CA2214913A1 - Method for improving photoimage quality - Google Patents
Method for improving photoimage quality Download PDFInfo
- Publication number
- CA2214913A1 CA2214913A1 CA002214913A CA2214913A CA2214913A1 CA 2214913 A1 CA2214913 A1 CA 2214913A1 CA 002214913 A CA002214913 A CA 002214913A CA 2214913 A CA2214913 A CA 2214913A CA 2214913 A1 CA2214913 A1 CA 2214913A1
- Authority
- CA
- Canada
- Prior art keywords
- oxyl
- tetramethylpiperidin
- bis
- light
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000003112 inhibitor Substances 0.000 claims abstract description 59
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 36
- 239000011342 resin composition Substances 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 26
- 238000007639 printing Methods 0.000 claims description 25
- -1 nitroxide compounds Chemical class 0.000 claims description 22
- 150000001412 amines Chemical class 0.000 claims description 13
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 12
- SXPLGYBFGPYAHS-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 SXPLGYBFGPYAHS-UHFFFAOYSA-N 0.000 claims description 10
- 239000003999 initiator Substances 0.000 claims description 10
- CSGAUKGQUCHWDP-UHFFFAOYSA-N 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-ol Chemical compound CC1(C)CC(O)CC(C)(C)N1O CSGAUKGQUCHWDP-UHFFFAOYSA-N 0.000 claims description 9
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 9
- 229910000679 solder Inorganic materials 0.000 claims description 9
- 150000002832 nitroso derivatives Chemical class 0.000 claims description 8
- 150000002989 phenols Chemical class 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims description 8
- 239000012965 benzophenone Substances 0.000 claims description 7
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 6
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 6
- 230000002401 inhibitory effect Effects 0.000 claims description 6
- 229950000688 phenothiazine Drugs 0.000 claims description 6
- HCUWXYBKPSKTAB-UHFFFAOYSA-N 4-benzylidene-2,6-ditert-butylcyclohexa-2,5-dien-1-one Chemical compound C1=C(C(C)(C)C)C(=O)C(C(C)(C)C)=CC1=CC1=CC=CC=C1 HCUWXYBKPSKTAB-UHFFFAOYSA-N 0.000 claims description 5
- 244000028419 Styrax benzoin Species 0.000 claims description 5
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 5
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 5
- 229960002130 benzoin Drugs 0.000 claims description 5
- 235000019382 gum benzoic Nutrition 0.000 claims description 5
- RVWJIVLFXACVCQ-UHFFFAOYSA-N (1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) 2-ethylhexanoate Chemical compound CCCCC(CC)C(=O)OC1CC(C)(C)N(O)C(C)(C)C1 RVWJIVLFXACVCQ-UHFFFAOYSA-N 0.000 claims description 4
- JURKUHPHNMPLCP-UHFFFAOYSA-N (1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) 4-tert-butylbenzoate Chemical compound C1=CC(C(C)(C)C)=CC=C1C(=O)OC1CC(C)(C)N(O)C(C)(C)C1 JURKUHPHNMPLCP-UHFFFAOYSA-N 0.000 claims description 4
- CRGBPDJWOLULDY-UHFFFAOYSA-N (1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) acetate Chemical compound CC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 CRGBPDJWOLULDY-UHFFFAOYSA-N 0.000 claims description 4
- DRFYZAIGLPMIOS-UHFFFAOYSA-N (1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) benzoate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C1=CC=CC=C1 DRFYZAIGLPMIOS-UHFFFAOYSA-N 0.000 claims description 4
- DSSWUSNSRXWFBO-UHFFFAOYSA-N 1-(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl)azepan-2-one Chemical compound C1C(C)(C)N(O)C(C)(C)CC1N1C(=O)CCCCC1 DSSWUSNSRXWFBO-UHFFFAOYSA-N 0.000 claims description 4
- KMEUSKGEUADGET-UHFFFAOYSA-N 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)N1O KMEUSKGEUADGET-UHFFFAOYSA-N 0.000 claims description 4
