EP1097261B1 - Galvanic bath, method for producing structured hard chromium layers and use thereof - Google Patents
Galvanic bath, method for producing structured hard chromium layers and use thereof Download PDFInfo
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- EP1097261B1 EP1097261B1 EP99931178A EP99931178A EP1097261B1 EP 1097261 B1 EP1097261 B1 EP 1097261B1 EP 99931178 A EP99931178 A EP 99931178A EP 99931178 A EP99931178 A EP 99931178A EP 1097261 B1 EP1097261 B1 EP 1097261B1
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- ions
- chromium
- galvanic bath
- current density
- chromium layer
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N7/00—Shells for rollers of printing machines
- B41N7/04—Shells for rollers of printing machines for damping rollers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N2207/00—Location or type of the layers in shells for rollers of printing machines
- B41N2207/02—Top layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N2207/00—Location or type of the layers in shells for rollers of printing machines
- B41N2207/10—Location or type of the layers in shells for rollers of printing machines characterised by inorganic compounds, e.g. pigments
Definitions
- the present invention relates to a galvanic bath and a method for producing structured hard chrome layers and its use for producing structured hard chrome layers on components. It has long been common state of the art to provide objects of technology or general use with surface coatings by means of galvanic processes. This is necessary in order to give the objects special functional and / or decorative surface properties, such as hardness, corrosion resistance, metallic appearance, gloss, etc.
- a bath that contains at least the metal to be deposited as a salt is converted into metal deposited by means of direct current on the object connected as cathode.
- the object to be coated usually consists of a metallic material. If the base material is not electrically conductive per se instead, the surface can be made conductive by a thin metallization.
- Galvanic baths containing nickel or chrome are mostly used in technical applications to produce particularly hard, mechanically resistant layers.
- an electroplated hard chrome layer has a rough surface structure.
- decorative tops for example, a matt appearance or a pleasant, not smooth "handle" should be created.
- rough hard chrome layers or structured chrome layers fulfill certain functional properties.
- printing drums, ink rollers and, in particular, dampening cylinders with a special, rough surface are required for printing machines. Chromium-plated tools can be used in forming technology to give the workpiece to be machined a structured surface.
- objects with a hard chrome coating and a rough surface structure are obtained by mechanical processing, such as grinding, sandblasting, spark erosion, etc., or by chemical etching processes before, between or after the chrome plating.
- mechanical processing such as grinding, sandblasting, spark erosion, etc.
- chemical etching processes before, between or after the chrome plating.
- DE 42 11 881 discloses a galvanic method for applying surface coatings to machine components, in which, for example, chromium is deposited in a structured form.
- at least one initial pulse and at least one subsequent pulse of voltage or current and certain guidance of the voltage or current function initially cause nucleation on the surface of the machine component and subsequent growth of the germs of the separating material.
- the chromium is deposited in the form of statistically evenly distributed, dendritic or approximately hemispherical (dome-shaped) elevations.
- EP 0 722 515 contains a further development of the method according to DE 42 11 881, the increase in electrical voltage or current density taking place in stages.
- DE 34 02 554 C2 describes a saturated aliphatic sulfonic acid with a maximum of two carbon atoms and a maximum of six sulfonic acid groups or salts or halogen acid derivatives thereof for increasing the current efficiency in the electrodeposition of hard chromium on a workpiece made of steel or aluminum alloy from an aqueous, chromic acid and Use non-caustic electrolytes containing sulfuric acid.
- US-A-5 176 813 discloses a process for the electrodeposition of chromium from a galvanic bath with a lead-containing anode in the absence of monosulfonic acid, the galvanic bath containing chromic acid, Contains sulfate ions and at least one optionally halogenated alkylpolysulfonic acid or its salt with 1 to 3 carbon atoms.
- the object of the present invention is therefore to simplify the production of structured hard chrome layers considerably and, in particular, to enable structure layers with a more uniform surface topography and significantly higher roughness values.
- the galvanic bath according to the invention preferably contains chromium (VI) ions in an amount which corresponds to 200 to 250 g / l chromic acid anhydride.
- the chromium (VI) ion-providing compound is preferably selected from chromic anhydride (CrO 3 ) and / or alkali dichromates such as Na 2 Cr 2 O 7 and K 2 Cr 2 O 7 . Of the alkali dichromates, K 2 Cr 2 O 7 is preferred.
- the chromium (VI) ion-providing compound is chromic anhydride.
- part of the chromium (VI) ion-providing compound is one or more alkali dichromate (s), preferably potassium dichromate.
- alkali dichromate preferably potassium dichromate.
- preferably less than 30% and particularly preferably less than 15% of the chromium (VI) ions are supplied by alkali dichromate.
- the molar concentration ratio of chromium (VI) ions to sulfate ions in the electroplating bath is preferably 100: 1 to 105: 1.
- the soluble salts of sulfuric acid which can be used are preferably selected from sodium sulfate, potassium sulfate, lithium sulfate, ammonium sulfate, magnesium sulfate, strontium sulfate, aluminum sulfate and potassium aluminum sulfate. Strontium sulfate is particularly preferred
- the bath comprises 2-hydroxyethanesulfonate ions in an amount corresponding to 0.07 to 1.5 / l of the sodium salt.
- the 2-hydroxyethanesulfonate ions contained in the galvanic bath according to the invention can be provided by the 2-hydroxyethanesulfonic acid itself or a salt thereof, preferably the sodium salt.
- the electroplating chrome bath according to the invention can be used in the electroplating systems usually used in this technology and with the usual working methods as well as for the usual coating purposes on the normally provided basic materials.
- Such base materials can be, for example, objects made of conductive materials such as metal, in particular steel, and metallized, non-conductive objects.
- the galvanic bath according to the invention is expediently used at temperatures between 30 and 70 ° C.
- chrome layers with a largely uniform dome-shaped microstructure and roughness values Rz of up to approximately 40 ⁇ m can be produced.
