EP1097261B1 - Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung - Google Patents
Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung Download PDFInfo
- Publication number
- EP1097261B1 EP1097261B1 EP99931178A EP99931178A EP1097261B1 EP 1097261 B1 EP1097261 B1 EP 1097261B1 EP 99931178 A EP99931178 A EP 99931178A EP 99931178 A EP99931178 A EP 99931178A EP 1097261 B1 EP1097261 B1 EP 1097261B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- ions
- chromium
- galvanic bath
- current density
- chromium layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 55
- 239000011651 chromium Substances 0.000 title claims abstract description 22
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title description 3
- 238000000034 method Methods 0.000 claims abstract description 29
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 claims abstract description 18
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 15
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 11
- -1 2-hydroxyethane sulfonate ions Chemical class 0.000 claims abstract description 10
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 7
- 159000000000 sodium salts Chemical class 0.000 claims abstract description 6
- 239000007864 aqueous solution Substances 0.000 claims abstract description 3
- 238000001556 precipitation Methods 0.000 claims abstract 4
- 230000008021 deposition Effects 0.000 claims description 20
- 239000002585 base Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 claims description 8
- 230000004913 activation Effects 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 5
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 claims description 4
- 239000001117 sulphuric acid Substances 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 2
- 229910021653 sulphate ion Inorganic materials 0.000 claims 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 2
- 229910052700 potassium Inorganic materials 0.000 claims 2
- 239000011591 potassium Substances 0.000 claims 2
- 235000011149 sulphuric acid Nutrition 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 239000004411 aluminium Substances 0.000 claims 1
- 239000001164 aluminium sulphate Substances 0.000 claims 1
- 235000011128 aluminium sulphate Nutrition 0.000 claims 1
- 238000013016 damping Methods 0.000 claims 1
- BUACSMWVFUNQET-UHFFFAOYSA-H dialuminum;trisulfate;hydrate Chemical compound O.[Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O BUACSMWVFUNQET-UHFFFAOYSA-H 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 229910052712 strontium Inorganic materials 0.000 claims 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 48
- 238000000151 deposition Methods 0.000 description 17
- 238000000926 separation method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000002346 layers by function Substances 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- LADXKQRVAFSPTR-UHFFFAOYSA-M sodium;2-hydroxyethanesulfonate Chemical compound [Na+].OCCS([O-])(=O)=O LADXKQRVAFSPTR-UHFFFAOYSA-M 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000009760 electrical discharge machining Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N7/00—Shells for rollers of printing machines
- B41N7/04—Shells for rollers of printing machines for damping rollers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N2207/00—Location or type of the layers in shells for rollers of printing machines
- B41N2207/02—Top layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N2207/00—Location or type of the layers in shells for rollers of printing machines
- B41N2207/10—Location or type of the layers in shells for rollers of printing machines characterised by inorganic compounds, e.g. pigments
Definitions
- the present invention relates to a galvanic bath and a method for producing structured hard chrome layers and its use for producing structured hard chrome layers on components. It has long been common state of the art to provide objects of technology or general use with surface coatings by means of galvanic processes. This is necessary in order to give the objects special functional and / or decorative surface properties, such as hardness, corrosion resistance, metallic appearance, gloss, etc.
- a bath that contains at least the metal to be deposited as a salt is converted into metal deposited by means of direct current on the object connected as cathode.
- the object to be coated usually consists of a metallic material. If the base material is not electrically conductive per se instead, the surface can be made conductive by a thin metallization.
- Galvanic baths containing nickel or chrome are mostly used in technical applications to produce particularly hard, mechanically resistant layers.
- an electroplated hard chrome layer has a rough surface structure.
- decorative tops for example, a matt appearance or a pleasant, not smooth "handle" should be created.
- rough hard chrome layers or structured chrome layers fulfill certain functional properties.
- printing drums, ink rollers and, in particular, dampening cylinders with a special, rough surface are required for printing machines. Chromium-plated tools can be used in forming technology to give the workpiece to be machined a structured surface.
