KR100536922B1 - 포토이미지의화질개량방법 - Google Patents

포토이미지의화질개량방법 Download PDF

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Publication number
KR100536922B1
KR100536922B1 KR1019970046487A KR19970046487A KR100536922B1 KR 100536922 B1 KR100536922 B1 KR 100536922B1 KR 1019970046487 A KR1019970046487 A KR 1019970046487A KR 19970046487 A KR19970046487 A KR 19970046487A KR 100536922 B1 KR100536922 B1 KR 100536922B1
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KR
South Korea
Prior art keywords
oxyl
bis
tetramethylpiperidin
derivatives
inhibitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019970046487A
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English (en)
Korean (ko)
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KR19980024485A (ko
Inventor
앤드류 마르
해리 조셉 에버스
치아-후 창
타이 홍 구이엔
휴 스테펜 라버
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
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Publication of KR19980024485A publication Critical patent/KR19980024485A/ko
Application granted granted Critical
Publication of KR100536922B1 publication Critical patent/KR100536922B1/ko
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
KR1019970046487A 1996-09-10 1997-09-10 포토이미지의화질개량방법 Expired - Fee Related KR100536922B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US70702096A 1996-09-10 1996-09-10
US8/707020 1996-09-10
US8/820322 1997-03-12
US08/820322 1997-03-12
US08/820,322 US5912106A (en) 1996-09-10 1997-03-12 Method for improving photoimage quality
US08/707020 1997-03-12

Publications (2)

Publication Number Publication Date
KR19980024485A KR19980024485A (ko) 1998-07-06
KR100536922B1 true KR100536922B1 (ko) 2006-04-14

Family

ID=27107809

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970046487A Expired - Fee Related KR100536922B1 (ko) 1996-09-10 1997-09-10 포토이미지의화질개량방법

Country Status (9)

Country Link
US (1) US5912106A (enExample)
EP (1) EP0828195B1 (enExample)
JP (1) JPH1097059A (enExample)
KR (1) KR100536922B1 (enExample)
CN (1) CN1176405A (enExample)
BR (1) BR9704669A (enExample)
CA (1) CA2214913A1 (enExample)
DE (1) DE69719131T2 (enExample)
TW (1) TW401534B (enExample)

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US6296984B1 (en) * 1999-03-12 2001-10-02 Agere Systems Guardian Corp. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US20110071232A1 (en) * 1999-12-09 2011-03-24 Tunja Jung Additive composition for increasing the storage stability of ethylenically unsaturated resins
US20050192384A1 (en) * 1999-12-09 2005-09-01 Tunja Jung Additive composition for increasing the storage stability of ethylenically unsaturated resins
JP5362938B2 (ja) * 1999-12-09 2013-12-11 チバ ホールディング インコーポレーテッド エチレン性不飽和樹脂の保存安定性を向上させる添加組成物
US6685823B2 (en) * 2000-10-16 2004-02-03 Uniroyal Chemical Company, Inc. C-nitrosoaniline compounds and their blends as polymerization inhibitors
JP4248875B2 (ja) 2000-10-16 2009-04-02 ケムチュア コーポレイション 重合抑制剤としての、キノンアルカイドとニトロキシル化合物の混合物
US6863406B2 (en) * 2002-08-01 2005-03-08 The University Of Chicago Apparatus and method for fabricating, sorting, and integrating materials with holographic optical traps
DE10255667B4 (de) * 2002-11-28 2006-05-11 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
US6881533B2 (en) 2003-02-18 2005-04-19 Kodak Polychrome Graphics Llc Flexographic printing plate with ink-repellent non-image areas
US20050056954A1 (en) * 2003-09-12 2005-03-17 Devlin Brian Gerrard Method for making contact lenses
KR101065394B1 (ko) * 2004-01-09 2011-09-16 삼성에스디아이 주식회사 평판 표시소자의 전자방출원 형성용 조성물 및 그로부터제조되는 전자방출원
US6962763B2 (en) * 2004-02-25 2005-11-08 Eastman Kodak Company Silver-free black-and-white thermographic materials
JP2006011397A (ja) * 2004-05-21 2006-01-12 Nippon Kayaku Co Ltd ネガ型着色感光性組成物
US8132507B2 (en) * 2004-10-08 2012-03-13 Flint Group Incorporated Energy-curable news ink containing soy oil
JP2008536993A (ja) * 2005-04-21 2008-09-11 チバ ホールディング インコーポレーテッド 缶中用安定化剤ブレンド
JP2007079153A (ja) * 2005-09-14 2007-03-29 Nippon Paint Co Ltd 感光性樹脂組成物
JP2007079152A (ja) * 2005-09-14 2007-03-29 Nippon Paint Co Ltd 感光性樹脂組成物
US7700264B2 (en) 2005-10-31 2010-04-20 Nippon Paint Co., Ltd. Photosensitive resin composition, image forming material and image forming method using thereof
EP1783548B1 (en) * 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
US20070160935A1 (en) * 2006-01-12 2007-07-12 Keiichi Okajima Lithographic printing plate material for CTP
JP2007225675A (ja) * 2006-02-21 2007-09-06 Nippon Paint Co Ltd Ｃｔｐ用平版印刷版材、その製法およびそれから得られる平版印刷版
US7968001B2 (en) 2007-12-19 2011-06-28 Air Products And Chemicals, Inc. Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor
US8440099B2 (en) * 2007-12-19 2013-05-14 Air Products And Chemicals, Inc. Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor
JP2010181843A (ja) * 2009-02-09 2010-08-19 Seiko Epson Corp 印刷版の製造方法および印刷版製造用光硬化性液体
CN101833241B (zh) * 2009-03-09 2012-07-04 村上精密制版（昆山）有限公司 一种感光性树脂组合物
WO2014024804A1 (ja) * 2012-08-06 2014-02-13 日立化成株式会社 永久マスクレジスト用感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
BR112015006206A2 (pt) * 2012-09-20 2017-07-04 Fujifilm Corp precursor de chapa de impressão litográfica e método de preparação da chapa
JP2017191892A (ja) * 2016-04-14 2017-10-19 イビデン株式会社 プリント配線基板及びその製造方法
EP3922462B1 (en) 2020-06-08 2023-03-01 Agfa Offset Bv Lithographic photopolymer printing plate precursor with improved daylight stability

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Also Published As

Publication number Publication date
BR9704669A (pt) 1999-07-27
CN1176405A (zh) 1998-03-18
TW401534B (en) 2000-08-11
EP0828195B1 (en) 2003-02-19
MX9706886A (es) 1998-03-31
US5912106A (en) 1999-06-15
DE69719131D1 (de) 2003-03-27
EP0828195A2 (en) 1998-03-11
JPH1097059A (ja) 1998-04-14
EP0828195A3 (en) 1998-08-19
DE69719131T2 (de) 2003-07-31
KR19980024485A (ko) 1998-07-06
CA2214913A1 (en) 1998-03-10

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