DE69901937T2 - Verfahren zur herstellung von elektroden - Google Patents
Verfahren zur herstellung von elektrodenInfo
- Publication number
- DE69901937T2 DE69901937T2 DE69901937T DE69901937T DE69901937T2 DE 69901937 T2 DE69901937 T2 DE 69901937T2 DE 69901937 T DE69901937 T DE 69901937T DE 69901937 T DE69901937 T DE 69901937T DE 69901937 T2 DE69901937 T2 DE 69901937T2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- substrate
- conductive
- electrode
- refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 38
- 239000004973 liquid crystal related substance Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000004020 conductor Substances 0.000 claims description 17
- 238000000059 patterning Methods 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 8
- 239000010931 gold Substances 0.000 claims description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 238000000608 laser ablation Methods 0.000 claims description 6
- 229910003437 indium oxide Inorganic materials 0.000 claims description 5
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 5
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 229920003002 synthetic resin Polymers 0.000 claims description 4
- 239000000057 synthetic resin Substances 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 claims description 3
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 claims description 3
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 2
- 229910001020 Au alloy Inorganic materials 0.000 claims description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 126
- 230000008569 process Effects 0.000 description 16
- 238000000429 assembly Methods 0.000 description 11
- 230000000712 assembly Effects 0.000 description 11
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- 239000004033 plastic Substances 0.000 description 7
- 229920003023 plastic Polymers 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 241000270711 Malaclemys terrapin Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- HECLRDQVFMWTQS-HORUIINNSA-N bis[cyclopentadiene] Chemical compound C1C2[C@H]3CC=C[C@H]3C1C=C2 HECLRDQVFMWTQS-HORUIINNSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 poly(alkyl) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/05—Bonding or intermediate layer characterised by chemical composition, e.g. sealant or spacer
- C09K2323/051—Inorganic, e.g. glass or silicon oxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Position Input By Displaying (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/009,391 US6379509B2 (en) | 1998-01-20 | 1998-01-20 | Process for forming electrodes |
| PCT/US1999/001133 WO1999036261A1 (en) | 1998-01-20 | 1999-01-20 | Process for forming electrodes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69901937D1 DE69901937D1 (de) | 2002-08-01 |
| DE69901937T2 true DE69901937T2 (de) | 2002-10-31 |
Family
ID=21737366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69901937T Expired - Lifetime DE69901937T2 (de) | 1998-01-20 | 1999-01-20 | Verfahren zur herstellung von elektroden |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6379509B2 (enExample) |
| EP (1) | EP1056596B1 (enExample) |
| JP (1) | JP2002509272A (enExample) |
| KR (1) | KR100606214B1 (enExample) |
| DE (1) | DE69901937T2 (enExample) |
| WO (1) | WO1999036261A1 (enExample) |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379509B2 (en) * | 1998-01-20 | 2002-04-30 | 3M Innovative Properties Company | Process for forming electrodes |
| WO2000070405A1 (en) | 1999-05-14 | 2000-11-23 | 3M Innovative Properties Company | Ablation enhancement layer |
| US6652981B2 (en) | 2000-05-12 | 2003-11-25 | 3M Innovative Properties Company | Etching process for making electrodes |
| US6762124B2 (en) | 2001-02-14 | 2004-07-13 | Avery Dennison Corporation | Method for patterning a multilayered conductor/substrate structure |
| US20020110673A1 (en) | 2001-02-14 | 2002-08-15 | Ramin Heydarpour | Multilayered electrode/substrate structures and display devices incorporating the same |
| JP2002343562A (ja) * | 2001-05-11 | 2002-11-29 | Pioneer Electronic Corp | 発光ディスプレイ装置及びその製造方法 |
| US6727970B2 (en) | 2001-06-25 | 2004-04-27 | Avery Dennison Corporation | Method of making a hybrid display device having a rigid substrate and a flexible substrate |
| US6856086B2 (en) | 2001-06-25 | 2005-02-15 | Avery Dennison Corporation | Hybrid display device |
| US6811815B2 (en) | 2002-06-14 | 2004-11-02 | Avery Dennison Corporation | Method for roll-to-roll deposition of optically transparent and high conductivity metallic thin films |
| US7338820B2 (en) * | 2002-12-19 | 2008-03-04 | 3M Innovative Properties Company | Laser patterning of encapsulated organic light emitting diodes |
| GB0302485D0 (en) * | 2003-02-04 | 2003-03-05 | Plastic Logic Ltd | Pixel capacitors |
| US7759609B2 (en) * | 2003-03-06 | 2010-07-20 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Method for manufacturing a patterned structure |
| US6950157B2 (en) | 2003-06-05 | 2005-09-27 | Eastman Kodak Company | Reflective cholesteric liquid crystal display with complementary light-absorbing layer |
| US20050237473A1 (en) | 2004-04-27 | 2005-10-27 | Stephenson Stanley W | Coatable conductive layer |
| US20060134564A1 (en) * | 2004-12-20 | 2006-06-22 | Eastman Kodak Company | Reflective display based on liquid crystal materials |
| US7630029B2 (en) | 2005-02-16 | 2009-12-08 | Industrial Technology Research Institute | Conductive absorption layer for flexible displays |
| US7557875B2 (en) | 2005-03-22 | 2009-07-07 | Industrial Technology Research Institute | High performance flexible display with improved mechanical properties having electrically modulated material mixed with binder material in a ratio between 6:1 and 0.5:1 |
| US7531239B2 (en) * | 2005-04-06 | 2009-05-12 | Eclipse Energy Systems Inc | Transparent electrode |
| US7564528B2 (en) | 2005-05-20 | 2009-07-21 | Industrial Technology Research Institute | Conductive layer to reduce drive voltage in displays |
| US20060261924A1 (en) * | 2005-05-20 | 2006-11-23 | Swenson Edward J | Method of forming passive electronic components on a substrate by direct write technique using shaped uniform laser beam |
| US20090090914A1 (en) * | 2005-11-18 | 2009-04-09 | Koki Yano | Semiconductor thin film, method for producing the same, and thin film transistor |
| US7507449B2 (en) | 2006-05-30 | 2009-03-24 | Industrial Technology Research Institute | Displays with low driving voltage and anisotropic particles |
| US7754295B2 (en) | 2006-06-29 | 2010-07-13 | Industrial Technology Research Institute | Single substrate guest-host polymer dispersed liquid crystal displays |
| DE102007024152A1 (de) * | 2007-04-18 | 2008-10-23 | Osram Opto Semiconductors Gmbh | Organisches optoelektronisches Bauelement |
