BR9704669A - Método para melhorar a qualidade de fotoimagens - Google Patents

Método para melhorar a qualidade de fotoimagens

Info

Publication number
BR9704669A
BR9704669A BR9704669A BR9704669A BR9704669A BR 9704669 A BR9704669 A BR 9704669A BR 9704669 A BR9704669 A BR 9704669A BR 9704669 A BR9704669 A BR 9704669A BR 9704669 A BR9704669 A BR 9704669A
Authority
BR
Brazil
Prior art keywords
quality
improve
photo images
photo
images
Prior art date
Application number
BR9704669A
Other languages
English (en)
Portuguese (pt)
Inventor
Chia-Hu Chang
Andrew Mar
Thai Hong Nguyen
Harry Joseph Evers
Hugh Stephen Layer
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR9704669A publication Critical patent/BR9704669A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
BR9704669A 1996-09-10 1997-09-09 Método para melhorar a qualidade de fotoimagens BR9704669A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70702096A 1996-09-10 1996-09-10
US08/820,322 US5912106A (en) 1996-09-10 1997-03-12 Method for improving photoimage quality

Publications (1)

Publication Number Publication Date
BR9704669A true BR9704669A (pt) 1999-07-27

Family

ID=27107809

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9704669A BR9704669A (pt) 1996-09-10 1997-09-09 Método para melhorar a qualidade de fotoimagens

Country Status (9)

Country Link
US (1) US5912106A (enExample)
EP (1) EP0828195B1 (enExample)
JP (1) JPH1097059A (enExample)
KR (1) KR100536922B1 (enExample)
CN (1) CN1176405A (enExample)
BR (1) BR9704669A (enExample)
CA (1) CA2214913A1 (enExample)
DE (1) DE69719131T2 (enExample)
TW (1) TW401534B (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2344103B (en) * 1998-11-24 2003-04-16 Ciba Sc Holding Ag Piperazinone derivatives
US6296984B1 (en) * 1999-03-12 2001-10-02 Agere Systems Guardian Corp. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US20110071232A1 (en) * 1999-12-09 2011-03-24 Tunja Jung Additive composition for increasing the storage stability of ethylenically unsaturated resins
US20050192384A1 (en) * 1999-12-09 2005-09-01 Tunja Jung Additive composition for increasing the storage stability of ethylenically unsaturated resins
JP5362938B2 (ja) * 1999-12-09 2013-12-11 チバ ホールディング インコーポレーテッド エチレン性不飽和樹脂の保存安定性を向上させる添加組成物
US6685823B2 (en) * 2000-10-16 2004-02-03 Uniroyal Chemical Company, Inc. C-nitrosoaniline compounds and their blends as polymerization inhibitors
JP4248875B2 (ja) 2000-10-16 2009-04-02 ケムチュア コーポレイション 重合抑制剤としての、キノンアルカイドとニトロキシル化合物の混合物
US6863406B2 (en) * 2002-08-01 2005-03-08 The University Of Chicago Apparatus and method for fabricating, sorting, and integrating materials with holographic optical traps
DE10255667B4 (de) * 2002-11-28 2006-05-11 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
US6881533B2 (en) 2003-02-18 2005-04-19 Kodak Polychrome Graphics Llc Flexographic printing plate with ink-repellent non-image areas
US20050056954A1 (en) * 2003-09-12 2005-03-17 Devlin Brian Gerrard Method for making contact lenses
KR101065394B1 (ko) * 2004-01-09 2011-09-16 삼성에스디아이 주식회사 평판 표시소자의 전자방출원 형성용 조성물 및 그로부터제조되는 전자방출원
US6962763B2 (en) * 2004-02-25 2005-11-08 Eastman Kodak Company Silver-free black-and-white thermographic materials
JP2006011397A (ja) * 2004-05-21 2006-01-12 Nippon Kayaku Co Ltd ネガ型着色感光性組成物
US8132507B2 (en) * 2004-10-08 2012-03-13 Flint Group Incorporated Energy-curable news ink containing soy oil
JP2008536993A (ja) * 2005-04-21 2008-09-11 チバ ホールディング インコーポレーテッド 缶中用安定化剤ブレンド
JP2007079153A (ja) * 2005-09-14 2007-03-29 Nippon Paint Co Ltd 感光性樹脂組成物
JP2007079152A (ja) * 2005-09-14 2007-03-29 Nippon Paint Co Ltd 感光性樹脂組成物
US7700264B2 (en) 2005-10-31 2010-04-20 Nippon Paint Co., Ltd. Photosensitive resin composition, image forming material and image forming method using thereof
EP1783548B1 (en) * 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
US20070160935A1 (en) * 2006-01-12 2007-07-12 Keiichi Okajima Lithographic printing plate material for CTP
JP2007225675A (ja) * 2006-02-21 2007-09-06 Nippon Paint Co Ltd Ｃｔｐ用平版印刷版材、その製法およびそれから得られる平版印刷版
US7968001B2 (en) 2007-12-19 2011-06-28 Air Products And Chemicals, Inc. Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor
US8440099B2 (en) * 2007-12-19 2013-05-14 Air Products And Chemicals, Inc. Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor
JP2010181843A (ja) * 2009-02-09 2010-08-19 Seiko Epson Corp 印刷版の製造方法および印刷版製造用光硬化性液体
CN101833241B (zh) * 2009-03-09 2012-07-04 村上精密制版（昆山）有限公司 一种感光性树脂组合物
WO2014024804A1 (ja) * 2012-08-06 2014-02-13 日立化成株式会社 永久マスクレジスト用感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
BR112015006206A2 (pt) * 2012-09-20 2017-07-04 Fujifilm Corp precursor de chapa de impressão litográfica e método de preparação da chapa
JP2017191892A (ja) * 2016-04-14 2017-10-19 イビデン株式会社 プリント配線基板及びその製造方法
EP3922462B1 (en) 2020-06-08 2023-03-01 Agfa Offset Bv Lithographic photopolymer printing plate precursor with improved daylight stability

