Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B08—CLEANING
  • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
  • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
  • B08B3/04—Cleaning involving contact with liquid
  • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/43—Solvents
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
  • C11D1/02—Anionic compounds
  • C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
  • C11D1/123—Sulfonic acids or sulfuric acid esters; Salts thereof derived from carboxylic acids, e.g. sulfosuccinates
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
  • C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
  • C11D17/0017—Multi-phase liquid compositions
  • C11D17/0021—Aqueous microemulsions
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/50—Solvents
  • C11D7/5036—Azeotropic mixtures containing halogenated solvents
  • C11D7/5068—Mixtures of halogenated and non-halogenated solvents
  • C11D7/5077—Mixtures of only oxygen-containing solvents
  • C11D7/5081—Mixtures of only oxygen-containing solvents the oxygen-containing solvents being alcohols only
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
  • C11D2111/10—Objects to be cleaned
  • C11D2111/14—Hard surfaces
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
  • C11D2111/40—Specific cleaning or washing processes
  • C11D2111/44—Multi-step processes
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S134/00—Cleaning and liquid contact with solids
  • Y10S134/902—Semiconductor wafer

Definitions

• the present invention relates to a cleaning method, more precisely it relates to a method for removing organic and / or mineral soiling from a solid surface (or substrate).
• a cleaning process making it possible to remove all organic and / or mineral soiling and traces of water from a solid surface (or substrate) characterized in that it comprises the following steps: a) cleaning of said solid surface by means of a cleaning composition of microemulsion type, b) draining said cleaned surface, c) rinsing said drained surface with an organic solvent or a mixture of organic solvents of low boiling point, and d) drying of said rinsed surface with the organic solvent or the mixture of organic solvents used in c).
• the cleaning composition of microemulsion type used according to the invention has the advantage of being able to effectively remove from the solid surface to be cleaned any organic and / or mineral soiling.
• This cleaning composition of microemulsion type is described in patent application FR 2 795 088. It comprises in particular:
• R 1 and R 2 each independently represent a linear or branched C 5 -C 20 alkyl radical
• - M is a cation chosen from Na ⁇ , K ⁇ and NR ⁇ R each independently representing hydrogen or a C 1 -C 4 alkyl radical; (A) + (B) + (C) representing 100 parts by weight.
• the cleaning step a) can be carried out in an immersion tank or a shower bath in combination with ultrasonic waves, vibrations or mechanical shaking.
• the cleaning composition of microemulsion type will be used at a temperature ranging from room temperature (about 20 ° C) to 60 ° C and, preferably, at a temperature between 20 ° C and 40 ° C.
• the cleaning time of the solid surface - step a) - depends on the type of soiling and its adhesion to the solid surface.
• the organic solvent (s) (B) contained in the cleaning composition of microemulsion type used in step a) are preferably chosen from aliphatic hydrocarbons, monoethers of alkylene glycols and monoethers of dialkylene glycols.
• Aliphatic hydrocarbons can be linear, branched, cyclic hydrocarbons or combinations thereof. They contain in particular from 3 to 24 carbon atoms, preferably 6 to 24 carbon atoms. Examples of commercially available aliphatic hydrocarbons are:
• the monoethers of the alkylene glycols can in particular be the monoethers of propylene glycol C 4 -C 25 , such as the monomethyl ether of propylene glycol (PM), the monoethyl ether of propylene glycol (PE), the mono-n ether.
• PM monomethyl ether of propylene glycol
• PE monoethyl ether of propylene glycol
• PNP propylene glycol propyl
• PTB propylene glycol mono-tert.-butyl ether
• PPB propylene glycol mono-n-butyl ether
• PNB propylene glycol mono-hexyl ether
• the monoethers of the dialkylene glycols can for example be the monomethyl ether of dipropylene glycol (DPM), the mono-n-propyl ether of dipropylene glycol (DPNP), the mono-tert.-butyl ether of dipropylene glycol (DPTB) , the mono-n-butyl ether of dipropylene glycol (DPNB) and the monohexyl ether of dipropylene glycol; and the n-butyl ether of diethylene glycol (Butyl Diglycol Ether - BDG), the hexyl ether of diethylene glycol and the octyl ether of diethylene glycol.
• the composition which can be used according to the invention can also contain:
• At least one sequestering agent such as ethylene diamine tetra acetic acid (EDTA) and its salts, in a proportion of 0.01 to 0.1 parts by weight per 100 parts by weight of (A) + (B) + (C); and or
• At least one anti-corrosion agent chosen in particular from organic acids of RCOOH type, R being a C 4 hydrocarbon radical- C 24 , and the amines, in an amount in particular from 0.01 to 0.5 part by weight per 100 parts by weight of (A) + (B) + (C); and or
• At least one additive in the usual quantities, chosen from disinfectants, fungicides (quaternary ammonium salts) and biocides (organic peroxides, hydrogen peroxide, active halogen compounds, inorganic phenolic salts, ammonium salts quaternaries, organometallic derivatives, organosulfur derivatives); and or
