DE69501986T2 - Flexodruckplatten aus fotohärtbarem Elastomerzusammensetzungen - Google Patents

Flexodruckplatten aus fotohärtbarem Elastomerzusammensetzungen

Info

Publication number
DE69501986T2
DE69501986T2 DE69501986T DE69501986T DE69501986T2 DE 69501986 T2 DE69501986 T2 DE 69501986T2 DE 69501986 T DE69501986 T DE 69501986T DE 69501986 T DE69501986 T DE 69501986T DE 69501986 T2 DE69501986 T2 DE 69501986T2
Authority
DE
Germany
Prior art keywords
photo
flexographic printing
printing plates
plates made
elastomer compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69501986T
Other languages
English (en)
Other versions
DE69501986D1 (de
Inventor
Catherine Mayenez
Xavier Muyldermans
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kraton Polymers Research BV
Original Assignee
Shell Internationale Research Maatschappij BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shell Internationale Research Maatschappij BV filed Critical Shell Internationale Research Maatschappij BV
Application granted granted Critical
Publication of DE69501986D1 publication Critical patent/DE69501986D1/de
Publication of DE69501986T2 publication Critical patent/DE69501986T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69501986T 1994-08-10 1995-08-09 Flexodruckplatten aus fotohärtbarem Elastomerzusammensetzungen Expired - Lifetime DE69501986T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP94202298 1994-08-10

Publications (2)

Publication Number Publication Date
DE69501986D1 DE69501986D1 (de) 1998-05-14
DE69501986T2 true DE69501986T2 (de) 1998-08-27

Family

ID=8217096

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501986T Expired - Lifetime DE69501986T2 (de) 1994-08-10 1995-08-09 Flexodruckplatten aus fotohärtbarem Elastomerzusammensetzungen

Country Status (5)

Country Link
EP (1) EP0696761B1 (de)
JP (1) JP3510393B2 (de)
KR (1) KR960008405A (de)
DE (1) DE69501986T2 (de)
ES (1) ES2115313T3 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19628541A1 (de) * 1996-07-16 1998-01-22 Du Pont Deutschland Strahlungsempfindliche Zusammensetzung und ein diese enthaltendes strahlungsempfindliches Aufzeichnungsmaterial
DE19639767A1 (de) * 1996-09-27 1998-04-02 Du Pont Deutschland Flexographische Druckformen für UV härtbare Druckfarben
DE19639761A1 (de) * 1996-09-27 1998-04-02 Du Pont Deutschland Flexographische Druckformen mit verbesserter Beständigkeit gegenüber UV härtbaren Druckfarben
DE19703917A1 (de) 1997-02-03 1998-08-06 Du Pont Deutschland Flexographische Druckformen für den Wellpappendruck
JP2002519465A (ja) 1998-06-29 2002-07-02 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー 光硬化性ポリマー組成物および光硬化性ポリマー組成物を含有するフレキソ印刷版
US6326127B1 (en) * 1998-12-31 2001-12-04 Kraton Polymers U.S. Llc Photo-curable polymer composition and flexographic printing plates containing the same
EP1158364A3 (de) 2000-05-03 2003-04-23 BASF Drucksysteme GmbH Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen
WO2005031459A1 (ja) * 2003-09-25 2005-04-07 Zeon Corporation 感光性フレキソ版用ブロック共重合体組成物
US7348076B2 (en) 2004-04-08 2008-03-25 Saint-Gobain Ceramics & Plastics, Inc. Single crystals and methods for fabricating same
US7241540B2 (en) 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
WO2006051863A1 (ja) 2004-11-11 2006-05-18 Asahi Kasei Chemicals Corporation フレキソ印刷用感光性樹脂組成物
WO2006120935A1 (ja) * 2005-05-11 2006-11-16 Asahi Kasei Chemicals Corporation 感光性樹脂組成物
JP4748812B2 (ja) * 2005-11-21 2011-08-17 旭化成イーマテリアルズ株式会社 フレキソ印刷版
BR112013020399A2 (pt) 2011-02-18 2016-10-25 Kraton Polymers Us Llc composição polimérica curável, cabo, selante, e, método de enchimento de um cabo de fibra óptica
KR101407396B1 (ko) * 2011-12-30 2014-06-17 유중지 절임배추의 제조방법
EP3436490B1 (de) * 2016-03-24 2023-08-16 Kraton Polymers U.S. LLC Halbkristalline blockcopolymere und zusammensetzungen daraus

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (de) 1951-08-20
US2948611A (en) 1957-10-30 1960-08-09 Du Pont Photopolymerizable compositions, elements, and processes
US3024180A (en) 1959-08-17 1962-03-06 Du Pont Photopolymerizable elements
US3674486A (en) 1970-02-02 1972-07-04 Little Inc A Photoresist material and method of forming printing plates and resulting product
CA977202A (en) 1970-08-03 1975-11-04 Uniroyal Photosensitive compositions
US3730941A (en) 1971-08-09 1973-05-01 Westinghouse Electric Corp Polymides from tetrahydrofuran-2,3:4,5-tetracarboxylic acid dianhydrides
US3798035A (en) 1972-10-06 1974-03-19 Goodrich Co B F Method of making flexible printing plates
JPS5032647B2 (de) 1972-12-28 1975-10-23
US3951657A (en) 1973-07-27 1976-04-20 The Upjohn Company Process for making a relief printing plate
AU476446B2 (en) 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
US4045231A (en) 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
FR2318441A1 (fr) 1975-07-17 1977-02-11 Nippon Paint Co Ltd Composition
DE2720228B2 (de) 1976-05-06 1979-10-18 Japan Synthetic Rubber Co., Ltd., Tokio Photopolymerisierbares Gemisch und seine Verwendung
JPS53127004A (en) 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
JPS59142538A (ja) 1983-02-04 1984-08-15 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPS6198344A (ja) 1984-10-19 1986-05-16 Fuji Photo Film Co Ltd 新規なフオトレジスト組成物
DE3536957A1 (de) 1985-10-17 1987-04-23 Basf Ag Durch photopolymerisation vernetzbare gemische
DE3602472A1 (de) 1986-01-28 1987-07-30 Basf Ag Polymeranalog modifizierte polymerisate
JPS6370242A (ja) * 1986-09-11 1988-03-30 Nippon Zeon Co Ltd 感光性エラストマ−組成物
JPS63161443A (ja) 1986-12-24 1988-07-05 Sumitomo Chem Co Ltd フオトレジスト組成物
JPH086059B2 (ja) 1987-06-11 1996-01-24 三菱化学株式会社 近赤外光により読みとるための印刷材料
AU608016B2 (en) 1987-07-06 1991-03-21 Dow Chemical Company, The Block polymers of methacrylates and derivatives thereof
CA1335614C (en) 1987-10-30 1995-05-16 Ronald James Hoxmeier Method for preparing asymmetric radial copolymers
DE3934177A1 (de) 1989-10-13 1991-04-18 Basf Ag Photopolymerisierbare gemische und diese enthaltende lichtempfindliche aufzeichnungselemente
DE4022980C1 (de) 1990-07-19 1991-08-08 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
EP0525206B1 (de) 1991-02-15 1998-04-29 Asahi Kasei Kogyo Kabushiki Kaisha Lichtempfindliche Elastomerzusammensetzung
DE4202332A1 (de) 1992-01-29 1993-08-05 Basf Lacke & Farben Lichtempfindliches gemisch zur herstellung von relief- und druckformen
TW274086B (de) 1992-06-04 1996-04-11 Shell Internat Res Schappej Bv

Also Published As

Publication number Publication date
JPH0869107A (ja) 1996-03-12
EP0696761B1 (de) 1998-04-08
EP0696761A1 (de) 1996-02-14
ES2115313T3 (es) 1998-06-16
JP3510393B2 (ja) 2004-03-29
DE69501986D1 (de) 1998-05-14
KR960008405A (ko) 1996-03-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: DERZEIT KEIN VERTRETER BESTELLT

8327 Change in the person/name/address of the patent owner

Owner name: KRATON POLYMERS RESEARCH B.V., AMSTERDAM, NL

8328 Change in the person/name/address of the agent

Representative=s name: DTS MUENCHEN PATENT- UND RECHTSANWAELTE, 80538 MUENCHEN

8328 Change in the person/name/address of the agent

Representative=s name: DERZEIT KEIN VERTRETER BESTELLT

8328 Change in the person/name/address of the agent

Representative=s name: STOLMAR SCHEELE & PARTNER, 80331 MUENCHEN