| EP2151144A2 (de) * | 2007-04-27 | 2010-02-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Scheinwerfer für ein kraftfahrzeug |
| KR100969714B1 (ko) * | 2007-05-18 | 2010-07-14 | 홍완식 | 축사의 분뇨가스 차단장치 |
| KR101008567B1 (ko) * | 2008-07-16 | 2011-01-19 | 대한민국 | 악취저감형 돈사 |
| US8228306B2 (en) * | 2008-07-23 | 2012-07-24 | Flextronics Ap, Llc | Integration design for capacitive touch panels and liquid crystal displays |
| US9128568B2 (en) * | 2008-07-30 | 2015-09-08 | New Vision Display (Shenzhen) Co., Limited | Capacitive touch panel with FPC connector electrically coupled to conductive traces of face-to-face ITO pattern structure in single plane |
| TWI381227B (zh) * | 2008-08-12 | 2013-01-01 | Ind Tech Res Inst | 透明導電膜與其形成方法 |
| US8209861B2 (en) | 2008-12-05 | 2012-07-03 | Flextronics Ap, Llc | Method for manufacturing a touch screen sensor assembly |
| US8274486B2 (en) * | 2008-12-22 | 2012-09-25 | Flextronics Ap, Llc | Diamond pattern on a single layer |
| US20100156811A1 (en) * | 2008-12-22 | 2010-06-24 | Ding Hua Long | New pattern design for a capacitive touch screen |
| US20100156846A1 (en) * | 2008-12-23 | 2010-06-24 | Flextronics Ap, Llc | Single substrate capacitive touch panel |
| CN101943978B (zh) * | 2009-07-06 | 2012-12-26 | 弗莱克斯电子有限责任公司 | 电容触摸屏面板及其制造方法、电容触摸传感器 |
| JP2011150455A (ja) * | 2010-01-20 | 2011-08-04 | Sony Corp | 入力装置、入力機能付き装置付き電気光学装置、および入力装置の製造方法 |
| US9285929B2 (en) | 2010-03-30 | 2016-03-15 | New Vision Display (Shenzhen) Co., Limited | Touchscreen system with simplified mechanical touchscreen design using capacitance and acoustic sensing technologies, and method therefor |
| WO2012092972A1 (de) * | 2011-01-06 | 2012-07-12 | Heliatek Gmbh | Elektronisches oder optoelektronisches bauelement mit organischen schichten |
| US8482713B2 (en) * | 2011-02-04 | 2013-07-09 | Apple Inc. | Laser processing of display components for electronic devices |
| US9425571B2 (en) * | 2012-01-06 | 2016-08-23 | Johnson & Johnson Vision Care, Inc. | Methods and apparatus to form electrical interconnects on ophthalmic devices |
| US8525955B2 (en) | 2012-01-31 | 2013-09-03 | Multek Display (Hong Kong) Limited | Heater for liquid crystal display |
| US8988636B2 (en) | 2012-09-20 | 2015-03-24 | Apple Inc. | Methods for trimming polarizers in displays |
| US9703139B2 (en) | 2012-09-20 | 2017-07-11 | Apple Inc. | Methods for trimming polarizers in displays |
| US9753317B2 (en) | 2012-12-21 | 2017-09-05 | Apple Inc. | Methods for trimming polarizers in displays using edge protection structures |
| WO2014137801A1 (en) * | 2013-03-03 | 2014-09-12 | John Moore | Temporary adhesive with tunable adhesion force sufficient for processing thin solid materials |
| DE102013214249A1 (de) * | 2013-07-22 | 2015-01-22 | Bayerische Motoren Werke Aktiengesellschaft | Verfahren zum Herstellen eines Folienverbunds und Folienverbund |
| KR101492215B1 (ko) | 2013-07-26 | 2015-02-12 | 부산대학교 산학협력단 | RF/DC 동시인가 마그네트론 스퍼터링법을 이용한 ITO:Ce 초박막, 이의 제조방법 및 이를 포함하는 터치 패널 |
| JP6450998B2 (ja) * | 2014-03-07 | 2019-01-16 | エルジー・ケム・リミテッド | 光変調装置｛ｌｉｇｈｔ ｍｏｄｕｌａｔｉｏｎ ｄｅｖｉｃｅ｝ |
| KR101959468B1 (ko) * | 2015-03-26 | 2019-03-18 | 주식회사 엘지화학 | 액정 소자 및 이의 용도 |
| KR101959470B1 (ko) * | 2015-03-27 | 2019-03-18 | 주식회사 엘지화학 | 반사형 액정 소자 및 이의 용도 |
| KR101953368B1 (ko) * | 2015-04-30 | 2019-02-28 | 주식회사 엘지화학 | 액정 소자 |