- VUZNLSBZRVZGIK-UHFFFAOYSA-N 2,2,6,6-Tetramethyl-1-piperidinol Chemical compound CC1(C)CCCC(C)(C)N1O VUZNLSBZRVZGIK-UHFFFAOYSA-N 0.000 claims description 4
- JPHYFFRXJKGOED-UHFFFAOYSA-N 3-dodecyl-1-(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl)pyrrolidine-2,5-dione Chemical compound O=C1C(CCCCCCCCCCCC)CC(=O)N1C1CC(C)(C)N(O)C(C)(C)C1 JPHYFFRXJKGOED-UHFFFAOYSA-N 0.000 claims description 4
- BGLKXHNUOPUFCL-UHFFFAOYSA-N 4-hydroxy-1-[2-(4-hydroxy-3,3,5,5-tetramethyl-2-oxopiperazin-1-yl)ethyl]-3,3,5,5-tetramethylpiperazin-2-one Chemical compound O=C1C(C)(C)N(O)C(C)(C)CN1CCN1C(=O)C(C)(C)N(O)C(C)(C)C1 BGLKXHNUOPUFCL-UHFFFAOYSA-N 0.000 claims description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 4
- 239000007983 Tris buffer Substances 0.000 claims description 4
- KRRWGJFRYFSLFQ-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) 2-butylpropanedioate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C(CCCC)C(=O)OC1CC(C)(C)N(O)C(C)(C)C1 KRRWGJFRYFSLFQ-UHFFFAOYSA-N 0.000 claims description 4
- WJZRRMYMGWLZDY-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) benzene-1,2-dicarboxylate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C1=CC=CC=C1C(=O)OC1CC(C)(C)N(O)C(C)(C)C1 WJZRRMYMGWLZDY-UHFFFAOYSA-N 0.000 claims description 4
- YJLOZVIELWKSNE-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) benzene-1,3-dicarboxylate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C1=CC=CC(C(=O)OC2CC(C)(C)N(O)C(C)(C)C2)=C1 YJLOZVIELWKSNE-UHFFFAOYSA-N 0.000 claims description 4
- MYKPPUUOBUFFML-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) benzene-1,4-dicarboxylate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C1=CC=C(C(=O)OC2CC(C)(C)N(O)C(C)(C)C2)C=C1 MYKPPUUOBUFFML-UHFFFAOYSA-N 0.000 claims description 4
- ZXDIQRGIYADNBI-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) butanedioate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)CCC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 ZXDIQRGIYADNBI-UHFFFAOYSA-N 0.000 claims description 4
- SIXHNVLZVKYFOR-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) hexanedioate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)CCCCC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 SIXHNVLZVKYFOR-UHFFFAOYSA-N 0.000 claims description 4
- CKJMHSMEPSUICM-UHFFFAOYSA-N di-tert-butyl nitroxide Chemical group CC(C)(C)N([O])C(C)(C)C CKJMHSMEPSUICM-UHFFFAOYSA-N 0.000 claims description 4
- 238000007650 screen-printing Methods 0.000 claims description 4
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 claims description 4
- IYKZUARSRNSVTC-UHFFFAOYSA-N (1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 IYKZUARSRNSVTC-UHFFFAOYSA-N 0.000 claims description 3
- GITLFISGTYWQIU-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) cyclohexane-1,4-dicarboxylate Chemical compound C1C(C)(C)N(O)C(C)(C)CC1OC(=O)C1CCC(C(=O)OC2CC(C)(C)N(O)C(C)(C)C2)CC1 GITLFISGTYWQIU-UHFFFAOYSA-N 0.000 claims description 3
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidine Chemical group CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 claims description 2
- GVNWZKBFMFUVNX-UHFFFAOYSA-N Adipamide Chemical compound NC(=O)CCCCC(N)=O GVNWZKBFMFUVNX-UHFFFAOYSA-N 0.000 claims description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 claims description 2
- 150000004056 anthraquinones Chemical class 0.000 claims description 2
- 239000011230 binding agent Substances 0.000 claims description 2
- KXQXILJJTWHMRW-UHFFFAOYSA-N n,n'-bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl)hexanediamide Chemical compound C1C(C)(C)N(O)C(C)(C)CC1NC(=O)CCCCC(=O)NC1CC(C)(C)N(O)C(C)(C)C1 KXQXILJJTWHMRW-UHFFFAOYSA-N 0.000 claims description 2