- Such a deposition is preferably carried out in the temperature range 40 and 50 ° C., preferably between 42 and 48 ° C. and particularly preferably between 44 and 46 ° C.
- Such a deposition is preferably carried out in the temperature range between 51 and 61 ° C., preferably between 53 and 59 ° C. and particularly preferably between 55 and 57 ° C.
- chrome bath according to the invention can be used to deposit directly onto the base material, for example steel. Galvanic precoatings, especially with nickel, are not necessary.
- the latter In order to deposit a structured hard chrome layer on an object, the latter, when connected as a cathode, is introduced into the galvanic bath according to the invention. It is sufficient if the object is ground to size. Further surface processing and in particular electroplating are not necessary. For a particularly uniform coating, it is advantageous to continuously circulate the bath and / or to keep the object to be coated rotating in the bath.
- the current density can be up to 50 A / dm 2 .
- a deposition time TP 10 to 15 minutes
- a base layer thickness of 6-9 ⁇ m can be achieved.
- a waiting time TW is expediently inserted before the start of the deposition while the object takes on the temperature of the bath. This time can be 1 to 10 minutes depending on the size of the object and the temperature difference.
- the current density can be up to 30 A / dm 2 . 1 to 2 minutes is sufficient as the duration TP.
- the base layer obtained generally has a microhardness of 800 to 950 HV 0.1.
- the actual deposition of the structured chrome layer takes place from the same bath.
- the bath temperature is to be set to 30 to 50 ° C., preferably to 40 to 50 ° C., particularly preferably to 42 to 48 ° C. and most preferably to 44 to 46 ° C.
- a waiting time TW and an activation step with the parameters already mentioned before the start of the deposition.
- the deposition is expediently carried out at a current density of 75 to 90 A / dm 2 . With a deposition time TP of 10 to 30 minutes, a thickness of the structural layer of 14 to 40 ⁇ m can be achieved.
- the structure layer obtained normally has a microhardness of 850 to 900 HV 0.1.
- the structure layer has a roughness Rz of up to about 40 ⁇ m.
- the structural chrome layer is coated with a thin, smooth hard chrome layer, the functional layer, again from the same bath.
- the bath is brought to a temperature in the range from 50 to 70 ° C., preferably from 51 to 61 ° C., particularly preferably from 53 to 59 ° C. and most preferably from 55 to 57 ° C. and then at a current density up to 50 A / dm 2 deposited.
- a deposition time TP of 5 to 15 minutes, a layer thickness of the functional layer of 3 to 9 ⁇ m can be achieved.
- the functional layer normally has a microhardness of 1,000 to 1050 HV 0.1.
- the final thin hard chrome layer practically does not change the roughness of the structural layer.
- the ramp time TR can be 1 to 5 minutes each.
- the method is distinguished by a particularly simple current density control.
- it is simply sufficient to linearly increase the current density to the respective setpoint or the respective descent in the respective steps.
- otherwise required, technically complex and thus expensive current and voltage regulating units and their complex programming are not required.
- it can also be favorable and advantageous in individual cases to regulate the current density in steps to the maximum value or down again.
- a structured hard chrome layer is obtained on the surface of the object, which is characterized by a particularly dense and uniform distribution of very well-formed dome-shaped elevations.
- a layer with a peak number of 75 to 100 / cm can be obtained.
- roughness values Rz up to 40 ⁇ m can be achieved.
- the method according to the invention can be used to generate a chrome layer on components, in particular machine components.
- the method is used to produce a structured hard chrome layer on machine components in sliding contact with one another, in particular pistons, cylinders, bushings and axle bearings, on rollers, drums or cylinders in the graphics industry, in particular ink rollers and dampening cylinders, and on tools ,
- 100 l of bath contain 20.450 kg of chromic anhydride, 2.500 kg of potassium dichromate, 0.550 kg Strontium sulfate and 3.5 g of 2-hydroxyethanesulfonic acid sodium salt. This results in the concentration values in the bath of 222 g / l chromic anhydride, 2.2 g / l free sultate and 0.035 g / l 2-hydroxyethanesulfonic acid sodium salt.
- the structure chrome layer obtained has a roughness Rz of 35 to 40 ⁇ m and a peak number of 75-100 / cm with an extremely uniform distribution of very well-formed dome-shaped elevations.
- FIG. 1 shows the SEM image of the surface of the roll cylinder, which is chromium-plated by way of example with the chrome bath according to the invention and according to the method according to the invention, at a magnification of 30: 1.
- the dense and even distribution of dome-shaped elevations can be clearly seen.
- 3 shows the SEM image of a cross section through the layer at an enlargement of 400: 1.
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Abstract
Description
Die vorliegende Erfindung betrifft ein galvanisches Bad und ein Verfahren zur Erzeugung strukturierter Hartchromschichten sowie dessen Verwendung zur Erzeugung strukturierter Hartchromschichten auf Bauteilen. Es ist seit langem gängiger Stand der Technik, Gegenstände der Technik oder des allgemeinen Gebrauchs mittels galvanischer Prozesse mit Oberflächenbeschichtungen zu versehen. Dies ist erforderlich, um den Gegenständen spezielle funk4ionelle und/oder dekorative Oberflächeneigenschaften zu verleihen, wie etwa Härte, Korrosionsbeständigkeit, metallisches Aussehen, Glanz etc. Bei der galvanischen Oberflächenbeschichtung wird aus einem Bad, das zumindest das abzuscheidende Metall als Salz gelöst enthält, das Metall mittels Gleichstrom auf dem als Kathode geschalteten Gegenstand abgeschieden. Der zu beschichtende Gegenstand besteht in aller Regel aus einem metallischen Material. Ist das Grundmaterial statt dessen an sich nicht elektrisch leitend, so kann die Oberfläche etwa durch eine dünne Metallisierung leitfähig gemacht werden. Galvanische Bäder, die Nickel oder Chrom enthalten, dienen bei technischen Anwendungen meist zur Erzeugung besonders harter, mechanisch widerstandsfähiger Schichten.The present invention relates to a galvanic bath and a method for producing structured hard chrome layers and its use for producing structured hard chrome layers on components. It has long been common state of the art to provide objects of technology or general use with surface coatings by means of galvanic processes. This is necessary in order to give the objects special functional and / or decorative surface properties, such as hardness, corrosion resistance, metallic appearance, gloss, etc. In the case of galvanic surface coating, a bath that contains at least the metal to be deposited as a salt is converted into metal deposited by means of direct current on the object connected as cathode. The object to be coated usually consists of a metallic material. If the base material is not electrically conductive per se instead, the surface can be made conductive by a thin metallization. Galvanic baths containing nickel or chrome are mostly used in technical applications to produce particularly hard, mechanically resistant layers.
In bestimmten Fällen ist es erforderlich oder erwünscht, daß Gegenstände, die mit einer galvanisch erzeugten Hartchromschicht versehen sind, eine rauhe Oberflächenstruktur aufweisen. Bei dekorativen Oberzügen soll somit etwa ein mattes Aussehen oder ein angenehmer, nicht glatter "Griff" erzeugt werden. Im technischen Bereich erfüllen rauhe Hartchromschichten oder Strukturchromschichten bestimmte funktionale Eigenschaften. Bei Maschinenbauteilen, die in gleitendem Kontakt miteinander stehen, wie zum Beispiel Kolben, Zylinder, Laufbuchsen, Achslagern etc., sind rauhe Hartchromschichten von Vorteil, da die Struktur Schmiermitteldepots bildet, so daß ein Trockenlaufen verhindert wird. In der graphischen Industrie werden z.B. für Druckmaschinen bogenführende Trommeln, Farbwalzen und insbesondere Feuchtreibzylinder mit einer speziellen, rauhen Oberfläche benötigt. In der Umformtechnik können strukturverchromte Werkzeuge verwendet werden, um dem zu bearbeitenden Werkstück eine strukturierte Oberfläche zu verleihen.In certain cases, it is necessary or desirable that objects which are provided with an electroplated hard chrome layer have a rough surface structure. With decorative tops, for example, a matt appearance or a pleasant, not smooth "handle" should be created. In the technical field, rough hard chrome layers or structured chrome layers fulfill certain functional properties. For machine components that are in sliding contact with each other, such as pistons, cylinders, liners, axle bearings, etc., rough hard chrome layers are advantageous because the structure forms lubricant deposits so that dry running is prevented. In the graphics industry, for example, printing drums, ink rollers and, in particular, dampening cylinders with a special, rough surface are required for printing machines. Chromium-plated tools can be used in forming technology to give the workpiece to be machined a structured surface.
Nach konventioneller Technik werden Gegenstände mit Hartchrombeschichtung und rauher Oberflächenstruktur durch mechanische Bearbeitung, wie etwa Schleifen, Sandstrahlen, Funkenerosion etc., oder durch chemische Ätzprozesse vor, zwischen oder nach der Verchromung erhalten. Entsprechende Verfahren sind jedoch aufgrund der Vielzahl der erforderlichen unterschiedlichen Arbeitstechniken aufwendig, kompliziert und kostenintensiv.According to conventional technology, objects with a hard chrome coating and a rough surface structure are obtained by mechanical processing, such as grinding, sandblasting, spark erosion, etc., or by chemical etching processes before, between or after the chrome plating. However, due to the large number of different working techniques required, corresponding methods are complex, complicated and cost-intensive.
Aus DE 42 11 881 ist ein galvanisches Verfahren zum Aufbringen von Oberflächenbeschichtungen auf Maschinenbauteile bekannt, bei dem z.B. Chrom in strukturierter Form abgeschieden wird. Hierbei wird durch zumindest einen Anfangsimpuls und zumindest einen Folgeimpuls von Spannung bzw. Strom sowie bestimmte Führung der Spannungs- bzw. Stromfunktion zunächst eine Keimbildung auf der Oberfläche des Maschinenbauteils und anschließendes Wachstum der Keime des Abscheidematerials bewirkt.
Hierbei wird das Chrom in Form von statistisch gleichmäßig verteilten, dendritischen oder ungefähr halbkugelförmigen (kalottenförmigen) Erhebungen abgeschieden.DE 42 11 881 discloses a galvanic method for applying surface coatings to machine components, in which, for example, chromium is deposited in a structured form. In this case, at least one initial pulse and at least one subsequent pulse of voltage or current and certain guidance of the voltage or current function initially cause nucleation on the surface of the machine component and subsequent growth of the germs of the separating material.
The chromium is deposited in the form of statistically evenly distributed, dendritic or approximately hemispherical (dome-shaped) elevations.
EP 0 722 515 beinhaltet eine Fortbildung des Verfahrens gemäß DE 42 11 881, wobei die Erhöhung der elektrischen Spannung bzw. der Stromdichte in Stufen erfolgt.EP 0 722 515 contains a further development of the method according to DE 42 11 881, the increase in electrical voltage or current density taking place in stages.
In diesen Verfahren werden an sich bekannte, übliche galvanische Bäder eingesetzt.Known, conventional galvanic baths are used in these processes.
In DE 34 02 554 C2 wird beschrieben, eine gesättigte aliphatische Sulfonsäure mit maximal zwei Kohlenstoffatomen und maximal sechs Sulfonsäuregruppen bzw. Salze oder Halogensäurederivate davon zur Erhöhung der Stromausbeute bei der galvanischen Abscheidung von Hartchrom auf einem Werkstück aus Stahl oder Aluminiumlegierung aus einem wäßrigen, Chromsäure und Schwefelsäure enthaltenden, nichtätzenden Elektrolyten zu verwenden.DE 34 02 554 C2 describes a saturated aliphatic sulfonic acid with a maximum of two carbon atoms and a maximum of six sulfonic acid groups or salts or halogen acid derivatives thereof for increasing the current efficiency in the electrodeposition of hard chromium on a workpiece made of steel or aluminum alloy from an aqueous, chromic acid and Use non-caustic electrolytes containing sulfuric acid.