- objects with a hard chrome coating and a rough surface structure are obtained by mechanical processing, such as grinding, sandblasting, spark erosion, etc., or by chemical etching processes before, between or after the chrome plating.
- mechanical processing such as grinding, sandblasting, spark erosion, etc.
- chemical etching processes before, between or after the chrome plating.
- DE 42 11 881 discloses a galvanic method for applying surface coatings to machine components, in which, for example, chromium is deposited in a structured form.
- at least one initial pulse and at least one subsequent pulse of voltage or current and certain guidance of the voltage or current function initially cause nucleation on the surface of the machine component and subsequent growth of the germs of the separating material.
- the chromium is deposited in the form of statistically evenly distributed, dendritic or approximately hemispherical (dome-shaped) elevations.
- EP 0 722 515 contains a further development of the method according to DE 42 11 881, the increase in electrical voltage or current density taking place in stages.
- DE 34 02 554 C2 describes a saturated aliphatic sulfonic acid with a maximum of two carbon atoms and a maximum of six sulfonic acid groups or salts or halogen acid derivatives thereof for increasing the current efficiency in the electrodeposition of hard chromium on a workpiece made of steel or aluminum alloy from an aqueous, chromic acid and Use non-caustic electrolytes containing sulfuric acid.
- US-A-5 176 813 discloses a process for the electrodeposition of chromium from a galvanic bath with a lead-containing anode in the absence of monosulfonic acid, the galvanic bath containing chromic acid, Contains sulfate ions and at least one optionally halogenated alkylpolysulfonic acid or its salt with 1 to 3 carbon atoms.
- the object of the present invention is therefore to simplify the production of structured hard chrome layers considerably and, in particular, to enable structure layers with a more uniform surface topography and significantly higher roughness values.
- the galvanic bath according to the invention preferably contains chromium (VI) ions in an amount which corresponds to 200 to 250 g / l chromic acid anhydride.
- the chromium (VI) ion-providing compound is preferably selected from chromic anhydride (CrO 3 ) and / or alkali dichromates such as Na 2 Cr 2 O 7 and K 2 Cr 2 O 7 . Of the alkali dichromates, K 2 Cr 2 O 7 is preferred.
- the chromium (VI) ion-providing compound is chromic anhydride.
- part of the chromium (VI) ion-providing compound is one or more alkali dichromate (s), preferably potassium dichromate.
- alkali dichromate preferably potassium dichromate.
- preferably less than 30% and particularly preferably less than 15% of the chromium (VI) ions are supplied by alkali dichromate.
- the molar concentration ratio of chromium (VI) ions to sulfate ions in the electroplating bath is preferably 100: 1 to 105: 1.
- the soluble salts of sulfuric acid which can be used are preferably selected from sodium sulfate, potassium sulfate, lithium sulfate, ammonium sulfate, magnesium sulfate, strontium sulfate, aluminum sulfate and potassium aluminum sulfate. Strontium sulfate is particularly preferred
- the bath comprises 2-hydroxyethanesulfonate ions in an amount corresponding to 0.07 to 1.5 / l of the sodium salt.
- the 2-hydroxyethanesulfonate ions contained in the galvanic bath according to the invention can be provided by the 2-hydroxyethanesulfonic acid itself or a salt thereof, preferably the sodium salt.
- the electroplating chrome bath according to the invention can be used in the electroplating systems usually used in this technology and with the usual working methods as well as for the usual coating purposes on the normally provided basic materials.
- Such base materials can be, for example, objects made of conductive materials such as metal, in particular steel, and metallized, non-conductive objects.
- the galvanic bath according to the invention is expediently used at temperatures between 30 and 70 ° C.
- chrome layers with a largely uniform dome-shaped microstructure and roughness values Rz of up to approximately 40 ⁇ m can be produced.
- Such a deposition is preferably carried out in the temperature range 40 and 50 ° C., preferably between 42 and 48 ° C. and particularly preferably between 44 and 46 ° C.