• the cleaned solid surface is subjected to a draining step b) which consists in removing said cleaned solid surface from the cleaning composition and dripping it at room temperature for a period ranging from 30 seconds to 1 minute.
• the drained solid surface is subjected to a rinsing step c) which is carried out with an organic solvent or a mixture of organic solvents, inert, preferably non-flammable and of low boiling point.
• This rinsing step is carried out at a temperature 10 to 15 ° C lower, preferably 5 ° C lower than the boiling point of the organic solvent or the most volatile compound in the mixture of organic solvents used for said rinsing step .
• azeotropic or quasi-azeotropic mixtures will be used in particular.
• organic solvent or mixture of organic solvents with a low boiling point is used to denote an organic solvent or a mixture of organic solvents having a boiling point at most equal to 90 ° C. and preferably between 25 ° C. and 70 ° C.
• the organic solvent or the mixture of organic solvents can in particular be chosen from: - aliphatic alcohols such as methanol, ethanol, isopropanol, butanol;
• aliphatic esters such as ethyl acetate, butyl acetate; methyl formate;
• - aliphatic ketones such as acetone, methyl ethyl ketone
• - aliphatic ethers such as tetrahydrofuran (THF), diethyl ether, dipropyl ether, dibutyl ether;
• HFCs hydrofluorocarbons
• hydrofluorochlorocarbons such as 1, 1-dichloro-1-fluoroethane (141 b), hydrofluoroethers such as perfluoromethyl ether (C 4 F 9 OCH 3 ); or the mixture of at least two of the above-mentioned compounds.
• azeotropic or quasi-azeotropic mixtures of at least two of the abovementioned compounds will be used.
• azeotropic or quasi-azeotropic mixtures which can be used according to the present invention as a rinsing solvent, there may be mentioned:
• the azeotropes mentioned in patent application FR 2 781 499-1 A1 such as the binary azeotrope 4310 mee / 365 mfc (9/91), (the figures in parentheses indicate the percentages by weight respectively of the constituents of the azeotrope) , the ternary azeotrope 4310 mee / 365 mfc / CH 3 OH (12/83/5);
• the azeotropes mentioned in patent application FR 2 792 648 such as the binary azeotrope 4310 mee / trichlorethylene (89/1 1), the ternary azeotrope 4310 mee / trichlorethylene / CH 3 OH (84.5 / 9.5 / 6), the ternary azeotrope 4310 mee / trichlorethylene / isopropanol (88.2 / 9.6 / 2.2), the ternary azeotrope 4310 mee / trichlorethylene / methylal (87/9/4);
• - the azeotropes mentioned in patent application FR 2 792 647 such as the quaternary azeotrope 365 mfc / CH 2 CI 2 / CH 3 OH / 4310 mee (56.2 / 39.8 / 3.5 / 0.5) ;
• - the azeotropes or quasi-azeotropes mentioned in patent application FR 2 766 836 such as the ternary quasi-azeotrope 365 mfc / CH 2 CI 2 / CH 3 OH (89/7/4);
• - the azeotropes mentioned in patent application FR 2 759 090 such as the binary azeotrope 4310 mee / CH 2 CI 2 (50/50).
• the ternary azeotrope 4310 mee / 365 mfc / CH 3 OH (12.83.5), the binary azeotrope .4310 mee / CH 2 CI 2 (50/50) is particularly preferred.
• the drying step d) is carried out by exposing the rinsed solid surface to the steam produced by the heating of the organic solvent or of the mixture of organic solvents used in the rinsing step c). In the case of a mixture of non-azeotropic solvents, the rinsed surface will be dried with the vapor of the most volatile compound.
• the drying time is at least 20 seconds and preferably between 30 seconds and 1 minute.
• the method according to the present invention is particularly applicable for the removal of organic and / or mineral soiling from solid surfaces of metal parts, ceramics, glasses, plastics, printed circuits (electronic parts, semi-finished parts drivers).
• the process of the present invention makes it possible to obtain clean solid surfaces, free of any organic and / or mineral soiling as well as traces of water.
• the parts cleaned using the method according to the invention can be used immediately for other treatment operations such as, for example, painting, electroplating.
• the device for implementing the method according to the invention can be constituted by the sequence of the following devices:
• This tank can be provided with heating means and means making it possible to produce ultrasound.
• the part (or parts) to be cleaned, placed on a basket, is immersed in a bath of the microemulsion type composition at a temperature and for a duration as defined above.
• the part is then removed from the bath and then drained, preferably above an inclined plane which allows the return of the microemulsion type composition in the cleaning tank and then it is directed to the rinse / drying cycle. Rinsing steps. - drying are preferably carried out in a commercial machine comprising at least two tanks provided with heating and condensing means.
• a first tank optionally provided with means for producing ultrasound
• the part is rinsed by immersion in a bath of organic solvent or of a mixture of organic solvents brought to a temperature as defined above. Then, the part is removed from said bath and then conveyed to the second tank to be dried there.
• This second tank contains the organic solvent or the mixture of organic solvents used in the previous rinsing tank which is brought to its boiling point.
• the part is therefore dried by the vapors of the organic solvent or of the mixture of organic solvents used for rinsing. These vapors are condensed by means of a refrigerated condensing coil and recycled into the liquid rinsing tank.
• the following examples illustrate the invention.
• DPNB dipropylene glycol

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• Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Life Sciences & Earth Sciences (AREA)
• Engineering & Computer Science (AREA)
• Oil, Petroleum & Natural Gas (AREA)
• Wood Science & Technology (AREA)
• Organic Chemistry (AREA)
• General Chemical & Material Sciences (AREA)
• Detergent Compositions (AREA)
• Cleaning By Liquid Or Steam (AREA)
• Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
• Drying Of Solid Materials (AREA)

Applications Claiming Priority (3)

Publications (2)

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• 2001
  • 2001-01-09 FR FR0100228A patent/FR2819201B1/fr not_active Expired - Fee Related
• 2002
  • 2002-01-07 US US10/250,914 patent/US7417018B2/en not_active Expired - Fee Related
  • 2002-01-07 EP EP02710948A patent/EP1349678B1/de not_active Expired - Lifetime
  • 2002-01-07 WO PCT/FR2002/000035 patent/WO2002055223A1/fr active IP Right Grant
  • 2002-01-07 KR KR10-2003-7009194A patent/KR100502532B1/ko active IP Right Grant
  • 2002-01-07 AU AU2002229853A patent/AU2002229853B2/en not_active Ceased
  • 2002-01-07 CN CNB028062698A patent/CN1236866C/zh not_active Expired - Fee Related
  • 2002-01-07 ES ES02710948T patent/ES2253518T3/es not_active Expired - Lifetime
  • 2002-01-07 AT AT02710948T patent/ATE313390T1/de not_active IP Right Cessation
  • 2002-01-07 CA CA002434183A patent/CA2434183C/fr not_active Expired - Fee Related
  • 2002-01-07 JP JP2002555945A patent/JP2004525753A/ja active Pending
  • 2002-01-07 DE DE60208154T patent/DE60208154D1/de not_active Expired - Fee Related

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