US-A-5 176 813 offenbart ein Verfahren zur galvanischen Abscheidung von Chrom aus einem galvanischen Bad mit einer bleihaltigen Anode in Abwesenheit von Monosulfonsäure, wobei das galvanische Bad Chromsäure, Sulfationen und wenigstens eine gegebenenfalls halogenierte Alkylpolysulfönsäure oder deren Salz mit 1 bis 3 Kohlenstoffatomen enthält.US-A-5 176 813 discloses a process for the electrodeposition of chromium from a galvanic bath with a lead-containing anode in the absence of monosulfonic acid, the galvanic bath containing chromic acid, Contains sulfate ions and at least one optionally halogenated alkylpolysulfonic acid or its salt with 1 to 3 carbon atoms.
Die bekannten Verfahren, bei denen strukturierte Chromschichten galvanisch erzeugt werden, besitzen jedoch Nachteile. Sie erfordern einen komplizierten mehrschichtigen Schichtaufbau, bei dem vor der eigentlichen Strukturchromschicht zunächst eine Nickel-Strikeschicht, dann eine dickere Sulfamat-Nickelschicht, gefolgt von einer rißarmen Chromschicht auf das Grundmaterial des Bauteils aufgebracht und zuletzt die Strukturchromschicht mit einer rißarmen Hartchromschicht überzogen werden muß. Diese verschiedenen Schichten erfordern spezifische, unterschiedlich zusammengesetzte galvanische Bäder und hierauf jeweils abgestimmte unterschiedliche Abscheidebedingungen. Die Prozeßführung ist somit aufwendig, kompliziert und aufgrund der notwendigen Arbeitsschritte sehr kostenintensiv. Weiterhin sind mit diesem Verfahren offenbar nur Schichten mit Rauhigkeitswerten Rz bis etwa 10 µm erhältlich. Darüber hinaus ist die Gleichmäßigkeit der Verteilung und der Ausbildung kalottenförmiger Erhebungen noch verbesserungsbedürftig.However, the known methods in which structured chromium layers are generated galvanically have disadvantages. They require a complicated multi-layer structure, in which a nickel strike layer is applied before the actual structural chrome layer, then a thicker sulfamate nickel layer, followed by a low-crack chrome layer on the base material of the component, and finally the structural chrome layer has to be coated with a low-crack hard chrome layer. These different layers require specific, differently composed galvanic baths and different deposition conditions matched to them. The process control is thus complex, complicated and very expensive due to the necessary work steps. Furthermore, only layers with roughness values Rz up to about 10 µm are apparently available with this method. In addition, the uniformity of the distribution and the formation of dome-shaped surveys is still in need of improvement.
Der vorliegenden Erfindung liegt daher die Aufgabenstellung zugrunde, die Erzeugung von strukturierten Hartchromschichten erheblich zu vereinfachen und insbesondere Strukturschichten mit gleichmäßigerer Oberflächentopographie und wesentlich höheren Rauhigkeitswerten zu ermöglichen.The object of the present invention is therefore to simplify the production of structured hard chrome layers considerably and, in particular, to enable structure layers with a more uniform surface topography and significantly higher roughness values.
Es wurde nun gefunden, daß den Anforderungen entsprechende strukturierte Hartchromschichten aus einem galvanischen Bad erhalten werden können, das in wäßriger Lösung mindestens eine Chrom(VI)-ionen liefernde Verbindung enthält und
- a) Chrom(VI)-ionen in einer Menge, die 100 bis 600 g/l Chromsäureanhydrid entspricht,
- b) Sulfationen in Form von Schwefelsäure und/oder eines löslichen Salzes davon in einem molaren Konzentrationsverhältnis von Chrom(VI)-ionen zu Sulfationen (SO4 2-) von 90:1 bis 120:1, und
- c) 2-Hydroxyethansuifonationen in einer Menge, die 0,01 bis 3,0 g/l des Natriumsalzes entspricht, umfaßt
- a) chromium (VI) ions in an amount corresponding to 100 to 600 g / l chromic anhydride,
- b) sulfate ions in the form of sulfuric acid and / or a soluble salt thereof in a molar concentration ratio of chromium (VI) ions to sulfate ions (SO 4 2- ) of 90: 1 to 120: 1, and
- c) 2-hydroxyethanesulfonate ions in an amount corresponding to 0.01 to 3.0 g / l of the sodium salt, comprises
Es wurde überraschend gefunden, daß die erfindungsgemäße Kombination der Komponenten Sulfat und 2-Hydroxyethansulfonat besonders vorteilhafte Eigenschaften des Chrombades zur Folge hat.It was surprisingly found that the combination of the components sulfate and 2-hydroxyethanesulfonate according to the invention results in particularly advantageous properties of the chromium bath.
Vorzugsweise enthält das erfindungsgemäße galvanische Bad Chrom(VI)-ionen in einer Menge, die 200 bis 250 g/l Chromsäureanhydrid entspricht. Die Chrom(VI)-ionen liefernde Verbindung wird bevorzugt ausgewählt aus Chromsäureanhydrid (CrO3) und/oder Alkalidichromaten wie Na2Cr2O7 und K2Cr2O7. Von den Alkalidichromaten ist K2Cr2O7 bevorzugt In einer besonders bevorzugten Ausführungsform ist die Chrom(VI)-ionen liefernde Verbindung Chromsäureanhydrid. In einer weiteren Ausführungsform ist ein Teil der Chrom(VI)-ionen liefernden Verbindung ein oder mehrere Alkalidichromat(e), bevorzugt Kaliumdichromat. In dieser Ausführungsform werden bevorzugt weniger als 30% und besonders bevorzugt weniger als 15% der Chrom(VI)-ionen durch Alkalidichromat geliefert.The galvanic bath according to the invention preferably contains chromium (VI) ions in an amount which corresponds to 200 to 250 g / l chromic acid anhydride. The chromium (VI) ion-providing compound is preferably selected from chromic anhydride (CrO 3 ) and / or alkali dichromates such as Na 2 Cr 2 O 7 and K 2 Cr 2 O 7 . Of the alkali dichromates, K 2 Cr 2 O 7 is preferred. In a particularly preferred embodiment, the chromium (VI) ion-providing compound is chromic anhydride. In a further embodiment, part of the chromium (VI) ion-providing compound is one or more alkali dichromate (s), preferably potassium dichromate. In this embodiment, preferably less than 30% and particularly preferably less than 15% of the chromium (VI) ions are supplied by alkali dichromate.