- Such a deposition is preferably carried out in the temperature range between 51 and 61 ° C., preferably between 53 and 59 ° C. and particularly preferably between 55 and 57 ° C.
- chrome bath according to the invention can be used to deposit directly onto the base material, for example steel. Galvanic precoatings, especially with nickel, are not necessary.
- the latter In order to deposit a structured hard chrome layer on an object, the latter, when connected as a cathode, is introduced into the galvanic bath according to the invention. It is sufficient if the object is ground to size. Further surface processing and in particular electroplating are not necessary. For a particularly uniform coating, it is advantageous to continuously circulate the bath and / or to keep the object to be coated rotating in the bath.
- the current density can be up to 50 A / dm 2 .
- a deposition time TP 10 to 15 minutes
- a base layer thickness of 6-9 ⁇ m can be achieved.
- a waiting time TW is expediently inserted before the start of the deposition while the object takes on the temperature of the bath. This time can be 1 to 10 minutes depending on the size of the object and the temperature difference.
- the current density can be up to 30 A / dm 2 . 1 to 2 minutes is sufficient as the duration TP.
- the base layer obtained generally has a microhardness of 800 to 950 HV 0.1.
- the actual deposition of the structured chrome layer takes place from the same bath.
- the bath temperature is to be set to 30 to 50 ° C., preferably to 40 to 50 ° C., particularly preferably to 42 to 48 ° C. and most preferably to 44 to 46 ° C.
- a waiting time TW and an activation step with the parameters already mentioned before the start of the deposition.
- the deposition is expediently carried out at a current density of 75 to 90 A / dm 2 . With a deposition time TP of 10 to 30 minutes, a thickness of the structural layer of 14 to 40 ⁇ m can be achieved.
- the structure layer obtained normally has a microhardness of 850 to 900 HV 0.1.
- the structure layer has a roughness Rz of up to about 40 ⁇ m.
- the structural chrome layer is coated with a thin, smooth hard chrome layer, the functional layer, again from the same bath.
- the bath is brought to a temperature in the range from 50 to 70 ° C., preferably from 51 to 61 ° C., particularly preferably from 53 to 59 ° C. and most preferably from 55 to 57 ° C. and then at a current density up to 50 A / dm 2 deposited.
- a deposition time TP of 5 to 15 minutes, a layer thickness of the functional layer of 3 to 9 ⁇ m can be achieved.
- the functional layer normally has a microhardness of 1,000 to 1050 HV 0.1.
- the final thin hard chrome layer practically does not change the roughness of the structural layer.
- the ramp time TR can be 1 to 5 minutes each.
- the method is distinguished by a particularly simple current density control.
- it is simply sufficient to linearly increase the current density to the respective setpoint or the respective descent in the respective steps.
- otherwise required, technically complex and thus expensive current and voltage regulating units and their complex programming are not required.
- it can also be favorable and advantageous in individual cases to regulate the current density in steps to the maximum value or down again.
- a structured hard chrome layer is obtained on the surface of the object, which is characterized by a particularly dense and uniform distribution of very well-formed dome-shaped elevations.
- a layer with a peak number of 75 to 100 / cm can be obtained.
- roughness values Rz up to 40 ⁇ m can be achieved.
- the method according to the invention can be used to generate a chrome layer on components, in particular machine components.
- the method is used to produce a structured hard chrome layer on machine components in sliding contact with one another, in particular pistons, cylinders, bushings and axle bearings, on rollers, drums or cylinders in the graphics industry, in particular ink rollers and dampening cylinders, and on tools ,
- 100 l of bath contain 20.450 kg of chromic anhydride, 2.500 kg of potassium dichromate, 0.550 kg Strontium sulfate and 3.5 g of 2-hydroxyethanesulfonic acid sodium salt. This results in the concentration values in the bath of 222 g / l chromic anhydride, 2.2 g / l free sultate and 0.035 g / l 2-hydroxyethanesulfonic acid sodium salt.
- the structure chrome layer obtained has a roughness Rz of 35 to 40 ⁇ m and a peak number of 75-100 / cm with an extremely uniform distribution of very well-formed dome-shaped elevations.
- FIG. 1 shows the SEM image of the surface of the roll cylinder, which is chromium-plated by way of example with the chrome bath according to the invention and according to the method according to the invention, at a magnification of 30: 1.
- the dense and even distribution of dome-shaped elevations can be clearly seen.
- 3 shows the SEM image of a cross section through the layer at an enlargement of 400: 1.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Cosmetics (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19828545A DE19828545C1 (de) | 1998-06-26 | 1998-06-26 | Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung |
| DE19828545 | 1998-06-26 | ||
| PCT/EP1999/004412 WO2000000672A2 (de) | 1998-06-26 | 1999-06-24 | Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1097261A2 EP1097261A2 (de) | 2001-05-09 |
| EP1097261B1 true EP1097261B1 (de) | 2003-01-29 |
Family
ID=7872131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99931178A Expired - Lifetime EP1097261B1 (de) | 1998-06-26 | 1999-06-24 | Galvanisches bad und verfahren zur erzeugung strukturierter hartchromschichten und verwendung |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6447666B1 (cs) |
| EP (1) | EP1097261B1 (cs) |
| JP (1) | JP2002519514A (cs) |
| KR (1) | KR100573531B1 (cs) |
| CN (1) | CN1191392C (cs) |
| AT (1) | ATE231933T1 (cs) |
| BR (1) | BR9912214A (cs) |
| CA (1) | CA2334708A1 (cs) |
| CZ (1) | CZ299000B6 (cs) |
| DE (2) | DE19828545C1 (cs) |
| RU (1) | RU2202005C2 (cs) |
| WO (1) | WO2000000672A2 (cs) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3438695B2 (ja) | 2000-02-29 | 2003-08-18 | Jfeスチール株式会社 | クロムめっきロールの製造方法 |
| AT4737U1 (de) * | 2001-01-15 | 2001-11-26 | Plansee Ag | Pulvermetallurgisches verfahren zur herstellung hochdichter formteile |
| US6736954B2 (en) * | 2001-10-02 | 2004-05-18 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
| DE10255853A1 (de) | 2002-11-29 | 2004-06-17 | Federal-Mogul Burscheid Gmbh | Herstellung strukturierter Hartchromschichten |
| DE10302107A1 (de) * | 2003-01-21 | 2004-07-29 | Fuchs Technology Ag | Zylinderoberfläche |
| ES2726013T3 (es) * | 2003-05-12 | 2019-10-01 | Arkema Inc | Soluciones electrolíticas de ácido sulfónico de pureza elevada |
| DE102004019370B3 (de) | 2004-04-21 | 2005-09-01 | Federal-Mogul Burscheid Gmbh | Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung |
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| DE102008017270B3 (de) | 2008-04-04 | 2009-06-04 | Federal-Mogul Burscheid Gmbh | Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement |
| EP2149447A1 (de) | 2008-07-29 | 2010-02-03 | Alcan Technology & Management Ltd. | Verfahren zur Herstellung einer Materialbahn mit Oberflächenstruktur |
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| AT507785B1 (de) | 2009-08-04 | 2010-08-15 | Univ Wien Tech | Verfahren zur herstellung strukturierter chromschichten |
| DE102009028223A1 (de) | 2009-08-04 | 2011-02-24 | Koenig & Bauer Aktiengesellschaft | Verfahren und Herstellung strukturierter Chromschichten |
| CN101812708B (zh) * | 2010-04-20 | 2011-08-24 | 安徽华东光电技术研究所 | 一种钼芯杆镀铬的方法 |
| CN103952731B (zh) * | 2014-04-29 | 2016-05-04 | 上海交通大学 | 凸包状仿生织构化铬镀层的电沉积制备方法及其用途 |
| DE102014113000A1 (de) * | 2014-09-10 | 2016-03-10 | Rieter Ingolstadt Gmbh | Beschichtung für einen Drehteller |
| RU2603935C1 (ru) * | 2015-06-04 | 2016-12-10 | Закрытое акционерное общество "Поволжский Центр Гальваники" | Способ беспористого твёрдого хромирования деталей из чугунов и сталей |
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| US3506548A (en) | 1966-09-23 | 1970-04-14 | Allied Res Prod Inc | Electrodeposition of nickel |
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| DE3424528A1 (de) | 1984-07-04 | 1986-01-09 | Hoechst Ag, 6230 Frankfurt | Verfahren zum gleichzeitigen aufrauhen und verchromen von stahlplatten als traeger fuer lithographische anwendungen |
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| SU1530642A1 (ru) * | 1987-12-30 | 1989-12-23 | Научно-исследовательский институт санитарной техники | Электролит хромировани |
| US5176813A (en) * | 1989-11-06 | 1993-01-05 | Elf Atochem North America, Inc. | Protection of lead-containing anodes during chromium electroplating |
| DE4211881C2 (de) * | 1992-04-09 | 1994-07-28 | Wmv Ag | Verfahren zum elektrochemischen Aufbringen einer strukturierten Oberflächenbeschichtung |
| RU2094540C1 (ru) * | 1993-07-13 | 1997-10-27 | Воронежский Политехнический Институт | Электролит хромирования |
| CN1044395C (zh) * | 1993-10-07 | 1999-07-28 | 罗马包-控股公开股份有限公司 | 表面覆层的电镀方法 |
| DE4432512C2 (de) | 1994-09-13 | 1998-12-17 | Lpw Chemie Gmbh | Verwendung eines Verfahrens zur elektrolytischen Abscheidung von Chromschichten |
-
1998
- 1998-06-26 DE DE19828545A patent/DE19828545C1/de not_active Revoked
-
1999
- 1999-06-21 US US09/701,530 patent/US6447666B1/en not_active Expired - Fee Related
- 1999-06-24 CA CA002334708A patent/CA2334708A1/en not_active Abandoned
- 1999-06-24 AT AT99931178T patent/ATE231933T1/de not_active IP Right Cessation
- 1999-06-24 RU RU2001102496/02A patent/RU2202005C2/ru not_active IP Right Cessation
- 1999-06-24 JP JP2000557019A patent/JP2002519514A/ja active Pending
- 1999-06-24 KR KR1020007014501A patent/KR100573531B1/ko not_active Expired - Fee Related
- 1999-06-24 DE DE59904174T patent/DE59904174D1/de not_active Expired - Lifetime
- 1999-06-24 WO PCT/EP1999/004412 patent/WO2000000672A2/de not_active Ceased
- 1999-06-24 CN CNB998079324A patent/CN1191392C/zh not_active Expired - Fee Related
- 1999-06-24 CZ CZ20004789A patent/CZ299000B6/cs not_active IP Right Cessation
- 1999-06-24 EP EP99931178A patent/EP1097261B1/de not_active Expired - Lifetime
- 1999-06-24 BR BR9912214-6A patent/BR9912214A/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN1191392C (zh) | 2005-03-02 |
| WO2000000672A3 (de) | 2000-06-29 |
| ATE231933T1 (de) | 2003-02-15 |
| US6447666B1 (en) | 2002-09-10 |
| EP1097261A2 (de) | 2001-05-09 |
| CZ299000B6 (cs) | 2008-04-02 |
| KR100573531B1 (ko) | 2006-04-26 |
| CN1307652A (zh) | 2001-08-08 |
| CZ20004789A3 (cs) | 2001-12-12 |
| KR20010072627A (ko) | 2001-07-31 |
| DE19828545C1 (de) | 1999-08-12 |
| RU2202005C2 (ru) | 2003-04-10 |
| DE59904174D1 (de) | 2003-03-06 |
| CA2334708A1 (en) | 2000-01-06 |
| JP2002519514A (ja) | 2002-07-02 |
| WO2000000672A2 (de) | 2000-01-06 |
| BR9912214A (pt) | 2001-04-10 |
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