| US20170087873A1 (en) * | 2015-07-06 | 2017-03-30 | Custom Engraving, Inc. | Method of ablating and printing on firearms and the resulting product |
| TWI746603B (zh) * | 2016-08-09 | 2021-11-21 | 南韓商東友精細化工有限公司 | 透明電極、包括其的觸控感測器及影像顯示裝置 |
| PL233211B1 (pl) * | 2017-01-25 | 2019-09-30 | Saule Spolka Z Ograniczona Odpowiedzialnoscia | Folia optoelektroniczna oraz sposób wytwarzania folii optoelektronicznej |
| KR102394802B1 (ko) * | 2017-10-11 | 2022-05-04 | 현대자동차주식회사 | 운송 수단용 고분자 분산형 액정 필름 및 이를 포함하는 운송 수단 |
Family Cites Families (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5944993B2 (ja) | 1978-07-11 | 1984-11-02 | 帝人株式会社 | 積層体 |
| DE3065169D1 (en) | 1979-08-31 | 1983-11-10 | Teijin Ltd | Heat wave-reflective or electrically conductive laminated structure |
| JPS5761553A (en) | 1980-09-25 | 1982-04-14 | Toray Industries | Laminated film |
| FR2499744B1 (fr) | 1981-01-05 | 1986-07-04 | Commissariat Energie Atomique | Dispositif d'affichage matriciel comprenant deux familles d'electrodes lignes et son procede de commande |
| DE3271844D1 (en) | 1981-10-19 | 1986-07-31 | Teijin Ltd | Selectively light transmitting film and preformed laminar structure |
| JPS5910988A (ja) | 1982-07-12 | 1984-01-20 | ホシデン株式会社 | カラ−液晶表示器 |
| US4815079A (en) | 1987-12-17 | 1989-03-21 | Polaroid Corporation | Optical fiber lasers and amplifiers |
| US4937129A (en) * | 1988-01-06 | 1990-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Thin film pattern structure formed on a glass substrate |
| US4931158A (en) | 1988-03-22 | 1990-06-05 | The Regents Of The Univ. Of Calif. | Deposition of films onto large area substrates using modified reactive magnetron sputtering |
| JPH063506B2 (ja) * | 1988-07-27 | 1994-01-12 | 日本板硝子株式会社 | カラー液晶表示用透明基板 |
| FR2638893B1 (fr) * | 1988-11-10 | 1990-12-14 | Thomson Tubes Electroniques | Substrat electriquement isolant |
| JPH0618276B2 (ja) * | 1988-11-11 | 1994-03-09 | サンケン電気株式会社 | 半導体装置 |
| US5343216A (en) | 1989-01-31 | 1994-08-30 | Sharp Kabushiki Kaisha | Active matrix substrate and active matrix display apparatus |
| NO894656L (no) | 1989-02-07 | 1990-08-08 | Autodisplay As | Fremgangsmaate for fremstilling av et elektrodemoenster paa et substrat. |
| DE3925970A1 (de) | 1989-08-05 | 1991-02-07 | Hoechst Ag | Elektrisch leitfaehige polymere und ihre verwendung als orientierungsschicht in fluessigkristall-schalt- und -anzeigeelementen |
| US4938129A (en) * | 1989-09-28 | 1990-07-03 | Pitney Bowes | Mailing machine including improved impression roller |
| US5105291A (en) * | 1989-11-20 | 1992-04-14 | Ricoh Company, Ltd. | Liquid crystal display cell with electrodes of substantially amorphous metal oxide having low resistivity |
| JP2875363B2 (ja) | 1990-08-08 | 1999-03-31 | 株式会社日立製作所 | 液晶表示装置 |
| JP2874986B2 (ja) * | 1990-09-03 | 1999-03-24 | 出光興産株式会社 | 電極のパターン形成方法 |
| DE69226998T2 (de) | 1991-07-19 | 1999-04-15 | Sharp K.K., Osaka | Optisches Modulationselement und Vorrichtungen mit einem solchen Element |
| US5432015A (en) * | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
| US5667880A (en) * | 1992-07-20 | 1997-09-16 | Fuji Photo Optical Co., Ltd. | Electroconductive antireflection film |
| JP2912506B2 (ja) * | 1992-10-21 | 1999-06-28 | シャープ株式会社 | 透明導電膜の形成方法 |
| US5508091A (en) * | 1992-12-04 | 1996-04-16 | Photran Corporation | Transparent electrodes for liquid cells and liquid crystal displays |