Das molare Konzentrationsverhältnis von Chrom(VI)-ionen zu Sulfationen im galvanischen Bad beträgt vorzugsweise 100:1 bis 105:1. Die einsetzbaren löslichen Salze der Schwefelsäure werden bevorzugt ausgewählt aus Natriumsulfat, Kaliumsulfat, Lithiumsulfat, Ammoniumsulfat, Magnesiumsulfat, Strontiumsulfat, Aluminiumsulfat und Kaliumaluminiumsulfat. Besonders bevorzugt ist StrontiumsulfatThe molar concentration ratio of chromium (VI) ions to sulfate ions in the electroplating bath is preferably 100: 1 to 105: 1. The soluble salts of sulfuric acid which can be used are preferably selected from sodium sulfate, potassium sulfate, lithium sulfate, ammonium sulfate, magnesium sulfate, strontium sulfate, aluminum sulfate and potassium aluminum sulfate. Strontium sulfate is particularly preferred
In einer bevorzugten Ausführungsform umfaßt das Bad 2-Hydroxyethansulfonationen in einer Menge, die 0,07 bis 1,5/l des Natriumsalzes entspricht. Die im erfindungsgemäßen galvanischen Bad enthaltenen 2-Hydroxyethansulfonationen können bereitgestellt werden durch die 2-Hydroxyethansulfonsäure selbst oder ein Salz davon, bevorzugt das Natriumsalz.In a preferred embodiment, the bath comprises 2-hydroxyethanesulfonate ions in an amount corresponding to 0.07 to 1.5 / l of the sodium salt. The 2-hydroxyethanesulfonate ions contained in the galvanic bath according to the invention can be provided by the 2-hydroxyethanesulfonic acid itself or a salt thereof, preferably the sodium salt.
Das erfindungsgemäße galvanische Chrombad kann in den in dieser Technik gewöhnlich eingesetzten Galvanisieranlagen und mit den hierbei gängigen Arbeitsweisen sowie für die hierbei üblichen Beschichtungszwecke auf den üblicherweise vorgesehenen Grundmaterialien eingesetzt werden. Solche Grundmaterialien können z.B. Gegenstände aus leitenden Materialien wie Metall, insbesondere Stahl, und metallisierte, nicht-leitende Gegenstände sein.The electroplating chrome bath according to the invention can be used in the electroplating systems usually used in this technology and with the usual working methods as well as for the usual coating purposes on the normally provided basic materials. Such base materials can be, for example, objects made of conductive materials such as metal, in particular steel, and metallized, non-conductive objects.
Das erfindungsgemäße galvanische Bad wird zweckmäßig bei Temperaturen zwischen 30 und 70°C eingesetzt.The galvanic bath according to the invention is expediently used at temperatures between 30 and 70 ° C.
Wird die galvanische Abscheidung aus einem solchen Bad bei einer Temperatur von ≤ 50°C durchgeführt, so lassen sich Chromschichten mit weitestgehend gleichmäßiger kalottenförmiger Mikrostruktur und Rauhigkeitswerten Rz bis etwa 40 µm erzeugen. Eine solche Abscheidung wird bevorzugt im Temperaturbereich 40 und 50°C, bevorzugt zwischen 42 und 48°C und besonders bevorzugt zwischen 44 und 46°C vorgenommen.If the galvanic deposition from such a bath is carried out at a temperature of 50 50 ° C., chrome layers with a largely uniform dome-shaped microstructure and roughness values Rz of up to approximately 40 μm can be produced. Such a deposition is preferably carried out in the temperature range 40 and 50 ° C., preferably between 42 and 48 ° C. and particularly preferably between 44 and 46 ° C.
Wird die galvanische Abscheidung aus einem solchen Bad bei einer Temperatur von ≤ 50°C durchgeführt, so lassen sich rißarme glatte Chromschichten erzeugen. Eine solche Abscheidung wird bevorzugt im Temperaturbereich zwischen 51 und 61 °C, bevorzugt zwischen 53 und 59°C und besonders bevorzugt zwischen 55 und 57°C vorgenommen.If the galvanic deposition from such a bath is carried out at a temperature of ≤ 50 ° C, smooth chrome layers with little cracks can be produced. Such a deposition is preferably carried out in the temperature range between 51 and 61 ° C., preferably between 53 and 59 ° C. and particularly preferably between 55 and 57 ° C.
Es ist also auf diese Weise ohne weiteres möglich, aus ein und dem selben erfindungsgemäßen Chrombad nur durch Variation der Badtemperatur während der galvanischen Abscheidung einen dreischichtigen Schichtaufbau auf der Unterlage vorzunehmen, wobei zweckmäßigerweise als erste Schicht eine rißarme glatte Grundschicht, darauf folgend eine Strukturchromschicht und abschließend eine rißarme glatte Funktionsschicht vorgesehen sind. Mit dem erfindungsgemäßen Chrombad kann direkt auf das Grundmaterial, etwa Stahl, abgeschieden werden. Galvanische Vorbeschichtungen, insbesondere mit Nickel, sind nicht erforderlich.It is thus possible in this way without further ado to make a three-layer build-up on the substrate from one and the same chrome bath according to the invention only by varying the bath temperature during the electrodeposition, expediently as a first layer a low-crack, smooth base layer, subsequently a structured chrome layer and finally a low-crack smooth functional layer are provided. The chrome bath according to the invention can be used to deposit directly onto the base material, for example steel. Galvanic precoatings, especially with nickel, are not necessary.
