EP1097261B1 - Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung - Google Patents

Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung Download PDF

Info

Publication number
EP1097261B1
EP1097261B1 EP99931178A EP99931178A EP1097261B1 EP 1097261 B1 EP1097261 B1 EP 1097261B1 EP 99931178 A EP99931178 A EP 99931178A EP 99931178 A EP99931178 A EP 99931178A EP 1097261 B1 EP1097261 B1 EP 1097261B1
Authority
EP
European Patent Office
Prior art keywords
ions
chromium
galvanic bath
current density
chromium layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP99931178A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1097261A2 (de
Inventor
Klaus Szameitat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cromotec Oberflaechentechnik GmbH
Original Assignee
Cromotec Oberflaechentechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cromotec Oberflaechentechnik GmbH filed Critical Cromotec Oberflaechentechnik GmbH
Publication of EP1097261A2 publication Critical patent/EP1097261A2/de
Application granted granted Critical
Publication of EP1097261B1 publication Critical patent/EP1097261B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N7/00Shells for rollers of printing machines
    • B41N7/04Shells for rollers of printing machines for damping rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N2207/00Location or type of the layers in shells for rollers of printing machines
    • B41N2207/02Top layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N2207/00Location or type of the layers in shells for rollers of printing machines
    • B41N2207/10Location or type of the layers in shells for rollers of printing machines characterised by inorganic compounds, e.g. pigments