| JP2794369B2 (ja) | 1992-12-11 | 1998-09-03 | キヤノン株式会社 | 液晶素子 |
| US5268978A (en) | 1992-12-18 | 1993-12-07 | Polaroid Corporation | Optical fiber laser and geometric coupler |
| TW250618B (enExample) * | 1993-01-27 | 1995-07-01 | Mitsui Toatsu Chemicals | |
| US5373576A (en) | 1993-05-04 | 1994-12-13 | Polaroid Corporation | High power optical fiber |
| CA2123658C (en) * | 1993-05-19 | 1999-01-19 | Willis H. Smith, Jr. | Inducing tilted parallel alignment in liquid crystals |
| US5520952A (en) * | 1993-07-16 | 1996-05-28 | Tokyo Ohka Kogyo Co., Ltd. | Method for forming a protective coating film on electronic parts and devices |
| KR0124958B1 (ko) | 1993-11-29 | 1997-12-11 | 김광호 | 액정용 박막트랜지스터 및 그 제조방법 |
| US5418880A (en) | 1994-07-29 | 1995-05-23 | Polaroid Corporation | High-power optical fiber amplifier or laser device |
| US5736267A (en) * | 1994-08-17 | 1998-04-07 | Asahi Glass Company Ltd. | Transparent conductive film and method for its production, and sputtering target |
| US5556694A (en) * | 1994-12-07 | 1996-09-17 | Photran Corporation | Faceplate for a touch-sensitive video display unit |
| JP3565929B2 (ja) * | 1994-12-27 | 2004-09-15 | 大日本印刷株式会社 | 液晶表示素子用プラスチック基板 |
| US5514618A (en) * | 1995-02-23 | 1996-05-07 | Litel Instruments | Process for manufacture of flat panel liquid crystal display using direct laser etch |
| JP2985763B2 (ja) * | 1995-03-22 | 1999-12-06 | 凸版印刷株式会社 | 多層導電膜、並びにこれを用いた透明電極板および液晶表示装置 |
| DE69629613T2 (de) * | 1995-03-22 | 2004-06-17 | Toppan Printing Co. Ltd. | Mehrschichtiger, elektrisch leitender Film, transparentes Elektrodensubstrat und Flüssigkristallanzeige die diesen benutzen |
| JPH09152618A (ja) * | 1995-11-30 | 1997-06-10 | Sony Corp | 平板状表示パネルの製造方法 |
| JPH09171188A (ja) * | 1995-12-18 | 1997-06-30 | Ulvac Japan Ltd | 積層型透明導電膜 |
| JP3592830B2 (ja) * | 1996-03-15 | 2004-11-24 | 日本板硝子株式会社 | 表示素子用基板 |
| JP3785676B2 (ja) * | 1996-04-26 | 2006-06-14 | 旭硝子株式会社 | 透明導電膜付き基体とその製造方法 |
| US5726524A (en) * | 1996-05-31 | 1998-03-10 | Minnesota Mining And Manufacturing Company | Field emission device having nanostructured emitters |
| US6379509B2 (en) * | 1998-01-20 | 2002-04-30 | 3M Innovative Properties Company | Process for forming electrodes |
| US6652981B2 (en) * | 2000-05-12 | 2003-11-25 | 3M Innovative Properties Company | Etching process for making electrodes |
-
1998
- 1998-01-20 US US09/009,391 patent/US6379509B2/en not_active Expired - Lifetime
-
1999
- 1999-01-20 KR KR1020007007912A patent/KR100606214B1/ko not_active Expired - Fee Related
- 1999-01-20 EP EP99904141A patent/EP1056596B1/en not_active Expired - Lifetime
- 1999-01-20 DE DE69901937T patent/DE69901937T2/de not_active Expired - Lifetime
- 1999-01-20 JP JP2000539999A patent/JP2002509272A/ja active Pending
- 1999-01-20 WO PCT/US1999/001133 patent/WO1999036261A1/en not_active Ceased
-
2001
- 2001-09-17 US US09/954,515 patent/US7303809B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1056596B1 (en) | 2002-06-26 |
| WO1999036261A1 (en) | 1999-07-22 |
| KR100606214B1 (ko) | 2006-07-28 |
| US20020114901A1 (en) | 2002-08-22 |
| DE69901937D1 (de) | 2002-08-01 |
| EP1056596A1 (en) | 2000-12-06 |
| KR20010040361A (ko) | 2001-05-15 |
| JP2002509272A (ja) | 2002-03-26 |
| US6379509B2 (en) | 2002-04-30 |
| US7303809B2 (en) | 2007-12-04 |
| US20010050222A1 (en) | 2001-12-13 |
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