Zur Abscheidung einer strukturierten Hartchromschicht auf einem Gegenstand wird dieser, als Kathode geschaltet, in das erfindungsgemäße galvanische Bad eingebracht. Dabei ist es ausreichend, wenn der Gegenstand auf Maß geschliffen ist. Eine weitere Oberflächenbearbeitung sowie insbesondere galvanische Vorbeschichtungen sind nicht erforderlich. Für eine besonders gleichmäßige Beschichtung ist es vorteilhaft, das Bad laufend umzuwälzen und/oder den zu beschichtenden Gegenstand im Bad in Rotation zu halten.In order to deposit a structured hard chrome layer on an object, the latter, when connected as a cathode, is introduced into the galvanic bath according to the invention. It is sufficient if the object is ground to size. Further surface processing and in particular electroplating are not necessary. For a particularly uniform coating, it is advantageous to continuously circulate the bath and / or to keep the object to be coated rotating in the bath.
Das erfindungsgemäße Verfahren kann in der folgenden Weise durchgeführt werden:The process according to the invention can be carried out in the following way:
In einem ersten Schritt wird eine Grundschicht in Form einer glatten rißarmen Chromschicht bei einer Temperatur im Bereich von 50 bis 70°C, bevorzugt von 51 bis 61°C, besonders bevorzugt von 53 bis 59°C und am meisten bevorzugt von 55 bis 57°C abgeschieden. Die Stromdichte kann hierbei bis zu 50 A/dm2 betragen. Bei einer Abscheidedauer TP von 10 bis 15 Minuten kann hierbei eine Grundschichtdicke von 6-9 µm erreicht werden. Zweckmäßigerweise wird vor dem Beginn der Abscheidung eine Wartezeit TW eingelegt, während der Gegenstand die Temperatur des Bades annimmt. Diese Zeit kann je nach Größe des Objektes und Temperaturdifferenz 1 bis 10 Minuten betragen. Es ist vorteilhaft, vor der Abscheidung einen Aktivierungsschritt einzulegen, bei dem der Gegenstand positiv gepolt wird. Die Stromdichte kann hierbei bis zu 30 A/dm2 betragen. Als Zeitdauer TP sind 1 bis 2 Minuten ausreichend. Die erhaltene Grundschicht weist in der Regel eine Mikrohärte von 800 bis 950 HV 0,1 auf.In a first step, a base layer in the form of a smooth, low-crack chrome layer at a temperature in the range from 50 to 70 ° C, preferably from 51 to 61 ° C, particularly preferably from 53 to 59 ° C and most preferably from 55 to 57 ° C deposited. The current density can be up to 50 A / dm 2 . With a deposition time TP of 10 to 15 minutes, a base layer thickness of 6-9 µm can be achieved. A waiting time TW is expediently inserted before the start of the deposition while the object takes on the temperature of the bath. This time can be 1 to 10 minutes depending on the size of the object and the temperature difference. It is advantageous to insert an activation step before the deposition, in which the object is poled positively. The current density can be up to 30 A / dm 2 . 1 to 2 minutes is sufficient as the duration TP. The base layer obtained generally has a microhardness of 800 to 950 HV 0.1.
Im zweiten Schritt erfolgt die eigentliche Abscheidung der Strukturchromschicht aus dem gleichen Bad. Hierfür ist die Badtemperatur auf 30 bis 50°C, bevorzugt auf 40 bis 50°C, besonders bevorzugt auf 42 bis 48°C und am meisten bevorzugt auf 44 bis 46°C einzustellen. Auch in diesem Schritt ist es zweckmäßig, vor dem Beginn der Abscheidung eine Wartezeit TW und einen Aktivierungsschritt mit den bereits genannten Parametern einzulegen. Die Abscheidung erfolgt zweckmäßigerweise bei einer Stromdichte von 75 bis 90 A/dm2. Bei einer Abscheidedauer TP von 10 bis 30 Minuten kann hierbei eine Dicke der Strukturschicht von 14 bis 40 µm erreicht werden. Die erhaltene Strukturschicht weist normalerweise eine Mikrohärte von 850 bis 900 HV 0,1 auf. Die Strukturschicht erhält eine Rauhigkeit Rz von bis zu etwa 40 µm.In the second step, the actual deposition of the structured chrome layer takes place from the same bath. For this, the bath temperature is to be set to 30 to 50 ° C., preferably to 40 to 50 ° C., particularly preferably to 42 to 48 ° C. and most preferably to 44 to 46 ° C. In this step, too, it is expedient to insert a waiting time TW and an activation step with the parameters already mentioned before the start of the deposition. The deposition is expediently carried out at a current density of 75 to 90 A / dm 2 . With a deposition time TP of 10 to 30 minutes, a thickness of the structural layer of 14 to 40 µm can be achieved. The structure layer obtained normally has a microhardness of 850 to 900 HV 0.1. The structure layer has a roughness Rz of up to about 40 μm.
Im dritten Schritt wird die Strukturchromschicht mit einer dünnen, glatten Hartchromschicht, der Funktionsschicht, überzogen, wiederum aus dem gleichen Bad. Hierzu wird das Bad auf eine Temperatur im Bereich von 50 bis 70°C, bevorzugt von 51 bis 61 °C, besonders bevorzugt von 53 bis 59°C und am meisten bevorzugt von 55 bis 57°C gebracht und dann bei einer Stromdichte bis 50 A/dm2 abgeschieden. Bei einer Abscheidedauer TP von 5 bis 15 Minuten kann hierbei eine Schichtdicke der Funktionsschicht von 3 bis 9 µm erreicht werden. Die Funktionsschicht weist normalerweise eine Mikrohärte von 1 000 bis 1050 HV 0,1 auf. Durch die abschließende dünne Hartchromschicht wird die Rauhigkeit der Strukturschicht praktisch nicht verändert. Auch in diesem Schritt ist es wiederum zweckmäßig, vor dem Beginn der Abscheidung eine Wartezeit TW und einen Aktivierungsschritt mit den bereits genannten Parametern einzulegen.In the third step, the structural chrome layer is coated with a thin, smooth hard chrome layer, the functional layer, again from the same bath. For this purpose, the bath is brought to a temperature in the range from 50 to 70 ° C., preferably from 51 to 61 ° C., particularly preferably from 53 to 59 ° C. and most preferably from 55 to 57 ° C. and then at a current density up to 50 A / dm 2 deposited. With a deposition time TP of 5 to 15 minutes, a layer thickness of the functional layer of 3 to 9 µm can be achieved. The functional layer normally has a microhardness of 1,000 to 1050 HV 0.1. The final thin hard chrome layer practically does not change the roughness of the structural layer. In this step, too, it is advisable to use the At the beginning of the separation, insert a waiting time TW and an activation step with the parameters already mentioned.
Bei allen Abscheideschritten ist es weiterhin vorteilhaft, vor den jeweiligen Abscheidezeiten eine Rampenzeit TR vorzusehen, in der die Stromdichte auf den entsprechenden Wert geregelt wird. Die Rampenzeit TR kann jeweils 1 bis 5 Minuten betragen.In all separation steps, it is also advantageous to provide a ramp time TR before the respective separation times, in which the current density is regulated to the corresponding value. The ramp time TR can be 1 to 5 minutes each.
Das Verfahren zeichnet sich, im Gegensatz zu Verfahren nach dem Stand der Technik, durch eine besonders einfache Stromdichteführung aus. So ist es zur Erzeugung dünner gleichmäßigen, gut strukturierten Hartchromstrukturbeschichtung ohne weiteres ausreichend, in den jeweiligen Schritten den Anstieg der Stromdichte auf den jeweiligen Sollwert bzw. den jeweiligen Abstieg linear zu führen. Hierdurch werden andernfalls erforderliche, technisch aufwendige und damit teuere Strom- und Spannungsregeleinheiten und deren aufwendige Programmierung nicht benötigt. Es kann aber auch im Einzelfall günstig und vorteilhaft sein, die Stromdichte in Stufen auf den Maximalwert bzw. wieder herunterzuregeln.In contrast to methods according to the prior art, the method is distinguished by a particularly simple current density control. In order to produce thin, uniform, well-structured hard chrome structure coatings, it is simply sufficient to linearly increase the current density to the respective setpoint or the respective descent in the respective steps. As a result, otherwise required, technically complex and thus expensive current and voltage regulating units and their complex programming are not required. However, it can also be favorable and advantageous in individual cases to regulate the current density in steps to the maximum value or down again.
Bei diesem Vorgehen erhält man auf der Oberfläche des Gegenstandes eine strukturierte Hartchromschicht, die sich durch eine besonders dichte und gleichmäßige Verteilung von sehr gut ausgebildeten kalottenförmigen Erhebungen auszeichnet. Es kann eine Schicht mit einer Spitzenzahl von 75 bis 100/cm erhalten werden. Je nach Wahl der Abscheidebedingungen, insbesondere im Schritt der Strukturbeschichtung, können Rauhigskeitswerte Rz bis zu 40 µm erzielt werden.With this procedure, a structured hard chrome layer is obtained on the surface of the object, which is characterized by a particularly dense and uniform distribution of very well-formed dome-shaped elevations. A layer with a peak number of 75 to 100 / cm can be obtained. Depending on the selection of the deposition conditions, especially in the step of the structural coating, roughness values Rz up to 40 µm can be achieved.
Das erfindungsgemäße Verfahren kann verwendet werden, um eine Chromschicht auf Bauteilen, insbesondere Maschinenbauteilen, zu erzeugen. In einer bevorzugten Ausführungsform wird das Verfahren verwendet, um eine strukturierte Hartchromschicht auf in gleitendem Kontakt miteinander stehenden Maschinenbauteilen, insbesondere Kolben, Zylindern, Laufbuchsen und Achslagern, auf Walzen, Trommeln oder Zylindern der graphischen Industrie, insbesondere Farbwalzen und Feuchtreibzylindern, und auf Werkzeugen zu erzeugen.The method according to the invention can be used to generate a chrome layer on components, in particular machine components. In a preferred embodiment, the method is used to produce a structured hard chrome layer on machine components in sliding contact with one another, in particular pistons, cylinders, bushings and axle bearings, on rollers, drums or cylinders in the graphics industry, in particular ink rollers and dampening cylinders, and on tools ,
In einer beispielhaften Ausführungsform der Erfindung enthalten 100 I Bad 20,450 kg Chromsäureanhydrid, 2,500 kg Kaliumdichromat, 0,550 kg Strontiumsulfat und 3,5 g 2-Hydroxyethansulfonsäure-Natriumsalz. Hieraus ergeben sich als Konzentrationswerte im Bad 222 g/l Chromsäureanhydrid, 2,2 g/l freies Sultat und 0,035 g/l 2-Hydroxyethansulfonsäure-Natriumsalz. Zur Strukturverchromung am Beispiel eines Walzzylinders aus dem Grundwerkstoff Stahl St 52 werden etwa folgende Verfahrensparameter gewählt
Die erhaltene Strukturchromschicht weist eine Rauhigkeit Rz von 35 bis 40 µm und eine Spitzenzahl von 75-100/cm bei einer äußerst gleichmäßigen Verteilung von sehr gut ausgebildeten kalottenförmigen Erhebungen auf.The structure chrome layer obtained has a roughness Rz of 35 to 40 μm and a peak number of 75-100 / cm with an extremely uniform distribution of very well-formed dome-shaped elevations.
Fig. 1 zeigt die REM-Aufnahme der Oberfläche des beispielhaft mit dem erfindungsgemäßen Chrombad und gemäß dem erfindungsgemäßen Verfahren strukturverchromten Walzzylinders bei einer Vergrößerung von 30:1. Es ist deutlich die dichte und gleichmäßige Verteilung von kalottenförmigen Erhebungen zu erkennen.1 shows the SEM image of the surface of the roll cylinder, which is chromium-plated by way of example with the chrome bath according to the invention and according to the method according to the invention, at a magnification of 30: 1. The dense and even distribution of dome-shaped elevations can be clearly seen.
Fig. 2 zeigt einen Ausschnitt aus diesem Bereich bei einer Vergrößerung von 400:1, bei der die Topographie der Struktur verdeutlicht wird.2 shows a section of this area at a magnification of 400: 1, in which the topography of the structure is clarified.
Fig. 3 zeigt die REM-Aufnahme eines Querschliffes durch die Schicht bei einer Vergrößerung von 400:1.3 shows the SEM image of a cross section through the layer at an enlargement of 400: 1.
Claims (17)
- Galvanic bath which contains in aqueous solution at least one compound providing chromium (VI) ions and comprisesa) Chromium (VI) ions in an amount which corresponds to 100 to 600 g/l chromic acid anhydrideb) Sulphate ions in the form of sulphuric acid and/or a soluble salt thereof in a molar concentration ratio of chromium (VI) ions to sulphate ions (SO4 2-) of 90:1 to 120:1, andc) 2-hydroxyethane sulphonate ions in an amount which corresponds to 0.01 to 3.0 g/l of the sodium salt.
- Galvanic bath according to claim 1 characterised in that the bath comprises chromium (VI) ions in an amount which corresponds to 200 to 250 g/l chromic acid anhydride.
- Galvanic bath according to claim 1 or 2 characterised in that the compound providing chromium (VI) ions is selected from chromic acid anhydride and/or alkali dichromates.
- Galvanic bath according to one of claims 1 to 3 characterised in that the molar concentration ratio of chromium (VI) ions to sulphate ions amounts to 100:1 to 105:1.
- Galvanic bath according to one of claims 1 to 4 characterised in that it comprises sulphate ions in the form of sulphuric acid, sodium, potassium, lithium, ammonium, magnesium, strontium, aluminium and/or potassium aluminium sulphate.
- Galvanic bath according to claim 5 characterised in that it comprises sulphate ions in the form of strontium sulphate.
- Galvanic bath according to one of claims 1 to 6 characterised in that the bath contains 0.07 to 1.5 g/l 2-hydroxyethane sulphonate, calculated as sodium salt.
- Process for chromium coating characterised in that chromium is precipitated from a galvanic bath according to one of claims 1 to 7 on to an article connected as cathode.
- Process according to claim 8 comprising the following steps:a) Precipitation of a base chromium layer at a temperature of ≥50°C,b) precipitation of a structured chromium layer at a temperature of ≤50°C, andc) precipitation of a functional chromium layer at a temperature of ≥50°C.
- Process according to claim 9 characterised in that independently of one another step a) is carried out at a temperature in the range between 51 and 61°C, step b) at a temperature in the range between 40 and 50°C, and step c) at a temperature in the range between 51 and 61°C.
- Process according to claim 9 or 10 characterised in that independently of one another the deposition of the basic chromium layer in step a) is carried out at a current density of up to 50A/dm2, the deposition of the structured chromium layer in step b) at a current density of 70 to 90A/dm2, and the deposition of the functional chromium layer in step c) at a current density of up to 50A/dm2.
- Process according to one of claims 9 to 11 characterised in that the rise and/or fall of the current density in the steps a), b), and/or c) from the starting to the finishing value or vice versa is carried out linearly in each case.
- Process according to one of claims 9 to 11 characterised in that the rise and/or fall of the current density in the steps a), b), and/or c) from the starting to the finishing value or vice versa is carried out stepwise in each case.
- Process according to one of claims 9 to 13 characterised in that independently of one another before one or more of the steps a), b) and c) an activation is carried out at a current density of up to 30 A/dm2 and positive polarisation of the article.
- Use of the process according to one of claims 9 to 14 to generate a chromium layer on a component.
- Use according to claim 15 characterised in that a structured hard chromium layer is generated on machine components in sliding contact with one another, particularly pistons, cylinders, running bearings and axle bearings on rollers in the graphic industry, particularly inking rollers and damping distributor cylinders, or on tools.
- Use according to claim 15 characterised in that a structured hard chromium layer is generated on sheet guiding cylinders or drums in the graphic industry.
Applications Claiming Priority (3)
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DE19828545A DE19828545C1 (en) | 1998-06-26 | 1998-06-26 | Galvanic bath for forming a hard chromium layer on machine parts |
DE19828545 | 1998-06-26 | ||
PCT/EP1999/004412 WO2000000672A2 (en) | 1998-06-26 | 1999-06-24 | Galvanic bath, method for producing structured hard chromium layers and use thereof |
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EP1097261A2 EP1097261A2 (en) | 2001-05-09 |
EP1097261B1 true EP1097261B1 (en) | 2003-01-29 |
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US (1) | US6447666B1 (en) |
EP (1) | EP1097261B1 (en) |
JP (1) | JP2002519514A (en) |
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CN (1) | CN1191392C (en) |
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DE (2) | DE19828545C1 (en) |
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1998
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WO2000000672A2 (en) | 2000-01-06 |
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CA2334708A1 (en) | 2000-01-06 |
KR20010072627A (en) | 2001-07-31 |
WO2000000672A3 (en) | 2000-06-29 |
DE19828545C1 (en) | 1999-08-12 |
CN1191392C (en) | 2005-03-02 |
EP1097261A2 (en) | 2001-05-09 |
DE59904174D1 (en) | 2003-03-06 |
CN1307652A (en) | 2001-08-08 |
CZ299000B6 (en) | 2008-04-02 |
ATE231933T1 (en) | 2003-02-15 |
RU2202005C2 (en) | 2003-04-10 |
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