Definitions

  • the present invention relates to a galvanic bath and a method for producing structured hard chrome layers and its use for producing structured hard chrome layers on components. It has long been common state of the art to provide objects of technology or general use with surface coatings by means of galvanic processes. This is necessary in order to give the objects special functional and / or decorative surface properties, such as hardness, corrosion resistance, metallic appearance, gloss, etc.
  • a bath that contains at least the metal to be deposited as a salt is converted into metal deposited by means of direct current on the object connected as cathode.
  • the object to be coated usually consists of a metallic material. If the base material is not electrically conductive per se instead, the surface can be made conductive by a thin metallization.
  • Galvanic baths containing nickel or chrome are mostly used in technical applications to produce particularly hard, mechanically resistant layers.
  • an electroplated hard chrome layer has a rough surface structure.
  • decorative tops for example, a matt appearance or a pleasant, not smooth "handle" should be created.
  • rough hard chrome layers or structured chrome layers fulfill certain functional properties.
  • printing drums, ink rollers and, in particular, dampening cylinders with a special, rough surface are required for printing machines. Chromium-plated tools can be used in forming technology to give the workpiece to be machined a structured surface.
  • objects with a hard chrome coating and a rough surface structure are obtained by mechanical processing, such as grinding, sandblasting, spark erosion, etc., or by chemical etching processes before, between or after the chrome plating.
  • mechanical processing such as grinding, sandblasting, spark erosion, etc.
  • chemical etching processes before, between or after the chrome plating.
  • DE 42 11 881 discloses a galvanic method for applying surface coatings to machine components, in which, for example, chromium is deposited in a structured form.
  • at least one initial pulse and at least one subsequent pulse of voltage or current and certain guidance of the voltage or current function initially cause nucleation on the surface of the machine component and subsequent growth of the germs of the separating material.
  • the chromium is deposited in the form of statistically evenly distributed, dendritic or approximately hemispherical (dome-shaped) elevations.
  • EP 0 722 515 contains a further development of the method according to DE 42 11 881, the increase in electrical voltage or current density taking place in stages.
  • DE 34 02 554 C2 describes a saturated aliphatic sulfonic acid with a maximum of two carbon atoms and a maximum of six sulfonic acid groups or salts or halogen acid derivatives thereof for increasing the current efficiency in the electrodeposition of hard chromium on a workpiece made of steel or aluminum alloy from an aqueous, chromic acid and Use non-caustic electrolytes containing sulfuric acid.
  • US-A-5 176 813 discloses a process for the electrodeposition of chromium from a galvanic bath with a lead-containing anode in the absence of monosulfonic acid, the galvanic bath containing chromic acid, Contains sulfate ions and at least one optionally halogenated alkylpolysulfonic acid or its salt with 1 to 3 carbon atoms.
  • the object of the present invention is therefore to simplify the production of structured hard chrome layers considerably and, in particular, to enable structure layers with a more uniform surface topography and significantly higher roughness values.
  • the galvanic bath according to the invention preferably contains chromium (VI) ions in an amount which corresponds to 200 to 250 g / l chromic acid anhydride.
  • the chromium (VI) ion-providing compound is preferably selected from chromic anhydride (CrO 3 ) and / or alkali dichromates such as Na 2 Cr 2 O 7 and K 2 Cr 2 O 7 . Of the alkali dichromates, K 2 Cr 2 O 7 is preferred.
  • the chromium (VI) ion-providing compound is chromic anhydride.
  • part of the chromium (VI) ion-providing compound is one or more alkali dichromate (s), preferably potassium dichromate.
  • alkali dichromate preferably potassium dichromate.
  • preferably less than 30% and particularly preferably less than 15% of the chromium (VI) ions are supplied by alkali dichromate.
  • the molar concentration ratio of chromium (VI) ions to sulfate ions in the electroplating bath is preferably 100: 1 to 105: 1.
  • the soluble salts of sulfuric acid which can be used are preferably selected from sodium sulfate, potassium sulfate, lithium sulfate, ammonium sulfate, magnesium sulfate, strontium sulfate, aluminum sulfate and potassium aluminum sulfate. Strontium sulfate is particularly preferred
  • the bath comprises 2-hydroxyethanesulfonate ions in an amount corresponding to 0.07 to 1.5 / l of the sodium salt.
  • the 2-hydroxyethanesulfonate ions contained in the galvanic bath according to the invention can be provided by the 2-hydroxyethanesulfonic acid itself or a salt thereof, preferably the sodium salt.
  • the electroplating chrome bath according to the invention can be used in the electroplating systems usually used in this technology and with the usual working methods as well as for the usual coating purposes on the normally provided basic materials.
  • Such base materials can be, for example, objects made of conductive materials such as metal, in particular steel, and metallized, non-conductive objects.
  • the galvanic bath according to the invention is expediently used at temperatures between 30 and 70 ° C.
  • chrome layers with a largely uniform dome-shaped microstructure and roughness values Rz of up to approximately 40 ⁇ m can be produced.
  • Such a deposition is preferably carried out in the temperature range 40 and 50 ° C., preferably between 42 and 48 ° C. and particularly preferably between 44 and 46 ° C.
  • Such a deposition is preferably carried out in the temperature range between 51 and 61 ° C., preferably between 53 and 59 ° C. and particularly preferably between 55 and 57 ° C.
  • chrome bath according to the invention can be used to deposit directly onto the base material, for example steel. Galvanic precoatings, especially with nickel, are not necessary.
  • the latter In order to deposit a structured hard chrome layer on an object, the latter, when connected as a cathode, is introduced into the galvanic bath according to the invention. It is sufficient if the object is ground to size. Further surface processing and in particular electroplating are not necessary. For a particularly uniform coating, it is advantageous to continuously circulate the bath and / or to keep the object to be coated rotating in the bath.
  • the current density can be up to 50 A / dm 2 .
  • a deposition time TP 10 to 15 minutes
  • a base layer thickness of 6-9 ⁇ m can be achieved.
  • a waiting time TW is expediently inserted before the start of the deposition while the object takes on the temperature of the bath. This time can be 1 to 10 minutes depending on the size of the object and the temperature difference.
  • the current density can be up to 30 A / dm 2 . 1 to 2 minutes is sufficient as the duration TP.
  • the base layer obtained generally has a microhardness of 800 to 950 HV 0.1.
  • the actual deposition of the structured chrome layer takes place from the same bath.
  • the bath temperature is to be set to 30 to 50 ° C., preferably to 40 to 50 ° C., particularly preferably to 42 to 48 ° C. and most preferably to 44 to 46 ° C.
  • a waiting time TW and an activation step with the parameters already mentioned before the start of the deposition.
  • the deposition is expediently carried out at a current density of 75 to 90 A / dm 2 . With a deposition time TP of 10 to 30 minutes, a thickness of the structural layer of 14 to 40 ⁇ m can be achieved.
  • the structure layer obtained normally has a microhardness of 850 to 900 HV 0.1.
  • the structure layer has a roughness Rz of up to about 40 ⁇ m.
  • the structural chrome layer is coated with a thin, smooth hard chrome layer, the functional layer, again from the same bath.
  • the bath is brought to a temperature in the range from 50 to 70 ° C., preferably from 51 to 61 ° C., particularly preferably from 53 to 59 ° C. and most preferably from 55 to 57 ° C. and then at a current density up to 50 A / dm 2 deposited.
  • a deposition time TP of 5 to 15 minutes, a layer thickness of the functional layer of 3 to 9 ⁇ m can be achieved.
  • the functional layer normally has a microhardness of 1,000 to 1050 HV 0.1.
  • the final thin hard chrome layer practically does not change the roughness of the structural layer.
  • the ramp time TR can be 1 to 5 minutes each.
  • the method is distinguished by a particularly simple current density control.
  • it is simply sufficient to linearly increase the current density to the respective setpoint or the respective descent in the respective steps.
  • otherwise required, technically complex and thus expensive current and voltage regulating units and their complex programming are not required.
  • it can also be favorable and advantageous in individual cases to regulate the current density in steps to the maximum value or down again.
  • a structured hard chrome layer is obtained on the surface of the object, which is characterized by a particularly dense and uniform distribution of very well-formed dome-shaped elevations.
  • a layer with a peak number of 75 to 100 / cm can be obtained.
  • roughness values Rz up to 40 ⁇ m can be achieved.
  • the method according to the invention can be used to generate a chrome layer on components, in particular machine components.
  • the method is used to produce a structured hard chrome layer on machine components in sliding contact with one another, in particular pistons, cylinders, bushings and axle bearings, on rollers, drums or cylinders in the graphics industry, in particular ink rollers and dampening cylinders, and on tools ,
  • 100 l of bath contain 20.450 kg of chromic anhydride, 2.500 kg of potassium dichromate, 0.550 kg Strontium sulfate and 3.5 g of 2-hydroxyethanesulfonic acid sodium salt. This results in the concentration values in the bath of 222 g / l chromic anhydride, 2.2 g / l free sultate and 0.035 g / l 2-hydroxyethanesulfonic acid sodium salt.
  • the structure chrome layer obtained has a roughness Rz of 35 to 40 ⁇ m and a peak number of 75-100 / cm with an extremely uniform distribution of very well-formed dome-shaped elevations.
  • FIG. 1 shows the SEM image of the surface of the roll cylinder, which is chromium-plated by way of example with the chrome bath according to the invention and according to the method according to the invention, at a magnification of 30: 1.
  • the dense and even distribution of dome-shaped elevations can be clearly seen.
  • 3 shows the SEM image of a cross section through the layer at an enlargement of 400: 1.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cosmetics (AREA)
EP99931178A 1998-06-26 1999-06-24 Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung Expired - Lifetime EP1097261B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19828545A DE19828545C1 (de) 1998-06-26 1998-06-26 Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung
DE19828545 1998-06-26
PCT/EP1999/004412 WO2000000672A2 (de) 1998-06-26 1999-06-24 Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung

Publications (2)

Publication Number Publication Date
EP1097261A2 EP1097261A2 (de) 2001-05-09
EP1097261B1 true EP1097261B1 (de) 2003-01-29

Family

ID=7872131

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99931178A Expired - Lifetime EP1097261B1 (de) 1998-06-26 1999-06-24 Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung

Country Status (12)

Country Link
US (1) US6447666B1 (cs)
EP (1) EP1097261B1 (cs)
JP (1) JP2002519514A (cs)
KR (1) KR100573531B1 (cs)
CN (1) CN1191392C (cs)
AT (1) ATE231933T1 (cs)
BR (1) BR9912214A (cs)
CA (1) CA2334708A1 (cs)
CZ (1) CZ299000B6 (cs)
DE (2) DE19828545C1 (cs)
RU (1) RU2202005C2 (cs)
WO (1) WO2000000672A2 (cs)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3438695B2 (ja) 2000-02-29 2003-08-18 Jfeスチール株式会社 クロムめっきロールの製造方法
AT4737U1 (de) * 2001-01-15 2001-11-26 Plansee Ag Pulvermetallurgisches verfahren zur herstellung hochdichter formteile
US6736954B2 (en) * 2001-10-02 2004-05-18 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
DE10255853A1 (de) 2002-11-29 2004-06-17 Federal-Mogul Burscheid Gmbh Herstellung strukturierter Hartchromschichten
DE10302107A1 (de) * 2003-01-21 2004-07-29 Fuchs Technology Ag Zylinderoberfläche
ES2726013T3 (es) * 2003-05-12 2019-10-01 Arkema Inc Soluciones electrolíticas de ácido sulfónico de pureza elevada
DE102004019370B3 (de) 2004-04-21 2005-09-01 Federal-Mogul Burscheid Gmbh Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung
CN100359048C (zh) * 2004-12-27 2008-01-02 西安建筑科技大学 一种导电辊修复方法
DE102005022692A1 (de) * 2005-05-18 2006-11-23 Robert Bosch Gmbh Verfahren zur Herstellung beschichteter Oberflächen und Verwendung derselben
CH698493B1 (de) * 2006-06-01 2009-08-31 Hartchrom Ag Bauteil aus zwei kraftschlüssig verbundenen Werkstücken.
DE102006025847A1 (de) * 2006-06-02 2007-12-06 Merck Patent Gmbh Verwendung von Phosphinsäure in der Galvanotechnik
DE102006042076A1 (de) * 2006-09-05 2008-03-20 Goldschmidt Tib Gmbh Ein neues Additiv für Chromelektrolyte
DE102006055251A1 (de) * 2006-11-23 2008-05-29 Mahle International Gmbh Zweiteiliger Kolben für einen Verbrennungsmotor
RU2392356C2 (ru) * 2008-01-10 2010-06-20 Владимир Фёдорович Воржев Электролит хромирования (варианты)
DE102008017270B3 (de) 2008-04-04 2009-06-04 Federal-Mogul Burscheid Gmbh Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement
EP2149447A1 (de) 2008-07-29 2010-02-03 Alcan Technology & Management Ltd. Verfahren zur Herstellung einer Materialbahn mit Oberflächenstruktur
CN101372756B (zh) * 2008-09-28 2010-06-09 武汉船用机械有限责任公司 一种大直径球冠工件球冠面的镀铬方法
EP2440691B1 (en) * 2009-06-08 2019-10-23 Modumetal, Inc. Electrodeposited, nanolaminate coatings and claddings for corrosion protection
AT507785B1 (de) 2009-08-04 2010-08-15 Univ Wien Tech Verfahren zur herstellung strukturierter chromschichten
DE102009028223A1 (de) 2009-08-04 2011-02-24 Koenig & Bauer Aktiengesellschaft Verfahren und Herstellung strukturierter Chromschichten
CN101812708B (zh) * 2010-04-20 2011-08-24 安徽华东光电技术研究所 一种钼芯杆镀铬的方法
CN103952731B (zh) * 2014-04-29 2016-05-04 上海交通大学 凸包状仿生织构化铬镀层的电沉积制备方法及其用途
DE102014113000A1 (de) * 2014-09-10 2016-03-10 Rieter Ingolstadt Gmbh Beschichtung für einen Drehteller
RU2603935C1 (ru) * 2015-06-04 2016-12-10 Закрытое акционерное общество "Поволжский Центр Гальваники" Способ беспористого твёрдого хромирования деталей из чугунов и сталей
JP6650112B2 (ja) * 2016-04-08 2020-02-19 トヨタ紡織株式会社 成形型の製造方法
CN110257883A (zh) * 2019-07-22 2019-09-20 嘉兴怀莲贸易有限公司 一种高耐磨磁悬浮轴承
EP4012074A1 (de) * 2020-12-14 2022-06-15 topocrom systems AG Oberflächenbeschichtung und verfahren zu ihrer herstellung
CN114875466B (zh) * 2022-06-07 2024-03-22 中国航发航空科技股份有限公司 一种不可分解轴承零件的尺寸修复工装夹具及修复方法
KR102688362B1 (ko) * 2023-10-27 2024-07-24 조성강 강도 및 도금 효율성이 개선된 복합 크롬 다이아몬드 도금을 위한 전해질 용액

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3506548A (en) 1966-09-23 1970-04-14 Allied Res Prod Inc Electrodeposition of nickel
DE3402554A1 (de) * 1984-01-26 1985-08-08 LPW-Chemie GmbH, 4040 Neuss Abscheidung von hartchrom auf einer metallegierung aus einem waessrigen, chromsaeure und schwefelsaeure enthaltenden elektrolyten
DE3424528A1 (de) 1984-07-04 1986-01-09 Hoechst Ag, 6230 Frankfurt Verfahren zum gleichzeitigen aufrauhen und verchromen von stahlplatten als traeger fuer lithographische anwendungen
US4588481A (en) 1985-03-26 1986-05-13 M&T Chemicals Inc. Chromium plating bath for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching
SU1530642A1 (ru) * 1987-12-30 1989-12-23 Научно-исследовательский институт санитарной техники Электролит хромировани
US5176813A (en) * 1989-11-06 1993-01-05 Elf Atochem North America, Inc. Protection of lead-containing anodes during chromium electroplating
DE4211881C2 (de) * 1992-04-09 1994-07-28 Wmv Ag Verfahren zum elektrochemischen Aufbringen einer strukturierten Oberflächenbeschichtung
RU2094540C1 (ru) * 1993-07-13 1997-10-27 Воронежский Политехнический Институт Электролит хромирования
CN1044395C (zh) * 1993-10-07 1999-07-28 罗马包-控股公开股份有限公司 表面覆层的电镀方法
DE4432512C2 (de) 1994-09-13 1998-12-17 Lpw Chemie Gmbh Verwendung eines Verfahrens zur elektrolytischen Abscheidung von Chromschichten

Also Published As

Publication number Publication date
CN1191392C (zh) 2005-03-02
WO2000000672A3 (de) 2000-06-29
ATE231933T1 (de) 2003-02-15
US6447666B1 (en) 2002-09-10
EP1097261A2 (de) 2001-05-09
CZ299000B6 (cs) 2008-04-02
KR100573531B1 (ko) 2006-04-26
CN1307652A (zh) 2001-08-08
CZ20004789A3 (cs) 2001-12-12
KR20010072627A (ko) 2001-07-31
DE19828545C1 (de) 1999-08-12
RU2202005C2 (ru) 2003-04-10
DE59904174D1 (de) 2003-03-06
CA2334708A1 (en) 2000-01-06
JP2002519514A (ja) 2002-07-02
WO2000000672A2 (de) 2000-01-06
BR9912214A (pt) 2001-04-10

Similar Documents

Publication Publication Date Title
EP1097261B1 (de) Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung
EP0565070B1 (de) Verfahren zum galvanischen Aufbringen einer Oberflächenbeschichtung
EP0054165B1 (de) Druckwalze in Verbundkörperbauweise
DE3031501C2 (cs)
DE2462449A1 (de) Verfahren zum kontinuierlichen elektrolytischen eloxieren und galvanisieren von aluminium sowie vorrichtung zur durchfuehrung dieses verfahrens
DE19638609A1 (de) Verfahren zur Herstellung einer porösen galvanogeformten Schale
DE3933896C1 (cs)
EP3241929A1 (de) Beschichtung von funktionsteilen aus metall
EP1565596B1 (de) Herstellung strukturierter hartchromschichten
EP1738000B1 (de) Herstellung einer strukturierten hartchromschicht und herstellung einer beschichtung
DE2600654B2 (de) Verfahren zur gleichzeitigen kathodischen abscheidung einer chromschicht und einer darueberliegenden schicht aus hydratisierten chromoxiden auf stahlblechen
DE2545654C2 (de) Galvanisches Bad und Verfahren zum Abscheiden von Chrom oder einer Chromlegierung und Herstellung eines solchen Bades
DE834312C (de) Verfahren zur Herstellung von Chromueberzuegen mit einem Netzwerk aus Rissen
EP4012074A1 (de) Oberflächenbeschichtung und verfahren zu ihrer herstellung
DE1771241A1 (de) Plattierte Gegenstaende
DE2618638A1 (de) Galvanisches verfahren zur abscheidung von zinnenthaltenden legierungen, sowie entsprechendes elektrolysebad
DE69207704T2 (de) Verfahren zur Elektroverzinkung eines Metallbleches
DE579064C (de) Verfahren zur Herstellung von Tiefdruckwalzen oder -zylindern
DE2237834A1 (de) Gegenstand aus einem metallischen grundkoerper mit einer metallischen beschichtung
DE2165329A1 (de) Verfahren zum schnellen galvanischen Niederschlagen von Nickel
DE10060127B4 (de) Elektrolytisches Eisenabscheidungsbad und Verfahren zum elektrolytischen Abscheiden von Eisen und Anwendungen des Verfahrens
DD242829A1 (de) Verfahren zur oberflaechenbehandlung von stahlzylindern zur metallfolienerzeugung
DE1013938B (de) Verfahren und Vorrichtung zum galvanischen Abscheiden von Metallueberzuegen, insbesondere zum Hartverchromen
EP0146702A1 (de) Verfahren zum kontinuierlichen elektrolytischen Abscheiden von Metallen
DE1176956B (de) Verfahren zum mehrstufigen galvanischen Abscheiden glaenzender Nickelueberzuege

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20001019

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT CH DE FR GB IT LI NL SE

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Designated state(s): AT CH DE FR GB IT LI NL SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20030129

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20030129

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: E. BLUM & CO. PATENTANWAELTE

Ref country code: CH

Ref legal event code: EP

REF Corresponds to:

Ref document number: 59904174

Country of ref document: DE

Date of ref document: 20030306

Kind code of ref document: P

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20030429

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 20030407

ET Fr: translation filed
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20030624

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20031030

REG Reference to a national code

Ref country code: CH

Ref legal event code: PFA

Owner name: CROMOTECH OBERFLAECHENTECHNIK GMBH

Free format text: CROMOTECH OBERFLAECHENTECHNIK GMBH#LUCAS-CRANACH-STRASSE 7#70771 LEINFELDEN-ECHTERDINGEN (DE) -TRANSFER TO- CROMOTECH OBERFLAECHENTECHNIK GMBH#LUCAS-CRANACH-STRASSE 7#70771 LEINFELDEN-ECHTERDINGEN (DE)

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20090615

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20090618

Year of fee payment: 11

REG Reference to a national code

Ref country code: CH

Ref legal event code: PUE

Owner name: HARTCHROM AG

Free format text: CROMOTECH OBERFLAECHENTECHNIK GMBH#LUCAS-CRANACH-STRASSE 7#70771 LEINFELDEN-ECHTERDINGEN (DE) -TRANSFER TO- HARTCHROM AG#SCHULSTRASSE 70#9323 STEINACH (CH)

Ref country code: CH

Ref legal event code: NV

Representative=s name: ISLER & PEDRAZZINI AG

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20100624

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20110228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100630

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 59904174

Country of ref document: DE

Representative=s name: LOESENBECK UND KOLLEGEN, DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100624

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 59904174

Country of ref document: DE

Representative=s name: LOESENBECK UND KOLLEGEN, DE

Effective date: 20110722

Ref country code: DE

Ref legal event code: R081

Ref document number: 59904174

Country of ref document: DE

Owner name: HARTCHROM AG, CH

Free format text: FORMER OWNER: CROMOTECH OBERFLAECHENTECHNIK GMBH, 70771 LEINFELDEN-ECHTERDINGEN, DE

Effective date: 20110722

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20160621

Year of fee payment: 18

Ref country code: CH

Payment date: 20160613

Year of fee payment: 18

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 59904174

Country of ref document: DE

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170630

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170630

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20180103