- 150000002990 phenothiazines Chemical class 0.000 claims description 2
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 claims 3
- 229920005989 resin Polymers 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract description 5
- 238000009472 formulation Methods 0.000 description 17
- 238000012360 testing method Methods 0.000 description 17
- 150000003254 radicals Chemical class 0.000 description 10
- 230000002441 reversible effect Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 125000000687 hydroquinonyl group Chemical class C1(O)=C(C=C(O)C=C1)* 0.000 description 5
- 239000000976 ink Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
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- 150000008062 acetophenones Chemical class 0.000 description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
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- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- HOYRZHJJAHRMLL-UHFFFAOYSA-N 2,6-dinitro-p-cresol Chemical group CC1=CC([N+]([O-])=O)=C(O)C([N+]([O-])=O)=C1 HOYRZHJJAHRMLL-UHFFFAOYSA-N 0.000 description 1
- AZUHIVLOSAPWDM-UHFFFAOYSA-N 2-(1h-imidazol-2-yl)-1h-imidazole Chemical compound C1=CNC(C=2NC=CN=2)=N1 AZUHIVLOSAPWDM-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
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- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
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- TUWIPEVLOCKMNA-UHFFFAOYSA-N benzyl(dimethyl)stannane Chemical compound C[SnH](C)Cc1ccccc1 TUWIPEVLOCKMNA-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- KCDZTIGZDHLICX-UHFFFAOYSA-N bis[4-tert-butyl-2-(trichloromethyl)phenyl]methanone Chemical compound ClC(Cl)(Cl)C1=CC(C(C)(C)C)=CC=C1C(=O)C1=CC=C(C(C)(C)C)C=C1C(Cl)(Cl)Cl KCDZTIGZDHLICX-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 239000011951 cationic catalyst Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- KOMDZQSPRDYARS-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1.C1C=CC=C1 KOMDZQSPRDYARS-UHFFFAOYSA-N 0.000 description 1
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- 239000003822 epoxy resin Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical group C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- ODUCDPQEXGNKDN-UHFFFAOYSA-N nitroxyl Chemical class O=N ODUCDPQEXGNKDN-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- FAQJJMHZNSSFSM-UHFFFAOYSA-N phenylglyoxylic acid Chemical class OC(=O)C(=O)C1=CC=CC=C1 FAQJJMHZNSSFSM-UHFFFAOYSA-N 0.000 description 1
- 238000001782 photodegradation Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000004151 quinonyl group Chemical group 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US70702096A | 1996-09-10 | 1996-09-10 | |
| US08/707,020 | 1996-09-10 | ||
| US08/820,322 | 1997-03-12 | ||
| US08/820,322 US5912106A (en) | 1996-09-10 | 1997-03-12 | Method for improving photoimage quality |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2214913A1 true CA2214913A1 (en) | 1998-03-10 |
Family
ID=27107809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002214913A Abandoned CA2214913A1 (en) | 1996-09-10 | 1997-09-08 | Method for improving photoimage quality |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5912106A (enExample) |
| EP (1) | EP0828195B1 (enExample) |
| JP (1) | JPH1097059A (enExample) |
| KR (1) | KR100536922B1 (enExample) |
| CN (1) | CN1176405A (enExample) |
| BR (1) | BR9704669A (enExample) |
| CA (1) | CA2214913A1 (enExample) |
| DE (1) | DE69719131T2 (enExample) |
| TW (1) | TW401534B (enExample) |
Families Citing this family (30)
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| GB2344103B (en) * | 1998-11-24 | 2003-04-16 | Ciba Sc Holding Ag | Piperazinone derivatives |
