DE69719131T2 - Verfahren zur Verbesserung der Bildqualität - Google Patents
Verfahren zur Verbesserung der BildqualitätInfo
- Publication number
- DE69719131T2 DE69719131T2 DE69719131T DE69719131T DE69719131T2 DE 69719131 T2 DE69719131 T2 DE 69719131T2 DE 69719131 T DE69719131 T DE 69719131T DE 69719131 T DE69719131 T DE 69719131T DE 69719131 T2 DE69719131 T2 DE 69719131T2
- Authority
- DE
- Germany
- Prior art keywords
- light
- inhibitor
- oxyl
- weight
- derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 23
- 239000000203 mixture Substances 0.000 claims description 48
- 239000003112 inhibitor Substances 0.000 claims description 46
- 239000000463 material Substances 0.000 claims description 26
- 238000007639 printing Methods 0.000 claims description 25
- 238000006116 polymerization reaction Methods 0.000 claims description 24
- 150000001412 amines Chemical class 0.000 claims description 13
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 9
- VZNHVRPXNXQSTG-UHFFFAOYSA-N decanedioic acid;1-hydroxy-2,2,6,6-tetramethylpiperidin-4-ol Chemical group CC1(C)CC(O)CC(C)(C)N1O.CC1(C)CC(O)CC(C)(C)N1O.OC(=O)CCCCCCCCC(O)=O VZNHVRPXNXQSTG-UHFFFAOYSA-N 0.000 claims description 9
- 239000003999 initiator Substances 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 229910000679 solder Inorganic materials 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 8
- 239000012965 benzophenone Substances 0.000 claims description 7
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims description 7
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 6
- 239000011342 resin composition Substances 0.000 claims description 6
- 244000028419 Styrax benzoin Species 0.000 claims description 5
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 5
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 5
- 229960002130 benzoin Drugs 0.000 claims description 5
- 235000019382 gum benzoic Nutrition 0.000 claims description 5
- 230000002401 inhibitory effect Effects 0.000 claims description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 4
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 claims description 4
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 claims description 3
- 150000004056 anthraquinones Chemical class 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidine Chemical group CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000011230 binding agent Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 238000009472 formulation Methods 0.000 description 17
- 238000012360 testing method Methods 0.000 description 17
- 150000003254 radicals Chemical class 0.000 description 11
- -1 4-(1-oxyl-2,6-di-tert-butyl-benzylidene)-2,6-di-tert-butyl-cyclohexa-2,5-dienone free radical Chemical class 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- SXPLGYBFGPYAHS-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical group C1C(C)(C)N(O)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 SXPLGYBFGPYAHS-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000976 ink Substances 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSGAUKGQUCHWDP-UHFFFAOYSA-N 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-ol Chemical compound CC1(C)CC(O)CC(C)(C)N1O CSGAUKGQUCHWDP-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 239000002516 radical scavenger Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- DRFYZAIGLPMIOS-UHFFFAOYSA-N (1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) benzoate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C1=CC=CC=C1 DRFYZAIGLPMIOS-UHFFFAOYSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical class CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- HOYRZHJJAHRMLL-UHFFFAOYSA-N 2,6-dinitro-p-cresol Chemical group CC1=CC([N+]([O-])=O)=C(O)C([N+]([O-])=O)=C1 HOYRZHJJAHRMLL-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical class OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 description 1
- PXOGBEAGHDNDDM-UHFFFAOYSA-N 2-morpholin-4-yl-1-phenylethanone Chemical compound C=1C=CC=CC=1C(=O)CN1CCOCC1 PXOGBEAGHDNDDM-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- HCUWXYBKPSKTAB-UHFFFAOYSA-N 4-benzylidene-2,6-ditert-butylcyclohexa-2,5-dien-1-one Chemical compound C1=C(C(C)(C)C)C(=O)C(C(C)(C)C)=CC1=CC1=CC=CC=C1 HCUWXYBKPSKTAB-UHFFFAOYSA-N 0.000 description 1