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4180403A (en) * 1973-01-18 1979-12-25 E. I. Du Pont De Nemours And Company Photohardenable films having high resolution containing nitroso dimers
AU507014B2 (en) * 1975-11-05 1980-01-31 Hercules Inc. Photopolymer compositions
US4216019A (en) * 1977-07-21 1980-08-05 Kenneth James Reed Photographically produced stencils
CA1100148A (en) * 1978-01-04 1981-04-28 Rudolph L. Pohl Photopolymer compositions for printing plates
US4264705A (en) * 1979-12-26 1981-04-28 Uniroyal, Inc. Multilayered elastomeric printing plate
US4431723A (en) * 1981-09-21 1984-02-14 E. I. Du Pont De Nemours And Company Aqueous processible, alcohol resistant flexographic printing plates
US4427759A (en) * 1982-01-21 1984-01-24 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4517279A (en) * 1982-08-31 1985-05-14 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems
US4666821A (en) * 1984-02-23 1987-05-19 W. R. Grace & Co. Photopolymer for use as a solder mask
ZA851456B (en) * 1984-03-06 1985-10-30 Uniroyal Inc Tapered di-block copolymer photopolymerizable composition
JPS60191237A (ja) * 1984-03-13 1985-09-28 Asahi Chem Ind Co Ltd 露光硬化後非粘着性感光性樹脂組成物
JPH0666030B2 (ja) * 1984-07-04 1994-08-24 工業技術院長 スクリ−ン製版用感光性樹脂組成物
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same
GB8525027D0 (en) * 1985-10-10 1985-11-13 Autotype Int Ltd Water soluble photoinitiators
PT85756A (pt) * 1986-09-22 1988-10-14 Napp Systems Inc Processo para a preparacao de chapas fotossensiveis e revelaveis com agua
DE3641014A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
EP0295944A3 (en) * 1987-06-18 1989-09-06 Napp Systems (Usa) Inc. Photosensitive resin composition and printing plate prepared therefrom
JP2653458B2 (ja) * 1988-03-26 1997-09-17 旭化成工業株式会社 凸版印刷版用感光性樹脂組成物
DE3905765A1 (de) * 1989-02-24 1990-08-30 Basf Ag Lichtempfindliches aufzeichnungselement
US5268257A (en) * 1990-08-01 1993-12-07 W. R. Grace & Co.-Conn. Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
JPH06295060A (ja) * 1992-10-29 1994-10-21 Ajinomoto Co Inc 感光性樹脂組成物又は感光性熱硬化性樹脂組成物及びそれらを使用したフォトソルダ−レジスト組成物
WO1995012148A1 (en) * 1993-10-26 1995-05-04 The Chromaline Corporation Screen printing stencil composition with improved water resistance

Also Published As

Publication number Publication date
CN1176405A (zh) 1998-03-18
TW401534B (en) 2000-08-11
EP0828195B1 (en) 2003-02-19
MX9706886A (es) 1998-03-31
KR100536922B1 (ko) 2006-04-14
US5912106A (en) 1999-06-15
DE69719131D1 (de) 2003-03-27
EP0828195A2 (en) 1998-03-11
JPH1097059A (ja) 1998-04-14
EP0828195A3 (en) 1998-08-19
DE69719131T2 (de) 2003-07-31
KR19980024485A (ko) 1998-07-06
CA2214913A1 (en) 1998-03-10

Similar Documents

Publication Publication Date Title
BR9704669A (pt) Método para melhorar a qualidade de fotoimagens
DE69721607D1 (de) Bildherstellungsverfahren
DE69532929D1 (de) Bildherstellungsverfahren
DE69713243D1 (de) Bilderzeugungsgerät
DE69535808D1 (de) Bilderzeugungsgerät
DE69529004D1 (de) Bilderzeugungsgerät
DE69535711D1 (de) Bilderzeugungsgerät
DE69740084D1 (de) Bilderzeugungsgerät
DE69725824D1 (de) Bilderzeugungsgerät
DE69719690D1 (de) Bilderzeugungsgerät
DE69723767D1 (de) Bilderzeugungsgerät
DE69535312D1 (de) Bilderzeugungsgerät
DE69535086D1 (de) Bilderzeugungsgerät
EP0705704A3 (en) Imaging processes
DE69734421D1 (de) Bilderzeugungsapparat
DE69723761D1 (de) Bilderzeugungsgerät
DE69532265D1 (de) Bilderzeugungsgerät
DE69527115D1 (de) Bilderzeugungsgerät
DE69730195D1 (de) Bilderzeugungsgerät
DE69525224D1 (de) Bilderzeugungsgerät
DE69525778D1 (de) Mehrfarben-Bilderzeugungsgerät
DE69728944D1 (de) Bilderzeugungsgerät
DE69708372D1 (de) Farbbilderzeugungsgerät
DE69735185D1 (de) Bilderzeugungsgerät
DE69733729D1 (de) Bilderzeugungsgerät

Legal Events

Date Code Title Description
FB34 Technical and formal requirements: requirement - article 34 of industrial property law
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements