control |
WO1995029039A1 (fr) * | 1994-04-22 | 1995-11-02 | Kabushiki Kaisha Toshiba | Plaque support de surface de meulage separable et appareil associe |
JPH081504A (ja) | 1994-06-20 | 1996-01-09 | Hitachi Ltd | 塗装パテの研摩方法 |
US5607341A (en) * | 1994-08-08 | 1997-03-04 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
JP3329644B2 (ja) | 1995-07-21 | 2002-09-30 | 株式会社東芝 | 研磨パッド、研磨装置及び研磨方法 |
JP3007566B2 (ja) * | 1996-02-16 | 2000-02-07 | 株式会社共立 | ディスククリーナ |
TW378166B (en) * | 1996-10-25 | 2000-01-01 | Toshiba Machine Co Ltd | Headstock of a polishing machine |
JPH1190815A (ja) | 1997-09-25 | 1999-04-06 | Fujitsu Ltd | 研磨装置 |
US5827111A (en) * | 1997-12-15 | 1998-10-27 | Micron Technology, Inc. | Method and apparatus for grinding wafers |
JP3070917B2 (ja) * | 1998-06-16 | 2000-07-31 | 株式会社共立 | ディスククリーナ |
JP3124276B1 (ja) * | 2000-03-28 | 2001-01-15 | 株式会社共立 | ディスククリーナ |
-
2002
- 2002-03-04 ES ES02701709T patent/ES2287242T3/es not_active Expired - Lifetime
- 2002-03-04 JP JP2002569349A patent/JPWO2002070199A1/ja active Pending
- 2002-03-04 WO PCT/JP2002/001981 patent/WO2002070199A1/ja active IP Right Grant
- 2002-03-04 EP EP02701709A patent/EP1369200B1/de not_active Expired - Fee Related
- 2002-03-04 US US10/468,893 patent/US6869344B2/en not_active Expired - Lifetime
- 2002-03-04 DE DE60221502T patent/DE60221502T2/de not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4825497A (en) * | 1986-03-24 | 1989-05-02 | Kyushu Hitachi Maxell, Ltd. | Disc cleaner |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109531338A (zh) * | 2018-12-29 | 2019-03-29 | 重庆荣成玻璃制品有限公司 | 玻璃吹压生产装置 |
CN109531338B (zh) * | 2018-12-29 | 2020-06-30 | 重庆荣成玻璃制品有限公司 | 玻璃吹压生产装置 |
Also Published As
Publication number | Publication date |
---|---|
EP1369200A4 (de) | 2005-11-23 |
EP1369200A1 (de) | 2003-12-10 |
WO2002070199A1 (fr) | 2002-09-12 |
US20040072515A1 (en) | 2004-04-15 |
JPWO2002070199A1 (ja) | 2004-07-02 |
US6869344B2 (en) | 2005-03-22 |
DE60221502D1 (de) | 2007-09-13 |
DE60221502T2 (de) | 2008-04-17 |
ES2287242T3 (es) | 2007-12-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1369200B1 (de) | Vorrichtung zum polieren von optischen platten | |
US4179852A (en) | Method and apparatus for polishing floppy discs | |
US7275311B2 (en) | Apparatus and system for precise lapping of recessed and protruding elements in a workpiece | |
JPS63162155A (ja) | 研磨のための工作物取付け方法 | |
WO2004058451A1 (ja) | 情報記録媒体用ガラス基板及びその製造方法 | |
JP2002160147A (ja) | 板ガラスの端縁部研磨方法 | |
JP4780607B2 (ja) | 磁気ディスク用ガラス基板の製造方法、磁気ディスク用ガラス基板、及び磁気ディスクの製造方法。 | |
US6398623B1 (en) | Processing method of device and processing method of slider | |
JP2002100031A (ja) | 磁気記録媒体用ガラス基板、及び磁気記録媒体 | |
JP4905238B2 (ja) | 磁気記録媒体用ガラス基板の研磨方法 | |
JP2000185927A (ja) | 研磨方法及び研磨装置並びに磁気記録媒体用ガラス基板及び磁気記録媒体 | |
JP3782346B2 (ja) | 端面研磨方法 | |
WO2004022283A1 (ja) | 光ディスク研磨装置 | |
JP2008119809A (ja) | 円板状基板の製造方法 | |
JP2000288921A (ja) | 研磨用キャリア及び研磨方法並びに情報記録媒体用基板の製造方法 | |
JP2001191247A (ja) | ディスク状基板の両面研削方法、情報記録媒体用基板の製造方法、及び情報記録媒体の製造方法 | |
JP2000288920A (ja) | 研磨用キャリア及び研磨方法並びに情報記録媒体用基板の製造方法 | |
JPH11265506A (ja) | 磁気ディスク用ガラス基板及び磁気ディスク | |
JP2001246536A (ja) | 記録媒体ディスク原板の端部を鏡面仕上げする方法 | |
US7189150B2 (en) | System and method for edge blending hard drive head sliders | |
TWM287491U (en) | Cleaning apparatus for main-shaft CD-carrying plate of CD-ROM drive | |
US6783441B2 (en) | Apparatus and method for transferring a torque from a rotating hub frame to a one-piece hub shaft | |
WO2021193970A1 (ja) | キャリア及び基板の製造方法 | |
JP6215709B2 (ja) | 情報記録媒体用ガラス基板の製造方法 | |
JPH10134316A (ja) | 磁気ヘッドの加工方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20030903 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7B 24B 37/04 A Ipc: 7B 08B 1/04 B |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20051006 |
|
17Q | First examination report despatched |
Effective date: 20060210 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ELM INC. |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): DE ES FR GB IT |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REF | Corresponds to: |
Ref document number: 60221502 Country of ref document: DE Date of ref document: 20070913 Kind code of ref document: P |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2287242 Country of ref document: ES Kind code of ref document: T3 |
|
EN | Fr: translation not filed | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20080506 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20080328 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080331 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R082 Ref document number: 60221502 Country of ref document: DE Representative=s name: HOEGER, STELLRECHT & PARTNER PATENTANWAELTE MB, DE |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: ES Payment date: 20170214 Year of fee payment: 16 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20170427 Year of fee payment: 16 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20180228 Year of fee payment: 17 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 60221502 Country of ref document: DE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20181002 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20190904 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180305 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20190304 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20190304 |