- OCIFJWVZZUDMRL-UHFFFAOYSA-N 6-hydroxyhexyl prop-2-enoate Chemical compound OCCCCCCOC(=O)C=C OCIFJWVZZUDMRL-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 101100240096 Arabidopsis thaliana NAP1 gene Proteins 0.000 description 1
- 229920003319 Araldite® Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- SESFRYSPDFLNCH-UHFFFAOYSA-N benzyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1=CC=CC=C1 SESFRYSPDFLNCH-UHFFFAOYSA-N 0.000 description 1
- TUWIPEVLOCKMNA-UHFFFAOYSA-N benzyl(dimethyl)stannane Chemical compound C[SnH](C)Cc1ccccc1 TUWIPEVLOCKMNA-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- KCDZTIGZDHLICX-UHFFFAOYSA-N bis[4-tert-butyl-2-(trichloromethyl)phenyl]methanone Chemical compound ClC(Cl)(Cl)C1=CC(C(C)(C)C)=CC=C1C(=O)C1=CC=C(C(C)(C)C)C=C1C(Cl)(Cl)Cl KCDZTIGZDHLICX-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011951 cationic catalyst Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- KOMDZQSPRDYARS-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1.C1C=CC=C1 KOMDZQSPRDYARS-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical group C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- YYTYIUAYFBFKHX-UHFFFAOYSA-N n-(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl)acetamide Chemical compound CC(=O)NC1CC(C)(C)N(O)C(C)(C)C1 YYTYIUAYFBFKHX-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- FAQJJMHZNSSFSM-UHFFFAOYSA-N phenylglyoxylic acid Chemical class OC(=O)C(=O)C1=CC=CC=C1 FAQJJMHZNSSFSM-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000004151 quinonyl group Chemical group 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- KXCAEQNNTZANTK-UHFFFAOYSA-N stannane Chemical compound [SnH4] KXCAEQNNTZANTK-UHFFFAOYSA-N 0.000 description 1
- 229910000080 stannane Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US70702096A | 1996-09-10 | 1996-09-10 | |
| US08/820,322 US5912106A (en) | 1996-09-10 | 1997-03-12 | Method for improving photoimage quality |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69719131D1 DE69719131D1 (de) | 2003-03-27 |
| DE69719131T2 true DE69719131T2 (de) | 2003-07-31 |
Family
ID=27107809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69719131T Expired - Fee Related DE69719131T2 (de) | 1996-09-10 | 1997-09-02 | Verfahren zur Verbesserung der Bildqualität |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5912106A (enExample) |
| EP (1) | EP0828195B1 (enExample) |
| JP (1) | JPH1097059A (enExample) |
| KR (1) | KR100536922B1 (enExample) |
| CN (1) | CN1176405A (enExample) |
| BR (1) | BR9704669A (enExample) |
| CA (1) | CA2214913A1 (enExample) |
| DE (1) | DE69719131T2 (enExample) |
| TW (1) | TW401534B (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2344103B (en) * | 1998-11-24 | 2003-04-16 | Ciba Sc Holding Ag | Piperazinone derivatives |
| US6296984B1 (en) * | 1999-03-12 | 2001-10-02 | Agere Systems Guardian Corp. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| US20110071232A1 (en) * | 1999-12-09 | 2011-03-24 | Tunja Jung | Additive composition for increasing the storage stability of ethylenically unsaturated resins |
| US20050192384A1 (en) * | 1999-12-09 | 2005-09-01 | Tunja Jung | Additive composition for increasing the storage stability of ethylenically unsaturated resins |
| JP5362938B2 (ja) * | 1999-12-09 | 2013-12-11 | チバ ホールディング インコーポレーテッド | エチレン性不飽和樹脂の保存安定性を向上させる添加組成物 |
| US6685823B2 (en) * | 2000-10-16 | 2004-02-03 | Uniroyal Chemical Company, Inc. | C-nitrosoaniline compounds and their blends as polymerization inhibitors |
| JP4248875B2 (ja) | 2000-10-16 | 2009-04-02 | ケムチュア コーポレイション | 重合抑制剤としての、キノンアルカイドとニトロキシル化合物の混合物 |
| US6863406B2 (en) * | 2002-08-01 | 2005-03-08 | The University Of Chicago | Apparatus and method for fabricating, sorting, and integrating materials with holographic optical traps |
| DE10255667B4 (de) * | 2002-11-28 | 2006-05-11 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit |
| US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| US20050056954A1 (en) * | 2003-09-12 | 2005-03-17 | Devlin Brian Gerrard | Method for making contact lenses |
| KR101065394B1 (ko) * | 2004-01-09 | 2011-09-16 | 삼성에스디아이 주식회사 | 평판 표시소자의 전자방출원 형성용 조성물 및 그로부터제조되는 전자방출원 |
| US6962763B2 (en) * | 2004-02-25 | 2005-11-08 | Eastman Kodak Company | Silver-free black-and-white thermographic materials |
| JP2006011397A (ja) * | 2004-05-21 | 2006-01-12 | Nippon Kayaku Co Ltd | ネガ型着色感光性組成物 |
| US8132507B2 (en) * | 2004-10-08 | 2012-03-13 | Flint Group Incorporated | Energy-curable news ink containing soy oil |
| JP2008536993A (ja) * | 2005-04-21 | 2008-09-11 | チバ ホールディング インコーポレーテッド | 缶中用安定化剤ブレンド |
| JP2007079153A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| JP2007079152A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| US7700264B2 (en) | 2005-10-31 | 2010-04-20 | Nippon Paint Co., Ltd. | Photosensitive resin composition, image forming material and image forming method using thereof |
| EP1783548B1 (en) * | 2005-11-08 | 2017-03-08 | Rohm and Haas Electronic Materials LLC | Method of forming a patterned layer on a substrate |
| US20070160935A1 (en) * | 2006-01-12 | 2007-07-12 | Keiichi Okajima | Lithographic printing plate material for CTP |
| JP2007225675A (ja) * | 2006-02-21 | 2007-09-06 | Nippon Paint Co Ltd | Ｃｔｐ用平版印刷版材、その製法およびそれから得られる平版印刷版 |
| US7968001B2 (en) | 2007-12-19 | 2011-06-28 | Air Products And Chemicals, Inc. | Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor |
| US8440099B2 (en) * | 2007-12-19 | 2013-05-14 | Air Products And Chemicals, Inc. | Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor |
| JP2010181843A (ja) * | 2009-02-09 | 2010-08-19 | Seiko Epson Corp | 印刷版の製造方法および印刷版製造用光硬化性液体 |
| CN101833241B (zh) * | 2009-03-09 | 2012-07-04 | 村上精密制版（昆山）有限公司 | 一种感光性树脂组合物 |
| WO2014024804A1 (ja) * | 2012-08-06 | 2014-02-13 | 日立化成株式会社 | 永久マスクレジスト用感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| BR112015006206A2 (pt) * | 2012-09-20 | 2017-07-04 | Fujifilm Corp | precursor de chapa de impressão litográfica e método de preparação da chapa |
| JP2017191892A (ja) * | 2016-04-14 | 2017-10-19 | イビデン株式会社 | プリント配線基板及びその製造方法 |
| EP3922462B1 (en) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithographic photopolymer printing plate precursor with improved daylight stability |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4180403A (en) * | 1973-01-18 | 1979-12-25 | E. I. Du Pont De Nemours And Company | Photohardenable films having high resolution containing nitroso dimers |
| AU507014B2 (en) * | 1975-11-05 | 1980-01-31 | Hercules Inc. | Photopolymer compositions |
| US4216019A (en) * | 1977-07-21 | 1980-08-05 | Kenneth James Reed | Photographically produced stencils |
| CA1100148A (en) * | 1978-01-04 | 1981-04-28 | Rudolph L. Pohl | Photopolymer compositions for printing plates |
| US4264705A (en) * | 1979-12-26 | 1981-04-28 | Uniroyal, Inc. | Multilayered elastomeric printing plate |
| US4431723A (en) * | 1981-09-21 | 1984-02-14 | E. I. Du Pont De Nemours And Company | Aqueous processible, alcohol resistant flexographic printing plates |
| US4427759A (en) * | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| US4517279A (en) * | 1982-08-31 | 1985-05-14 | Uniroyal, Inc. | Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems |
| US4666821A (en) * | 1984-02-23 | 1987-05-19 | W. R. Grace & Co. | Photopolymer for use as a solder mask |
| ZA851456B (en) * | 1984-03-06 | 1985-10-30 | Uniroyal Inc | Tapered di-block copolymer photopolymerizable composition |
| JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
| JPH0666030B2 (ja) * | 1984-07-04 | 1994-08-24 | 工業技術院長 | スクリ−ン製版用感光性樹脂組成物 |
| US4540649A (en) * | 1984-09-12 | 1985-09-10 | Napp Systems (Usa) Inc. | Water developable photopolymerizable composition and printing plate element containing same |
| GB8525027D0 (en) * | 1985-10-10 | 1985-11-13 | Autotype Int Ltd | Water soluble photoinitiators |
| PT85756A (pt) * | 1986-09-22 | 1988-10-14 | Napp Systems Inc | Processo para a preparacao de chapas fotossensiveis e revelaveis com agua |
| DE3641014A1 (de) * | 1986-12-19 | 1988-06-16 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
| EP0295944A3 (en) * | 1987-06-18 | 1989-09-06 | Napp Systems (Usa) Inc. | Photosensitive resin composition and printing plate prepared therefrom |
| JP2653458B2 (ja) * | 1988-03-26 | 1997-09-17 | 旭化成工業株式会社 | 凸版印刷版用感光性樹脂組成物 |
| DE3905765A1 (de) * | 1989-02-24 | 1990-08-30 | Basf Ag | Lichtempfindliches aufzeichnungselement |
| US5268257A (en) * | 1990-08-01 | 1993-12-07 | W. R. Grace & Co.-Conn. | Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom |
| DE59108989D1 (de) * | 1990-12-18 | 1998-06-25 | Ciba Geigy Ag | Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel |
| JPH06295060A (ja) * | 1992-10-29 | 1994-10-21 | Ajinomoto Co Inc | 感光性樹脂組成物又は感光性熱硬化性樹脂組成物及びそれらを使用したフォトソルダ−レジスト組成物 |
| WO1995012148A1 (en) * | 1993-10-26 | 1995-05-04 | The Chromaline Corporation | Screen printing stencil composition with improved water resistance |
-
1997
- 1997-03-12 US US08/820,322 patent/US5912106A/en not_active Expired - Fee Related
- 1997-09-02 DE DE69719131T patent/DE69719131T2/de not_active Expired - Fee Related
- 1997-09-02 EP EP97810623A patent/EP0828195B1/en not_active Expired - Lifetime
- 1997-09-08 TW TW086112970A patent/TW401534B/zh not_active IP Right Cessation
- 1997-09-08 CA CA002214913A patent/CA2214913A1/en not_active Abandoned
- 1997-09-09 CN CN97118239A patent/CN1176405A/zh active Pending
- 1997-09-09 BR BR9704669A patent/BR9704669A/pt not_active Application Discontinuation
- 1997-09-10 JP JP9262848A patent/JPH1097059A/ja not_active Withdrawn
- 1997-09-10 KR KR1019970046487A patent/KR100536922B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| BR9704669A (pt) | 1999-07-27 |
| CN1176405A (zh) | 1998-03-18 |
| TW401534B (en) | 2000-08-11 |
| EP0828195B1 (en) | 2003-02-19 |
| MX9706886A (es) | 1998-03-31 |
| KR100536922B1 (ko) | 2006-04-14 |
| US5912106A (en) | 1999-06-15 |
| DE69719131D1 (de) | 2003-03-27 |
| EP0828195A2 (en) | 1998-03-11 |
| JPH1097059A (ja) | 1998-04-14 |
| EP0828195A3 (en) | 1998-08-19 |
| KR19980024485A (ko) | 1998-07-06 |
| CA2214913A1 (en) | 1998-03-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69719131T2 (de) | Verfahren zur Verbesserung der Bildqualität | |
| DE2650050C2 (enExample) | ||
| DE60006016T2 (de) | UV-härtbare Harzzusammensetzung und diese enthaltende Lötstopptinte | |
| DE69128274T2 (de) | Photopolymerisierbare Zusammensetzungen | |
| DE69919172T2 (de) | Photohärtbare polymerzusammensetzung und diese enthaltende flexodruckplatten | |
| DE2902412A1 (de) | Photopolymerisierbares elastomeres gemisch | |
| EP0553662B1 (de) | Lichtempfindliches Gemisch zur Herstellung von Relief- und Druckformen | |
| DE3012841A1 (de) | Lichtempfindliches elastomeres gemisch | |
| CH504022A (de) | Lichtempfindliches Material | |
| DE2821053C3 (de) | Lichthärtbares Aufzeichnungsmaterial und damit durchführbares Bildaufzeichnungsverfahren | |
| DE3136818A1 (de) | Photoempfindliche harzmasse | |
| DE2517034B2 (de) | Photopolymerisierbares Gemisch | |
| DE2736058C2 (de) | Übertragbares photopolymerisierbares Aufzeichnungsmaterial | |
| DE69127148T2 (de) | Lichtempfindliches elastomeres Element mit verbesserter Lösungsmittelbeständigkeit | |
| EP0115021B1 (de) | Positiv arbeitendes Verfahren zur Herstellung von Relief- und Druckformen | |
| DE69225277T2 (de) | Lichtempfindliche Elastomerzusammensetzung | |
| DE3808951A1 (de) | Photopolymerisierbare, zur herstellung von druckformen geeignete druckplatte | |
| DE69501986T2 (de) | Flexodruckplatten aus fotohärtbarem Elastomerzusammensetzungen | |
| DE69129171T2 (de) | Verfahren zur dimensionellen Stabilisierung von Photopolymer-Flexodruckplatten | |
| DE2651864B2 (de) | Photopolymerisierbares Aufzeichnungsmaterial, und Verfahren zur Bildreproduktion | |
| DE2902276A1 (de) | Strahlungsempfindliches laminat mit abbildbarem relief | |
| DE19846529A1 (de) | Photopolymerisierbare Druckformen zur Herstellung von Reliefdruckplatten für den Druck mit UV-härtbaren Druckfarben | |
| DE10208448A1 (de) | Lithografieverfahren zur Verringerung des lateralen Chromstrukturverlustes bei der Fotomaskenherstellung unter Verwendung chemisch verstärkter Resists | |
| DE69113969T2 (de) | Styrol/Maleat Terpolymere. | |
| DE2710417A1 (de) | Photopolymerisierbare massen und verfahren zur erzeugung von positiven oder negativen bildern |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8328 | Change in the person/name/address of the agent |
Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN |
|
| 8339 | Ceased/non-payment of the annual fee |