| US6296984B1 (en) * | 1999-03-12 | 2001-10-02 | Agere Systems Guardian Corp. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| US20110071232A1 (en) * | 1999-12-09 | 2011-03-24 | Tunja Jung | Additive composition for increasing the storage stability of ethylenically unsaturated resins |
| US20050192384A1 (en) * | 1999-12-09 | 2005-09-01 | Tunja Jung | Additive composition for increasing the storage stability of ethylenically unsaturated resins |
| JP5362938B2 (ja) * | 1999-12-09 | 2013-12-11 | チバ ホールディング インコーポレーテッド | エチレン性不飽和樹脂の保存安定性を向上させる添加組成物 |
| US6685823B2 (en) * | 2000-10-16 | 2004-02-03 | Uniroyal Chemical Company, Inc. | C-nitrosoaniline compounds and their blends as polymerization inhibitors |
| JP4248875B2 (ja) | 2000-10-16 | 2009-04-02 | ケムチュア コーポレイション | 重合抑制剤としての、キノンアルカイドとニトロキシル化合物の混合物 |
| US6863406B2 (en) * | 2002-08-01 | 2005-03-08 | The University Of Chicago | Apparatus and method for fabricating, sorting, and integrating materials with holographic optical traps |
| DE10255667B4 (de) * | 2002-11-28 | 2006-05-11 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit |
| US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| US20050056954A1 (en) * | 2003-09-12 | 2005-03-17 | Devlin Brian Gerrard | Method for making contact lenses |
| KR101065394B1 (ko) * | 2004-01-09 | 2011-09-16 | 삼성에스디아이 주식회사 | 평판 표시소자의 전자방출원 형성용 조성물 및 그로부터제조되는 전자방출원 |
| US6962763B2 (en) * | 2004-02-25 | 2005-11-08 | Eastman Kodak Company | Silver-free black-and-white thermographic materials |
| JP2006011397A (ja) * | 2004-05-21 | 2006-01-12 | Nippon Kayaku Co Ltd | ネガ型着色感光性組成物 |
| US8132507B2 (en) * | 2004-10-08 | 2012-03-13 | Flint Group Incorporated | Energy-curable news ink containing soy oil |
| JP2008536993A (ja) * | 2005-04-21 | 2008-09-11 | チバ ホールディング インコーポレーテッド | 缶中用安定化剤ブレンド |
| JP2007079153A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| JP2007079152A (ja) * | 2005-09-14 | 2007-03-29 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| US7700264B2 (en) | 2005-10-31 | 2010-04-20 | Nippon Paint Co., Ltd. | Photosensitive resin composition, image forming material and image forming method using thereof |
| EP1783548B1 (en) * | 2005-11-08 | 2017-03-08 | Rohm and Haas Electronic Materials LLC | Method of forming a patterned layer on a substrate |
| US20070160935A1 (en) * | 2006-01-12 | 2007-07-12 | Keiichi Okajima | Lithographic printing plate material for CTP |
| JP2007225675A (ja) * | 2006-02-21 | 2007-09-06 | Nippon Paint Co Ltd | Ｃｔｐ用平版印刷版材、その製法およびそれから得られる平版印刷版 |
| US7968001B2 (en) | 2007-12-19 | 2011-06-28 | Air Products And Chemicals, Inc. | Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor |
| US8440099B2 (en) * | 2007-12-19 | 2013-05-14 | Air Products And Chemicals, Inc. | Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor |
| JP2010181843A (ja) * | 2009-02-09 | 2010-08-19 | Seiko Epson Corp | 印刷版の製造方法および印刷版製造用光硬化性液体 |
| CN101833241B (zh) * | 2009-03-09 | 2012-07-04 | 村上精密制版（昆山）有限公司 | 一种感光性树脂组合物 |
| WO2014024804A1 (ja) * | 2012-08-06 | 2014-02-13 | 日立化成株式会社 | 永久マスクレジスト用感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| BR112015006206A2 (pt) * | 2012-09-20 | 2017-07-04 | Fujifilm Corp | precursor de chapa de impressão litográfica e método de preparação da chapa |
| JP2017191892A (ja) * | 2016-04-14 | 2017-10-19 | イビデン株式会社 | プリント配線基板及びその製造方法 |
| EP3922462B1 (en) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithographic photopolymer printing plate precursor with improved daylight stability |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US4180403A (en) * | 1973-01-18 | 1979-12-25 | E. I. Du Pont De Nemours And Company | Photohardenable films having high resolution containing nitroso dimers |
| AU507014B2 (en) * | 1975-11-05 | 1980-01-31 | Hercules Inc. | Photopolymer compositions |
| US4216019A (en) * | 1977-07-21 | 1980-08-05 | Kenneth James Reed | Photographically produced stencils |
| CA1100148A (en) * | 1978-01-04 | 1981-04-28 | Rudolph L. Pohl | Photopolymer compositions for printing plates |
| US4264705A (en) * | 1979-12-26 | 1981-04-28 | Uniroyal, Inc. | Multilayered elastomeric printing plate |
| US4431723A (en) * | 1981-09-21 | 1984-02-14 | E. I. Du Pont De Nemours And Company | Aqueous processible, alcohol resistant flexographic printing plates |
| US4427759A (en) * | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| US4517279A (en) * | 1982-08-31 | 1985-05-14 | Uniroyal, Inc. | Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems |
| US4666821A (en) * | 1984-02-23 | 1987-05-19 | W. R. Grace & Co. | Photopolymer for use as a solder mask |
| ZA851456B (en) * | 1984-03-06 | 1985-10-30 | Uniroyal Inc | Tapered di-block copolymer photopolymerizable composition |
| JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
| JPH0666030B2 (ja) * | 1984-07-04 | 1994-08-24 | 工業技術院長 | スクリ−ン製版用感光性樹脂組成物 |
| US4540649A (en) * | 1984-09-12 | 1985-09-10 | Napp Systems (Usa) Inc. | Water developable photopolymerizable composition and printing plate element containing same |
| GB8525027D0 (en) * | 1985-10-10 | 1985-11-13 | Autotype Int Ltd | Water soluble photoinitiators |
| PT85756A (pt) * | 1986-09-22 | 1988-10-14 | Napp Systems Inc | Processo para a preparacao de chapas fotossensiveis e revelaveis com agua |
| DE3641014A1 (de) * | 1986-12-19 | 1988-06-16 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
| EP0295944A3 (en) * | 1987-06-18 | 1989-09-06 | Napp Systems (Usa) Inc. | Photosensitive resin composition and printing plate prepared therefrom |
| JP2653458B2 (ja) * | 1988-03-26 | 1997-09-17 | 旭化成工業株式会社 | 凸版印刷版用感光性樹脂組成物 |
| DE3905765A1 (de) * | 1989-02-24 | 1990-08-30 | Basf Ag | Lichtempfindliches aufzeichnungselement |
| US5268257A (en) * | 1990-08-01 | 1993-12-07 | W. R. Grace & Co.-Conn. | Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom |
| DE59108989D1 (de) * | 1990-12-18 | 1998-06-25 | Ciba Geigy Ag | Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel |
| JPH06295060A (ja) * | 1992-10-29 | 1994-10-21 | Ajinomoto Co Inc | 感光性樹脂組成物又は感光性熱硬化性樹脂組成物及びそれらを使用したフォトソルダ−レジスト組成物 |
| WO1995012148A1 (en) * | 1993-10-26 | 1995-05-04 | The Chromaline Corporation | Screen printing stencil composition with improved water resistance |
-
1997
- 1997-03-12 US US08/820,322 patent/US5912106A/en not_active Expired - Fee Related
- 1997-09-02 DE DE69719131T patent/DE69719131T2/de not_active Expired - Fee Related
- 1997-09-02 EP EP97810623A patent/EP0828195B1/en not_active Expired - Lifetime
- 1997-09-08 TW TW086112970A patent/TW401534B/zh not_active IP Right Cessation
- 1997-09-08 CA CA002214913A patent/CA2214913A1/en not_active Abandoned
- 1997-09-09 CN CN97118239A patent/CN1176405A/zh active Pending
- 1997-09-09 BR BR9704669A patent/BR9704669A/pt not_active Application Discontinuation
- 1997-09-10 JP JP9262848A patent/JPH1097059A/ja not_active Withdrawn
- 1997-09-10 KR KR1019970046487A patent/KR100536922B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| BR9704669A (pt) | 1999-07-27 |
| CN1176405A (zh) | 1998-03-18 |
| TW401534B (en) | 2000-08-11 |
| EP0828195B1 (en) | 2003-02-19 |
| MX9706886A (es) | 1998-03-31 |
| KR100536922B1 (ko) | 2006-04-14 |
| US5912106A (en) | 1999-06-15 |
| DE69719131D1 (de) | 2003-03-27 |
| EP0828195A2 (en) | 1998-03-11 |
| JPH1097059A (ja) | 1998-04-14 |
| EP0828195A3 (en) | 1998-08-19 |
| DE69719131T2 (de) | 2003-07-31 |
| KR19980024485A (ko) | 1998-07-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |